JP7730727B2 - インプリント装置、及び物品の製造方法 - Google Patents

インプリント装置、及び物品の製造方法

Info

Publication number
JP7730727B2
JP7730727B2 JP2021183520A JP2021183520A JP7730727B2 JP 7730727 B2 JP7730727 B2 JP 7730727B2 JP 2021183520 A JP2021183520 A JP 2021183520A JP 2021183520 A JP2021183520 A JP 2021183520A JP 7730727 B2 JP7730727 B2 JP 7730727B2
Authority
JP
Japan
Prior art keywords
substrate
mold
imprint
unit
tilt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021183520A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023070981A5 (enExample
JP2023070981A (ja
Inventor
直城 丸山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2021183520A priority Critical patent/JP7730727B2/ja
Priority to US17/969,909 priority patent/US12447666B2/en
Priority to KR1020220144296A priority patent/KR20230068314A/ko
Publication of JP2023070981A publication Critical patent/JP2023070981A/ja
Publication of JP2023070981A5 publication Critical patent/JP2023070981A5/ja
Application granted granted Critical
Publication of JP7730727B2 publication Critical patent/JP7730727B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C2037/90—Measuring, controlling or regulating
    • B29C2037/903—Measuring, controlling or regulating by means of a computer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
JP2021183520A 2021-11-10 2021-11-10 インプリント装置、及び物品の製造方法 Active JP7730727B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2021183520A JP7730727B2 (ja) 2021-11-10 2021-11-10 インプリント装置、及び物品の製造方法
US17/969,909 US12447666B2 (en) 2021-11-10 2022-10-20 Imprint apparatus and article manufacturing method
KR1020220144296A KR20230068314A (ko) 2021-11-10 2022-11-02 임프린트 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021183520A JP7730727B2 (ja) 2021-11-10 2021-11-10 インプリント装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2023070981A JP2023070981A (ja) 2023-05-22
JP2023070981A5 JP2023070981A5 (enExample) 2024-11-07
JP7730727B2 true JP7730727B2 (ja) 2025-08-28

Family

ID=86229363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021183520A Active JP7730727B2 (ja) 2021-11-10 2021-11-10 インプリント装置、及び物品の製造方法

Country Status (3)

Country Link
US (1) US12447666B2 (enExample)
JP (1) JP7730727B2 (enExample)
KR (1) KR20230068314A (enExample)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013243315A (ja) 2012-05-22 2013-12-05 Canon Inc インプリント装置、インプリント方法及び物品の製造方法
JP2015130448A (ja) 2014-01-08 2015-07-16 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2016021441A (ja) 2014-07-11 2016-02-04 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016195183A (ja) 2015-03-31 2016-11-17 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP2017157639A (ja) 2016-02-29 2017-09-07 キヤノン株式会社 インプリント装置、および物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013243315A (ja) 2012-05-22 2013-12-05 Canon Inc インプリント装置、インプリント方法及び物品の製造方法
JP2015130448A (ja) 2014-01-08 2015-07-16 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2016021441A (ja) 2014-07-11 2016-02-04 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016195183A (ja) 2015-03-31 2016-11-17 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP2017157639A (ja) 2016-02-29 2017-09-07 キヤノン株式会社 インプリント装置、および物品の製造方法

Also Published As

Publication number Publication date
US20230145758A1 (en) 2023-05-11
US12447666B2 (en) 2025-10-21
JP2023070981A (ja) 2023-05-22
KR20230068314A (ko) 2023-05-17

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