JP7677548B2 - 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー - Google Patents

樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー Download PDF

Info

Publication number
JP7677548B2
JP7677548B2 JP2024547854A JP2024547854A JP7677548B2 JP 7677548 B2 JP7677548 B2 JP 7677548B2 JP 2024547854 A JP2024547854 A JP 2024547854A JP 2024547854 A JP2024547854 A JP 2024547854A JP 7677548 B2 JP7677548 B2 JP 7677548B2
Authority
JP
Japan
Prior art keywords
general formula
group
polymer
resin composition
structural unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024547854A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024203829A5 (https=
JPWO2024203829A1 (https=
Inventor
瞬 早川
祐輝 上田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Publication of JPWO2024203829A1 publication Critical patent/JPWO2024203829A1/ja
Publication of JPWO2024203829A5 publication Critical patent/JPWO2024203829A5/ja
Application granted granted Critical
Publication of JP7677548B2 publication Critical patent/JP7677548B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/02—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
    • C08F232/04—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings having one carbon-to-carbon double bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2024547854A 2023-03-29 2024-03-22 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー Active JP7677548B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023053506 2023-03-29
JP2023053506 2023-03-29
PCT/JP2024/011256 WO2024203829A1 (ja) 2023-03-29 2024-03-22 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー

Publications (3)

Publication Number Publication Date
JPWO2024203829A1 JPWO2024203829A1 (https=) 2024-10-03
JPWO2024203829A5 JPWO2024203829A5 (https=) 2025-03-06
JP7677548B2 true JP7677548B2 (ja) 2025-05-15

Family

ID=92906340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024547854A Active JP7677548B2 (ja) 2023-03-29 2024-03-22 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー

Country Status (5)

Country Link
JP (1) JP7677548B2 (https=)
KR (1) KR20250167010A (https=)
CN (1) CN121002114A (https=)
TW (1) TW202502856A (https=)
WO (1) WO2024203829A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301278A (ja) 2005-04-20 2006-11-02 Fuji Photo Film Co Ltd 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2018002855A (ja) 2016-06-30 2018-01-11 住友ベークライト株式会社 ポリマー、感光性樹脂組成物および電子装置
JP2019045622A (ja) 2017-08-31 2019-03-22 住友ベークライト株式会社 感光性樹脂組成物、パターン形成方法、電子デバイスの製造方法、ポリマーおよびポリマーの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301278A (ja) 2005-04-20 2006-11-02 Fuji Photo Film Co Ltd 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2018002855A (ja) 2016-06-30 2018-01-11 住友ベークライト株式会社 ポリマー、感光性樹脂組成物および電子装置
JP2019045622A (ja) 2017-08-31 2019-03-22 住友ベークライト株式会社 感光性樹脂組成物、パターン形成方法、電子デバイスの製造方法、ポリマーおよびポリマーの製造方法

Also Published As

Publication number Publication date
WO2024203829A1 (ja) 2024-10-03
TW202502856A (zh) 2025-01-16
KR20250167010A (ko) 2025-11-28
JPWO2024203829A1 (https=) 2024-10-03
CN121002114A (zh) 2025-11-21

Similar Documents

Publication Publication Date Title
JP4893402B2 (ja) 微細パターン形成方法
JP4996678B2 (ja) 湿式現像可能な底面反射防止膜組成物及びその使用方法
JPWO2010134639A1 (ja) レジストパターンの形成方法および現像液
JPH054662B2 (https=)
JPH06184311A (ja) 酸感応ポリマおよびホトレジスト構造の作成方法
JPWO2018230671A1 (ja) パターン形成方法及びｅｕｖリソグラフィー用ケイ素含有膜形成組成物
JP4527827B2 (ja) フォトレジスト架橋剤、フォトレジスト組成物、フォトレジストパターン形成方法、および半導体素子
JP7219292B2 (ja) レジスト下層膜用組成物およびこれを用いたパターン形成方法
JP7677548B2 (ja) 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー
JP4356090B2 (ja) シリコン含有レジスト組成物、およびパターニングされた材料を基板上に形成する方法（２層式リソグラフィ用の低シリコン・ガス放出レジスト）
KR100455652B1 (ko) 포지티브형 포토레지스트 막의 제조방법
JP2012153874A (ja) 親水性モノマー、それを含有する親水性フォトレジスト組成物、およびレジストパターン形成方法
KR102563289B1 (ko) 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법
TW581931B (en) Composition for positive type photoresist
JP5534205B2 (ja) 感光性レジスト下層膜形成組成物及びレジストパターンの形成方法
JP2026005458A (ja) 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー
CN118707807B (zh) 图案化组合物、图案化薄膜、图案化基底、半导体器件及其制造方法
JP2024092902A (ja) 感活性光線性または感放射線性樹脂組成物、パターン形成方法および電子デバイスの製造方法
KR102563287B1 (ko) 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법
JP2026058470A (ja) ポリマー、ポリマーの製造方法、樹脂組成物、パターン形成方法および電子装置の製造方法
CN120909060A (zh) 抗蚀剂底层组合物和使用组合物形成图案的方法
JP2026058988A (ja) ポリマー、ポリマーの製造方法、樹脂組成物、パターン形成方法および電子装置の製造方法
TW202611015A (zh) 化合物、微影膜形成用組成物、阻劑膜，及阻劑圖型之形成方法
JP2025110326A (ja) 有機膜形成用組成物、有機膜形成方法、パターン形成方法、及び界面活性剤
JP2025110317A (ja) 有機膜形成用組成物、有機膜形成方法、及びパターン形成方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240814

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240814

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20240814

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20241203

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250401

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250414

R150 Certificate of patent or registration of utility model

Ref document number: 7677548

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150