KR102767094B1 - 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치 - Google Patents

다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치 Download PDF

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KR102767094B1
KR102767094B1 KR1020217004044A KR20217004044A KR102767094B1 KR 102767094 B1 KR102767094 B1 KR 102767094B1 KR 1020217004044 A KR1020217004044 A KR 1020217004044A KR 20217004044 A KR20217004044 A KR 20217004044A KR 102767094 B1 KR102767094 B1 KR 102767094B1
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image
focus
laser beam
focal plane
slices
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KR20210024181A (ko
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폰 레이 브라운
제프 브라운
제드 시몬스
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오퍼 옵트로닉스 솔루션스 리미티드
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0214—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0422—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using light concentrators, collectors or condensers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Lasers (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020217004044A 2018-07-20 2019-07-08 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치 Active KR102767094B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862701244P 2018-07-20 2018-07-20
US62/701,244 2018-07-20
PCT/US2019/040891 WO2020018308A1 (en) 2018-07-20 2019-07-08 Method and apparatus for focus correction of multi-image laser beam quality measurements

Publications (2)

Publication Number Publication Date
KR20210024181A KR20210024181A (ko) 2021-03-04
KR102767094B1 true KR102767094B1 (ko) 2025-02-13

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KR1020217004044A Active KR102767094B1 (ko) 2018-07-20 2019-07-08 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치

Country Status (6)

Country Link
US (1) US11965775B2 (https=)
EP (1) EP3824259B1 (https=)
JP (1) JP7564086B2 (https=)
KR (1) KR102767094B1 (https=)
CN (1) CN112334744B (https=)
WO (1) WO2020018308A1 (https=)

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Publication number Priority date Publication date Assignee Title
CN113091898A (zh) * 2021-03-04 2021-07-09 南京理工大学 基于散射光成像法的激光光束质量测量方法
CN112924024A (zh) * 2021-03-12 2021-06-08 中国工程物理研究院激光聚变研究中心 一种新型高能激光光束质量测量装置
DE202021103431U1 (de) * 2021-06-28 2021-08-19 Trioptics Gmbh Vorrichtung zur Abbildung durch ein zu prüfendes optisches System und System zum Prüfen eines optischen Systems
US20230008319A1 (en) * 2021-07-06 2023-01-12 Divergent Technologies, Inc. Exchangeable beam entry window for am system
DE102022101274A1 (de) 2022-01-20 2023-07-20 TRUMPF Werkzeugmaschinen SE + Co. KG Verfahren und Messanordnung zur Bestimmung der Eigenschaften einer Laserschmelzschneidvorrichtung
DE102023102206A1 (de) * 2023-01-31 2024-08-01 TRUMPF Laser SE Kontrastmessung zur Laserpulseinstellung
CN121364060A (zh) * 2025-12-23 2026-01-20 中国计量科学研究院 一种扫描散射式光束分析仪

Citations (5)

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Publication number Priority date Publication date Assignee Title
US20060258942A1 (en) 2003-03-11 2006-11-16 Van Beek Michael C Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
US20130016358A1 (en) 2010-03-23 2013-01-17 Ophir-Spiricon Llc Beam scattering laser monitor
US20140233022A1 (en) 2012-10-22 2014-08-21 Haas Laser Technologies, Inc. Apparatus for focus beam analysis of high power lasers
US20160341969A1 (en) 2014-01-31 2016-11-24 Carl Zeiss Smt Gmbh Beam propagation camera and method for light beam analysis
US20180029164A1 (en) 2015-02-06 2018-02-01 Primes Gmbh Messtechnik Fuer Die Produktion Mit Laserstrahlung Apparatus and method for beam diagnosis on laser processing optics

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JPS6295742A (ja) 1985-10-19 1987-05-02 Hitachi Maxell Ltd レ−ザ露光装置
JP3040812B2 (ja) 1989-04-27 2000-05-15 コヒーレント・インク レーザービームのモード特性測定装置及びレーザー光集束レンズ系
US5760901A (en) 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
JP4397549B2 (ja) 2001-07-04 2010-01-13 株式会社リコー ビームプロファイル検証方法
IL148664A0 (en) 2002-03-13 2002-09-12 Yeda Res & Dev Auto-focusing method and device
IL156856A (en) 2003-07-09 2011-11-30 Joseph Shamir Method for particle size and concentration measurement
EP1804100B1 (en) 2005-12-30 2018-02-21 Datalogic IP TECH S.r.l. Device and method for focusing a laser light beam
US8520219B2 (en) 2011-12-19 2013-08-27 Perceptron, Inc. Non-contact sensor having improved laser spot
WO2017223426A1 (en) 2016-06-24 2017-12-28 Howard Hughes Medical Institute Automated adjustment of light sheet geometry in a microscope
CN106473702B (zh) 2016-09-11 2023-04-18 浙江大学 任意位置多点光聚焦及光斑优化的方法与系统
JP7582980B2 (ja) 2019-06-22 2024-11-13 オフィール オプトロニクス ソリューションズ リミテッド レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法
JP7428672B2 (ja) * 2021-02-03 2024-02-06 株式会社日立製作所 粒子測定装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060258942A1 (en) 2003-03-11 2006-11-16 Van Beek Michael C Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
US20130016358A1 (en) 2010-03-23 2013-01-17 Ophir-Spiricon Llc Beam scattering laser monitor
US20140233022A1 (en) 2012-10-22 2014-08-21 Haas Laser Technologies, Inc. Apparatus for focus beam analysis of high power lasers
US20160341969A1 (en) 2014-01-31 2016-11-24 Carl Zeiss Smt Gmbh Beam propagation camera and method for light beam analysis
US20180029164A1 (en) 2015-02-06 2018-02-01 Primes Gmbh Messtechnik Fuer Die Produktion Mit Laserstrahlung Apparatus and method for beam diagnosis on laser processing optics

Also Published As

Publication number Publication date
EP3824259A4 (en) 2022-03-30
CN112334744A (zh) 2021-02-05
US11965775B2 (en) 2024-04-23
EP3824259A1 (en) 2021-05-26
JP2021530710A (ja) 2021-11-11
KR20210024181A (ko) 2021-03-04
CN112334744B (zh) 2024-09-13
WO2020018308A1 (en) 2020-01-23
EP3824259B1 (en) 2024-12-18
JP7564086B2 (ja) 2024-10-08
US20210199495A1 (en) 2021-07-01

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