JP7625444B2 - ステージ装置、リソグラフィー装置および物品製造方法 - Google Patents

ステージ装置、リソグラフィー装置および物品製造方法 Download PDF

Info

Publication number
JP7625444B2
JP7625444B2 JP2021035636A JP2021035636A JP7625444B2 JP 7625444 B2 JP7625444 B2 JP 7625444B2 JP 2021035636 A JP2021035636 A JP 2021035636A JP 2021035636 A JP2021035636 A JP 2021035636A JP 7625444 B2 JP7625444 B2 JP 7625444B2
Authority
JP
Japan
Prior art keywords
stage
interferometer
optical assembly
scale
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021035636A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022135679A5 (https=
JP2022135679A (ja
Inventor
聡 岩谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2021035636A priority Critical patent/JP7625444B2/ja
Priority to EP23192352.5A priority patent/EP4273597A3/en
Priority to EP22157687.9A priority patent/EP4053497B1/en
Priority to TW111106723A priority patent/TWI853218B/zh
Priority to KR1020220024750A priority patent/KR20220125681A/ko
Priority to US17/684,541 priority patent/US12386274B2/en
Priority to CN202210205596.3A priority patent/CN115097697A/zh
Publication of JP2022135679A publication Critical patent/JP2022135679A/ja
Publication of JP2022135679A5 publication Critical patent/JP2022135679A5/ja
Application granted granted Critical
Publication of JP7625444B2 publication Critical patent/JP7625444B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/03—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring coordinates of points
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/15—Cat eye, i.e. reflection always parallel to incoming beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2021035636A 2021-03-05 2021-03-05 ステージ装置、リソグラフィー装置および物品製造方法 Active JP7625444B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2021035636A JP7625444B2 (ja) 2021-03-05 2021-03-05 ステージ装置、リソグラフィー装置および物品製造方法
EP23192352.5A EP4273597A3 (en) 2021-03-05 2022-02-21 Stage device, lithography apparatus, and article manufacturing method
EP22157687.9A EP4053497B1 (en) 2021-03-05 2022-02-21 Stage device, lithography apparatus, and article manufacturing method
TW111106723A TWI853218B (zh) 2021-03-05 2022-02-24 載台裝置、微影設備、及物品製造方法
KR1020220024750A KR20220125681A (ko) 2021-03-05 2022-02-25 스테이지 장치, 리소그래피 장치 및 물품 제조 방법
US17/684,541 US12386274B2 (en) 2021-03-05 2022-03-02 Stage device, lithography apparatus, and article manufacturing method
CN202210205596.3A CN115097697A (zh) 2021-03-05 2022-03-04 工作台装置、光刻设备和物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021035636A JP7625444B2 (ja) 2021-03-05 2021-03-05 ステージ装置、リソグラフィー装置および物品製造方法

Publications (3)

Publication Number Publication Date
JP2022135679A JP2022135679A (ja) 2022-09-15
JP2022135679A5 JP2022135679A5 (https=) 2024-03-13
JP7625444B2 true JP7625444B2 (ja) 2025-02-03

Family

ID=81326231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021035636A Active JP7625444B2 (ja) 2021-03-05 2021-03-05 ステージ装置、リソグラフィー装置および物品製造方法

Country Status (6)

Country Link
US (1) US12386274B2 (https=)
EP (2) EP4273597A3 (https=)
JP (1) JP7625444B2 (https=)
KR (1) KR20220125681A (https=)
CN (1) CN115097697A (https=)
TW (1) TWI853218B (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7625444B2 (ja) 2021-03-05 2025-02-03 キヤノン株式会社 ステージ装置、リソグラフィー装置および物品製造方法
TWI866681B (zh) * 2023-12-08 2024-12-11 均華精密工業股份有限公司 同向式多軸作業設備

