JPWO2024203829A1 - - Google Patents
Info
- Publication number
- JPWO2024203829A1 JPWO2024203829A1 JP2024547854A JP2024547854A JPWO2024203829A1 JP WO2024203829 A1 JPWO2024203829 A1 JP WO2024203829A1 JP 2024547854 A JP2024547854 A JP 2024547854A JP 2024547854 A JP2024547854 A JP 2024547854A JP WO2024203829 A1 JPWO2024203829 A1 JP WO2024203829A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/02—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
- C08F232/04—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings having one carbon-to-carbon double bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
- C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023053506 | 2023-03-29 | ||
| JP2023053506 | 2023-03-29 | ||
| PCT/JP2024/011256 WO2024203829A1 (ja) | 2023-03-29 | 2024-03-22 | 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2024203829A1 true JPWO2024203829A1 (https=) | 2024-10-03 |
| JPWO2024203829A5 JPWO2024203829A5 (https=) | 2025-03-06 |
| JP7677548B2 JP7677548B2 (ja) | 2025-05-15 |
Family
ID=92906340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024547854A Active JP7677548B2 (ja) | 2023-03-29 | 2024-03-22 | 樹脂組成物、パターン形成方法、電子デバイスの製造方法およびポリマー |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7677548B2 (https=) |
| KR (1) | KR20250167010A (https=) |
| CN (1) | CN121002114A (https=) |
| TW (1) | TW202502856A (https=) |
| WO (1) | WO2024203829A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006301278A (ja) * | 2005-04-20 | 2006-11-02 | Fuji Photo Film Co Ltd | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2018002855A (ja) * | 2016-06-30 | 2018-01-11 | 住友ベークライト株式会社 | ポリマー、感光性樹脂組成物および電子装置 |
| JP2019045622A (ja) * | 2017-08-31 | 2019-03-22 | 住友ベークライト株式会社 | 感光性樹脂組成物、パターン形成方法、電子デバイスの製造方法、ポリマーおよびポリマーの製造方法 |
-
2024
- 2024-03-22 CN CN202480023211.9A patent/CN121002114A/zh active Pending
- 2024-03-22 JP JP2024547854A patent/JP7677548B2/ja active Active
- 2024-03-22 KR KR1020257035384A patent/KR20250167010A/ko active Pending
- 2024-03-22 WO PCT/JP2024/011256 patent/WO2024203829A1/ja not_active Ceased
- 2024-03-26 TW TW113111207A patent/TW202502856A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006301278A (ja) * | 2005-04-20 | 2006-11-02 | Fuji Photo Film Co Ltd | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2018002855A (ja) * | 2016-06-30 | 2018-01-11 | 住友ベークライト株式会社 | ポリマー、感光性樹脂組成物および電子装置 |
| JP2019045622A (ja) * | 2017-08-31 | 2019-03-22 | 住友ベークライト株式会社 | 感光性樹脂組成物、パターン形成方法、電子デバイスの製造方法、ポリマーおよびポリマーの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024203829A1 (ja) | 2024-10-03 |
| TW202502856A (zh) | 2025-01-16 |
| KR20250167010A (ko) | 2025-11-28 |
| JP7677548B2 (ja) | 2025-05-15 |
| CN121002114A (zh) | 2025-11-21 |
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