JP7385304B2 - パワージェットモジュールを伴うシステム及びその方法 - Google Patents
パワージェットモジュールを伴うシステム及びその方法 Download PDFInfo
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- JP7385304B2 JP7385304B2 JP2021578244A JP2021578244A JP7385304B2 JP 7385304 B2 JP7385304 B2 JP 7385304B2 JP 2021578244 A JP2021578244 A JP 2021578244A JP 2021578244 A JP2021578244 A JP 2021578244A JP 7385304 B2 JP7385304 B2 JP 7385304B2
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- power jet
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- dispersion chamber
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- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 1
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- 241000080590 Niso Species 0.000 description 1
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- QTHKJEYUQSLYTH-UHFFFAOYSA-N [Co]=O.[Ni].[Li] Chemical class [Co]=O.[Ni].[Li] QTHKJEYUQSLYTH-UHFFFAOYSA-N 0.000 description 1
- BJUPUJPGMIDLOR-UHFFFAOYSA-N [Li+].[O--].[O--].[O--].[Al+3].[Co++] Chemical class [Li+].[O--].[O--].[O--].[Al+3].[Co++] BJUPUJPGMIDLOR-UHFFFAOYSA-N 0.000 description 1
- IDSMHEZTLOUMLM-UHFFFAOYSA-N [Li].[O].[Co] Chemical class [Li].[O].[Co] IDSMHEZTLOUMLM-UHFFFAOYSA-N 0.000 description 1
- CROQDZTZYUXPHE-UHFFFAOYSA-N [O-2].[Mn+2].[Fe+2].[Na+] Chemical class [O-2].[Mn+2].[Fe+2].[Na+] CROQDZTZYUXPHE-UHFFFAOYSA-N 0.000 description 1
- FDLZQPXZHIFURF-UHFFFAOYSA-N [O-2].[Ti+4].[Li+] Chemical class [O-2].[Ti+4].[Li+] FDLZQPXZHIFURF-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- NDPGDHBNXZOBJS-UHFFFAOYSA-N aluminum lithium cobalt(2+) nickel(2+) oxygen(2-) Chemical class [Li+].[O--].[O--].[O--].[O--].[Al+3].[Co++].[Ni++] NDPGDHBNXZOBJS-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000006183 anode active material Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- OJIJEKBXJYRIBZ-UHFFFAOYSA-N cadmium nickel Chemical compound [Ni].[Cd] OJIJEKBXJYRIBZ-UHFFFAOYSA-N 0.000 description 1
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- 230000022131 cell cycle Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940011182 cobalt acetate Drugs 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 1
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- ZOTKGJBKKKVBJZ-UHFFFAOYSA-L cobalt(2+);carbonate Chemical compound [Co+2].[O-]C([O-])=O ZOTKGJBKKKVBJZ-UHFFFAOYSA-L 0.000 description 1
- SEVNKUSLDMZOTL-UHFFFAOYSA-H cobalt(2+);manganese(2+);nickel(2+);hexahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mn+2].[Co+2].[Ni+2] SEVNKUSLDMZOTL-UHFFFAOYSA-H 0.000 description 1
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 1
