JP7429252B2 - 基板処理装置、半導体装置の製造方法、基板処理方法及びプログラム - Google Patents
基板処理装置、半導体装置の製造方法、基板処理方法及びプログラム Download PDFInfo
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- JP7429252B2 JP7429252B2 JP2022044565A JP2022044565A JP7429252B2 JP 7429252 B2 JP7429252 B2 JP 7429252B2 JP 2022044565 A JP2022044565 A JP 2022044565A JP 2022044565 A JP2022044565 A JP 2022044565A JP 7429252 B2 JP7429252 B2 JP 7429252B2
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- 230000015572 biosynthetic process Effects 0.000 description 6
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- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
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- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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Description
基板の処理を行う少なくとも1つの処理室と、
少なくとも1つの前記基板を載置可能な載置台と、
前記載置台を鉛直方向に少なくとも2カ所で保持し前記載置台の搬送を行う運搬装置を備える搬送室と、
前記搬送室で前記運搬装置の搬送制御を行うことが可能な制御部と、
を備える技術が提供される。
本実施形態の基板処理装置20は、縦型反応炉を備える基板処理装置である。
基板処理装置20は、図1~図3に示されるように、少なくとも一つの処理室30を備えている。本実施形態では、一例として、基板処理装置20が4つの処理室30を備えているが、これに限定されない。
基板処理装置20は、図17及び図18に示されるように、少なくとも1枚の基板Wを載置可能な載置台40を備えている。この載置台40は、底板42と、底板42に対向して配置される天板44と、底板42と天板44とを離隔した状態で支持する支柱46と、を備えている。底板42及び天板44は、一例として、円板状とされているが、これに限定されない。本実施形態では、支柱46は、底板42及び天板44の各々の周縁部に周方向に沿って間隔をあけて3本設けられているがこれに限定されない。また、支柱46は、一例として円柱状とされているが、これに限定されない。支柱46には、長手方向に間隔をあけて溝部46Aが形成されている。この溝部46Aには、基板Wの周縁部が挿入される。挿入された基板Wは、溝部46Aの下方となる溝壁により支持される。そして、3本の支柱46のそれぞれ同じ高さにある溝部46Aに基板Wを挿入することにより、基板Wが水平状態で支持することが可能になる。なお、溝部46Aの溝幅は、基板Wの厚みよりも大きい。これにより、基板Wを載置台40に出し入れする際に、基板Wの表面が溝部46Aの溝壁等に接触するのを抑制できる。また、3本の支柱46は、基板Wの出し入れのため、1カ所だけ配置間隔が広い。具体的には、3本の支柱46は、載置台40の中心Cに対して45度の角度で配置されている。なお、支柱46は、基板Wが載置される溝部46Aを有するため、基板載置具ともいえる。
基板処理装置20は、図1及び図3に示されるように、運搬装置60を有する搬送室50を備えている。搬送室50は、4つの処理室30の並べられた方向に延びている。搬送室50は、各処理室30の出入口を介して各処理室30と連通する。搬送室50を構成する筐体51は、各筐体31にそれぞれ固定されている。また、搬送室50には、搬送室50内を真空雰囲気とする排気装置等が接続されている。
基板処理装置20は、図21に示すように、制御部としてのコントローラ100を備えている。このコントローラ100は、CPU(Central Processing Unit)101A、RAM(Random Access Memory)101B、記憶部101C、I/Oポート101Dを備えたコンピュータとして構成されている。
なお、載置台40の重心位置は、以下の式により算出される。
xG=(m1x1+m2x2+...)/(m1+m2+...)
