WO2023038139A1 - ペリクル、露光原版、露光装置、及びペリクルの製造方法 - Google Patents

ペリクル、露光原版、露光装置、及びペリクルの製造方法 Download PDF

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Publication number
WO2023038139A1
WO2023038139A1 PCT/JP2022/034108 JP2022034108W WO2023038139A1 WO 2023038139 A1 WO2023038139 A1 WO 2023038139A1 JP 2022034108 W JP2022034108 W JP 2022034108W WO 2023038139 A1 WO2023038139 A1 WO 2023038139A1
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Prior art keywords
pellicle
mass
adhesive layer
meth
parts
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PCT/JP2022/034108
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English (en)
French (fr)
Japanese (ja)
Inventor
崇 畦崎
佳一郎 春田
靖 佐藤
健 伊藤
陽介 小野
真史 藤村
比佐子 石川
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Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Priority to JP2023547021A priority Critical patent/JP7673217B2/ja
Priority to US18/690,494 priority patent/US20240377726A1/en
Priority to CN202280061342.7A priority patent/CN118020023A/zh
Priority to KR1020247008338A priority patent/KR20240047426A/ko
Publication of WO2023038139A1 publication Critical patent/WO2023038139A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Definitions

  • the present disclosure relates to a pellicle, an exposure original plate, an exposure apparatus, and a method for manufacturing a pellicle.
  • a technique that is, photolithography
  • photolithography is known for forming a pattern by applying a photosensitive substance to the surface of an object such as an electronic component, a printed circuit board, or a display panel and exposing it in a pattern.
  • Photolithography uses a transparent substrate with a pattern on one side. This transparent substrate is called a photomask (hereinafter also referred to as "original").
  • a pellicle is attached to the photomask in order to prevent foreign matter such as dust from adhering to the surface of the photomask.
  • Patent Literature 1 discloses a pellicle that leaves little residue after pellicle peeling without adding compounds such as surface modifiers.
  • the pellicle disclosed in Patent Document 1 includes a pellicle frame, a pellicle membrane, and a pellicle adhesive.
  • the pellicle membrane is stretched over the upper end surface of the pellicle frame.
  • the pellicle adhesive is attached to the lower end surface of the pellicle frame.
  • the pellicle pressure-sensitive adhesive has a ratio of peel strength to tensile strength within a predetermined range.
  • Patent Document 2 discloses that the polymerization initiator in the adhesive layer is set to 8 ppm or less in order to prevent haze. It is described that (meth)acrylic acid alkyl esters having
  • Patent Document 1 JP-A-2018-21182
  • Patent Document 2 JP-A-2011-107469
  • the photomask moves at high speed.
  • the pellicle must be kept attached to prevent foreign matter from adhering to the photomask. Therefore, the adhesive layer of the pellicle is required to have a peeling strength that prevents the pellicle from peeling off from the photomask during exposure.
  • EUV light is easily absorbed by photomasks. Therefore, the photomask tends to reach a high temperature during exposure to EUV light. The heat of the photomask is conducted to the pellicle.
  • the adhesive layer of the pellicle tends to absorb scattered EUV light.
  • practical EUV light sources with high power are being developed. As a result, exposure to EUV light exposes the pellicle to high temperatures.
  • the temperature to which the pellicle is exposed is expected to be 60°C.
  • the peel strength of the pellicle described in Patent Document 1 may decrease when exposed to a high-temperature environment.
  • the pellicle described in Patent Literature 1 may peel off from the photomask during EUV exposure.
  • a soft adhesive layer is often used as the adhesive layer of the pellicle in order to suppress the distortion that the pellicle gives to the photomask when the pellicle is attached to the photomask.
  • the peel strength of soft pressure-sensitive adhesives may decrease when exposed to high-temperature environments.
  • a pellicle used for exposure with EUV light is required to maintain peeling strength so that it does not peel off from the photomask even in a high-temperature environment.
  • Pellicles used in exposure to light other than EUV light such as ArF are also required to have high reliability in order to extend the usable life.
  • An object to be solved by an embodiment of the present disclosure is to provide a pellicle, an exposure original plate, an exposure apparatus, and a method for manufacturing a pellicle that are not easily peeled off from a photomask even when exposed to a high-temperature environment.
  • "High temperature environment” refers to a temperature of 60°C.
  • Means for solving the above problems include the following embodiments. ⁇ 1> a pellicle frame; a pellicle membrane supported on one end surface of the pellicle frame; an adhesive layer provided on the other end face of the pellicle frame, A pellicle that satisfies the following formula (1).
  • Formula (1) [A 60° C. ] ⁇ 4.0 gf/mm 2 (In the above formula (1), [A 60 ° C. ] indicates the first peel strength when the pellicle is used as a test laminate, The test laminated body was obtained by placing the pellicle on a quartz glass substrate so that the adhesive layer was in contact with the surface of the quartz glass substrate, and holding a load of 5 kgf on the pellicle for 30 seconds.
  • Formula (3) [A23 °C ] ⁇ 30.0 gf/ mm2 ⁇ 4>
  • the adhesive layer contains a copolymer of a (meth)acrylic acid alkyl ester monomer and a monomer having a functional group reactive with at least one of an isocyanate group, an epoxy group, and an acid anhydride.
  • the adhesive layer contains a copolymer of a (meth)acrylic acid alkyl ester monomer and a monomer having a functional group reactive with at least one of an isocyanate group, an epoxy group and an acid anhydride,
  • the content of the (meth)acrylic acid alkyl ester monomer is 80 parts by mass to 99.5 parts by mass with respect to the total amount of 100 parts by mass of the monomers constituting the copolymer, the ⁇ 5 A pellicle according to any one of > to ⁇ 7>.
  • the content of the monomer having a functional group is 0.5 parts by mass to 20 parts by mass with respect to the total amount of 100 parts by mass of the monomers constituting the copolymer, ⁇ 5> to ⁇ 8> The pellicle according to any one of 8>.
  • the adhesive layer contains a reaction product of the copolymer and a cross-linking agent, Any of ⁇ 5> to ⁇ 9>, wherein the content of the cross-linking agent is 0.002 parts by mass to 3.000 parts by mass with respect to 100 parts by mass of the total amount of the monomers constituting the copolymer. or a pellicle according to one of the preceding claims.
  • An exposure original plate comprising an original plate having a pattern, and the pellicle according to any one of ⁇ 1> to ⁇ 10> attached to the surface of the original plate having the pattern.
  • ⁇ 12> a light source that emits exposure light;
  • the exposure original plate according to ⁇ 11>above; an optical system that guides the exposure light emitted from the light source to the exposure original plate; has An exposure apparatus, wherein the exposure original plate is arranged such that the exposure light emitted from the light source passes through the pellicle film and is irradiated onto the original plate.
  • a pellicle that does not easily peel off from the master even when exposed to a high-temperature environment an exposure master, an exposure apparatus, and a pellicle manufacturing method are provided.
  • FIG. 1 is a schematic cross-sectional view showing a cross section of a pellicle according to an example.
  • a numerical range indicated using “to” means a range including the numerical values before and after “to” as the minimum and maximum values, respectively.
  • upper or lower limits described in a certain numerical range may be replaced with upper or lower limits of other numerical ranges described step by step.
  • upper or lower limits described in a certain numerical range may be replaced with values shown in Examples.
  • a combination of two or more preferred aspects is a more preferred aspect.
  • the amount of each component means the total amount of the multiple types of substances unless otherwise specified when there are multiple types of substances corresponding to each component.
  • process is not only an independent process, but even if it cannot be clearly distinguished from other processes, it is included in the term as long as the intended purpose of the process is achieved.
  • (meth)acryl when used, it means one or both of "acryl” and “methacryl”.
  • a pellicle according to an embodiment of the present disclosure includes a pellicle frame, a pellicle film, and an adhesive layer.
  • the pellicle membrane is supported on one end face of the pellicle frame.
