JP7508278B2 - 露光装置、露光方法、及び物品の製造方法 - Google Patents

露光装置、露光方法、及び物品の製造方法 Download PDF

Info

Publication number
JP7508278B2
JP7508278B2 JP2020097739A JP2020097739A JP7508278B2 JP 7508278 B2 JP7508278 B2 JP 7508278B2 JP 2020097739 A JP2020097739 A JP 2020097739A JP 2020097739 A JP2020097739 A JP 2020097739A JP 7508278 B2 JP7508278 B2 JP 7508278B2
Authority
JP
Japan
Prior art keywords
light
distribution
solid
intensity distribution
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020097739A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021189397A (ja
JP2021189397A5 (enExample
Inventor
敢士 鈴木
学 八講
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2020097739A priority Critical patent/JP7508278B2/ja
Priority to CN202110598161.5A priority patent/CN113759666B/zh
Priority to US17/336,022 priority patent/US11841614B2/en
Priority to TW110119995A priority patent/TWI823099B/zh
Priority to KR1020210072134A priority patent/KR102900819B1/ko
Publication of JP2021189397A publication Critical patent/JP2021189397A/ja
Publication of JP2021189397A5 publication Critical patent/JP2021189397A5/ja
Application granted granted Critical
Publication of JP7508278B2 publication Critical patent/JP7508278B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
    • G02B19/0066—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED in the form of an LED array
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Prostheses (AREA)
  • Eyeglasses (AREA)
JP2020097739A 2020-06-04 2020-06-04 露光装置、露光方法、及び物品の製造方法 Active JP7508278B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2020097739A JP7508278B2 (ja) 2020-06-04 2020-06-04 露光装置、露光方法、及び物品の製造方法
CN202110598161.5A CN113759666B (zh) 2020-06-04 2021-05-31 曝光装置、曝光方法和物品制造方法
US17/336,022 US11841614B2 (en) 2020-06-04 2021-06-01 Exposure apparatus, exposure method, and article manufacturing method
TW110119995A TWI823099B (zh) 2020-06-04 2021-06-02 曝光設備，曝光方法及物件製造方法
KR1020210072134A KR102900819B1 (ko) 2020-06-04 2021-06-03 노광 장치, 노광 방법, 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020097739A JP7508278B2 (ja) 2020-06-04 2020-06-04 露光装置、露光方法、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2021189397A JP2021189397A (ja) 2021-12-13
JP2021189397A5 JP2021189397A5 (enExample) 2023-05-31
JP7508278B2 true JP7508278B2 (ja) 2024-07-01

Family

ID=78787272

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020097739A Active JP7508278B2 (ja) 2020-06-04 2020-06-04 露光装置、露光方法、及び物品の製造方法

Country Status (4)

Country Link
US (1) US11841614B2 (enExample)
JP (1) JP7508278B2 (enExample)
CN (1) CN113759666B (enExample)
TW (1) TWI823099B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7677004B2 (ja) * 2021-07-08 2025-05-15 ウシオ電機株式会社 照明光学系および露光装置
JP2023096983A (ja) * 2021-12-27 2023-07-07 キヤノン株式会社 露光装置、露光方法、および、物品製造方法
JP7751484B2 (ja) * 2021-12-27 2025-10-08 キヤノン株式会社 露光装置及び物品の製造方法
WO2025069249A1 (ja) * 2023-09-27 2025-04-03 株式会社ニコン 駆動方法、光源ユニット、照明ユニット、露光装置、及び露光方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007242775A (ja) 2006-03-07 2007-09-20 Canon Inc 露光装置及びデバイス製造方法
JP2009043933A (ja) 2007-08-08 2009-02-26 Canon Inc 露光装置、調整方法、露光方法及びデバイス製造方法
US20100220306A1 (en) 2009-02-27 2010-09-02 Malach Joseph D Solid-state array for lithography illumination
WO2015015749A1 (ja) 2013-08-02 2015-02-05 株式会社ニコンエンジニアリング 光源および露光装置
WO2016152359A1 (ja) 2015-03-26 2016-09-29 ウシオ電機株式会社 光源装置、露光装置
JP2016188878A (ja) 2015-03-28 2016-11-04 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP2017073549A (ja) 2015-10-08 2017-04-13 日亜化学工業株式会社 発光装置、集積型発光装置および発光モジュール
JP2018022884A (ja) 2016-07-21 2018-02-08 シチズン電子株式会社 発光装置
JP2020122921A (ja) 2019-01-31 2020-08-13 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1022222A (ja) * 1995-12-29 1998-01-23 Hyundai Electron Ind Co Ltd 露光装置
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
US7489387B2 (en) * 2006-11-30 2009-02-10 Canon Kabushiki Kaisha Exposure apparatus and device fabrication method
JP2018092078A (ja) * 2016-12-06 2018-06-14 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法
CN108803244B (zh) 2017-04-27 2021-06-18 上海微电子装备（集团）股份有限公司 照明装置及照明方法和一种光刻机

