JP7438929B2 - 無電解メッキ抑制組成物及びメッキ部品の製造方法 - Google Patents
無電解メッキ抑制組成物及びメッキ部品の製造方法 Download PDFInfo
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- JP7438929B2 JP7438929B2 JP2020214991A JP2020214991A JP7438929B2 JP 7438929 B2 JP7438929 B2 JP 7438929B2 JP 2020214991 A JP2020214991 A JP 2020214991A JP 2020214991 A JP2020214991 A JP 2020214991A JP 7438929 B2 JP7438929 B2 JP 7438929B2
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- Prior art keywords
- electroless plating
- group
- catalyst activity
- base material
- ether
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 56
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- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 24
- 239000002904 solvent Substances 0.000 claims description 23
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- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 11
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- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 claims description 5
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1612—Process or apparatus coating on selected surface areas by direct patterning through irradiation means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
- C23C18/204—Radiation, e.g. UV, laser
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2053—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment only one step pretreatment
- C23C18/206—Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/208—Multistep pretreatment with use of metal first
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Description
無電解メッキ抑制組成物は、触媒活性妨害剤と、溶剤とを含む。触媒活性妨害剤は、アミド基及びアミノ基の少なくとも一方を有する化合物である。溶剤は、グリコールエーテルを含む。触媒活性妨害剤は、溶剤中に分散している。即ち、グリコールエーテルを含む溶剤は、分散媒である。無電解メッキ抑制組成物は、メッキ部品の製造方法に用いられる。例えば、無電解メッキ抑制組成物は、メッキ部品の製造方法において、基材の無電解メッキ膜の形成を予定していない部分に付与され、無電解メッキ膜の生成を抑制する。
R11は、炭素数1~4個である、直鎖又は分岐鎖のアルキル基であり、
R12は、エチレン基又はプロピレン基であり、
R13は、水素原子又は、炭素数1~4個である、直鎖又は分岐鎖のアルキル基であり、
R11とR13は、同一の基であっても異なる基であってもよく、
nは、1又は2である。
図1に示すフローチャートに従って、本実施形態のメッキ部品の製造方法について説明する。本実施形態で製造するメッキ部品は、選択的にメッキ膜が形成されたメッキ部品であり、基材の表面の一部(所定パターン、所定部分)に無電解メッキ膜が形成されており、それ以外の部分には無電解メッキ膜が形成されていない。
触媒活性妨害剤として、下記式(5)で表されるハイパーブランチポリマーを、国際公開第2018/131492号に開示される方法により合成した。
試料2~6は、更にアルコールを含むこと、グリコールエーテルの配合量(X)の、アルコールの配合量(Y)に対する重量比(X/Y)を表1に示す値としたこと以外は、試料1と同様の方法により調製した。
試料7は、グリコールエーテルを含まず、代わりにアルコールを含むこと以外は、試料1と同様の方法により調製した。
試料8~23は、更にアルコールを含むこと、グリコールエーテル及びアルコールとして、表2及び表3に示す化合物を用いたこと以外は、試料1と同様の方法により調製した。
試料24~28は、更にアルコールを含むこと、グリコールエーテル及び触媒活性妨害剤の配合量を表4に示す値としたこと以外は、試料1と同様の方法により調製した。
試料1~28について、以下の評価を行った。評価結果を表1~表5に示す。尚、試料4の評価結果は、表1、表4及び表5に重複して示す。
調製した試料1~28(無電解メッキ抑制組成物)に含まれる触媒活性妨害剤の平均粒子径を粒度分布測定装置(BECKMAN COULTER製、N4 Plus)を用いて測定した。試料の分散性を以下の評価基準に基づいて評価した。尚、測定された平均粒子径が小さい程、試料における触媒活性妨害剤の分散性は良好であると判断できる。
○:触媒活性妨害剤の平均粒子径が150nm未満であった。
△:触媒活性妨害剤の平均粒子径が150nm以上、250nm未満であった。
×:触媒活性妨害剤の平均粒子径が、250nm以上であった。