  • the adhesive layer is provided on the other end surface of the pellicle frame.
  • a pellicle according to an embodiment satisfies the following formula (1).
  • [A 60° C. ] ⁇ 4.0 gf/mm 2 indicates the first peel strength when the pellicle is used as a test laminate.
  • the test laminated body was obtained by placing the pellicle on a quartz glass substrate so that the adhesive layer was in contact with the surface of the quartz glass substrate, and holding a load of 5 kgf on the pellicle for 30 seconds. It is obtained by leaving it at 23° C. for 24 hours after removing it.
  • the first peel strength was measured by using a standard universal testing machine to test the pellicle frame against the quartz glass substrate at a speed of 0.1 mm/sec under the condition that the temperature of the quartz glass substrate was 60°C.
  • the load per unit adhesion area required to separate the pellicle included in the test laminate from the quartz glass substrate when the pellicle frame is pulled along the height direction is shown. The details of the method for measuring the first peel strength will be described later in Examples.
  • the reason why the temperature of the quartz glass substrate is set to 60° C. when measuring the first peel strength is that the temperature to which the pellicle is exposed is expected to be 60° C. in exposure to EUV light. .
  • the pellicle according to the embodiment Since the pellicle according to the embodiment has the above configuration, it is difficult to separate from the master even when exposed to a high-temperature environment (for example, 60° C.). The original version will be described later.
  • the DUV light is less likely to be absorbed by the original or the like. Therefore, in the exposure with DUV light, the temperature to which the pellicle is exposed is expected to be about room temperature (23° C.).
  • the pellicle according to the embodiment is used for DUV exposure, there is a need to increase the first peel strength in a high-temperature environment.
  • Pellicles according to embodiments can meet such needs. In other words, the pellicle according to the embodiment is highly reliable.
  • the pellicle according to the embodiment satisfies Expression (1).
  • the lower limit of [ A60°C ] is 4.0 gf/mm2 or more, preferably 5.0 gf/mm2 or more, more preferably 8.0 gf/mm2 or more , and still more preferably 10.0 gf/ mm2 or more. is. If the lower limit of [A 60° C. ] is 5.0 gf/mm 2 or more, the pellicle will be less likely to peel off from the original plate even when exposed to a high-temperature environment, and higher reliability can be expected.
  • [A 60° C. ] is not limited, but can be, for example, 30.0 gf/mm 2 or less, 25.0 gf/mm 2 or less, or 20.0 gf/mm 2 or less. can be done. From these viewpoints, [A 60° C. ] is preferably 4.0 gf/mm 2 to 30.0 gf/mm 2 , more preferably 5.0 gf/mm 2 to 30.0 gf/mm 2 , still more preferably 8.0 gf/mm 2 to 30.0 gf/mm 2 . 0 gf/mm 2 to 30.0 gf/mm 2 , particularly preferably 10.0 gf/mm 2 to 30.0 gf/mm 2 . [A 60° C. ] is preferably 8.0 gf/mm 2 to 25.0 gf/mm 2 , more preferably 8.0 gf/mm 2 to 20.0 gf/mm 2 .
  • [A 60° C. ] is lowest when there is no exposure history, and tends to increase as the number of times of exposure increases. [A 60° C. ] is preferably evaluated without exposure history, but may be evaluated after exposure.
  • the pellicle according to the embodiment preferably satisfies the following formula (2).
  • [A23 °C ] represents the second peel strength when the pellicle is used as the test laminate.
  • the second peel strength was measured by using a standard universal testing machine to test the pellicle frame against the quartz glass substrate at a speed of 0.1 mm/sec under the condition that the temperature of the quartz glass substrate was 23°C.
  • the load per unit adhesion area required to separate the pellicle included in the test laminate from the quartz glass substrate when the pellicle frame is pulled along the height direction is shown. The details of the method for measuring the second peel strength will be described later in Examples.
  • the temperature of the quartz glass substrate when measuring the second peel strength is set to 23° C., because the temperature is set to 23° C. when the pellicle is peeled off from the original in order to replace the pellicle adhered to the original. °C.
  • the pellicle according to the embodiment satisfies Expression (2), it is possible to suppress the occurrence of adhesive residue.
  • a high-temperature environment e.g. 60°C
  • Adhesive residue means that at least part of the adhesive layer remains on the original after the pellicle is peeled off from the original.
  • a method of increasing the glass transition temperature of the pressure-sensitive adhesive can be considered. However, simply increasing the glass transition temperature requires a large second peel strength when peeling the pellicle from the original plate, and adhesive deposits tend to occur.
  • the pellicle satisfies the formula (2), the pellicle is less likely to separate from the master even when exposed to a high-temperature environment, and the occurrence of adhesive residue can be suppressed.
  • the lower limit of ([ A60°C ]/[ A23°C ]) is preferably 0.40 or more, more preferably 0.45 or more, even more preferably 0.48 or more, and particularly preferably 0.50 or more. If the lower limit of ([ A60°C ]/[ A23°C ]) is 0.35 or more, the amount of adhesive residue at room temperature can be reduced while making it difficult to peel the pellicle from the master in a high-temperature environment (e.g., 60°C). can be reduced.
  • ([A 60° C. ]/[A 23° C. ]) is preferably 0.40 to 2.00, more preferably 0.45 to 2.00, still more preferably 0.48 to 2.00. 00, particularly preferably 0.50 to 2.00.
  • ([A 60° C. ]/[A 23° C. ]) is preferably 0.45 to 1.00, more preferably 0.45 to 0.80, still more preferably 0.45 to 0.70.
  • [A 23° C. ] is lowest when there is no exposure history, and tends to increase as the number of times of exposure increases. [A 23° C. ] is preferably evaluated without exposure history, but may be evaluated after exposure.
  • a method of adjusting the content of the cross-linking agent for example, a method of adjusting the content of the cross-linking agent, which will be described later, can be mentioned. Specifically, there is a method in which the content of the cross-linking agent is set to 0.002 parts by mass or more and 3.000 parts by mass or less with respect to 100 parts by mass of the total amount of monomers constituting the copolymer described later.
  • the lower limit of the second peel strength [ A23°C ] is not limited, but is preferably 4.0 gf/mm2 or more , more preferably It is 6.0 gf/mm 2 or more, more preferably 10.0 gf/mm 2 or more, and particularly preferably 15.0 gf/mm 2 or more.
  • the upper limit of [A 23 °C ] is not limited, but is preferably 40.0 gf/mm 2 or less, more preferably 30, in order to suppress the occurrence of damage to the master plate and the occurrence of adhesive residue when the pellicle is peeled off from the master plate.
  • [A 23° C. ] is preferably 4.0 gf/mm 2 to 40.0 gf/mm 2 , more preferably 4.0 gf/mm 2 to 30.0 gf/mm 2 , still more preferably 4.0 gf/mm 2 to 30.0 gf/mm 2 .
  • 0 gf/mm 2 to 26.0 gf/mm 2 particularly preferably 4.0 gf/mm 2 to 20.0 gf/mm 2 .
  • ] is preferably 6.0 gf/mm 2 to 26.0 gf/mm 2 , more preferably 10.0 gf/mm 2 to 26.0 gf/mm 2 , still more preferably 15.0 gf/mm 2 to 26.0 gf/ mm2 .
  • the pellicle according to the embodiment includes an adhesive layer.
  • the adhesive layer allows the pellicle according to the embodiment to adhere to the master.
  • the adhesive layer is a gel-like viscoelastic body.
  • the adhesive layer has viscosity and cohesion.
  • viscosity refers to a liquid-like property that makes contact with the original plate, which is an adherend, and wets it.
  • Cohesion refers to a solid-like property to resist peeling from the master.
  • the adhesive layer is formed by applying, heating, drying, and curing the coating composition, as described later.
  • the glass transition temperature Tg of the adhesive layer is preferably above -25°C and below 10°C.
  • the adhesive layer has adhesive strength in the operating temperature range of the pellicle (for example, 20° C. or higher), and the pellicle is more difficult to peel off from the master even when exposed to a high-temperature environment.
