JP7502563B2 - 試料像観察装置及び方法 - Google Patents

試料像観察装置及び方法 Download PDF

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Publication number
JP7502563B2
JP7502563B2 JP2023525317A JP2023525317A JP7502563B2 JP 7502563 B2 JP7502563 B2 JP 7502563B2 JP 2023525317 A JP2023525317 A JP 2023525317A JP 2023525317 A JP2023525317 A JP 2023525317A JP 7502563 B2 JP7502563 B2 JP 7502563B2
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observation
image
sample
irradiation
electron beam
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JP2023525317A
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Japanese (ja)
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JPWO2022254698A1 (https=
Inventor
悠太 今井
大輔 備前
純一 片根
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/224—Luminescent screens or photographic plates for imaging; Apparatus specially adapted therefor, e. g. cameras, TV-cameras, photographic equipment or exposure control; Optical subsystems specially adapted therefor, e. g. microscopes for observing image on luminescent screen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2023525317A 2021-06-04 2021-06-04 試料像観察装置及び方法 Active JP7502563B2 (ja)

Applications Claiming Priority (1)

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PCT/JP2021/021390 WO2022254698A1 (ja) 2021-06-04 2021-06-04 試料像観察装置及び方法

Publications (2)

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JPWO2022254698A1 JPWO2022254698A1 (https=) 2022-12-08
JP7502563B2 true JP7502563B2 (ja) 2024-06-18

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US (1) US20240222065A1 (https=)
JP (1) JP7502563B2 (https=)
KR (1) KR102803067B1 (https=)
TW (1) TWI836437B (https=)
WO (1) WO2022254698A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011016208A1 (ja) 2009-08-07 2011-02-10 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡及び試料観察方法
JP2019525408A (ja) 2016-07-19 2019-09-05 バテル メモリアル インスティチュート 分析機器用のまばらなサンプリング方法およびプローブシステム
JP2021085776A (ja) 2019-11-28 2021-06-03 三菱重工業株式会社 開口合成処理装置、開口合成処理方法、及びそのプログラム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63100362A (ja) * 1986-06-27 1988-05-02 Jeol Ltd 材料検査方法
TWI661265B (zh) * 2014-03-10 2019-06-01 美商Ｄ２Ｓ公司 使用多重射束帶電粒子束微影術於表面上形成圖案之方法
NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011016208A1 (ja) 2009-08-07 2011-02-10 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡及び試料観察方法
JP2019525408A (ja) 2016-07-19 2019-09-05 バテル メモリアル インスティチュート 分析機器用のまばらなサンプリング方法およびプローブシステム
JP2021085776A (ja) 2019-11-28 2021-06-03 三菱重工業株式会社 開口合成処理装置、開口合成処理方法、及びそのプログラム

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Publication number Publication date
JPWO2022254698A1 (https=) 2022-12-08
WO2022254698A1 (ja) 2022-12-08
TWI836437B (zh) 2024-03-21
KR20230174258A (ko) 2023-12-27
US20240222065A1 (en) 2024-07-04
KR102803067B1 (ko) 2025-05-07
TW202249054A (zh) 2022-12-16

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