JP7661636B1 - 光学特性検査装置 - Google Patents
光学特性検査装置 Download PDFInfo
- Publication number
- JP7661636B1 JP7661636B1 JP2024551608A JP2024551608A JP7661636B1 JP 7661636 B1 JP7661636 B1 JP 7661636B1 JP 2024551608 A JP2024551608 A JP 2024551608A JP 2024551608 A JP2024551608 A JP 2024551608A JP 7661636 B1 JP7661636 B1 JP 7661636B1
- Authority
- JP
- Japan
- Prior art keywords
- optical axis
- optical
- detector
- light
- search
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/06—Restricting the angle of incident light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/58—Photometry, e.g. photographic exposure meter using luminescence generated by light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2024/016044 WO2025224871A1 (ja) | 2024-04-24 | 2024-04-24 | 光学特性検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP7661636B1 true JP7661636B1 (ja) | 2025-04-14 |
| JPWO2025224871A1 JPWO2025224871A1 (https=) | 2025-10-30 |
| JPWO2025224871A5 JPWO2025224871A5 (https=) | 2026-04-01 |
Family
ID=95373649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024551608A Active JP7661636B1 (ja) | 2024-04-24 | 2024-04-24 | 光学特性検査装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7661636B1 (https=) |
| WO (1) | WO2025224871A1 (https=) |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03167511A (ja) * | 1989-11-27 | 1991-07-19 | Nec Corp | 半導体レーザモジュールの光軸合わせ方法 |
| JP2001085549A (ja) * | 1999-09-14 | 2001-03-30 | Matsushita Electronics Industry Corp | 気密封止型半導体パッケージ |
| JP2004085801A (ja) * | 2002-08-26 | 2004-03-18 | Matsushita Electric Ind Co Ltd | 光学素子調整方法およびその装置、並びにその方法が用いられた光学素子製造方法 |
| JP2005172665A (ja) * | 2003-12-12 | 2005-06-30 | Oputeru:Kk | 光放射パターン測定装置 |
| JP2005214726A (ja) * | 2004-01-28 | 2005-08-11 | Advanced Lcd Technologies Development Center Co Ltd | 光強度分布検出方法、光強度分布検出装置、アニール装置及びアニール方法 |
| JP2005345925A (ja) * | 2004-06-04 | 2005-12-15 | Fujitsu Ltd | 光学部品間の調芯方法、調芯プログラム、および調芯装置 |
| JP2008216414A (ja) * | 2007-03-01 | 2008-09-18 | Konica Minolta Opto Inc | 位置決め装置および位置決め方法 |
| JP2010066562A (ja) * | 2008-09-11 | 2010-03-25 | Jtekt Corp | 光ファイバ位置決め方法 |
| JP2014199229A (ja) * | 2013-03-29 | 2014-10-23 | 住友ベークライト株式会社 | 傾斜角度測定方法および傾斜角度測定装置 |
| JP2015108789A (ja) * | 2013-12-06 | 2015-06-11 | 株式会社日立情報通信エンジニアリング | 光学部品の高精度調芯方法及び高精度調芯装置 |
| JP2016018028A (ja) * | 2014-07-07 | 2016-02-01 | 三菱電機株式会社 | 光軸調整装置および光軸調整方法 |
| JP2018116196A (ja) * | 2017-01-19 | 2018-07-26 | 三菱電機株式会社 | 光軸調整方法、光デバイスの製造方法、および光軸調整システム |
| JP2019203926A (ja) * | 2018-05-21 | 2019-11-28 | Tdk株式会社 | 接続装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001083379A (ja) * | 1999-07-09 | 2001-03-30 | Furukawa Electric Co Ltd:The | 光部品の光軸合わせ方法およびその装置 |
-
2024
- 2024-04-24 JP JP2024551608A patent/JP7661636B1/ja active Active
- 2024-04-24 WO PCT/JP2024/016044 patent/WO2025224871A1/ja active Pending
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03167511A (ja) * | 1989-11-27 | 1991-07-19 | Nec Corp | 半導体レーザモジュールの光軸合わせ方法 |
| JP2001085549A (ja) * | 1999-09-14 | 2001-03-30 | Matsushita Electronics Industry Corp | 気密封止型半導体パッケージ |
| JP2004085801A (ja) * | 2002-08-26 | 2004-03-18 | Matsushita Electric Ind Co Ltd | 光学素子調整方法およびその装置、並びにその方法が用いられた光学素子製造方法 |