  • the lower limit of the glass transition temperature Tg of the adhesive layer is preferably above ⁇ 25° C., more preferably ⁇ 22° C. or higher, further preferably ⁇ 20°C or higher, most preferably -18°C or higher.
  • the upper limit of the glass transition temperature Tg of the adhesive layer is preferably less than 10°C, more preferably 5°C or less, and even more preferably 0°C or less.
  • the upper limit of the glass transition temperature Tg of the adhesive layer is preferably ⁇ 5° C. or lower, more preferably ⁇ 10° C. or lower, from the viewpoint of easily suppressing distortion of the original plate due to distortion of the pellicle frame.
  • the glass transition temperature Tg is preferably -25°C to 5°C, more preferably -25°C to 0°C, more preferably -25°C to -5°C, more preferably -25°C.
  • glass transition temperature Tg of the adhesive layer is more than -10°C or less, more preferably -22°C to -10°C, particularly preferably -20°C to -10°C, still more preferably -18°C to -10°C.
  • the measurement of the glass transition temperature Tg of the adhesive layer is the same as the method described in Examples.
  • the coating composition contains a compound selected from various polymers, solvents, cross-linking agents, catalysts, initiators, etc. depending on the adhesive layer to be formed.
  • the coating composition is the precursor of the adhesive composition. That is, when the coating composition cures, it becomes a sticky composition.
  • Adhesive composition is not particularly limited, and includes acrylic, silicone, styrene-butadiene, urethane, and olefin adhesives.
  • the adhesive composition is preferably an acrylic adhesive.
  • the acrylic adhesive will be explained below.
  • the acrylic adhesive preferably contains a (meth)acrylic acid alkyl ester copolymer.
  • the (meth)acrylic acid alkyl ester copolymer is (Meth) acrylic acid alkyl ester monomer; It preferably contains a copolymer with a monomer having a functional group reactive with at least one of an isocyanate group, an epoxy group, and an acid anhydride (hereinafter also referred to as "functional group-containing monomer").
  • the copolymer of the (meth)acrylic acid alkyl ester monomer and the functional group-containing monomer is also referred to as "the copolymer”.
  • the acrylic pressure-sensitive adhesive contains a (meth)acrylic acid alkyl ester copolymer
  • the pellicle has sufficient first peel strength and can suppress the occurrence of adhesive residue.
  • the weight average molecular weight (Mw) of the (meth)acrylic acid alkyl ester copolymer is preferably 30,000 to 2,500,000, more preferably 50,000 to 1,500,000, and still more preferably 70,000 to 1,200,000. If the upper limit of the weight average molecular weight (Mw) of the (meth)acrylic acid alkyl ester copolymer is 2,500,000 or less, the solution viscosity can be controlled within a range that facilitates processing even if the solid content concentration of the coating composition is increased. .
  • the upper limit of the weight average molecular weight (Mw) of the (meth)acrylic acid alkyl ester copolymer is preferably 2,500,000 or less, more preferably 1,500,000 or less, and still more preferably 1,200,000 or less.
  • the pellicle When the lower limit of the weight-average molecular weight (Mw) of the (meth)acrylic acid alkyl ester copolymer is 30,000 or more, the pellicle has an appropriate first peel strength, and the occurrence of adhesive residue can be suppressed.
  • the lower limit of the weight average molecular weight (Mw) of the (meth)acrylic acid alkyl ester copolymer is preferably 30,000 or more, more preferably 50,000 or more, and still more preferably 70,000 or more.
  • the method for measuring the weight average molecular weight (Mw) of the (meth)acrylic acid alkyl ester copolymer is GPC (gel permeation chromatography), and the details of the measuring method will be described later in Examples.
  • the weight average molecular weight (Mw) tends to increase as the monomer concentration during the polymerization reaction increases, and the weight average molecular weight (Mw) increases as the amount of the polymerization initiator decreases and the polymerization temperature decreases. There is a tendency.
  • the weight average molecular weight can be controlled by adjusting the monomer concentration, the amount of polymerization initiator and the polymerization temperature.
  • the number average molecular weight (Mn) of the (meth)acrylic acid alkyl ester copolymer is preferably 50,000 to 500,000, more preferably 80,000 to 300,000, and still more preferably 10,000 to 200,000. , and most preferably 20,000 to 200,000. If the upper limit of the number average molecular weight (Mn) of the (meth)acrylic acid alkyl ester copolymer is 500,000 or less, the solution viscosity can be controlled within a range that facilitates processing even if the solid content concentration of the coating composition is increased. .
  • the upper limit of the number average molecular weight (Mn) of the (meth)acrylic acid alkyl ester copolymer is preferably 500,000 or less, more preferably 300,000 or less, and still more preferably 200,000 or less.
  • the lower limit of the number average molecular weight (Mn) of the (meth)acrylic acid alkyl ester copolymer is preferably 5,000 or more, more preferably 8,000 or more, and still more preferably 10,000 or more. , and most preferably 20,000 or more.
  • the method for measuring the number average molecular weight (Mn) of the (meth)acrylic acid alkyl ester copolymer is GPC (gel permeation chromatography), and the details of the measuring method will be described later in Examples.
  • the "weight average molecular weight (Mw)/number average molecular weight (Mn)" (hereinafter also referred to as "Mw/Mn") of the (meth)acrylic acid alkyl ester copolymer is preferably 1.0 to 10.0, more It is preferably 2.0 to 9.0, more preferably 2.5 to 8.0, and most preferably 3.0 to 7.0.
  • Mw/Mn is within the above range, the (meth)acrylic acid alkyl ester copolymer can be easily produced, and adhesive residue can be reduced. If the upper limit of Mw/Mn is 10.0 or less, the occurrence of adhesive residue can be suppressed.
  • the upper limit of Mw/Mn is preferably 10.0 or less, more preferably 9.0 or less, still more preferably 8.0 or less, and most preferably 7.0 or less. If the lower limit of Mw/Mn is 1.0 or more, the (meth)acrylic acid alkyl ester copolymer can be easily produced.
  • the lower limit of Mw/Mn is preferably 1.0 or more, more preferably 2.0 or more, still more preferably 2.5 or more, and most preferably 3.0 or more.
  • the (meth)acrylic acid alkyl ester monomer preferably contains a (meth)acrylic acid alkyl ester monomer having an alkyl group having 1 to 14 carbon atoms.
  • Examples of (meth)acrylic acid alkyl ester monomers having an alkyl group having 1 to 14 carbon atoms include linear aliphatic alcohol (meth)acrylic acid ester monomers and branched chain aliphatic alcohol (meth)acrylic acid ester monomers. , a (meth)acrylic acid ester monomer of a cyclic aliphatic alcohol, and the like.
  • Examples of (meth)acrylic acid ester monomers of linear aliphatic alcohols include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, propyl (meth)acrylate, (meth)acryl hexyl acid, octyl (meth)acrylate, decyl (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate and the like.
  • (Meth)acrylic acid ester monomers of branched chain aliphatic alcohols include, for example, isobutyl (meth)acrylate, isoamyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, (meth) ) and isononyl acrylate. These may be used individually by 1 type, and may use 2 or more types together.
  • Examples of (meth)acrylic acid ester monomers of cycloaliphatic alcohols include cyclohexyl (meth)acrylate and dicyclopentenyloxyethyl (meth)acrylate.
  • the (meth)acrylic acid alkyl ester monomer preferably has at least one of an alkyl group having 1 to 3 carbon atoms and an alicyclic alkyl group.
  • a (meth)acrylic acid alkyl ester monomer having at least one of an alkyl group having 1 to 3 carbon atoms and an alicyclic alkyl group is also referred to as a "high Tg monomer”.
  • Tg refers to the glass transition temperature.
