TWI910405B - 調溫裝置，調溫方法，設備製造裝置及物品製造方法 - Google Patents

調溫裝置，調溫方法，設備製造裝置及物品製造方法

Info

Publication number
TWI910405B
TWI910405B TW112105489A TW112105489A TWI910405B TW I910405 B TWI910405 B TW I910405B TW 112105489 A TW112105489 A TW 112105489A TW 112105489 A TW112105489 A TW 112105489A TW I910405 B TWI910405 B TW I910405B
Authority
TW
Taiwan
Prior art keywords
temperature
aforementioned
temperature control
heaters
control
Prior art date
Application number
TW112105489A
Other languages
English (en)
Chinese (zh)
Other versions
TW202405572A (zh
Inventor
大田崇文
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW202405572A publication Critical patent/TW202405572A/zh
Application granted granted Critical
Publication of TWI910405B publication Critical patent/TWI910405B/zh

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/20—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1951—Control of temperature characterised by the use of electric means with control of the working time of a temperature controlling device

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Automation & Control Theory (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Control Of Temperature (AREA)
  • Feedback Control In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW112105489A 2022-03-29 2023-02-16 調溫裝置，調溫方法，設備製造裝置及物品製造方法 TWI910405B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022054319A JP7756588B2 (ja) 2022-03-29 2022-03-29 温調装置、温調方法、デバイス製造装置、および物品製造方法
JP2022-054319 2022-03-29

Publications (2)

Publication Number Publication Date
TW202405572A TW202405572A (zh) 2024-02-01
TWI910405B true TWI910405B (zh) 2026-01-01

Family

ID=88286782

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112105489A TWI910405B (zh) 2022-03-29 2023-02-16 調溫裝置，調溫方法，設備製造裝置及物品製造方法

Country Status (4)

Country Link
JP (1) JP7756588B2 (https=)
KR (1) KR20230140363A (https=)
CN (1) CN116893704A (https=)
TW (1) TWI910405B (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006005135A (ja) * 2004-06-17 2006-01-05 Canon Inc 温度調節装置およびデバイス製造装置
CN1766768A (zh) * 2005-09-13 2006-05-03 中国电力科学研究院 晶闸管阀组密闭式循环纯水冷却装置控制系统
JP2010258168A (ja) * 2009-04-23 2010-11-11 Canon Inc デバイス製造装置およびデバイス製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641709U (https=) 1979-09-01 1981-04-17

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006005135A (ja) * 2004-06-17 2006-01-05 Canon Inc 温度調節装置およびデバイス製造装置
CN1766768A (zh) * 2005-09-13 2006-05-03 中国电力科学研究院 晶闸管阀组密闭式循环纯水冷却装置控制系统
JP2010258168A (ja) * 2009-04-23 2010-11-11 Canon Inc デバイス製造装置およびデバイス製造方法

Also Published As

Publication number Publication date
TW202405572A (zh) 2024-02-01
KR20230140363A (ko) 2023-10-06
JP7756588B2 (ja) 2025-10-20
CN116893704A (zh) 2023-10-17
JP2023146890A (ja) 2023-10-12

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