| JP2005172665A (ja) * | 2003-12-12 | 2005-06-30 | Oputeru:Kk | 光放射パターン測定装置 |
| JP2005214726A (ja) * | 2004-01-28 | 2005-08-11 | Advanced Lcd Technologies Development Center Co Ltd | 光強度分布検出方法、光強度分布検出装置、アニール装置及びアニール方法 |
| JP2005345925A (ja) * | 2004-06-04 | 2005-12-15 | Fujitsu Ltd | 光学部品間の調芯方法、調芯プログラム、および調芯装置 |
| JP2008216414A (ja) * | 2007-03-01 | 2008-09-18 | Konica Minolta Opto Inc | 位置決め装置および位置決め方法 |
| JP2010066562A (ja) * | 2008-09-11 | 2010-03-25 | Jtekt Corp | 光ファイバ位置決め方法 |
| JP2014199229A (ja) * | 2013-03-29 | 2014-10-23 | 住友ベークライト株式会社 | 傾斜角度測定方法および傾斜角度測定装置 |
| JP2015108789A (ja) * | 2013-12-06 | 2015-06-11 | 株式会社日立情報通信エンジニアリング | 光学部品の高精度調芯方法及び高精度調芯装置 |
| JP2016018028A (ja) * | 2014-07-07 | 2016-02-01 | 三菱電機株式会社 | 光軸調整装置および光軸調整方法 |
| JP2018116196A (ja) * | 2017-01-19 | 2018-07-26 | 三菱電機株式会社 | 光軸調整方法、光デバイスの製造方法、および光軸調整システム |
| JP2019203926A (ja) * | 2018-05-21 | 2019-11-28 | Tdk株式会社 | 接続装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2025224871A1 (https=) | 2025-10-30 |
| WO2025224871A1 (ja) | 2025-10-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6291816B1 (en) | System and method for measuring object features with coordinated two and three dimensional imaging | |
| TWI551855B (zh) | 檢測晶圓之系統與方法以及由該系統讀取的程式儲存裝置 | |
| CN107037443B (zh) | 基于三角测量原理来确定距离的方法和测距单元 | |
| JP5341351B2 (ja) | 共焦点顕微鏡システムの基本原理に基づく測定装置及び方法 | |
| TWI575626B (zh) | 檢測晶圓之系統及方法 | |
| CA2587245C (en) | Laser triangulation method for measurement of highly reflective solder balls | |
| JP6467233B2 (ja) | 検査装置、描画装置及び検査方法 | |
| WO2019179123A1 (zh) | ToF相机及衍射光学元件的设计方法 | |
| JP7661636B1 (ja) | 光学特性検査装置 | |
| US20110025823A1 (en) | Three-dimensional measuring apparatus | |
| JP2015108582A (ja) | 3次元計測方法と装置 | |
| CN119595253A (zh) | 一种长条光斑的检测方法、系统、设备及介质 | |
| KR20220070464A (ko) | 1차원 고유 구조에 대한 패턴 대 설계 정렬 | |
| JP2021124429A (ja) | 走査測定方法及び走査測定装置 | |
| US20240282000A1 (en) | Incline estimation system, incline estimation method, incline estimation program, semiconductor inspection system, and organism observation system | |
| CN109257595A (zh) | 一种测试图像传感器像元内响应非均匀性的系统 | |
| JP2001166202A (ja) | 焦点検出方法及び焦点検出装置 | |
| KR102159863B1 (ko) | 막두께 측정 장치, 기판 검사 장치, 막두께 측정 방법 및 기판 검사 방법 | |
| JPH1184223A (ja) | 自動位置検出方法及び自動位置検出装置 | |
| CN1603868A (zh) | 光束诊断装置和方法 | |
| TWI889326B (zh) | 經組態以照明及測量工件之孔隙的計量系統 | |
| KR102705735B1 (ko) | 라인빔을 이용한 형상 프로파일 측정장치 | |
| US20250146949A1 (en) | Machine vision system utilizing autofocus and inspection processes | |
| JP2021018307A (ja) | 撮像装置、及びフォーカス調整方法 | |
| JPH09258091A (ja) | レーザー光射出光学ユニットのピント測定方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240829 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240829 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20240829 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20241203 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20241227 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20250305 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20250402 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7661636 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |