JP7728765B2 - 被覆粒子を含む軟磁性粉末 - Google Patents

被覆粒子を含む軟磁性粉末

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Publication number
JP7728765B2
JP7728765B2 JP2022542373A JP2022542373A JP7728765B2 JP 7728765 B2 JP7728765 B2 JP 7728765B2 JP 2022542373 A JP2022542373 A JP 2022542373A JP 2022542373 A JP2022542373 A JP 2022542373A JP 7728765 B2 JP7728765 B2 JP 7728765B2
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Prior art keywords
solid oxide
layers
shell
soft magnetic
core
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JP2022542373A
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Japanese (ja)
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JP2023509796A5 (https=
JPWO2021140156A5 (https=
JP2023509796A (ja
Inventor
プランチャック，ロバート
エー． ヒメネス，ホセ
ケーニヒ，レネ
ヨクジモフィク，ラストコ
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BASF SE
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BASF SE
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
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    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
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    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05—Metallic powder characterised by the size or surface area of the particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/16—Metallic particles coated with a non-metal
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0206—Manufacturing of magnetic cores by mechanical means
    • H01F41/0246—Manufacturing of magnetic circuits by moulding or by pressing powder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/06—Metallic powder characterised by the shape of the particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2301/00—Metallic composition of the powder or its coating
    • B22F2301/35—Iron
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2302/00—Metal Compound, non-Metallic compound or non-metal composition of the powder or its coating
    • B22F2302/25—Oxide
    • B22F2302/253—Aluminum oxide (Al2O3)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2302/00—Metal Compound, non-Metallic compound or non-metal composition of the powder or its coating
    • B22F2302/25—Oxide
    • B22F2302/256—Silicium oxide (SiO2)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C2202/00—Physical properties
    • C22C2202/02—Magnetic

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Soft Magnetic Materials (AREA)
  • Powder Metallurgy (AREA)
  • Compounds Of Iron (AREA)
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JP7413786B2 (ja) * 2020-01-15 2024-01-16 セイコーエプソン株式会社 圧粉磁心の製造方法および圧粉磁心
KR102815906B1 (ko) * 2020-11-17 2025-06-04 삼성전기주식회사 자성 시트 및 이를 이용한 코일 부품
US12322695B2 (en) 2020-12-01 2025-06-03 Ferric Inc. Magnetic core with hard ferromagnetic biasing layers and structures containing same
EP4367692A1 (en) * 2021-07-16 2024-05-15 Ferric Inc. Ferromagnetic-polymer composite material and structures comprising same
US12224091B2 (en) 2021-07-16 2025-02-11 Ferric Inc. Ferromagnetic-polymer composite material and structures comprising same
US12125713B2 (en) 2022-03-22 2024-10-22 Ferric Inc. Method for manufacturing ferromagnetic-dielectric composite material
EP4569152A1 (en) * 2022-08-10 2025-06-18 Basf Se Process for preparing coated organic particles
KR102703464B1 (ko) * 2022-11-30 2024-09-06 한국전자기술연구원 전자기파 차폐용 복합재 및 이의 제조 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005501176A (ja) 2001-07-18 2005-01-13 ザ・リージエンツ・オブ・ザ・ユニバーシテイ・オブ・コロラド コンフォーマル超薄膜を有する金属含有微粒子の絶縁化及び機能化方法
JP2006188727A (ja) 2005-01-05 2006-07-20 Sony Corp 金属磁性ナノ粒子群及びその製造方法
JP2006351946A (ja) 2005-06-17 2006-12-28 Fuji Electric Holdings Co Ltd 軟磁性成形体の製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3428121A1 (de) 1984-07-31 1986-02-13 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von eisenpulver
DE3940347C2 (de) 1989-12-06 1997-02-20 Basf Ag Verfahren zur Herstellung von Eisenwhiskers
JP3032927B2 (ja) * 1993-02-05 2000-04-17 日鉄鉱業株式会社 表面に金属酸化物膜を有する金属又は金属化合物粉体
US6713117B1 (en) 1998-10-02 2004-03-30 Dharma Kodali Vegetable oil having elevated stearic acid content
US6613383B1 (en) 1999-06-21 2003-09-02 Regents Of The University Of Colorado Atomic layer controlled deposition on particle surfaces
US6713177B2 (en) 2000-06-21 2004-03-30 Regents Of The University Of Colorado Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films
WO2007148734A1 (ja) * 2006-06-20 2007-12-27 Hitachi Metals, Ltd. 金属微粒子及び生体物質抽出用の磁気ビーズ、並びにそれらの製造方法
JP4585493B2 (ja) 2006-08-07 2010-11-24 株式会社東芝 絶縁性磁性材料の製造方法
CN103046033A (zh) 2012-12-21 2013-04-17 中国钢研科技集团有限公司 一种包覆型羰基铁粉的制备方法
JP7015647B2 (ja) * 2016-06-30 2022-02-03 太陽誘電株式会社 磁性材料及び電子部品
JP6930722B2 (ja) * 2017-06-26 2021-09-01 太陽誘電株式会社 磁性材料、電子部品及び磁性材料の製造方法
CN108183012A (zh) * 2017-12-25 2018-06-19 郑州轻工业学院 一种提高铁基软磁复合材料压制密度的绝缘包覆处理方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005501176A (ja) 2001-07-18 2005-01-13 ザ・リージエンツ・オブ・ザ・ユニバーシテイ・オブ・コロラド コンフォーマル超薄膜を有する金属含有微粒子の絶縁化及び機能化方法
JP2006188727A (ja) 2005-01-05 2006-07-20 Sony Corp 金属磁性ナノ粒子群及びその製造方法
JP2006351946A (ja) 2005-06-17 2006-12-28 Fuji Electric Holdings Co Ltd 軟磁性成形体の製造方法

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