JP7356996B2 - 化学機械研磨装置における消耗部品モニタリング - Google Patents
化学機械研磨装置における消耗部品モニタリング Download PDFInfo
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- JP7356996B2 JP7356996B2 JP2020548664A JP2020548664A JP7356996B2 JP 7356996 B2 JP7356996 B2 JP 7356996B2 JP 2020548664 A JP2020548664 A JP 2020548664A JP 2020548664 A JP2020548664 A JP 2020548664A JP 7356996 B2 JP7356996 B2 JP 7356996B2
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/0053—Control means for lapping machines or devices detecting loss or breakage of a workpiece during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0069—Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/18—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the presence of dressing tools
- B24B49/186—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the presence of dressing tools taking regard of the wear of the dressing tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/04—Architecture, e.g. interconnection topology
- G06N3/045—Combinations of networks
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/08—Learning methods
- G06N3/084—Backpropagation, e.g. using gradient descent
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
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- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20084—Artificial neural networks [ANN]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Theoretical Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computational Linguistics (AREA)
- Molecular Biology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Artificial Intelligence (AREA)
- Biomedical Technology (AREA)
- Biophysics (AREA)
- Software Systems (AREA)
- Data Mining & Analysis (AREA)
- Evolutionary Computation (AREA)
- General Health & Medical Sciences (AREA)
- Mathematical Physics (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Quality & Reliability (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Description
Claims (7)
- 研磨ステーションと、
前記研磨ステーションにある研磨パッドと接触した状態に基板を保持するためのキャリアヘッドであり、保持リングを含むキャリアヘッドと、
前記キャリアヘッドが前記研磨パッドから移動するときに前記保持リングの下面の画像を捕捉するように配置されたカメラと、
前記画像に対して画像処理アルゴリズムを実行して前記保持リングの前記下面が損傷しているかどうかを判定するように構成されたコントローラと
を備え、前記損傷が、i)亀裂、ii)欠け目、iii)汚れ及びiv)擦り傷の一つ以上を含む、研磨装置。 - 前記画像処理アルゴリズムが、訓練された機械学習アルゴリズムを含む、請求項1に記載の研磨装置。
- 前記基板をロードし、かつ/または前記基板を前記キャリアヘッドからアンロードするための基板移送ステーションを備え、前記キャリアヘッドが、前記研磨ステーションと前記移送ステーションとの間で移動可能であり、前記カメラが、前記研磨ステーションと前記移送ステーションの間の位置で前記保持リングの前記下面の前記画像を捕捉するように配置された、請求項1に記載の研磨装置。
- 前記カメラが、前記保持リングの前記下面の全体を単一の画像として捕捉する視野を有する、請求項1に記載の研磨装置。
- 前記カメラが、前記キャリアヘッドが移動するときに前記保持リングの前記下面の多数の画像を撮影するように構成された、請求項1に記載の研磨装置。
- 前記コントローラが、前記多数の画像をつなぎ合わせて、前記保持リングの前記下面の全体を捕捉した単一の画像にするように構成された、請求項5に記載の研磨装置。
- 前記保持リングが損傷していることを前記コントローラが検出した場合にオペレータへの警報を生成するように、前記コントローラが構成された、請求項1に記載の研磨装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2023160206A JP2023178295A (ja) | 2018-03-13 | 2023-09-25 | 化学機械研磨装置における消耗部品モニタリング |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US201862642450P | 2018-03-13 | 2018-03-13 | |
US62/642,450 | 2018-03-13 | ||
PCT/US2019/021044 WO2019177841A1 (en) | 2018-03-13 | 2019-03-06 | Consumable part monitoring in chemical mechanical polisher |
Related Child Applications (1)
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JP2023160206A Division JP2023178295A (ja) | 2018-03-13 | 2023-09-25 | 化学機械研磨装置における消耗部品モニタリング |
Publications (2)
Publication Number | Publication Date |
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JP2021517519A JP2021517519A (ja) | 2021-07-26 |
JP7356996B2 true JP7356996B2 (ja) | 2023-10-05 |