- PFQLIVQUKOIJJD-UHFFFAOYSA-L cobalt(ii) formate Chemical compound [Co+2].[O-]C=O.[O-]C=O PFQLIVQUKOIJJD-UHFFFAOYSA-L 0.000 description 1
- ASKVAEGIVYSGNY-UHFFFAOYSA-L cobalt(ii) hydroxide Chemical compound [OH-].[OH-].[Co+2] ASKVAEGIVYSGNY-UHFFFAOYSA-L 0.000 description 1
- 238000006258 combinatorial reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 238000005087 graphitization Methods 0.000 description 1
- 238000003837 high-temperature calcination Methods 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910001867 inorganic solvent Inorganic materials 0.000 description 1
- 239000003049 inorganic solvent Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 1
- GELKBWJHTRAYNV-UHFFFAOYSA-K lithium iron phosphate Chemical compound [Li+].[Fe+2].[O-]P([O-])([O-])=O GELKBWJHTRAYNV-UHFFFAOYSA-K 0.000 description 1
- 229910002102 lithium manganese oxide Inorganic materials 0.000 description 1
- FRMOHNDAXZZWQI-UHFFFAOYSA-N lithium manganese(2+) nickel(2+) oxygen(2-) Chemical class [O-2].[Mn+2].[Ni+2].[Li+] FRMOHNDAXZZWQI-UHFFFAOYSA-N 0.000 description 1
- QEXMICRJPVUPSN-UHFFFAOYSA-N lithium manganese(2+) oxygen(2-) Chemical class [O-2].[Mn+2].[Li+] QEXMICRJPVUPSN-UHFFFAOYSA-N 0.000 description 1
- MHCFAGZWMAWTNR-UHFFFAOYSA-M lithium perchlorate Chemical compound [Li+].[O-]Cl(=O)(=O)=O MHCFAGZWMAWTNR-UHFFFAOYSA-M 0.000 description 1
- 229910001486 lithium perchlorate Inorganic materials 0.000 description 1
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 1
- 229910001496 lithium tetrafluoroborate Inorganic materials 0.000 description 1
- SBWRUMICILYTAT-UHFFFAOYSA-K lithium;cobalt(2+);phosphate Chemical compound [Li+].[Co+2].[O-]P([O-])([O-])=O SBWRUMICILYTAT-UHFFFAOYSA-K 0.000 description 1
- XKPJKVVZOOEMPK-UHFFFAOYSA-M lithium;formate Chemical compound [Li+].[O-]C=O XKPJKVVZOOEMPK-UHFFFAOYSA-M 0.000 description 1
- ILXAVRFGLBYNEJ-UHFFFAOYSA-K lithium;manganese(2+);phosphate Chemical compound [Li+].[Mn+2].[O-]P([O-])([O-])=O ILXAVRFGLBYNEJ-UHFFFAOYSA-K 0.000 description 1
- VGYDTVNNDKLMHX-UHFFFAOYSA-N lithium;manganese;nickel;oxocobalt Chemical class [Li].[Mn].[Ni].[Co]=O VGYDTVNNDKLMHX-UHFFFAOYSA-N 0.000 description 1
- URIIGZKXFBNRAU-UHFFFAOYSA-N lithium;oxonickel Chemical compound [Li].[Ni]=O URIIGZKXFBNRAU-UHFFFAOYSA-N 0.000 description 1
- 229940071125 manganese acetate Drugs 0.000 description 1
- 235000002867 manganese chloride Nutrition 0.000 description 1
- 239000011565 manganese chloride Substances 0.000 description 1
- 229940099607 manganese chloride Drugs 0.000 description 1
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 1
