JP7564086B2 - 複数画像レーザビーム品質測定の焦点補正のための方法及び装置 - Google Patents

複数画像レーザビーム品質測定の焦点補正のための方法及び装置 Download PDF

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JP7564086B2
JP7564086B2 JP2021503009A JP2021503009A JP7564086B2 JP 7564086 B2 JP7564086 B2 JP 7564086B2 JP 2021503009 A JP2021503009 A JP 2021503009A JP 2021503009 A JP2021503009 A JP 2021503009A JP 7564086 B2 JP7564086 B2 JP 7564086B2
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image
focus
focal plane
laser beam
imaging device
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JP2021530710A (ja
JP2021530710A5 (https=
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レイ ブラウン，フォン
ブラウン，ジェフ
シモンズ，ジェド
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オフィール オプトロニクス ソリューションズ リミテッド
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0214—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0422—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using light concentrators, collectors or condensers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Lasers (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2021503009A 2018-07-20 2019-07-08 複数画像レーザビーム品質測定の焦点補正のための方法及び装置 Active JP7564086B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862701244P 2018-07-20 2018-07-20
US62/701,244 2018-07-20
PCT/US2019/040891 WO2020018308A1 (en) 2018-07-20 2019-07-08 Method and apparatus for focus correction of multi-image laser beam quality measurements

Publications (3)

Publication Number Publication Date
JP2021530710A JP2021530710A (ja) 2021-11-11
JP2021530710A5 JP2021530710A5 (https=) 2022-06-13
JP7564086B2 true JP7564086B2 (ja) 2024-10-08

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JP2021503009A Active JP7564086B2 (ja) 2018-07-20 2019-07-08 複数画像レーザビーム品質測定の焦点補正のための方法及び装置

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Country Link
US (1) US11965775B2 (https=)
EP (1) EP3824259B1 (https=)
JP (1) JP7564086B2 (https=)
KR (1) KR102767094B1 (https=)
CN (1) CN112334744B (https=)
WO (1) WO2020018308A1 (https=)

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CN113091898A (zh) * 2021-03-04 2021-07-09 南京理工大学 基于散射光成像法的激光光束质量测量方法
CN112924024A (zh) * 2021-03-12 2021-06-08 中国工程物理研究院激光聚变研究中心 一种新型高能激光光束质量测量装置
DE202021103431U1 (de) * 2021-06-28 2021-08-19 Trioptics Gmbh Vorrichtung zur Abbildung durch ein zu prüfendes optisches System und System zum Prüfen eines optischen Systems
US20230008319A1 (en) * 2021-07-06 2023-01-12 Divergent Technologies, Inc. Exchangeable beam entry window for am system
DE102022101274A1 (de) 2022-01-20 2023-07-20 TRUMPF Werkzeugmaschinen SE + Co. KG Verfahren und Messanordnung zur Bestimmung der Eigenschaften einer Laserschmelzschneidvorrichtung
DE102023102206A1 (de) * 2023-01-31 2024-08-01 TRUMPF Laser SE Kontrastmessung zur Laserpulseinstellung
CN121364060A (zh) * 2025-12-23 2026-01-20 中国计量科学研究院 一种扫描散射式光束分析仪

Citations (3)

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JP2003014583A (ja) 2001-07-04 2003-01-15 Ricoh Co Ltd ビームプロファイル検証方法
JP2013522651A (ja) 2010-03-23 2013-06-13 オフィール−スピリコン エルエルシー ビーム散乱レーザーモニター
WO2017223426A1 (en) 2016-06-24 2017-12-28 Howard Hughes Medical Institute Automated adjustment of light sheet geometry in a microscope

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JPS6295742A (ja) 1985-10-19 1987-05-02 Hitachi Maxell Ltd レ−ザ露光装置
JP3040812B2 (ja) 1989-04-27 2000-05-15 コヒーレント・インク レーザービームのモード特性測定装置及びレーザー光集束レンズ系
US5760901A (en) 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
IL148664A0 (en) 2002-03-13 2002-09-12 Yeda Res & Dev Auto-focusing method and device
EP1608954A1 (en) 2003-03-11 2005-12-28 Koninklijke Philips Electronics N.V. Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
IL156856A (en) 2003-07-09 2011-11-30 Joseph Shamir Method for particle size and concentration measurement
EP1804100B1 (en) 2005-12-30 2018-02-21 Datalogic IP TECH S.r.l. Device and method for focusing a laser light beam
US8520219B2 (en) 2011-12-19 2013-08-27 Perceptron, Inc. Non-contact sensor having improved laser spot
US8711343B1 (en) 2012-10-22 2014-04-29 Haas Laser Technologies, Inc. Apparatus for focus beam analysis of high power lasers
DE102014201779B4 (de) * 2014-01-31 2016-12-15 Carl Zeiss Smt Gmbh Strahlpropagationskamera und Verfahren zur Lichtstrahlanalyse
DE102015001421B4 (de) 2015-02-06 2016-09-15 Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Vorrichtung und Verfahren zur Strahldiagnose an Laserbearbeitungs-Optiken (PRl-2015-001)
CN106473702B (zh) 2016-09-11 2023-04-18 浙江大学 任意位置多点光聚焦及光斑优化的方法与系统
JP7582980B2 (ja) 2019-06-22 2024-11-13 オフィール オプトロニクス ソリューションズ リミテッド レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法
JP7428672B2 (ja) * 2021-02-03 2024-02-06 株式会社日立製作所 粒子測定装置

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JP2003014583A (ja) 2001-07-04 2003-01-15 Ricoh Co Ltd ビームプロファイル検証方法
JP2013522651A (ja) 2010-03-23 2013-06-13 オフィール−スピリコン エルエルシー ビーム散乱レーザーモニター
WO2017223426A1 (en) 2016-06-24 2017-12-28 Howard Hughes Medical Institute Automated adjustment of light sheet geometry in a microscope

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Also Published As

Publication number Publication date
EP3824259A4 (en) 2022-03-30
CN112334744A (zh) 2021-02-05
US11965775B2 (en) 2024-04-23
KR102767094B1 (ko) 2025-02-13
EP3824259A1 (en) 2021-05-26
JP2021530710A (ja) 2021-11-11
KR20210024181A (ko) 2021-03-04
CN112334744B (zh) 2024-09-13
WO2020018308A1 (en) 2020-01-23
EP3824259B1 (en) 2024-12-18
US20210199495A1 (en) 2021-07-01

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