Family
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Family Applications (2)
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JP2020548664A Active JP7356996B2 (ja) | 2018-03-13 | 2019-03-06 | 化学機械研磨装置における消耗部品モニタリング |
JP2023160206A Pending JP2023178295A (ja) | 2018-03-13 | 2023-09-25 | 化学機械研磨装置における消耗部品モニタリング |
Family Applications After (1)
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JP2023160206A Pending JP2023178295A (ja) | 2018-03-13 | 2023-09-25 | 化学機械研磨装置における消耗部品モニタリング |
Country Status (8)
Country | Link |
---|---|
US (2) | US11571786B2 (ja) |
EP (1) | EP3765238A4 (ja) |
JP (2) | JP7356996B2 (ja) |
KR (1) | KR20200120960A (ja) |
CN (2) | CN111936267B (ja) |
SG (1) | SG11202008881QA (ja) |
TW (1) | TWI806985B (ja) |
WO (1) | WO2019177841A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020053550A (ja) * | 2018-09-27 | 2020-04-02 | 株式会社荏原製作所 | 研磨装置、研磨方法、及び機械学習装置 |
JP2020131353A (ja) * | 2019-02-19 | 2020-08-31 | パナソニックIpマネジメント株式会社 | 研磨加工システム、学習装置、学習装置の学習方法 |
US11574398B2 (en) * | 2019-03-08 | 2023-02-07 | Mitsubishi Electric Corporation | Inspection method for rotating electric machine, rotating electric machine, and inspection system for rotating electric machine |
US20220270939A1 (en) * | 2021-02-25 | 2022-08-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for controlling chemical mechanical planarization |
US20220284560A1 (en) | 2021-03-05 | 2022-09-08 | Applied Materials, Inc. | Detecting an excursion of a cmp component using time-based sequence of images |
JP2024508913A (ja) * | 2021-03-05 | 2024-02-28 | アプライド マテリアルズ インコーポレイテッド | 保持リングを分類するための機械学習 |
US11890722B2 (en) * | 2021-04-05 | 2024-02-06 | Applied Materials, Inc. | Chemical mechanical polishing slurry buildup monitoring |
US11969140B2 (en) * | 2021-06-22 | 2024-04-30 | Micron Technology, Inc. | Surface cleaning |
CN113510620A (zh) * | 2021-07-26 | 2021-10-19 | 长鑫存储技术有限公司 | 加液装置及研磨设备 |
CN113858034B (zh) * | 2021-09-18 | 2023-06-30 | 长江存储科技有限责任公司 | 抛光装置、抛光装置的检测方法和抛光系统 |
US20230390891A1 (en) * | 2022-06-06 | 2023-12-07 | Applied Materials, Inc. | Acoustic monitoring of conditioner during polishing |
US20240051081A1 (en) * | 2022-08-15 | 2024-02-15 | Applied Materials, Inc. | Multiple disk pad conditioner |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008543047A (ja) | 2005-05-26 | 2008-11-27 | アプライド マテリアルズ インコーポレイテッド | スマートコンディショナすすぎ洗いステーション |
JP2013532588A (ja) | 2010-07-26 | 2013-08-19 | アプライド マテリアルズ インコーポレイテッド | 保持リングの厚さおよび寿命の実時間モニタリング |
JP2015188955A (ja) | 2014-03-27 | 2015-11-02 | 株式会社荏原製作所 | 研磨装置 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01284413A (ja) | 1988-05-07 | 1989-11-15 | Mitsubishi Electric Corp | 研磨装置 |
TW320732B (ja) | 1995-04-20 | 1997-11-21 | Matsushita Electron Co Ltd | |
JP3761673B2 (ja) | 1997-06-17 | 2006-03-29 | 株式会社荏原製作所 | ポリッシング装置 |
JPH11347917A (ja) * | 1998-06-09 | 1999-12-21 | Ebara Corp | ポリッシング装置 |
US6210255B1 (en) * | 1998-09-08 | 2001-04-03 | Applied Materials, Inc. | Carrier head for chemical mechanical polishing a substrate |
US6390908B1 (en) * | 1999-07-01 | 2002-05-21 | Applied Materials, Inc. | Determining when to replace a retaining ring used in substrate polishing operations |
TW545580U (en) * | 2002-06-07 | 2003-08-01 | Nanya Technology Corp | CMP device of measuring apparatus with a notched size for measuring the guide ring of wafer edge |
US7008295B2 (en) | 2003-02-04 | 2006-03-07 | Applied Materials Inc. | Substrate monitoring during chemical mechanical polishing |