- BHVPEUGTPDJECS-UHFFFAOYSA-L manganese(2+);diformate Chemical compound [Mn+2].[O-]C=O.[O-]C=O BHVPEUGTPDJECS-UHFFFAOYSA-L 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 description 1
- PMQJYWORJJEMQC-UHFFFAOYSA-N manganese;dihydrate Chemical compound O.O.[Mn] PMQJYWORJJEMQC-UHFFFAOYSA-N 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003446 memory effect Effects 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 229910001960 metal nitrate Inorganic materials 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- HZPNKQREYVVATQ-UHFFFAOYSA-L nickel(2+);diformate Chemical compound [Ni+2].[O-]C=O.[O-]C=O HZPNKQREYVVATQ-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- AIBQNUOBCRIENU-UHFFFAOYSA-N nickel;dihydrate Chemical compound O.O.[Ni] AIBQNUOBCRIENU-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- UDJMEHOEDIAPCK-UHFFFAOYSA-N sodium iron(2+) oxygen(2-) Chemical compound [O-2].[Fe+2].[Na+] UDJMEHOEDIAPCK-UHFFFAOYSA-N 0.000 description 1
- AWRQDLAZGAQUNZ-UHFFFAOYSA-K sodium;iron(2+);phosphate Chemical compound [Na+].[Fe+2].[O-]P([O-])([O-])=O AWRQDLAZGAQUNZ-UHFFFAOYSA-K 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
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- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
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- B05B7/02—Spray pistols; Apparatus for discharge
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
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Description
図1Aは、粒子材料を生成するための処理システム100の一実施形態の斜視図である。処理システム100のこの例示的な実施形態は、1つ以上のガスを、ガスライン106を通して送達するためのシステム入口102と、粒子材料を処理システムから外に送達するためのシステム出口104とを含む。1つ以上のガスは、特に、空気、酸素、二酸化炭素、窒素ガス、水素ガス、不活性ガス、希ガス、及びそれらの組み合わせのガス源から選択され得る。
図8は、分散室に結合されるパワージェットモジュールを伴うシステムを機能させる方法800のステップを示す。方法800は、ステップ810、ステップ820、ステップ830、ステップ840、ステップ850、ステップ860、及びステップ870を含む。
Claims (19)
- 生成物を液体混合物から生成するための処理システムであって、
前記液体混合物を噴出し1つ以上の液滴流にして、前記1つ以上の液滴流を前記処理システムに押し込むように適応する1つ以上のパワージェットモジュールの配列であって、各パワージェットモジュールはパワージェットを備える、1つ以上のパワージェットモジュールの配列と、
前記1つ以上のパワージェットモジュールに結合され、前記分散室内で1つ以上のガス流が内部で分散する状態で、前記1つ以上の液滴流を受けるように適応する分散室と、
前記分散室に接続され、前記1つ以上の液滴流を処理して前記生成物にするように適応する反応室と、を含み、
前記分散室は1つ以上の開口を含み、各パワージェットモジュールの前記パワージェットは、前記分散室の開口に移動可能に結合されるように適応し、
各パワージェットモジュールは、さらに、前記パワージェットの移動を支持するための支持フレーム及び第1のアクチュエータを備える、処理システム。 - 前記第1のアクチュエータは電子制御センターによって制御され、前記パワージェットを移動させ、前記分散室上の開口に一致するように接続させるように適応する、請求項1に記載の処理システム。
- 各パワージェットモジュールの前記パワージェットは、前記パワージェットモジュールの前記第1のアクチュエータによって移動され、前記分散室の前記開口に接続されるに位置付けられる、請求項1に記載の処理システム。
- 各パワージェットモジュールは、さらに、前記第1の位置で前記分散室の前記開口で各パワージェットモジュールを密閉する密閉要素を含む、請求項1に記載の処理システム。
- 各パワージェットモジュールの前記パワージェットは、前記パワージェットモジュールの前記第1のアクチュエータによって移動され、前記分散室の前記開口から離れている第2の位置に位置付けられる、請求項1に記載の処理システム。