  • the (meth)acrylic acid alkyl ester monomer is more preferably an acrylic acid alkyl ester monomer having an alkyl group having 1 to 3 carbon atoms or an alicyclic alkyl group, More preferably, it is an acrylic acid alkyl ester monomer having an alkyl group having 1 to 3 carbon atoms.
  • the (meth)acrylic acid alkyl ester monomer is an acrylic acid alkyl ester monomer having an alicyclic alkyl group
  • the alicyclic alkyl group preferably has 5 to 10 carbon atoms from the viewpoint of availability. preferable.
  • high Tg monomers include methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, cyclohexyl acrylate, dicyclopentanyl acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate, methacryl isopropyl acid, cyclohexyl methacrylate, dicyclopentanyl methacrylate, and the like.
  • the (meth)acrylic acid alkyl ester monomer contains at least an alkyl group having 1 to 2 carbon atoms and an alicyclic alkyl group. It is preferable to have one, and the (meth)acrylic acid alkyl ester monomer more preferably has an alkyl group having 1 to 2 carbon atoms.
  • the (meth)acrylic acid alkyl ester copolymer is a copolymer of a (meth)acrylic acid alkyl ester monomer and a monomer having a functional group reactive with at least one of an isocyanate group, an epoxy group and an acid anhydride.
  • the (meth)acrylic acid alkyl ester monomer preferably has at least one of an alkyl group having 1 to 3 carbon atoms and an alicyclic alkyl group.
  • the content of the (meth)acrylic acid alkyl ester monomer is preferably 80 parts by mass to 99.5 parts by mass, more preferably 85 parts by mass to 100 parts by mass, based on the total amount of the monomers constituting the copolymer. 99.5 parts by mass, more preferably 87 to 99.5 parts by mass. If the content of the (meth)acrylic acid alkyl ester monomer is within the range of 80 parts by mass to 99.5 parts by mass, appropriate adhesive strength can be achieved.
  • the content of the meth)acrylic acid alkyl ester monomer is preferably in the range of 80 parts by mass to 99.5 parts by mass. From the same point of view, the content of the (meth)acrylic acid alkyl ester monomer, which is at least one of an alkyl group having 1 to 2 carbon atoms and an alicyclic alkyl group, is 80 parts by mass to 99.5 parts by mass.
  • the content of the (meth)acrylic acid alkyl ester monomer is more preferably within the range of 80 parts by mass to 99.5 parts by mass.
  • the functional group-containing monomer is a monomer copolymerizable with the (meth)acrylic acid alkyl ester monomer.
  • the functional group-containing monomer has a functional group reactive with at least one of an isocyanate group, an epoxy group and an acid anhydride.
  • Examples of functional group-containing monomers include carboxy group-containing monomers, hydroxy group-containing monomers, and epoxy group-containing monomers.
  • Carboxy group-containing monomers include (meth)acrylic acid, itaconic acid, (meth)acrylic itaconic acid, maleic acid, crotonic acid and the like.
  • hydroxy group-containing monomers examples include 2-hydroxyethyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate.
  • epoxy group-containing monomers examples include glycidyl (meth)acrylate and the like. These may be used individually by 1 type, and may use 2 or more types together.
  • the functional group-containing monomer is a hydroxy group-containing (meth)acrylic acid having a hydroxyalkyl group having 2 to 4 carbon atoms, or a (meth)acrylic acid that is an epoxy group-containing monomer.
  • the hydroxy group-containing (meth)acrylic acid having a hydroxyalkyl group having 2 to 4 carbon atoms includes 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 2-hydroxy (meth)acrylate. butyl, 4-hydroxybutyl (meth)acrylate and the like.
  • the content of the functional group-containing monomer is preferably, for example, 0.5 parts by mass to 20 parts by mass with respect to 100 parts by mass of the total monomers constituting the copolymer.
  • the lower limit of the content of the functional group-containing monomer is 1 part by mass or more with respect to 100 parts by mass of the total amount of the monomers constituting the (meth)acrylic acid alkyl ester copolymer. is more preferably 2 parts by mass or more, and particularly preferably 3 parts by mass or more.
  • the upper limit of the content of the functional group-containing monomer is It is more preferably 15 parts by mass or less, and even more preferably 10 parts by mass or less.
  • the polymerization method of the (meth)acrylic acid alkyl ester copolymer is not particularly limited, and examples thereof include solution polymerization, bulk polymerization, emulsion polymerization, and various radical polymerizations. be done.
  • the (meth)acrylic acid alkyl ester copolymers obtained by these polymerization methods may be random copolymers, block copolymers, graft copolymers, or the like.
  • the reaction solution contains a polymerization solvent.
  • a polymerization solvent for example, propyl acetate, ethyl acetate, toluene, etc.
  • diluent solvents include propyl acetate, acetone, ethyl acetate, and toluene.
  • the viscosity of the copolymer solution is preferably 1000 Pa ⁇ s or less, more preferably 500 Pa ⁇ s or less, still more preferably 200 Pa ⁇ s or less.
  • the viscosity of the coating composition is the viscosity when the temperature of the coating composition is 25° C., and can be measured with an E-type viscometer.
  • Solution polymerization As an example of solution polymerization, a polymerization initiator is added to a mixed solution of monomers under an inert gas stream such as nitrogen, and the mixture is heated at 50°C to 100°C for 4 hours. A method of conducting the polymerization reaction for up to 30 hours may be mentioned.
  • polymerization initiators examples include azo polymerization initiators and peroxide polymerization initiators.
  • azo polymerization initiator 2,2'-azobisisobutyronitrile (AIBN), 2,2'-azobis-2-methylbutyronitrile, 2,2'-azobis (2-methylpropionic acid) dimethyl, 4,4'-azobis-4-cyanovaleric acid and the like.
  • Benzoyl peroxide etc. are mentioned as a peroxide-type polymerization initiator.
  • the content of the polymerization initiator is preferably 0.01 to 2.0 parts by mass with respect to 100 parts by mass of the total amount of all monomers constituting the (meth)acrylic acid alkyl ester copolymer.
  • a chain transfer agent in addition to the polymerization initiator, a chain transfer agent, an emulsifier, etc. may be added to the mixed solution of the monomers.
  • a chain transfer agent emulsifier, etc., known ones can be appropriately selected and used.
  • the amount of the polymerization initiator remaining in the adhesive layer is small. Thereby, the amount of outgas generated during exposure can be reduced.
  • a method for reducing the amount of the polymerization initiator remaining in the adhesive layer there is a method of minimizing the amount of the polymerization initiator added when polymerizing the (meth)acrylic acid alkyl ester copolymer, and a method that easily decomposes thermally. Examples include a method of using a polymerization initiator, a method of heating the adhesive to a high temperature for a long period of time in the coating and drying steps of the adhesive, and decomposing the polymerization initiator in the drying step.
  • the 10-hour half-life temperature is used as an index representing the thermal decomposition rate of the polymerization initiator.
  • “Half-life” refers to the time it takes for half of the polymerization initiator to decompose.
  • 10-hour half-life temperature” indicates the temperature at which the half-life is 10 hours.
  • the 10-hour half-life temperature of the polymerization initiator is preferably 80°C or lower, more preferably 75°C or lower.
  • Examples of the azo polymerization initiator with a low 10-hour half-life temperature include 2,2′-azobis(4-methoxy-2,4-dimethylvaleronitrile) (10-hour half-life temperature: 30° C.), 2,2 '-azobisisobutyronitrile (10-hour half-life temperature: 65 ° C.), 2,2-azobis(2,4-dimethylvaleronitrile) (10-hour half-life temperature: 51 ° C.), dimethyl 2,2'- Azobis(2-methylpropionate) (10-hour half-life temperature: 66°C), 2,2'-azobis(2-methylbutyronitrile) (10-hour half-life temperature: 67°C), and the like.
  • peroxide-based polymerization initiators having a low 10-hour half-life temperature examples include dibenzoyl peroxide (10-hour half-life temperature: 74°C), dilauroyl peroxide (10-hour half-life temperature: 62°C), and the like. mentioned.
