JP7673217B2 - ペリクル、露光原版、露光装置、及びペリクルの製造方法 - Google Patents

ペリクル、露光原版、露光装置、及びペリクルの製造方法 Download PDF

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Publication number
JP7673217B2
JP7673217B2 JP2023547021A JP2023547021A JP7673217B2 JP 7673217 B2 JP7673217 B2 JP 7673217B2 JP 2023547021 A JP2023547021 A JP 2023547021A JP 2023547021 A JP2023547021 A JP 2023547021A JP 7673217 B2 JP7673217 B2 JP 7673217B2
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Japan
Prior art keywords
pellicle
mass
adhesive layer
meth
parts
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JP2023547021A
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English (en)
Japanese (ja)
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JPWO2023038139A1 (https=
JPWO2023038139A5 (https=
Inventor
崇 畦崎
佳一郎 春田
靖 佐藤
健 伊藤
陽介 小野
真史 藤村
比佐子 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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Publication of JPWO2023038139A1 publication Critical patent/JPWO2023038139A1/ja
Publication of JPWO2023038139A5 publication Critical patent/JPWO2023038139A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP2023547021A 2021-09-13 2022-09-12 ペリクル、露光原版、露光装置、及びペリクルの製造方法 Active JP7673217B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021148630 2021-09-13
JP2021148630 2021-09-13
PCT/JP2022/034108 WO2023038139A1 (ja) 2021-09-13 2022-09-12 ペリクル、露光原版、露光装置、及びペリクルの製造方法

Publications (3)

Publication Number Publication Date
JPWO2023038139A1 JPWO2023038139A1 (https=) 2023-03-16
JPWO2023038139A5 JPWO2023038139A5 (https=) 2024-06-04
JP7673217B2 true JP7673217B2 (ja) 2025-05-08

Family

ID=85506430

Family Applications (1)

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JP2023547021A Active JP7673217B2 (ja) 2021-09-13 2022-09-12 ペリクル、露光原版、露光装置、及びペリクルの製造方法

Country Status (5)

Country Link
US (1) US20240377726A1 (https=)
JP (1) JP7673217B2 (https=)
KR (1) KR20240047426A (https=)
CN (1) CN118020023A (https=)
WO (1) WO2023038139A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230080753A1 (en) * 2020-03-27 2023-03-16 Mitsui Chemicals, Inc. Pellicle, and production method therefor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015114502A (ja) 2013-12-12 2015-06-22 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法
JP2016156882A (ja) 2015-02-23 2016-09-01 旭化成株式会社 ペリクル
JP2018021182A (ja) 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5319501B2 (ja) 2009-11-18 2013-10-16 旭化成イーマテリアルズ株式会社 ペリクル
KR102172218B1 (ko) * 2018-07-31 2020-10-30 주식회사 시엠테크놀로지 펠리클 수납용기

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015114502A (ja) 2013-12-12 2015-06-22 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法
JP2016156882A (ja) 2015-02-23 2016-09-01 旭化成株式会社 ペリクル
JP2018021182A (ja) 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法

Also Published As

Publication number Publication date
US20240377726A1 (en) 2024-11-14
WO2023038139A1 (ja) 2023-03-16
TW202314378A (zh) 2023-04-01
KR20240047426A (ko) 2024-04-12
JPWO2023038139A1 (https=) 2023-03-16
CN118020023A (zh) 2024-05-10

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