JP7424300B2 - 光学センサー用組成物 - Google Patents

光学センサー用組成物 Download PDF

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Publication number
JP7424300B2
JP7424300B2 JP2020550546A JP2020550546A JP7424300B2 JP 7424300 B2 JP7424300 B2 JP 7424300B2 JP 2020550546 A JP2020550546 A JP 2020550546A JP 2020550546 A JP2020550546 A JP 2020550546A JP 7424300 B2 JP7424300 B2 JP 7424300B2
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Japan
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group
mass
composition
meth
compound
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JP2020550546A
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English (en)
Japanese (ja)
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JPWO2020071486A1 (ja
Inventor
耕治 畠山
裕亮 村田
泰典 川部
浩平 和田
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JSR Corp
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JSR Corp
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Publication of JPWO2020071486A1 publication Critical patent/JPWO2020071486A1/ja
Priority to JP2023196021A priority Critical patent/JP2024020454A/ja
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Publication of JP7424300B2 publication Critical patent/JP7424300B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0091—Complexes with metal-heteroatom-bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2258—Oxides; Hydroxides of metals of tungsten

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Filters (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
JP2020550546A 2018-10-05 2019-10-03 光学センサー用組成物 Active JP7424300B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023196021A JP2024020454A (ja) 2018-10-05 2023-11-17 光学センサー用組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018189759 2018-10-05
JP2018189759 2018-10-05
PCT/JP2019/039121 WO2020071486A1 (fr) 2018-10-05 2019-10-03 Composition pour capteurs optiques

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023196021A Division JP2024020454A (ja) 2018-10-05 2023-11-17 光学センサー用組成物

Publications (2)

Publication Number Publication Date
JPWO2020071486A1 JPWO2020071486A1 (ja) 2021-09-30
JP7424300B2 true JP7424300B2 (ja) 2024-01-30

Family

ID=70055447

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020550546A Active JP7424300B2 (ja) 2018-10-05 2019-10-03 光学センサー用組成物
JP2023196021A Pending JP2024020454A (ja) 2018-10-05 2023-11-17 光学センサー用組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023196021A Pending JP2024020454A (ja) 2018-10-05 2023-11-17 光学センサー用組成物

Country Status (5)

Country Link
JP (2) JP7424300B2 (fr)
KR (1) KR20210071971A (fr)
CN (3) CN112789526B (fr)
TW (1) TWI803701B (fr)
WO (1) WO2020071486A1 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018186489A1 (fr) 2017-04-07 2018-10-11 山本化成株式会社 Composé phtalocyanine et son utilisation
JP2018180167A (ja) 2017-04-07 2018-11-15 Jsr株式会社 固体撮像素子用組成物、赤外線遮蔽膜及び固体撮像素子
JP2019159120A (ja) 2018-03-13 2019-09-19 Jsr株式会社 赤外線吸収組成物

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0257364B2 (fr) * 1986-08-06 1997-10-15 Konica Corporation Procédé pour développer des images latentes électrostatiques
DE3873914T2 (de) * 1987-02-13 1993-02-25 Secr Defence Brit Substituierte phthalocyanine.
JPH0615671B2 (ja) * 1987-10-20 1994-03-02 三井東圧化学株式会社 近赤外線吸収剤およびそれを用いた光記録媒体
JPH0730300B2 (ja) * 1988-04-01 1995-04-05 三井東圧化学株式会社 アルキルフタロシアニン近赤外線吸収剤及びそれを用いた表示・記録材料
CA2047477C (fr) * 1990-08-08 1998-04-21 Xavier Jose Quinones Boyau en cellulose colore avec bande transparente
JPH08248715A (ja) * 1995-03-06 1996-09-27 Sharp Corp 画像形成装置及びそれに用いる感光体
JP3780388B2 (ja) * 1996-07-19 2006-05-31 リコープリンティングシステムズ株式会社 カラー画像形成装置及びカラー画像形成方法
US6767677B2 (en) * 2002-11-20 2004-07-27 Eastman Kodak Company Display element with a backprint comprising a squarine dye
WO2004066398A1 (fr) * 2003-01-20 2004-08-05 Sharp Kabushiki Kaisha Composition de resine transparente pour filtre de capteur optique, capteur optique et procede de fabrication
JP2008201952A (ja) 2007-02-21 2008-09-04 Nippon Shokubai Co Ltd フタロシアニン化合物
CN103649162A (zh) * 2011-03-31 2014-03-19 可乐丽股份有限公司 嵌段共聚物及光电转换元件
US20140166942A1 (en) * 2011-03-31 2014-06-19 Takafumi Izawa Block copolymer and photoelectric conversion element
TWI548701B (zh) * 2011-09-14 2016-09-11 富士軟片股份有限公司 用於彩色濾光片的著色感放射線性組成物、著色膜、圖案形成方法、彩色濾光片及其製造方法以及固態影像感測裝置
US20170040550A1 (en) * 2014-04-25 2017-02-09 Nippon Kayaku Kabushiki Kaisha Material for photoelectric conversion element for use in imaging element, and photoelectric conversion element including same
KR20170036694A (ko) * 2014-07-28 2017-04-03 다우 글로벌 테크놀로지스 엘엘씨 Lcd의 컬러 필터용으로 사용된 프탈로시아닌 화합물

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018186489A1 (fr) 2017-04-07 2018-10-11 山本化成株式会社 Composé phtalocyanine et son utilisation
JP2018180167A (ja) 2017-04-07 2018-11-15 Jsr株式会社 固体撮像素子用組成物、赤外線遮蔽膜及び固体撮像素子
JP2019159120A (ja) 2018-03-13 2019-09-19 Jsr株式会社 赤外線吸収組成物

Also Published As

Publication number Publication date
JPWO2020071486A1 (ja) 2021-09-30
WO2020071486A1 (fr) 2020-04-09
TWI803701B (zh) 2023-06-01
TW202022050A (zh) 2020-06-16
CN112789526A (zh) 2021-05-11
JP2024020454A (ja) 2024-02-14
CN112789526B (zh) 2023-05-30
CN116520637A (zh) 2023-08-01
CN116520638A (zh) 2023-08-01
KR20210071971A (ko) 2021-06-16

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