調製した試料1~28(無電解メッキ抑制組成物)を密閉容器にそれぞれ収容し、密閉容器ごと60℃の恒温槽に1ヶ月保存した。保存前と保存後に、それぞれ、分散性の評価と同様の方法により各試料に含まれる触媒活性妨害剤の平均粒子径を測定した。保存前後における、触媒活性妨害剤の平均粒子径の変化率R(%)を以下の式により計算した。試料の分散安定性を以下の評価基準に基づいて評価した。尚、触媒活性妨害剤の平均粒子径の変化率R(%)が小さい程、試料の保存安定性は良好であると判断できる。
R(%)=(A-B)/B×100
A:保存後の触媒活性妨害剤の平均粒子径(nm)
B:保存前の触媒活性妨害剤の平均粒子径(nm)
○:触媒活性妨害剤の平均粒子径の変化率Rが10%未満であった。
△:触媒活性妨害剤の平均粒子径の変化率Rが10%以上、15%未満であった。
×:触媒活性妨害剤の平均粒子径の変化率Rが15%以上であった。
以下に示す方法により、試料(無電解メッキ抑制組成物)のメッキ抑制効果について評価した。
○:基材表面に無電解メッキ膜が形成されなかった。
△:基材表面の1%未満の面積に無電解メッキ膜が形成された。
×:基材表面の1%以上の面積に無電解メッキ膜が形成された。
<グリコールエーテル>
BG:エチレングリコールモノブチルエーテル(SP:9.8)
PM:プロピレングリコールモノメチルエーテル(SP:10.4)
MG:エチレングリコールモノメチルエーテル(SP:11.6)
i‐PG:エチレングリコールモノイソプロピルエーテル(SP:9.2)
i‐BDG:ジエチレングリコールモノイソブチルエーテル(SP:8.7)
MFDG:ジプロピレングリコールモノメチルエーテル(SP:9.6)
DMG:エチレングリコールジメチルエーテル(SP:8.6)
<アルコール>
EtOH:エタノール
NPA:1‐プロパノール(n‐プロパノール)
IPA:2‐プロパノール(イソプロピルアルコール)
NBA:1‐ブタノール(n‐ブタノール)
IBA:2‐ブタノール
PeOH:1‐ペンタノール(n‐ペンタノール)
HxOH:1‐ヘキサノール(n‐ヘキサノール)
EG:エチレングリコール
PG:プロピレングリコール
DEG:ジエチレングリコール
1,3‐BD:1,3-ブタンジオール
1,2‐HD:1,2-ヘキサンジオール
<基材>
PPS:ポリフェニレンサルファイド(帝人株式会社製、ガラス繊維強化PPS 1040G、黒色)
PC:ポリカーボネート(出光興産社製、ガラス繊維強化ポリカーボネート タフロンGZ2530)
ABS:アクリロニトリル・ブタジエン・スチレン共重合体(東レ社製、トヨラック)
LCP:液晶ポリマー(住友化学社製、スミカスーパー LCP)
PA6:ナイロン6(宇部興産社製、UBEナイロン(登録商標)GC1015GC9)
Claims (10)
- 無電解メッキ抑制組成物であって、
アミド基及びアミノ基の少なくとも一方を有する化合物である触媒活性妨害剤と、
グリコールエーテルを含む溶剤と、を含み、
前記触媒活性妨害剤が、前記アミド基及び前記アミノ基の少なくとも一方を含む側鎖を有する分岐ポリマーであり、
前記触媒活性妨害剤が式(1)で表されるハイパーブランチポリマーである、無電解メッキ抑制組成物。
式(1)において、A 1 が式(2)で表される基であり;
A 2 が式(3)で表される基であって、R 1 が単結合であり、R 2 が水素であり、R 3 がイソプロピル基であり;
- 前記溶剤が、更に、アルコールを含む、請求項1に記載の無電解メッキ抑制組成物。
- 前記無電解メッキ抑制組成物中において、前記グリコールエーテルの配合量(X)の、前記アルコールの配合量(Y)に対する重量比(X/Y)が、(X/Y)=2/98~80/20である、請求項2に記載の無電解メッキ抑制組成物。
- 前記アルコールが、エタノール、1‐プロパノール、2‐プロパノール、1‐ブタノール、2‐ブタノール、1‐ペンタノール、1‐ヘキサノール、エチレングリコール、プロピレングリコール、ジエチレングリコール、1,3-ブタンジオール、及び1,2-ヘキサンジオールからなる群から選択される少なくとも1つである、請求項2又は3に記載の無電解メッキ抑制組成物。
- 前記グリコールエーテルが、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、エチレングリコールモノメチルエーテル、エチレングリコールモノイソプロピルエーテル、ジエチレングリコールモノイソブチルエーテル、ジプロピレングリコールモノメチルエーテル、及びエチレングリコールジメチルエーテルからなる群から選択される少なくとも1つである、請求項1~4のいずれか一項に記載の無電解メッキ抑制組成物。
- 前記触媒活性妨害剤の重量平均分子量が1,000~1,000,000である、請求項1~5のいずれか一項に記載の無電解メッキ抑制組成物。
- 前記触媒活性妨害剤が、ハイパーブランチポリマーである、請求項1~6のいずれか一項に記載の無電解メッキ抑制組成物。
- 前記触媒活性妨害剤の配合量の、前記グリコールエーテルの配合量に対する重量比が、0.4重量%~25.0重量%である、請求項1~7のいずれか一項に記載の無電解メッキ抑制組成物。
- 前記無電解メッキ抑制組成物中において、前記触媒活性妨害剤の配合量が、0.2重量%~5.0重量%である、請求項1~8のいずれか一項に記載の無電解メッキ抑制組成物。
- メッキ部品の製造方法であって、
基材の表面に、請求項1~9のいずれか一項に記載の前記無電解メッキ抑制組成物を付与することと、
前記基材の表面の一部を加熱又は光照射することと、
加熱又は光照射した前記基材の表面に無電解メッキ触媒を付与することと、
前記無電解メッキ触媒を付与した前記基材の表面に無電解メッキ液を接触させ、前記表面の加熱部分又は光照射部分に無電解メッキ膜を形成することとを含むメッキ部品の製造方法。
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JP2017160518A (ja) | 2016-03-11 | 2017-09-14 | 日立マクセル株式会社 | メッキ部品の製造方法、メッキ部品、触媒活性妨害剤及び無電解メッキ用複合材料 |
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JP2017160518A (ja) | 2016-03-11 | 2017-09-14 | 日立マクセル株式会社 | メッキ部品の製造方法、メッキ部品、触媒活性妨害剤及び無電解メッキ用複合材料 |
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