  • a cross-linking agent is a compound that contributes to the formation of a three-dimensional network structure by reacting the functional group of the compound with the copolymer.
  • the acrylic pressure-sensitive adhesive preferably contains a reaction product of a (meth)acrylic acid alkyl ester copolymer and a cross-linking agent.
  • the cross-linking agent has at least one of an isocyanate group, an epoxy group, an acid anhydride, and a radical generating group.
  • cross-linking agents include monofunctional epoxy compounds, polyfunctional epoxy compounds, acid anhydride compounds, metal salts, metal alkoxides, aldehyde compounds, non-amino resin amino compounds, urea compounds, isocyanate compounds
  • examples include metal chelate compounds, melamine compounds, aziridine compounds, azo radical generators, organic peroxides, and the like.
  • the cross-linking agent includes monofunctional epoxy compounds, polyfunctional epoxy compounds, isocyanate compounds and acid anhydride compounds. is more preferably at least one of, more preferably an acid anhydride-based compound.
  • Examples of monofunctional epoxy compounds include glycidyl (meth)acrylate, glycidyl acetate, butyl glycidyl ether, phenyl glycidyl ether and the like.
  • Polyfunctional epoxy compounds include, for example, neopentyl glycol diglycidyl ether, polyethylene glycol diglycidyl ether, bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, phthalate diglycidyl ester, dimer acid diglycidyl ester, triglycidyl isocyanate.
  • acid anhydride compounds include aliphatic dicarboxylic acid anhydrides and aromatic polyvalent carboxylic acid anhydrides.
  • Aliphatic dicarboxylic anhydrides include maleic anhydride, hexahydrophthalic anhydride, hexahydro-4-methylphthalic anhydride, bicyclo[2.2.1]heptane-2,3-dicarboxylic anhydride, 2-methylbicyclo [2.2.1] Heptane-2,3-dicarboxylic anhydride, tetrahydrophthalic anhydride and the like can be mentioned.
  • aromatic polycarboxylic acid anhydrides include phthalic anhydride and trimellitic anhydride.
  • isocyanate-based compounds include xylylene diisocyanate, hexamethylene diisocyanate, tolylene diisocyanate, and polymers, derivatives, and polymers thereof. These may be used alone or in combination of two or more.
  • the cross-linking agent may be a product.
  • Products of the cross-linking agent include "Rikashid MH-700G” manufactured by New Japan Chemical Co., Ltd., and the like.
  • the adhesive layer contains a reaction product of the copolymer and a cross-linking agent, and the content of the cross-linking agent is 0.002 parts by mass with respect to the total amount of 100 parts by mass of the monomers constituting the copolymer. It is preferably up to 3.000 parts by mass.
  • the content of the cross-linking agent is preferably 0.002 parts by mass to 3.000 parts by mass with respect to the total amount of 100 parts by mass of the monomers constituting the copolymer.
  • an adhesive layer in which the stress exerted on is relaxed, more preferably 0.002 parts by mass to 2.000 parts by mass, more preferably 0.005 parts by mass to 2.000 parts by mass, still more preferably It is 0.01 to 1.000 parts by mass, particularly preferably 0.1 to 0.500 parts by mass.
  • the upper limit of the content of the cross-linking agent is 3.000 parts by mass or less, the cross-linking density of the (meth)acrylic acid alkyl ester copolymer does not become too large. Therefore, it is considered that the pressure-sensitive adhesive absorbs the stress applied to the original, and the influence of the adhesive layer on the flatness of the original is alleviated.
  • the upper limit of the content of the cross-linking agent is preferably 2.000 parts by mass or less, more preferably 1.000 parts by mass or less.
  • the lower limit of the content of the cross-linking agent is 0.002 parts by mass or more, the cross-linking density does not become too small, so that the handling property during the manufacturing process is maintained, and the adhesive when peeling the pellicle from the master is maintained. It is thought that the remainder is unlikely to occur. If the content of the cross-linking agent is within the range of 0.002 parts by mass to 3.000 parts by mass, a pellicle that satisfies the formula (2) can be obtained.
  • the coating composition may further contain a catalyst. This can further accelerate the curing of the (meth)acrylic acid alkyl ester copolymer.
  • catalysts include amine-based catalysts.
  • the amine-based catalyst include (1,8-diazabicyclo-(5.4.0)undecene-7) octylate and triethylenediamine.
  • the amine-based catalyst may be a product of San-Apro Co., Ltd. such as "DBU", “DBN”, “U-CAT”, “U-CAT SA1", “U-CAT SA102".
  • the content of the catalyst is preferably 0.002 parts by mass to 3.000 parts by mass, more preferably 0.10 parts by mass to 1.00 parts by mass, relative to 100 parts by mass of the (meth)acrylic acid alkyl ester copolymer. Department.
  • the coating composition preferably does not contain a surface modifier. As a result, the amount of outgas generated can be suppressed.
  • the coating composition may contain additives such as fillers, pigments, diluents, anti-aging agents, tackifiers, etc., if necessary. These additives may be used alone or in combination of two or more.
  • the coating composition may contain a dilution solvent. Thereby, the viscosity of the coating composition can be adjusted. As a result, when the coating composition is applied to the other end surface of the pellicle frame, the thickness and width of the coating composition are easily controlled.
  • diluent solvents include propyl acetate, acetone, ethyl acetate, and toluene.
  • the viscosity of the coating composition is preferably 50 Pa ⁇ s or less, more preferably 10 Pa ⁇ s to 40 Pa ⁇ s, still more preferably 20 Pa ⁇ s to 30 Pa ⁇ s.
  • the viscosity of the coating composition is the viscosity when the temperature of the coating composition is 25° C., and can be measured with an E-type viscometer.
  • the adhesive layer is preferably water-insoluble.
  • Deterioration of the adhesive layer includes deterioration of adhesive strength due to exposure to moisture in the atmosphere, deterioration of mask distortion, and the like.
  • outgassing is likely to occur due to moisture adsorbed on the adhesive layer in a vacuum environment such as EUV exposure.
  • the fact that the adhesive layer is water-insoluble indicates that the adhesive layer is less likely to adsorb moisture in the atmosphere. Therefore, the water-insoluble adhesive layer can suppress the amount of outgassing.
  • the raw material of the adhesive layer contains the copolymer, and the copolymer is water-insoluble.
  • the first gel fraction indicates the ratio (% by mass) of the mass of the adhesive layer after the first treatment to the mass of the adhesive layer before the first treatment.
  • the first treatment is a treatment in which the adhesive layer is immersed in water, heated and stirred at 60° C. for 3 hours to obtain a water-insoluble residue of the adhesive layer, and the resulting residue is dried at 100° C. for 3 hours.
  • the amount of water used is 100 parts by mass with respect to 1 part by mass of the adhesive layer.
  • the weight of the adhesive layer after the first treatment indicates the weight of the residual adhesive layer after drying.
  • the adhesive layer used for evaluation may be a test piece taken from the adhesive layer.
  • the first gel fraction is 70% by mass or less, it may be determined that the adhesive layer is water-soluble. If the first gel fraction is 80% by mass or less, it may be determined that the adhesive layer is water-soluble. If the first gel fraction is 90% by mass or less, it may be determined that the adhesive layer is water-soluble.
  • the second gel fraction indicates the ratio (% by mass) of the mass of the copolymer after the second treatment to the mass of the copolymer before the second treatment.
  • the copolymer is immersed in water, heated and stirred at 60° C. for 3 hours to obtain a residue of the copolymer that is insoluble in water, and the obtained residue is dried at 100° C. for 3 hours. indicates
  • the amount of water used is 100 parts by mass with respect to 1 part by mass of the copolymer.
  • the weight of the copolymer after the second treatment indicates the residual weight of the copolymer after drying.
  • the copolymer used for evaluation may be a test piece taken from the copolymer. If the second gel fraction is 70% by mass or less, it may be determined that the copolymer is water-soluble. If the second gel fraction is 80% by mass or less, it may be determined that the copolymer is water-soluble. If the second gel fraction is 90% by mass or less, it may be determined that the copolymer is water-soluble.
