JP7547630B2 - 試料ホルダおよび解析システム - Google Patents

試料ホルダおよび解析システム Download PDF

Info

Publication number
JP7547630B2
JP7547630B2 JP2023522004A JP2023522004A JP7547630B2 JP 7547630 B2 JP7547630 B2 JP 7547630B2 JP 2023522004 A JP2023522004 A JP 2023522004A JP 2023522004 A JP2023522004 A JP 2023522004A JP 7547630 B2 JP7547630 B2 JP 7547630B2
Authority
JP
Japan
Prior art keywords
sample
holder
holder shaft
rotation
shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023522004A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022244055A5 (https=
JPWO2022244055A1 (https=
Inventor
浩之 浅倉
秀樹 菊池
紀恵 矢口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of JPWO2022244055A1 publication Critical patent/JPWO2022244055A1/ja
Publication of JPWO2022244055A5 publication Critical patent/JPWO2022244055A5/ja
Application granted granted Critical
Publication of JP7547630B2 publication Critical patent/JP7547630B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007Holding mechanisms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20214Rotation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204Means for introducing and/or outputting objects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3174Etching microareas
    • H01J2237/31745Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/31749Focused ion beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2023522004A 2021-05-17 2021-05-17 試料ホルダおよび解析システム Active JP7547630B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/018607 WO2022244055A1 (ja) 2021-05-17 2021-05-17 試料ホルダおよび解析システム

Publications (3)

Publication Number Publication Date
JPWO2022244055A1 JPWO2022244055A1 (https=) 2022-11-24
JPWO2022244055A5 JPWO2022244055A5 (https=) 2024-02-14
JP7547630B2 true JP7547630B2 (ja) 2024-09-09

Family

ID=84141369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023522004A Active JP7547630B2 (ja) 2021-05-17 2021-05-17 試料ホルダおよび解析システム

Country Status (4)

Country Link
US (1) US20240266141A1 (https=)
JP (1) JP7547630B2 (https=)
DE (1) DE112021007286T5 (https=)
WO (1) WO2022244055A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119008367B (zh) * 2024-08-14 2025-09-19 北京大学 一种用于保护敏感样品的样品杆

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011090973A (ja) 2009-10-26 2011-05-06 Hitachi High-Technologies Corp 荷電粒子線装置及び荷電粒子線装置における三次元情報の表示方法
JP2014089936A (ja) 2012-10-31 2014-05-15 Hitachi High-Technologies Corp 電子ビーム顕微装置
JP2015018645A (ja) 2013-07-10 2015-01-29 株式会社日立ハイテクノロジーズ 試料ホールダおよび荷電粒子装置
JP2016100119A (ja) 2014-11-19 2016-05-30 新日鐵住金株式会社 試料ホルダー及び透過型電子顕微鏡による観察方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4654216B2 (ja) 2007-04-23 2011-03-16 株式会社日立ハイテクノロジーズ 荷電粒子線装置用試料ホールダ

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011090973A (ja) 2009-10-26 2011-05-06 Hitachi High-Technologies Corp 荷電粒子線装置及び荷電粒子線装置における三次元情報の表示方法
JP2014089936A (ja) 2012-10-31 2014-05-15 Hitachi High-Technologies Corp 電子ビーム顕微装置
JP2015018645A (ja) 2013-07-10 2015-01-29 株式会社日立ハイテクノロジーズ 試料ホールダおよび荷電粒子装置
JP2016100119A (ja) 2014-11-19 2016-05-30 新日鐵住金株式会社 試料ホルダー及び透過型電子顕微鏡による観察方法

Also Published As

Publication number Publication date
JPWO2022244055A1 (https=) 2022-11-24
DE112021007286T5 (de) 2024-01-25
WO2022244055A1 (ja) 2022-11-24
US20240266141A1 (en) 2024-08-08

Similar Documents

Publication Publication Date Title
US8581206B2 (en) Focused ion beam system and sample processing method using the same
JP4178741B2 (ja) 荷電粒子線装置および試料作製装置
KR102646113B1 (ko) 집속 이온 빔 장치
JP5422416B2 (ja) 試料搬送装置
US8247785B2 (en) Particle beam device and method for use in a particle beam device
US20160181059A1 (en) Specimen holder for a charged particle microscope
US8963102B2 (en) Charged particle beam microscope, sample holder for charged particle beam microscope, and charged particle beam microscopy
US20070029481A1 (en) Specimen tip and tip holder assembly
JP2002025490A (ja) 電子顕微鏡の試料ホルダー、試料台および試料台用治具
KR20190010473A (ko) 이중 빔 하전 입자 현미경에서의 시료 준비 및 검사
US20190287755A1 (en) Ion Milling Apparatus and Sample Holder
EP3226279B1 (en) Sample holder and focused ion beam apparatus
JP4654216B2 (ja) 荷電粒子線装置用試料ホールダ
JP7547630B2 (ja) 試料ホルダおよび解析システム
JP2008032715A (ja) 試料を搬送するための搬送機構
US7755044B2 (en) Apparatus for working and observing samples and method of working and observing cross sections
KR20180089469A (ko) 시료 홀더, 이온 밀링 장치, 시료 가공 방법, 시료 관찰 방법, 및 시료 가공·관찰 방법
WO2014195998A1 (ja) 荷電粒子線顕微鏡、荷電粒子線顕微鏡用試料ホルダ及び荷電粒子線顕微方法
JP2004295146A (ja) マニピュレータおよびそれを用いたプローブ装置、試料作製装置
US10269534B2 (en) Mask position adjustment method of ion milling, electron microscope capable of adjusting mask position, mask adjustment device mounted on sample stage and sample mask component of ion milling device
JP2004309499A (ja) 試料作製装置および試料作製方法
JP2002319365A (ja) ステージ及びfib試料作成装置
EP4581659B1 (en) Charged-particle irradiation unit for a diffractometer
JP4428369B2 (ja) 荷電粒子線装置および試料作製装置
Clarke A novel approach to TEM preparation with a (7-axis stage) triple-beam FIB-SEM system

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231109

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20231109

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240604

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240801

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240820

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240828

R150 Certificate of patent or registration of utility model

Ref document number: 7547630

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150