xGは、載置台40の重心位置を指している。
m1、m2、…は、基板Wの重量を指している。
x1、x2、…は、基板Wの載置位置を指している。
ここで、基板Wの有効載置数を50枚とした場合の一例について説明する。
基板の重量mは130g、
基板載置位置を、載置台最下部を1、最上部を50とした場合、
載置台に基板を50枚載置した場合、重心位置は26基板載置位置となる。
また載置台下部に基板を25枚載置した場合の重心は38載置位置、載置台上部に基板を25枚載置した場合の重心は13載置位置と求めることができる。
次に、本開示の一実施形態に係る基板処理装置20を用いた半導体装置の製造方法、すなわち、基板Wの処理手順について説明する。以下の説明において、基板処理装置20を構成する各部の動作はコントローラ100により制御される。
本実施形態では、運搬装置60が載置台40を鉛直方向に少なくとも2カ所で保持するため、運搬装置60による載置台40の搬送時に、載置台40に作用する加速及び減速時の応力を抑えることが可能になる。これにより、載置台40に移載された基板Wの位置ズレを軽減することが可能になる。結果として、運搬装置60の搬送速度を上げることが可能となり、生産性の向上に貢献することができる。
本開示は上述の実施形態に限定されるものではなく、その要旨を逸脱しない範囲で種々変更可能である。例えば、載置台40の底板42及び天板44のそれぞれの下面に下部保持部64及び上部保持部66が嵌る溝が形成されていてよいし、底板42及び天板44の少なくとも一方に保持部との固定機構が設けられてもよい。
30 処理室
40 載置台
50 搬送室
53 移載部
60 運搬装置
64 下部保持部
66 上部保持部
68 可動部
70 回転軸(第1の回転機構)
72 回転軸(第2の回転機構)
76 バランサ
80 収容容器
84 移載機
100 コントローラ(制御部の一例)
130 搬送管理部
132 重心算出部
Claims (17)
- 基板の処理を行う少なくとも1つの処理室と、
少なくとも1つの前記基板を載置可能な載置台と、
前記載置台への前記基板の移載が可能な移載部と、前記載置台を鉛直方向に少なくとも2カ所で保持し前記載置台の搬送を行う運搬装置と、を備える搬送室と、
少なくとも1つの前記基板を収容可能な収容容器を載置可能なロードポートと、
前記ロードポートに載置された前記収容容器と前記搬送室との間で、少なくとも1つの前記基板を移載可能な移載機と、
前記基板の移載時に、前記運搬装置による前記載置台の保持状態を確認し、前記載置台を保持している場合は前記運搬装置を前記移載部に移動するよう制御を行い、前記載置台を保持していない場合は前記処理室から前記載置台を取得し保持した後に前記運搬装置を前記移載部に移動するよう、前記運搬装置の搬送制御を行うことが可能な制御部と、
を備える基板処理装置。 - 前記運搬装置は、前記載置台の上部及び下部をそれぞれ保持する保持部を有する、請求項1に記載の基板処理装置。
- 前記制御部は、前記移載部と前記処理室との間で前記運搬装置の搬送制御が可能であり、前記基板を処理した前記処理室と別の前記処理室との間で前記運搬装置の搬送制御も可能である、請求項1に記載の基板処理装置。
- 前記運搬装置は、搬送台と、前記搬送台に設けられ、前記搬送台に対して水平方向及び鉛直方向へ伸縮可能な可動部と、を有する、請求項1に記載の基板処理装置。
- 前記可動部は、鉛直方向を軸とする第1の回転機構を有し、前記載置台の中心と前記第1の回転機構の軸心を合わせた状態で前記搬送台に対して回転可能なよう構成されている、請求項4に記載の基板処理装置。
- 前記可動部は、鉛直方向を軸とする第2の回転機構を有し、前記第1の回転機構と前記第2の回転機構を回転させることで、前記処理室への前記載置台の搬入及び搬出を可能なよう構成されている、請求項5に記載の基板処理装置。
- 前記第1の回転機構は、前記運搬装置の進行方向に対して、前記載置台と該載置台を保持する部分の配置条件が同じとなるように調整可能なよう構成されている、請求項5に記載の基板処理装置。