  • the adhesive layer may contain metal ions and ammonium ions from the viewpoint of suppressing deterioration of the adhesive layer and suppressing the amount of outgas.
  • metal ions include sodium ions, potassium ions, calcium ions, and the like.
  • the total content of metal ions and ammonium ions is preferably 4% by mass or less, more preferably 3% by mass or less, still more preferably 2% by mass or less, and particularly preferably 1% by mass, relative to the total amount of the adhesive layer. % or less, more preferably 0.5 mass % or less.
  • the total content of metal ions and ammonium ions is preferably 4% by mass or less, more preferably 3% by mass or less, and even more preferably 2% by mass or less, relative to the total amount of monomers constituting the copolymer. , particularly preferably 1% by mass or less, more preferably 0.5% by mass or less. Furthermore, in order to suppress contamination of the device by components derived from ions such as metal ions, the content of the total amount of metal ions and ammonium ions is preferably 4% by mass or less, more preferably 4% by mass or less, relative to the mass of the adhesive layer.
  • the content is preferably 3% by mass or less, more preferably 2% by mass or less, particularly preferably 1% by mass or less, and even more preferably 0.5% by mass or less.
  • the content ratio of the total amount of metal ions and ammonium ions is preferably 4 mass with respect to the total amount of monomers constituting the copolymer. % or less, more preferably 3 mass % or less, still more preferably 2 mass % or less, particularly preferably 1 mass % or less, and even more preferably 0.5 mass % or less.
  • the thickness of the adhesive layer is not particularly limited, preferably 0.01 mm to 1 mm, more preferably 0.1 mm to 0.8 mm. If the thickness of the adhesive layer is within the above range, it is possible to reduce the distortion of the original plate after attachment while ensuring the adhesion to the original plate, thereby eliminating errors during exposure.
  • a pellicle according to an embodiment includes a pellicle frame.
  • the pellicle frame supports the pellicle membrane.
  • a pellicle frame is a cylinder.
  • the pellicle frame has through holes.
  • the through-hole indicates a space through which the exposure light transmitted through the pellicle film passes to reach the original plate.
  • the pellicle frame may have a vent.
  • the ventilation hole communicates the internal space of the pellicle with the external space of the pellicle.
  • inner space of the pellicle refers to the space surrounded by the pellicle and the original plate.
  • space outside the pellicle refers to the space not surrounded by the pellicle and the master.
  • the rectangular pellicle frame has four sides when viewed from the thickness direction.
  • the length of one side in the longitudinal direction is preferably 200 mm or less.
  • the size and the like of the pellicle frame are standardized according to the type of exposure apparatus.
  • the length of one side of the pellicle frame in the longitudinal direction of 200 mm or less satisfies the size standardized for exposure using EUV light.
  • the length of one side in the short direction can be, for example, 5 mm to 180 mm, preferably 80 mm to 170 mm, and more preferably 100 mm to 160 mm.
  • the height of the pellicle frame (that is, the length of the pellicle frame in the thickness direction) is not particularly limited, and is preferably 3.0 mm or less, more preferably 2.4 mm or less, and even more preferably 2.375 mm or less. This allows the pellicle frame to meet the standardized size for EUV exposure.
  • the height of the pellicle frame normalized for EUV exposure is, for example, 2.375 mm.
  • the mass of the pellicle frame is not particularly limited, and is preferably 20 g or less, more preferably 15 g or less. This makes the pellicle frame suitable for EUV exposure applications.
  • Materials for the pellicle frame include aluminum, titanium, stainless steel, ceramic materials (eg, silicon, glass, etc.), resins such as polyethylene, and the like.
  • the shape of the pellicle frame corresponds to the shape of the master plate. Examples of the shape of the pellicle frame include a rectangular frame shape and a square frame shape.
  • a pellicle according to an embodiment includes a pellicle membrane.
  • the pellicle film prevents foreign matter from adhering to the surface of the original plate and allows exposure light to pass therethrough during exposure. Foreign matter includes dust. Examples of exposure light include deep ultraviolet (DUV: Deep UltraViolet) light, EUV, and the like. EUV refers to light with a wavelength of 5 nm to 30 nm.
  • the pellicle film covers the entire opening on one end face side of the through-hole of the pellicle frame.
  • the pellicle membrane may be directly supported on one end face of the pellicle frame, or may be supported via an adhesive layer (hereinafter also referred to as "film adhesive layer").
  • the film adhesive layer may be a cured product of a known adhesive.
  • the film thickness of the pellicle film is preferably 1 nm to 200 nm.
  • the material of the pellicle film is not particularly limited, and examples thereof include carbon-based materials, SiN, and polysilicon. Carbon-based materials include carbon nanotubes (hereinafter also referred to as “CNT”). Among others, the material of the pellicle film 12 preferably contains CNT.
  • the CNTs may be single-wall CNTs, multi-wall CNTs, or may include single-wall CNTs and multi-wall CNTs.
  • the pellicle membrane may be a non-woven structure. The non-woven structure is formed, for example, by fibrous CNTs.
  • the pellicle according to the embodiment may be provided with a protective film (liner), if necessary.
  • the protective film protects at least the surface of the adhesive layer that comes into contact with the original.
  • the protective film can be peeled off from the adhesive layer.
  • the thickness of the protective film is preferably 5 ⁇ m to 500 ⁇ m, more preferably 30 ⁇ m to 200 ⁇ m. Polyester etc. are mentioned as a material of a protective film.
  • a release agent may be applied to the surface of the protective film that contacts the adhesive layer. Examples of release agents include silicone-based release agents and fluorine-based release agents.
  • An exposure original plate according to the embodiment includes an original plate and a pellicle according to the embodiment.
  • the master has a pattern.
  • the pellicle according to the embodiment is adhered to the pattern-bearing surface of the original. Since the exposure original plate according to the embodiment includes the pellicle according to the embodiment, the pellicle is less likely to peel off from the original plate even when exposed to a high-temperature environment (for example, 60° C.).
  • the original plate may be formed by laminating a support substrate, a reflective layer, and an absorber layer in this order. Partial absorption of light (eg, EUV) by the absorber layer forms a desired image on a sensitive substrate (eg, a semiconductor substrate with a photoresist film).
  • a sensitive substrate eg, a semiconductor substrate with a photoresist film
  • the reflective layer include a multilayer film of molybdenum (Mo) and silicon (Si).
  • the absorber layer material may be a highly absorbing material such as EUV. Chromium (Cr), tantalum nitride, and the like can be cited as highly absorbing materials such as EUV.
  • the exposure apparatus includes a light source, an exposure original plate according to the embodiment, and an optical system.
  • a light source emits exposure light.
  • the optical system guides the exposure light emitted from the light source to the exposure original plate.
  • the exposure original plate is arranged so that the exposure light emitted from the light source passes through the pellicle film and is irradiated onto the original plate.
  • the exposure apparatus is capable of generating poor resolution due to foreign matter even when using EUV, which tends to cause problems with poor resolution due to foreign matter.
  • a reduced patterned exposure can be performed.
  • the exposure light is preferably EUV. Due to its short wavelength, EUV is easily absorbed by gases such as oxygen or nitrogen. Therefore, exposure with EUV light is performed in a vacuum environment.
  • a pellicle manufacturing method is a method for manufacturing a pellicle according to an embodiment, and includes a pellicle film attaching step described later and an adhesive layer forming step described later. including. Thereby, a pellicle that satisfies the formula (1) is obtained.
  • the execution order of the pellicle film attaching step and the adhesive layer forming step is not particularly limited.
  • the pellicle film is attached to one end face of the pellicle frame.
  • the method of attaching the pellicle film to one end face of the pellicle frame is not particularly limited. A method of arranging a pellicle film and the like can be mentioned.