DE10324429B4 (de) * | 2003-05-28 | 2010-08-19 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zum Betreiben eines chemisch-mechanischen Polier Systems mittels eines Sensorsignals eines Polierkissenkonditionierers |
JP2005340718A (ja) | 2004-05-31 | 2005-12-08 | Tokyo Seimitsu Co Ltd | 研磨パッド及び化学機械研磨装置 |
JP2006035353A (ja) | 2004-07-26 | 2006-02-09 | Seiko Epson Corp | Cmp装置、cmp研磨方法、及び、半導体装置の製造方法 |
CN101422867B (zh) | 2005-05-26 | 2013-03-06 | 应用材料公司 | 智能调整器冲洗站 |
US7407433B2 (en) * | 2005-11-03 | 2008-08-05 | Applied Materials, Inc. | Pad characterization tool |
CN103084969B (zh) | 2011-11-01 | 2015-09-09 | 中芯国际集成电路制造(上海)有限公司 | 一种化学机械研磨设备 |
US9017138B2 (en) * | 2012-01-25 | 2015-04-28 | Applied Materials, Inc. | Retaining ring monitoring and control of pressure |
KR101322410B1 (ko) | 2012-03-08 | 2013-10-28 | 김오수 | 화학기계식 웨이퍼연마장치 |
US9067295B2 (en) | 2012-07-25 | 2015-06-30 | Applied Materials, Inc. | Monitoring retaining ring thickness and pressure control |
US9095952B2 (en) | 2013-01-23 | 2015-08-04 | Applied Materials, Inc. | Reflectivity measurements during polishing using a camera |
TWI511836B (zh) * | 2013-05-09 | 2015-12-11 | Kinik Co | 化學機械研磨修整器之檢測裝置及方法 |
JP6403981B2 (ja) * | 2013-11-13 | 2018-10-10 | 株式会社荏原製作所 | 基板保持装置、研磨装置、研磨方法、およびリテーナリング |
TWI551399B (zh) * | 2014-01-20 | 2016-10-01 | 中國砂輪企業股份有限公司 | 高度磨料品質之化學機械研磨修整器 |
JP6344950B2 (ja) * | 2014-03-31 | 2018-06-20 | 株式会社荏原製作所 | 研磨装置及び研磨方法 |
JP2016140970A (ja) * | 2015-02-05 | 2016-08-08 | 株式会社東芝 | リテーナリング、研磨装置および半導体装置の製造方法 |
US10565701B2 (en) | 2015-11-16 | 2020-02-18 | Applied Materials, Inc. | Color imaging for CMP monitoring |
US10360477B2 (en) | 2016-01-11 | 2019-07-23 | Kla-Tencor Corp. | Accelerating semiconductor-related computations using learning based models |
WO2017146719A1 (en) | 2016-02-26 | 2017-08-31 | Intel Corporation | Wafer retainer rings for chemical mechanical polishing |
US11228709B2 (en) * | 2018-02-06 | 2022-01-18 | Hewlett-Packard Development Company, L.P. | Constructing images of users' faces by stitching non-overlapping images |
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2019
- 2019-03-06 CN CN201980024571.XA patent/CN111936267B/zh active Active
- 2019-03-06 CN CN202310890328.4A patent/CN116872088A/zh active Pending
- 2019-03-06 EP EP19766872.6A patent/EP3765238A4/en active Pending
- 2019-03-06 SG SG11202008881QA patent/SG11202008881QA/en unknown
- 2019-03-06 JP JP2020548664A patent/JP7356996B2/ja active Active
- 2019-03-06 US US16/294,486 patent/US11571786B2/en active Active
- 2019-03-06 KR KR1020207029029A patent/KR20200120960A/ko active IP Right Grant
- 2019-03-06 WO PCT/US2019/021044 patent/WO2019177841A1/en unknown
- 2019-03-12 TW TW108108157A patent/TWI806985B/zh active
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JP2013532588A (ja) | 2010-07-26 | 2013-08-19 | アプライド マテリアルズ インコーポレイテッド | 保持リングの厚さおよび寿命の実時間モニタリング |
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US20230249315A1 (en) | 2023-08-10 |
CN116872088A (zh) | 2023-10-13 |
US11571786B2 (en) | 2023-02-07 |
JP2021517519A (ja) | 2021-07-26 |
EP3765238A4 (en) | 2021-12-08 |
CN111936267B (zh) | 2023-07-25 |
JP2023178295A (ja) | 2023-12-14 |
EP3765238A1 (en) | 2021-01-20 |
WO2019177841A1 (en) | 2019-09-19 |
US11931860B2 (en) | 2024-03-19 |
CN111936267A (zh) | 2020-11-13 |
TWI806985B (zh) | 2023-07-01 |
US20190283209A1 (en) | 2019-09-19 |
SG11202008881QA (en) | 2020-10-29 |
TW201938321A (zh) | 2019-10-01 |
KR20200120960A (ko) | 2020-10-22 |
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