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002319541A (ja) 2001-02-15 2002-10-31 Canon Inc レーザ干渉干渉計システムを含む露光装置
JP2005244088A (ja) 2004-02-27 2005-09-08 Canon Inc ステージ装置及びその制御方法
JP2009302490A (ja) 2008-06-17 2009-12-24 Canon Inc 露光装置及びデバイス製造方法
US20120032067A1 (en) 2010-06-09 2012-02-09 Nikon Corporation Two dimensional encoder system and method
JP2013525750A (ja) 2010-03-30 2013-06-20 ザイゴ コーポレーション 干渉計エンコーダ・システム
JP2014190896A (ja) 2013-03-28 2014-10-06 Nikon Corp エンコーダ、駆動装置、ステージ装置及び露光装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07270122A (ja) * 1994-03-30 1995-10-20 Canon Inc 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
US5757160A (en) * 1996-12-23 1998-05-26 Svg Lithography Systems, Inc. Moving interferometer wafer stage
JP2004510129A (ja) * 2000-05-17 2004-04-02 ザイゴ　コーポレイション 干渉装置および干渉方法
TW527526B (en) 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1931947A2 (en) * 2005-09-21 2008-06-18 Koninklijke Philips Electronics N.V. System for detecting motion of a body
TWI605491B (zh) * 2006-01-19 2017-11-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
US7636165B2 (en) * 2006-03-21 2009-12-22 Asml Netherlands B.V. Displacement measurement systems lithographic apparatus and device manufacturing method
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
WO2009098891A1 (ja) * 2008-02-08 2009-08-13 Nikon Corporation 位置計測システム及び位置計測方法、移動体装置、移動体駆動方法、露光装置及び露光方法、パターン形成装置、並びにデバイス製造方法
JP2013101084A (ja) 2011-11-09 2013-05-23 Nikon Corp 位置検出方法及び装置、エンコーダ装置、並びに露光装置
JP2014086476A (ja) * 2012-10-22 2014-05-12 Canon Inc リソグラフィー装置、それを用いた物品の製造方法
EP3207339B1 (en) * 2014-10-13 2019-07-24 Zygo Corporation Interferometric encoder systems
JP7625444B2 (ja) 2021-03-05 2025-02-03 キヤノン株式会社 ステージ装置、リソグラフィー装置および物品製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002319541A (ja) 2001-02-15 2002-10-31 Canon Inc レーザ干渉干渉計システムを含む露光装置
JP2005244088A (ja) 2004-02-27 2005-09-08 Canon Inc ステージ装置及びその制御方法
JP2009302490A (ja) 2008-06-17 2009-12-24 Canon Inc 露光装置及びデバイス製造方法
JP2013525750A (ja) 2010-03-30 2013-06-20 ザイゴ コーポレーション 干渉計エンコーダ・システム
US20120032067A1 (en) 2010-06-09 2012-02-09 Nikon Corporation Two dimensional encoder system and method
JP2014190896A (ja) 2013-03-28 2014-10-06 Nikon Corp エンコーダ、駆動装置、ステージ装置及び露光装置

Also Published As

Publication number Publication date
CN115097697A (zh) 2022-09-23
US12386274B2 (en) 2025-08-12
KR20220125681A (ko) 2022-09-14
EP4273597A3 (en) 2023-11-29
US20220283518A1 (en) 2022-09-08
EP4273597A2 (en) 2023-11-08
EP4053497A1 (en) 2022-09-07
TWI853218B (zh) 2024-08-21
TW202236028A (zh) 2022-09-16
JP2022135679A (ja) 2022-09-15
EP4053497B1 (en) 2023-09-20

Similar Documents

Publication Publication Date Title
JP5131281B2 (ja) 露光装置及び露光方法、並びにデバイス製造方法
JP4854499B2 (ja) リトグラフィー投影装置の較正方法
JP5579793B2 (ja) 露光装置及びデバイス製造方法
US6285457B2 (en) Exposure apparatus and device manufacturing method including measuring position and/or displacement of each of a base and a stage with respect to a support
KR101264798B1 (ko) 위치 센서 및 리소그래피 장치
US6285444B1 (en) Positioning system and position measuring method for use in exposure apparatus
KR20100124245A (ko) 위치 계측 시스템 및 위치 계측 방법, 이동체 장치, 이동체 구동 방법, 노광 장치 및 노광 방법, 패턴 형성 장치, 그리고 디바이스 제조 방법
JP2011503529A (ja) 精確な測定を有する移動装置
KR20110059651A (ko) 이동체 장치 및 이동체 구동 방법
JP6767682B2 (ja) エンコーダ装置及び露光装置
KR20120091158A (ko) 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP7625444B2 (ja) ステージ装置、リソグラフィー装置および物品製造方法
JPWO2007097350A1 (ja) 位置計測装置及び位置計測方法、移動体駆動システム及び移動体駆動方法、パターン形成装置及びパターン形成方法、露光装置及び露光方法、並びにデバイス製造方法
JP6680997B2 (ja) エンコーダ装置及びその使用方法、光学装置、露光装置、並びにデバイス製造方法
JP2013101084A (ja) 位置検出方法及び装置、エンコーダ装置、並びに露光装置
CN114152193A (zh) 运动台光栅测量系统和光刻机
HK1181124B (en) Exposure apparatus, exposure method, and device manufacturing method
HK1181124A1 (en) Exposure apparatus, exposure method, and device manufacturing method

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240304

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240304

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20241010

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20241018

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241216

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20241224

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250122

R150 Certificate of patent or registration of utility model

Ref document number: 7625444

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150