- 前記載置台は、前記移載機に対し、前記基板が移載可能な向きで保持される、請求項1に記載の基板処理装置。
- 前記移載部と前記処理室との間の距離情報を記憶することが可能な記憶部を有し、
前記制御部は、前記記憶部より目的とする前記処理室の距離情報を取得し、取得した前記距離情報より、前記運搬装置の移動距離の制御を行うことが可能なよう構成されている、請求項1に記載の基板処理装置。 - 前記制御部は、前記運搬装置の制御を行う搬送管理部を有し、
前記搬送管理部は、前記制御部からの指示を受け、前記運搬装置の制御を行うことが可能なよう構成されている、請求項1に記載の基板処理装置。 - 前記運搬装置は、前記載置台の重心位置を調整可能なよう構成されている、請求項10に記載の基板処理装置。
- 前記制御部は、前記載置台の鉛直方向の重心位置を調整管理可能な重心算出部を有し、
前記重心算出部は、前記載置台に載置された前記基板の載置状態に合わせて、重心位置を算出することが可能なよう構成されている、請求項11に記載の基板処理装置。 - 前記制御部は、前記重心算出部が算出した前記重心位置に合わせて前記搬送管理部に前記運搬装置が有するバランサを鉛直方向に移動し、前記載置台の重心位置を調整する指示を行うことが可能なよう構成されている、請求項12に記載の基板処理装置。
- 前記制御部は、前記処理室の状態を監視し、前記処理室の状態に合わせて前記運搬装置の搬送スケジュールを調整する、請求項1に記載の基板処理装置。
- 基板を収容可能な収容容器を載置可能なロードポートに前記収容容器を載置する工程と、
前記基板を載置可能な載置台に前記基板を載置する工程と、
前記載置台を鉛直方向に少なくとも2カ所で保持する工程と、
前記基板の移載が可能な移載部を有し、前記移載部にて前記ロードポートに載置された前記収容容器と前記載置台との間で前記基板を移載する工程と、
前記載置台の保持状態を確認する工程と、
前記基板の移載時に、前記載置台を保持している場合は前記載置台を前記移載部に移動し、前記載置台を保持していない場合は前記基板を処理する処理室から前記載置台を取得し保持した後に前記移載部に移動するよう、前記載置台の搬送制御を行う工程と、
前記処理室で前記基板の処理を行う工程と、
を有する半導体装置の製造方法。 - 基板を収容可能な収容容器を載置可能なロードポートに前記収容容器を載置する工程と、
前記基板を載置可能な載置台に前記基板を載置する工程と、
前記載置台を鉛直方向に少なくとも2カ所で保持する工程と、
前記基板の移載が可能な移載部を有し、前記移載部にて前記ロードポートに載置された前記収容容器と前記載置台との間で前記基板を移載する工程と、
前記載置台の保持状態を確認する工程と、
前記基板の移載時に、前記載置台を保持している場合は前記載置台を前記移載部に移動し、前記載置台を保持していない場合は前記基板を処理する処理室から前記載置台を取得し保持した後に前記移載部に移動するよう、前記載置台の搬送制御を行う工程と、
前記処理室で前記基板の処理を行う工程と、
を有する基板処理方法。 - 基板を収容可能な収容容器を載置可能なロードポートに前記収容容器を載置する手順と、
前記基板を載置可能な載置台に前記基板を載置する手順と、
前記載置台を鉛直方向に少なくとも2カ所で保持する手順と、
前記基板の移載が可能な移載部を有し、前記移載部にて前記ロードポートに載置された前記収容容器と前記載置台との間で前記基板を移載する手順と、
前記載置台の保持状態を確認する手順と、
前記基板の移載時に、前記載置台を保持している場合は前記載置台を前記移載部に移動し、前記載置台を保持していない場合は前記基板を処理する処理室から前記載置台を取得し保持した後に前記移載部に移動するよう、前記載置台の搬送制御を行う手順と、
前記処理室で前記基板の処理を行う手順と、
をコンピュータによって基板処理装置に実行させるプログラム。
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