KR20240047426A - 펠리클, 노광 원판, 노광 장치 및 펠리클의 제조 방법 - Google Patents

펠리클, 노광 원판, 노광 장치 및 펠리클의 제조 방법 Download PDF

Info

Publication number
KR20240047426A
KR20240047426A KR1020247008338A KR20247008338A KR20240047426A KR 20240047426 A KR20240047426 A KR 20240047426A KR 1020247008338 A KR1020247008338 A KR 1020247008338A KR 20247008338 A KR20247008338 A KR 20247008338A KR 20240047426 A KR20240047426 A KR 20240047426A
Authority
KR
South Korea
Prior art keywords
pellicle
mass
adhesive layer
meth
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247008338A
Other languages
English (en)
Korean (ko)
Inventor
다카시 우네자키
가이치로 하루타
야스시 사토
켄 이토
요스케 오노
마사시 후지무라
히사코 이시카와
Original Assignee
미쯔이가가꾸가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔이가가꾸가부시끼가이샤 filed Critical 미쯔이가가꾸가부시끼가이샤
Publication of KR20240047426A publication Critical patent/KR20240047426A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020247008338A 2021-09-13 2022-09-12 펠리클, 노광 원판, 노광 장치 및 펠리클의 제조 방법 Pending KR20240047426A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021148630 2021-09-13
JPJP-P-2021-148630 2021-09-13
PCT/JP2022/034108 WO2023038139A1 (ja) 2021-09-13 2022-09-12 ペリクル、露光原版、露光装置、及びペリクルの製造方法

Publications (1)

Publication Number Publication Date
KR20240047426A true KR20240047426A (ko) 2024-04-12

Family

ID=85506430

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247008338A Pending KR20240047426A (ko) 2021-09-13 2022-09-12 펠리클, 노광 원판, 노광 장치 및 펠리클의 제조 방법

Country Status (5)

Country Link
US (1) US20240377726A1 (https=)
JP (1) JP7673217B2 (https=)
KR (1) KR20240047426A (https=)
CN (1) CN118020023A (https=)
WO (1) WO2023038139A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021193681A1 (ja) * 2020-03-27 2021-09-30 三井化学株式会社 ペリクル、およびその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011107469A (ja) 2009-11-18 2011-06-02 Asahi Kasei E-Materials Corp ペリクル
JP2018021182A (ja) 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6430118B2 (ja) * 2013-12-12 2018-11-28 旭化成株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法
JP6543044B2 (ja) * 2015-02-23 2019-07-10 旭化成株式会社 ペリクル
KR102172218B1 (ko) * 2018-07-31 2020-10-30 주식회사 시엠테크놀로지 펠리클 수납용기

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011107469A (ja) 2009-11-18 2011-06-02 Asahi Kasei E-Materials Corp ペリクル
JP2018021182A (ja) 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法

Also Published As

Publication number Publication date
WO2023038139A1 (ja) 2023-03-16
CN118020023A (zh) 2024-05-10
JPWO2023038139A1 (https=) 2023-03-16
TW202314378A (zh) 2023-04-01
JP7673217B2 (ja) 2025-05-08
US20240377726A1 (en) 2024-11-14

Similar Documents

Publication Publication Date Title
KR20110067119A (ko) 자외선 경화형 재박리성 점착제 조성물 및 이것을 사용한 점착 시트
JP5785489B2 (ja) ペリクル
JP6105188B2 (ja) ペリクル
JP2017034117A (ja) ダイシング・ダイボンディング一体型テープ
JP5319500B2 (ja) ペリクル
KR20240047426A (ko) 펠리클, 노광 원판, 노광 장치 및 펠리클의 제조 방법
TW202020088A (zh) 黏著劑組成物及黏著薄片
KR20240047425A (ko) 펠리클
JP5756744B2 (ja) ペリクル用粘着剤組成物
KR20240038817A (ko) 펠리클 프레임, 펠리클, 펠리클의 제조 방법 및 펠리클 프레임의 평가 방법
TWI919000B (zh) 防護膜、曝光原版、曝光裝置及防護膜的製造方法
JP2011107469A (ja) ペリクル
JP2020160466A (ja) ペリクル
CN102073213A (zh) 表膜
WO2023182186A1 (ja) 粘着層付きペリクル枠の製造方法、保護フィルム付きペリクル枠、粘着層付きペリクル枠、ペリクル及びペリクル付きフォトマスク
JP7274636B2 (ja) ペリクル
JPWO2011071107A1 (ja) 光硬化反応後およびパターン形成後にも接着性を有する感光性接着剤組成物
JP2025102326A (ja) マスク粘着層付きペリクル枠、ペリクル、マスク粘着層付きペリクル枠の製造方法及びペリクルの製造方法
JPWO2017168699A1 (ja) 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品
JP2007171375A (ja) ディスプレイ用回路基板及び粘着剤シート
WO2023149347A1 (ja) ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法
KR20180092381A (ko) 점착제 조성물 및 이로부터 형성되는 점착 패턴
JP2022065423A (ja) 積層体の製造方法および処理方法、当該製造方法および処理方法で用いる感光性樹脂組成物
KR20240132343A (ko) 펠리클, 노광 원판 및 노광 장치, 그리고 펠리클의 제작 방법 및 마스크용 점착제층의 시험 방법
JP2009251228A (ja) 基板用樹脂シート及び基板用シート

Legal Events

Date Code Title Description
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11 Administrative time limit extension requested

Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13 Pre-grant limitation requested

Free format text: ST27 STATUS EVENT CODE: A-2-3-E10-E13-LIM-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000