- 前記パワージェットは1つ以上のノズルオリフィスの配列を含み、各オリフィスは前記液体混合物を噴出して1つ以上の液滴流にするように適応する、請求項1に記載の処理システム。
- 各パワージェットモジュールの前記パワージェットはさらにドアを含み、その結果、前記パワージェットは、第2のアクチュエータによって、閉位置及び開位置に位置付けられるように適応する、請求項4に記載の処理システム。
- 各パワージェットモジュールはさらに洗浄アセンブリを備える、請求項1に記載の処理システム。
- 各パワージェットモジュールの前記洗浄アセンブリは、さらに、移動可能洗浄ブレード要素を含む、請求項8に記載の処理システム。
- 各パワージェットモジュールの前記洗浄アセンブリは、さらに、移動可能吸引要素を含む、請求項8に記載の処理システム。
- 1つ以上の搬送ガスを1つ以上のガス流にするように形成するための1つ以上のチャネルを内部に伴うガス分配器を有する緩衝室をさらに含む、請求項1に記載の処理システム。
- 前記処理システムはさらに電子制御センターを含む、請求項1に記載の処理システム。
- 生成物を液体混合物から生成するための処理システムであって、
前記液体混合物を噴出し1つ以上の液滴流にするように適応する1つ以上のパワージェットモジュールの配列であって、各パワージェットモジュールは、パワージェットと、前記パワージェットの移動を支持するための支持フレームとを備える、1つ以上のパワージェットモジュールの配列と、
前記1つ以上のパワージェットモジュールに接続され、前記1つ以上の液滴流を内部で受けるように適応する分散室であって、各パワージェットモジュールの前記パワージェットは、前記分散室の開口に接続される第1の位置に位置付けられ、前記分散室の前記開口から離れている第2の位置に位置付けられるように適応する、分散室と、
前記分散室に接続され、前記1つ以上の液滴流を処理して前記生成物にするように適応する反応室と、を含む、処理システム。 - 各パワージェットモジュールは、さらに、前記第1の位置で前記分散室の前記開口の各パワージェットモジュールを固定する密閉要素を含む、請求項13に記載の処理システム。
- 前記パワージェットは1つ以上のノズルオリフィスの配列を含み、各オリフィスは前記液体混合物を噴出して1つ以上の液滴流にするように適応する、請求項13に記載の処理システム。
- 1つ以上のパワージェットモジュールを伴う請求項1~15のいずれか一項に記載の処理システムにおいて生成物を液体混合物から生成する方法であって、
前記1つ以上のパワージェットモジュールのそれぞれを第1の方向に移動させ、第1の位置に位置付け、処理システムの分散室の開口に接続させることと、
前記1つ以上のパワージェットモジュールのそれぞれを、前記分散室上の1つ以上の開口のそれぞれに一致させることと、
前記1つ以上のパワージェットモジュールの1つ以上のドアを開くことと、
前記処理システムの反応室の内側で1つ以上の液滴流を処理することと、
前記パワージェットモジュールの前記1つ以上のドアを閉じることと、
前記1つ以上のパワージェットモジュールのそれぞれを第2の方向に移動させ、第2の位置に位置付け、前記分散室の前記開口から離すことと、を含む、方法。 - 1つ以上の洗浄アセンブリを使用して前記1つ以上のパワージェットを洗浄し、蓄積した不要な材料及び汚染物質を除去することをさらに含む、請求項16に記載の方法。
- 第1の温度で前記1つ以上の液滴流を乾燥することをさらに含む、請求項16に記載の方法。
- 第2の温度で前記1つ以上の液滴流を反応させ、前記生成物にすることをさらに含む、請求項16に記載の方法。
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JP2023188782A JP2024020291A (ja) | 2019-06-28 | 2023-11-02 | パワージェットモジュールを伴うシステム及びその方法 |
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US16/457,889 | 2019-06-28 | ||
US16/457,889 US11121354B2 (en) | 2019-06-28 | 2019-06-28 | System with power jet modules and method thereof |
PCT/US2020/039680 WO2020264206A1 (en) | 2019-06-28 | 2020-06-25 | System with power jet modules and method thereof |
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US20230163351A1 (en) * | 2021-11-25 | 2023-05-25 | eJoule, Inc. | Large-scale synthesis of powders of solid-state electrolyte material particles for solid-state batteries, systems and methods thereof |
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EP3981037A1 (en) | 2022-04-13 |
TW202119677A (zh) | 2021-05-16 |
TWI742742B (zh) | 2021-10-11 |
WO2020264206A1 (en) | 2020-12-30 |
US11121354B2 (en) | 2021-09-14 |
KR20220035337A (ko) | 2022-03-22 |
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