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007242775A (ja) 2006-03-07 2007-09-20 Canon Inc 露光装置及びデバイス製造方法
JP2009043933A (ja) 2007-08-08 2009-02-26 Canon Inc 露光装置、調整方法、露光方法及びデバイス製造方法
US20100220306A1 (en) 2009-02-27 2010-09-02 Malach Joseph D Solid-state array for lithography illumination
WO2015015749A1 (ja) 2013-08-02 2015-02-05 株式会社ニコンエンジニアリング 光源および露光装置
WO2016152359A1 (ja) 2015-03-26 2016-09-29 ウシオ電機株式会社 光源装置、露光装置
JP2016188878A (ja) 2015-03-28 2016-11-04 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP2017073549A (ja) 2015-10-08 2017-04-13 日亜化学工業株式会社 発光装置、集積型発光装置および発光モジュール
JP2018022884A (ja) 2016-07-21 2018-02-08 シチズン電子株式会社 発光装置
JP2020122921A (ja) 2019-01-31 2020-08-13 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法

Also Published As

Publication number Publication date
JP2021189397A (ja) 2021-12-13
US20210382397A1 (en) 2021-12-09
CN113759666B (zh) 2024-09-13
KR20210150997A (ko) 2021-12-13
US11841614B2 (en) 2023-12-12
TW202212983A (zh) 2022-04-01
TWI823099B (zh) 2023-11-21
CN113759666A (zh) 2021-12-07

Similar Documents

Publication Publication Date Title
JP7508278B2 (ja) 露光装置、露光方法、及び物品の製造方法
JP3259657B2 (ja) 投影露光装置及びそれを用いたデバイスの製造方法
TWI633399B (zh) 用於ｅｕｖ投射微影之照射光學單元與光學系統
KR100696736B1 (ko) 오목 및 볼록거울을 포함하는 컬렉터를 구비한 리소그래피투영장치
JP3576685B2 (ja) 露光装置及びそれを用いたデバイスの製造方法
JP3101613B2 (ja) 照明光学装置及び投影露光装置
JP3817365B2 (ja) 投影露光装置及びそれを用いたデバイスの製造方法
KR20230034325A (ko) Euv 집광기
JP2016188878A (ja) 照明光学系、露光装置、およびデバイス製造方法
KR20040087894A (ko) 디바이스 제조방법, 상기 방법에 사용되는 마스크 세트,프로그램가능한 패터닝 디바이스를 제어하는 데이터 세트,마스크 패턴을 생성하는 방법 및 컴퓨터 프로그램
TW200839460A (en) Exposure apparatus and semiconductor device fabrication method
JP2004071776A (ja) 照明光学系、露光方法及び装置
JP7751484B2 (ja) 露光装置及び物品の製造方法
TW202016646A (zh) 確定用於微影光罩基材之複數個像素的位置之方法和裝置
JP2003232901A (ja) 光学素子、照明装置及び露光装置
KR102900819B1 (ko) 노광 장치, 노광 방법, 및 물품의 제조 방법
JP7570826B2 (ja) 露光装置、露光方法、及び物品の製造方法
KR101850584B1 (ko) 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법
JP2009157325A (ja) 露光照明装置及び露光パターンの位置ずれ調整方法
JP3376043B2 (ja) 照明装置及びそれを用いた投影露光装置
KR101999553B1 (ko) 조명 광학장치, 노광장치, 및 물품의 제조방법
JP2020140172A (ja) 照明光学系、露光装置、および、物品の製造方法。
JP2006080109A (ja) 照明装置、露光装置及びマイクロデバイスの製造方法
JP7240162B2 (ja) 露光装置、露光方法及び物品の製造方法
JPH07135148A (ja) 照明装置及び該照明装置を備える露光装置

Legal Events

Date Code Title Description
RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20200727

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230523

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230523

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20231213

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20240110

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240123

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240314

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240521

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240619

R150 Certificate of patent or registration of utility model

Ref document number: 7508278

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150