  • Adhesive Layer Forming Step In the adhesive layer forming step, the coating composition described above is applied to the other end surface of the pellicle frame and heated to form an adhesive layer. Thereby, the coating composition is dried and cured to obtain an adhesive composition (adhesive layer).
  • the method of coating the other end face of the pellicle frame with the coating composition is not particularly limited, and examples thereof include a method using a dispenser.
  • the thickness of the coating composition is preferably 0.1 mm to 4.5 mm, more preferably 0.1 mm to 3.5 mm, still more preferably 0.2 mm to 2 mm.
  • the method of heating the coating composition is not particularly limited, and includes known methods.
  • the temperature for heating the coating composition is appropriately selected according to the boiling points of the solvent and residual monomers, the decomposition temperature of the (meth)acrylic acid alkyl ester copolymer, etc., and is preferably 50°C to 200°C, more preferably 60°C. ⁇ 190°C.
  • Volatile compounds such as solvent and residual monomers are removed from the adhesive layer by heating the coating composition.
  • the coating composition contains a cross-linking agent
  • the functional group of the (meth)acrylic acid alkyl ester copolymer and the cross-linking agent react with each other by heating to form a cross-linked structure in the adhesive layer.
  • a reaction product of the acrylic acid alkyl ester copolymer and the cross-linking agent By this heat drying, the adhesive layer adheres to the surface of the pellicle frame, and the pellicle frame and the adhesive layer are integrated.
  • Pellicle A pellicle according to a modification of the present disclosure includes a pellicle frame, a pellicle film supported on one end face of the pellicle frame, and a pellicle film provided on the other end face of the pellicle frame. and an adhesive layer having a glass transition temperature Tg of more than -25°C and less than 10°C.
  • the measurement of the glass transition temperature Tg of the adhesive layer is the same as the method described in Examples.
  • the pellicle since the pellicle has the above configuration, it is difficult to separate from the master even when exposed to a high-temperature environment (eg, 60°C).
  • a high-temperature environment eg, 60°C
  • the glass transition temperature Tg of the adhesive layer is more than ⁇ 25° C. and less than 10° C., except that it does not have to satisfy the above formula (1). , is the same as the pellicle according to the embodiment.
  • the description of the embodiment of the present disclosure can be used for the description of the modification of the present disclosure.
  • the preferred range of the glass transition temperature Tg of the adhesive layer is the same as in the embodiment.
  • the pellicle preferably satisfies the above formula (1). Accordingly, as described above, the pellicle according to the modified example is less likely to separate from the master even when exposed to a high-temperature environment (eg, 60° C.).
  • a high-temperature environment eg, 60° C.
  • the preferred range of the first peel strength and the like are the same as in the embodiment.
  • the pellicle according to the modification preferably satisfies the above formula (2). Thereby, as described above, it is possible to suppress the occurrence of adhesive residue.
  • the preferable range of the peel strength ratio ([A 60° C. ]/[A 23° C. ]) and the method of satisfying the formula (2) are the same as in the embodiment.
  • Second Peel Strength The preferred range of the second peel strength is the same as in the embodiment.
  • the pellicle according to the modification includes an adhesive layer.
  • the adhesive layer enables the pellicle according to the modification to be adhered to the master.
  • the adhesive layer is a gel-like viscoelastic body as in the embodiment.
  • the adhesive layer is formed by applying, heating, drying, and curing the coating composition, as described later.
  • the coating composition includes a composition containing a compound selected from various polymers, solvents, cross-linking agents, catalysts, initiators, etc., depending on the adhesive layer to be formed. , are precursors of adhesive compositions. That is, when the coating composition cures, it becomes a sticky composition.
  • Adhesive composition is not particularly limited, and includes acrylic, silicone, styrene-butadiene, urethane, and olefin adhesives.
  • the adhesive composition is preferably an acrylic adhesive.
  • the acrylic adhesive will be explained below.
  • the acrylic pressure-sensitive adhesive and the like according to the modification are the same as those of the embodiment.
  • the acrylic adhesive preferably contains a (meth)acrylic acid alkyl ester copolymer.
  • (Meth) acrylic acid alkyl ester copolymer (Meth) acrylic acid alkyl ester monomer; It preferably contains a copolymer with a monomer having a functional group reactive with at least one of an isocyanate group, an epoxy group, and an acid anhydride. Since the acrylic pressure-sensitive adhesive contains a (meth)acrylic acid alkyl ester copolymer, the pellicle has a sufficient first peel strength and can suppress the occurrence of adhesive residue.
  • the (meth)acrylic acid alkyl ester monomer preferably has at least one of an alkyl group having 1 to 3 carbon atoms and an alicyclic alkyl group. Thereby, it becomes easy to have sufficient 1st peel strength.
  • the (meth)acrylic acid alkyl ester copolymer is a copolymer of a (meth)acrylic acid alkyl ester monomer and a monomer having a functional group reactive with at least one of an isocyanate group, an epoxy group and an acid anhydride.
  • the (meth)acrylic acid alkyl ester monomer preferably has at least one of an alkyl group having 1 to 3 carbon atoms and an alicyclic alkyl group.
  • the content of the (meth)acrylic acid alkyl ester monomer is preferably 80 parts by mass to 99.5 parts by mass with respect to the total amount of 100 parts by mass of the monomers constituting the copolymer. If the content of the (meth)acrylic acid alkyl ester monomer is within the range of 80 parts by mass to 99.5 parts by mass, appropriate adhesive strength can be achieved.
  • the content of the functional group-containing monomer is preferably, for example, 0.5 to 20 parts by mass with respect to the total amount of 100 parts by mass of the monomers constituting the copolymer.
  • the pellicle according to the modified example may be provided with a protective film (liner), if necessary.
  • a protective film and the like are the same as in the embodiment.
  • the exposure original plate according to the modification includes an original plate and a pellicle according to the modification.
  • the master has a pattern.
  • the pellicle according to the modification is adhered to the pattern-bearing surface of the original. Since the exposure original plate according to the modified example includes the pellicle according to the modified example, the pellicle is less likely to peel off from the original plate even when exposed to a high-temperature environment (for example, 60° C.).
  • the original plate and the like are the same as those in the embodiment.
  • the exposure apparatus includes a light source, an exposure original plate according to the modification, and an optical system.
  • a light source emits exposure light.
  • the optical system guides the exposure light emitted from the light source to the exposure original plate.
  • the exposure original plate is arranged so that the exposure light emitted from the light source passes through the pellicle film and is irradiated onto the original plate.
  • the functions of the exposure device, the exposure light, and the like are the same as in the embodiment.
  • a pellicle manufacturing method is a method of manufacturing a pellicle according to a modification, and includes a pellicle film attaching step and an adhesive layer forming step.
  • a pellicle is obtained in which the adhesive layer has a glass transition temperature Tg in the range of more than -25°C and less than 10°C.
  • the execution order of the pellicle film attaching step and the adhesive layer forming step is not particularly limited.
  • the pellicle film attaching step, the adhesive layer forming step, and the like are the same as in the embodiment.
  • Example 1 A (meth)acrylic acid alkyl ester copolymer was prepared by a well-known method. Specifically, a reaction vessel equipped with a stirrer, a thermometer, a reflux condenser, a dropping device, and a nitrogen inlet tube was prepared. A polymerization solvent (180 parts by mass) was placed in a reaction vessel, and a mixture of EA/4-HBA/HEMA/GMA/AIBN (crosslinking agent) (423.4 parts by mass) was added at 378/12.6/21/8.4/ Charged at a mass ratio of 3.4. In a nitrogen atmosphere, this reaction solution was reacted at 85° C. for 6 hours and further at 95° C. for 2 hours to obtain an acrylic copolymer solution having a nonvolatile content (copolymer) concentration of 70% by mass (weight average molecular weight: 11 90,000).
  • an anodized aluminum pellicle frame (outer dimensions: 149 mm ⁇ 115 mm, frame height H: 4.5 mm, frame width W: 2 mm) was prepared as the pellicle frame 14 .
