JP7582073B2 - マトリックス支援レーザ脱離イオン化質量分析装置及び方法 - Google Patents

マトリックス支援レーザ脱離イオン化質量分析装置及び方法 Download PDF

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JP7582073B2
JP7582073B2 JP2021089812A JP2021089812A JP7582073B2 JP 7582073 B2 JP7582073 B2 JP 7582073B2 JP 2021089812 A JP2021089812 A JP 2021089812A JP 2021089812 A JP2021089812 A JP 2021089812A JP 7582073 B2 JP7582073 B2 JP 7582073B2
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fluorescence
sample
light
matrix
laser beam
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JP2022182314A (ja
JP2022182314A5 (https=
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慶 小寺
宏樹 石田
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Shimadzu Corp
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JP2021089812A 2021-05-28 2021-05-28 マトリックス支援レーザ脱離イオン化質量分析装置及び方法 Active JP7582073B2 (ja)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004212206A (ja) 2002-12-27 2004-07-29 Institute Of Physical & Chemical Research 高分子分析用基板、高分子分析用アレイおよび高分子分析方法
JP2007127653A (ja) 2005-11-04 2007-05-24 Agilent Technol Inc Ｍａｌｄｉのためのレーザ集束及びスポット撮像を一体に組み込むための装置
JP2009080106A (ja) 2000-10-10 2009-04-16 Biotrove Inc アッセイ、合成、および保存用の器具、ならびに、その作製、使用、および操作の方法
JP2020106293A (ja) 2018-12-26 2020-07-09 株式会社島津製作所 イメージング質量分析装置、質量分析方法およびプログラム
JP2020149853A (ja) 2019-03-13 2020-09-17 株式会社島津製作所 質量分析装置及び質量分析方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009080106A (ja) 2000-10-10 2009-04-16 Biotrove Inc アッセイ、合成、および保存用の器具、ならびに、その作製、使用、および操作の方法
JP2004212206A (ja) 2002-12-27 2004-07-29 Institute Of Physical & Chemical Research 高分子分析用基板、高分子分析用アレイおよび高分子分析方法
JP2007127653A (ja) 2005-11-04 2007-05-24 Agilent Technol Inc Ｍａｌｄｉのためのレーザ集束及びスポット撮像を一体に組み込むための装置
JP2020106293A (ja) 2018-12-26 2020-07-09 株式会社島津製作所 イメージング質量分析装置、質量分析方法およびプログラム
JP2020149853A (ja) 2019-03-13 2020-09-17 株式会社島津製作所 質量分析装置及び質量分析方法

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