JP7736429B2 - 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法 - Google Patents

積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法

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Publication number
JP7736429B2
JP7736429B2 JP2020182131A JP2020182131A JP7736429B2 JP 7736429 B2 JP7736429 B2 JP 7736429B2 JP 2020182131 A JP2020182131 A JP 2020182131A JP 2020182131 A JP2020182131 A JP 2020182131A JP 7736429 B2 JP7736429 B2 JP 7736429B2
Authority
JP
Japan
Prior art keywords
resistive layer
resistance
heating
less
laminated film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020182131A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022072602A (ja
Inventor
才将 西森
一裕 中島
智剛 梨木
英二 丹羽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2020182131A priority Critical patent/JP7736429B2/ja
Priority to US18/251,270 priority patent/US20230408244A1/en
Priority to PCT/JP2021/039823 priority patent/WO2022092202A1/ja
Priority to CN202180072118.3A priority patent/CN116438062A/zh
Priority to TW110140320A priority patent/TW202225651A/zh
Publication of JP2022072602A publication Critical patent/JP2022072602A/ja
Priority to JP2025093877A priority patent/JP2025116237A/ja
Application granted granted Critical
Publication of JP7736429B2 publication Critical patent/JP7736429B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/16—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge
    • G01B7/18—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge using change in resistance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Laminated Bodies (AREA)
JP2020182131A 2020-10-30 2020-10-30 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法 Active JP7736429B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2020182131A JP7736429B2 (ja) 2020-10-30 2020-10-30 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法
US18/251,270 US20230408244A1 (en) 2020-10-30 2021-10-28 Laminated film, method for producing second laminated film, and method for producing strain sensor
PCT/JP2021/039823 WO2022092202A1 (ja) 2020-10-30 2021-10-28 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法
CN202180072118.3A CN116438062A (zh) 2020-10-30 2021-10-28 层叠薄膜、第2层叠薄膜的制造方法和应变传感器的制造方法
TW110140320A TW202225651A (zh) 2020-10-30 2021-10-29 積層膜、第2積層膜之製造方法及應變感測器之製造方法
JP2025093877A JP2025116237A (ja) 2020-10-30 2025-06-05 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020182131A JP7736429B2 (ja) 2020-10-30 2020-10-30 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法

Related Child Applications (1)

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JP2025093877A Division JP2025116237A (ja) 2020-10-30 2025-06-05 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法

Publications (2)

Publication Number Publication Date
JP2022072602A JP2022072602A (ja) 2022-05-17
JP7736429B2 true JP7736429B2 (ja) 2025-09-09

Family

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Family Applications (2)

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JP2020182131A Active JP7736429B2 (ja) 2020-10-30 2020-10-30 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法
JP2025093877A Pending JP2025116237A (ja) 2020-10-30 2025-06-05 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法

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JP2025093877A Pending JP2025116237A (ja) 2020-10-30 2025-06-05 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法

Country Status (5)

Country Link
US (1) US20230408244A1 (https=)
JP (2) JP7736429B2 (https=)
CN (1) CN116438062A (https=)
TW (1) TW202225651A (https=)
WO (1) WO2022092202A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022150486A (ja) * 2021-03-26 2022-10-07 Tdk株式会社 歪抵抗膜、圧力センサおよび積層体

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004512515A (ja) 1999-04-29 2004-04-22 ザ・ボード・オブ・ガバナーズ・フォー・ハイヤー・エデュケイション、ステイト・オブ・ロード・アイランド・アンド・プロビデンス・プランテーションズ 高温で使用するための自己補償型セラミック歪みゲージ
JP2014074661A (ja) 2012-10-04 2014-04-24 Research Institute For Electromagnetic Materials 歪ゲージ
JP2018151204A (ja) 2017-03-10 2018-09-27 公益財団法人電磁材料研究所 水素ガス環境用歪センサ
JP2019066311A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2020129013A (ja) 2020-06-05 2020-08-27 ミネベアミツミ株式会社 ひずみゲージ
JP2022072604A (ja) 2020-10-30 2022-05-17 日東電工株式会社 積層フィルム、その製造方法およびひずみセンサ
JP2022072607A (ja) 2020-10-30 2022-05-17 日東電工株式会社 積層フィルムおよび歪みセンサの製造方法

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JP2562610B2 (ja) * 1987-08-08 1996-12-11 株式会社豊田中央研究所 歪ゲ−ジ用薄膜抵抗体
JP3642449B2 (ja) * 1997-03-21 2005-04-27 財団法人電気磁気材料研究所 Ｃｒ−Ｎ基歪抵抗膜およびその製造法ならびに歪センサ
CN107331487B (zh) * 2017-06-20 2019-04-09 华南理工大学 一种用于高温环境的TaN薄膜电阻及其制备方法
JP2019066312A (ja) * 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2019066454A (ja) * 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ、センサモジュール
JP2019066453A (ja) * 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2019066313A (ja) * 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2019082424A (ja) * 2017-10-31 2019-05-30 ミネベアミツミ株式会社 ひずみゲージ
JP2019090724A (ja) * 2017-11-15 2019-06-13 ミネベアミツミ株式会社 ひずみゲージ
JP2019090723A (ja) * 2017-11-15 2019-06-13 ミネベアミツミ株式会社 ひずみゲージ
JP2019113411A (ja) * 2017-12-22 2019-07-11 ミネベアミツミ株式会社 ひずみゲージ、センサモジュール
JP2019132790A (ja) * 2018-02-02 2019-08-08 ミネベアミツミ株式会社 ひずみゲージ
JP2019184344A (ja) * 2018-04-05 2019-10-24 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
JP2020053433A (ja) * 2018-09-21 2020-04-02 Koa株式会社 歪センサ抵抗器
WO2020085247A1 (ja) * 2018-10-23 2020-04-30 ミネベアミツミ株式会社 アクセルペダル、ステアリング、６軸センサ、エンジン、バンパー等

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004512515A (ja) 1999-04-29 2004-04-22 ザ・ボード・オブ・ガバナーズ・フォー・ハイヤー・エデュケイション、ステイト・オブ・ロード・アイランド・アンド・プロビデンス・プランテーションズ 高温で使用するための自己補償型セラミック歪みゲージ
JP2014074661A (ja) 2012-10-04 2014-04-24 Research Institute For Electromagnetic Materials 歪ゲージ
JP2018151204A (ja) 2017-03-10 2018-09-27 公益財団法人電磁材料研究所 水素ガス環境用歪センサ
JP2019066311A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2020129013A (ja) 2020-06-05 2020-08-27 ミネベアミツミ株式会社 ひずみゲージ
JP2022072604A (ja) 2020-10-30 2022-05-17 日東電工株式会社 積層フィルム、その製造方法およびひずみセンサ
JP2022072607A (ja) 2020-10-30 2022-05-17 日東電工株式会社 積層フィルムおよび歪みセンサの製造方法

Also Published As

Publication number Publication date
TW202225651A (zh) 2022-07-01
WO2022092202A1 (ja) 2022-05-05
CN116438062A (zh) 2023-07-14
JP2025116237A (ja) 2025-08-07
JP2022072602A (ja) 2022-05-17
US20230408244A1 (en) 2023-12-21

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