  • the prepared coating composition was applied to one end surface of the pellicle frame 14 with a dispenser. This was dried at 100 ° C. for 120 minutes, and after placing a protective film on the dried coating composition, it was dried at 120 ° C. for 20 hours to form an adhesive layer 15 (thickness: 0.2 mm) made of the adhesive composition. .
  • the pellicle film 12 was adhered to the other end surface of the pellicle frame 14 (the end surface on which the adhesive layer 15 is not formed) via the film adhesive layer 13 . Pellicle 10 was thus obtained.
  • the obtained pellicle 10 was evaluated by the following method.
  • the pellicle 10 is adhered to the quartz glass substrate by an adhesive layer 15 .
  • the test laminate was held by two long sides of the pellicle frame 14 using a universal material testing machine ("RTG-1310" manufactured by A&D Co., Ltd.) and a jig, and the load of the standard universal testing machine was applied.
  • RTG-1310 manufactured by A&D Co., Ltd.
  • a jig the load of the standard universal testing machine was applied.
  • Adhesive residue evaluation test Adhesive residue on each of the quartz glass substrate after the measurement of the first peel strength and the quartz glass substrate after the measurement of the second peel strength was evaluated according to the following criteria. Acceptable ratings are "A” or "B”. Table 1 shows the measurement results.
  • the term “adhesive residue area” refers to the area of the adhesive layer 15 remaining on the quartz glass substrate from which the pellicle 10 has been removed.
  • Adhesion area refers to the area of the portion of the surface of the quartz glass substrate that is in contact with the adhesive layer 15 .
  • A The ratio of the adhesive residue area to the adhesive area is 0 area % or more and less than 10 area %.
  • B The ratio of the adhesive residue area to the adhesion area is 10 area % or more and less than 30 area %.
  • C The ratio of the adhesive residue area to the adhesive area is 30 area % or more.
  • Table 1 shows the measurement results.
  • Glass transition temperature (Tg) The glass transition temperature (Tg) of the adhesive composition (adhesive layer) before sticking the pellicle 10 onto the quartz glass substrate was measured according to JIS K7112. Specifically, using a differential scanning calorimetry (DSC), the glass of the adhesive composition before the pellicle 10 is adhered onto the quartz glass substrate at a heating rate of 20° C./min under nitrogen conditions. The transition temperature (Tg) was measured. Table 1 shows the measurement results.
  • Example 2 The reaction was carried out under the same conditions as in Example 1, except that EA, 4-HBA, and GMA were charged at the mass ratio shown in Table 1, to obtain an acrylic copolymer solution with a nonvolatile content concentration of 70% by mass (weight average molecular weight : 138,000). The obtained solution was applied and processed in the same manner as in Example 1, and the obtained pellicle 10 was subjected to various evaluations.
  • Example 3 The reaction was carried out under the same conditions as in Example 1, except that EA, MMA, 4-HBA, HEMA, and GMA were charged at the mass ratios shown in Table 1, to obtain an acrylic copolymer solution having a nonvolatile content of 70% by mass. (Weight average molecular weight: 105,000).
  • the obtained solution was applied and processed in the same manner as in Example 1, and the obtained pellicle 10 was subjected to various evaluations.
  • the quartz glass substrate was broken during the measurement of the second peel strength, and the second peel strength was higher than 26.0 gf/mm 2 .
  • Example 4 The reaction was carried out under the same conditions as in Example 1 except that EA, BA, 4-HBA, and GMA were charged at the mass ratio shown in Table 1 to obtain an acrylic copolymer solution having a nonvolatile content of 70% by mass (weight Average molecular weight: 136,000). The obtained solution was applied and processed in the same manner as in Example 1, and the obtained pellicle 10 was subjected to various evaluations.
  • Example 5 The reaction was carried out under the same conditions as in Example 1, except that the amount of the cross-linking agent ("Licalid MH-700G”) was changed to the amount shown in Table 1, and an acrylic copolymer solution having a nonvolatile content concentration of 70% by mass was prepared. obtained (weight average molecular weight: 134,000). The obtained solution was applied and processed in the same manner as in Example 1, and the obtained pellicle 10 was subjected to various evaluations.
  • the cross-linking agent (“Licalid MH-700G”) was changed to the amount shown in Table 1, and an acrylic copolymer solution having a nonvolatile content concentration of 70% by mass was prepared. obtained (weight average molecular weight: 134,000).
  • the obtained solution was applied and processed in the same manner as in Example 1, and the obtained pellicle 10 was subjected to various evaluations.
  • Example 2 The reaction was carried out under the same conditions as in Example 1, except that BA, HEMA, and GMA were charged at the mass ratio shown in Table 1, to obtain an acrylic copolymer solution with a non-volatile content concentration of 70% by mass (weight average molecular weight: 18 60,000). The obtained solution was applied and processed in the same manner as in Example 1, and the obtained pellicle 10 was subjected to various evaluations.
  • “substrate temperature” indicates the temperature of the quartz glass substrate.
  • “copolymer solution” indicates an acrylic copolymer solution.
  • “parts” of each monomer in “copolymer” indicates the mass ratio of each monomer to 100 parts by mass of the total amount of monomers constituting the copolymer.
  • the “parts” of each component in the “additive blending amount” is the mass of the solid content of the copolymer solution (that is, the total mass of the monomers constituting the copolymer) when 100 parts. The mass ratio of each component is shown.
  • “12XL25” indicates “Perkadox 12-XL25”
  • "1173” indicates “omnirad1173”
  • “SA102” indicates “U-CAT SA-102”
  • “MH700G ” indicates “Licacid MH-700G”.
  • the pellicle of Comparative Example 1 includes a pellicle frame, a pellicle film, and an adhesive layer.
  • [A 60° C. ] was 2.3 gf/mm 2 and was not 4.0 gf/mm 2 or more. Therefore, it was found that the pellicle of Comparative Example 1 was easily peeled off from the photomask when exposed to a high-temperature environment (for example, 60°C).
  • the pellicles of Examples 1 to 5 had [A 60° C. ] of 4.0 gf/mm 2 or more. Therefore, it was found that the pellicles of Examples 1 to 5 are difficult to peel off from the photomask even when exposed to a high temperature environment (eg, 60° C.).
  • Example 5 when comparing Examples 1 to 4 with Example 5, in Example 5, [A 60 ° C. ]/[A 23 ° C. ] was 0.39, and the evaluation of adhesive residue at 23 ° C. was "B "Met. In Examples 1 to 4, [A 60° C. ]/[A 23° C. ] was 0.40 or more, and the evaluation of adhesive residue at 23° C. was "A", which was superior.
  • the adhesive composition of Example 1 contains an appropriate amount of a cross-linking agent (MH700G), so that the cross-linking density does not become too small, and when the pellicle is removed from the master plate, It is thought that adhesive residue is less likely to occur on the surface.
  • MH700G cross-linking agent

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PCT/JP2022/034108 2021-09-13 2022-09-12 ペリクル、露光原版、露光装置、及びペリクルの製造方法 Ceased WO2023038139A1 (ja)

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US18/690,494 US20240377726A1 (en) 2021-09-13 2022-09-12 Pellicle, exposure original plate, exposure device and pellicle production method
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JP2015114502A (ja) * 2013-12-12 2015-06-22 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法
JP2016156882A (ja) * 2015-02-23 2016-09-01 旭化成株式会社 ペリクル
JP2018021182A (ja) * 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法
KR20200014066A (ko) * 2018-07-31 2020-02-10 주식회사 시엠테크놀로지 펠리클 수납용기

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JP2015114502A (ja) * 2013-12-12 2015-06-22 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法
JP2016156882A (ja) * 2015-02-23 2016-09-01 旭化成株式会社 ペリクル
JP2018021182A (ja) * 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法
KR20200014066A (ko) * 2018-07-31 2020-02-10 주식회사 시엠테크놀로지 펠리클 수납용기

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