KR20230140363A - 온도 조절장치, 온도 조절방법, 디바이스 제조장치, 및 물품 제조방법 - Google Patents

온도 조절장치, 온도 조절방법, 디바이스 제조장치, 및 물품 제조방법 Download PDF

Info

Publication number
KR20230140363A
KR20230140363A KR1020230021122A KR20230021122A KR20230140363A KR 20230140363 A KR20230140363 A KR 20230140363A KR 1020230021122 A KR1020230021122 A KR 1020230021122A KR 20230021122 A KR20230021122 A KR 20230021122A KR 20230140363 A KR20230140363 A KR 20230140363A
Authority
KR
South Korea
Prior art keywords
temperature
temperature control
heaters
control
control unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020230021122A
Other languages
English (en)
Korean (ko)
Inventor
타카후미 오타
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230140363A publication Critical patent/KR20230140363A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/20—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1951—Control of temperature characterised by the use of electric means with control of the working time of a temperature controlling device

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Automation & Control Theory (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Control Of Temperature (AREA)
  • Feedback Control In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020230021122A 2022-03-29 2023-02-17 온도 조절장치, 온도 조절방법, 디바이스 제조장치, 및 물품 제조방법 Pending KR20230140363A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022054319A JP7756588B2 (ja) 2022-03-29 2022-03-29 温調装置、温調方法、デバイス製造装置、および物品製造方法
JPJP-P-2022-054319 2022-03-29

Publications (1)

Publication Number Publication Date
KR20230140363A true KR20230140363A (ko) 2023-10-06

Family

ID=88286782

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230021122A Pending KR20230140363A (ko) 2022-03-29 2023-02-17 온도 조절장치, 온도 조절방법, 디바이스 제조장치, 및 물품 제조방법

Country Status (4)

Country Link
JP (1) JP7756588B2 (https=)
KR (1) KR20230140363A (https=)
CN (1) CN116893704A (https=)
TW (1) TWI910405B (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641709U (https=) 1979-09-01 1981-04-17

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006005135A (ja) * 2004-06-17 2006-01-05 Canon Inc 温度調節装置およびデバイス製造装置
CN100403194C (zh) * 2005-09-13 2008-07-16 广州市高澜水技术有限公司 晶闸管阀组密闭式循环纯水冷却装置控制系统
JP5641709B2 (ja) * 2009-04-23 2014-12-17 キヤノン株式会社 デバイス製造装置およびデバイス製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641709U (https=) 1979-09-01 1981-04-17

Also Published As

Publication number Publication date
TW202405572A (zh) 2024-02-01
JP7756588B2 (ja) 2025-10-20
TWI910405B (zh) 2026-01-01
CN116893704A (zh) 2023-10-17
JP2023146890A (ja) 2023-10-12

Similar Documents

Publication Publication Date Title
US8638416B2 (en) Device manufacturing apparatus, including coolant temperature control, and method of manufacturing device
JP7443454B2 (ja) リソグラフィ装置およびデバイス製造方法
US6226073B1 (en) Stage system with driving mechanism, and exposure apparatus having the same
CN1940729B (zh) 光刻装置、器件制造方法和由其制造的器件
US7116396B2 (en) Exposure device, exposure method and device manufacturing method
JP5181047B2 (ja) リソグラフィ投影装置
US20120120379A1 (en) System and method for controlling the distortion of a reticle
US12571983B2 (en) Optical system, and method for operating an optical system
TWI430049B (zh) 微影方法及裝置
WO2022101039A1 (en) A method and apparatus for thermally deforming an optical element
KR20230140363A (ko) 온도 조절장치, 온도 조절방법, 디바이스 제조장치, 및 물품 제조방법
US12339592B2 (en) Method for thermo-mechanical control of a heat sensitive element and device for use in a lithographic production process
US20100186942A1 (en) Reticle error reduction by cooling
EP4002009A1 (en) A method and apparatus for thermally deforming an optical surface of an optical element
JP5460197B2 (ja) デバイス製造装置およびデバイス製造方法
JP2006295146A (ja) 位置決め装置、露光装置及びデバイス製造方法
US20090153812A1 (en) Positioning apparatus, exposure apparatus, and device manufacturing method
KR20040075563A (ko) 노광 설비의 웨이퍼 스테이지 유닛
JP2009170888A (ja) 位置決め装置、露光装置およびデバイス製造装置

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11 Administrative time limit extension requested

Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13 Pre-grant limitation requested

Free format text: ST27 STATUS EVENT CODE: A-2-3-E10-E13-LIM-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

D22 Grant of ip right intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701