JP7329609B2 - 紫外及び可視波長のプラズモニックフォトカソードエミッタ及び方法 - Google Patents
紫外及び可視波長のプラズモニックフォトカソードエミッタ及び方法 Download PDFInfo
- Publication number
- JP7329609B2 JP7329609B2 JP2021547727A JP2021547727A JP7329609B2 JP 7329609 B2 JP7329609 B2 JP 7329609B2 JP 2021547727 A JP2021547727 A JP 2021547727A JP 2021547727 A JP2021547727 A JP 2021547727A JP 7329609 B2 JP7329609 B2 JP 7329609B2
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- JP
- Japan
- Prior art keywords
- photocathode
- layer
- plasmonic
- array
- plasmonic structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/308—Semiconductor cathodes, e.g. cathodes with PN junction layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/34—Photo-emissive cathodes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/008—Surface plasmon devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/34—Photoemissive electrodes
- H01J2201/342—Cathodes
- H01J2201/3421—Composition of the emitting surface
- H01J2201/3423—Semiconductors, e.g. GaAs, NEA emitters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/34—Photoemissive electrodes
- H01J2201/342—Cathodes
- H01J2201/3421—Composition of the emitting surface
- H01J2201/3425—Metals, metal alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
- H01J2237/06333—Photo emission
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023110436A JP7599526B2 (ja) | 2019-02-17 | 2023-07-05 | 紫外及び可視波長のプラズモニックフォトカソードエミッタ |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962806822P | 2019-02-17 | 2019-02-17 | |
| US62/806,822 | 2019-02-17 | ||
| US16/789,650 | 2020-02-13 | ||
| US16/789,650 US11495428B2 (en) | 2019-02-17 | 2020-02-13 | Plasmonic photocathode emitters at ultraviolet and visible wavelengths |
| PCT/US2020/018199 WO2020168139A1 (en) | 2019-02-17 | 2020-02-14 | Plasmonic photocathode emitters at ultraviolet and visible wavelengths |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023110436A Division JP7599526B2 (ja) | 2019-02-17 | 2023-07-05 | 紫外及び可視波長のプラズモニックフォトカソードエミッタ |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2022521190A JP2022521190A (ja) | 2022-04-06 |
| JP2022521190A5 JP2022521190A5 (https=) | 2023-02-22 |
| JPWO2020168139A5 JPWO2020168139A5 (https=) | 2023-02-22 |
| JP7329609B2 true JP7329609B2 (ja) | 2023-08-18 |
Family
ID=72043672
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021547727A Active JP7329609B2 (ja) | 2019-02-17 | 2020-02-14 | 紫外及び可視波長のプラズモニックフォトカソードエミッタ及び方法 |
| JP2023110436A Active JP7599526B2 (ja) | 2019-02-17 | 2023-07-05 | 紫外及び可視波長のプラズモニックフォトカソードエミッタ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023110436A Active JP7599526B2 (ja) | 2019-02-17 | 2023-07-05 | 紫外及び可視波長のプラズモニックフォトカソードエミッタ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11495428B2 (https=) |
| EP (1) | EP3912182A4 (https=) |
| JP (2) | JP7329609B2 (https=) |
| KR (1) | KR102615663B1 (https=) |
| TW (1) | TWI829864B (https=) |
| WO (1) | WO2020168139A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11217416B2 (en) | 2019-09-27 | 2022-01-04 | Kla Corporation | Plasmonic photocathode emitters |
| CN112420466B (zh) * | 2020-10-29 | 2021-11-19 | 清华大学 | 表面等离激元诱导的电子发射源 |
| CN112908807B (zh) * | 2021-01-13 | 2024-07-02 | 陕西理工大学 | 一种光电阴极及其应用 |
| KR102714203B1 (ko) | 2021-12-23 | 2024-10-04 | 계명대학교 산학협력단 | 플라즈몬 나노입자를 포함하는 박막형 광학소재 제조방법 |
| CN119252723B (zh) * | 2024-09-26 | 2025-10-24 | 杭州邦齐州科技有限公司 | 一种光电阴极用级联增强型光学输入窗 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050264148A1 (en) | 2004-05-28 | 2005-12-01 | Applied Materials, Inc. | Multiple electron beam systems |
| JP2012069459A (ja) | 2010-09-27 | 2012-04-05 | Hamamatsu Photonics Kk | 撮像装置 |
| JP2017053823A (ja) | 2015-09-11 | 2017-03-16 | 株式会社東芝 | 電子線照射装置 |
| JP2022501772A (ja) | 2018-09-18 | 2022-01-06 | ケーエルエー コーポレイション | 金属封入光電陰極電子エミッタ |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5576559A (en) * | 1994-11-01 | 1996-11-19 | Intevac, Inc. | Heterojunction electron transfer device |
| US5912500A (en) * | 1995-11-22 | 1999-06-15 | Intevac, Inc. | Integrated photocathode |
| US6538256B1 (en) * | 2000-08-17 | 2003-03-25 | Applied Materials, Inc. | Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance |
| US7015467B2 (en) | 2002-10-10 | 2006-03-21 | Applied Materials, Inc. | Generating electrons with an activated photocathode |
| US20050285128A1 (en) | 2004-02-10 | 2005-12-29 | California Institute Of Technology | Surface plasmon light emitter structure and method of manufacture |
| JP4939033B2 (ja) * | 2005-10-31 | 2012-05-23 | 浜松ホトニクス株式会社 | 光電陰極 |
| JP4995660B2 (ja) * | 2007-07-30 | 2012-08-08 | 浜松ホトニクス株式会社 | 光電陰極 |
| CN102187425B (zh) | 2008-10-16 | 2013-11-06 | 小利兰·斯坦福大学托管委员会 | 光子增强型热离子发射 |
| US8196217B2 (en) | 2009-08-14 | 2012-06-05 | The Board Of Trustees Of The Leland Stanford Junior University | Tip-enhanced resonant apertures |
| KR101038923B1 (ko) | 2010-02-02 | 2011-06-03 | 전북대학교산학협력단 | 개선된 발광 효율을 갖는 발광 다이오드 및 이의 제조방법 |
| KR101182359B1 (ko) | 2010-12-13 | 2012-09-20 | 한국과학기술원 | 메탈 나노 입자의 표면 플라즈몬 공명 특성을 적용하여 강화된 음극선 발광 형광체의 구조 |
| WO2012126792A1 (en) | 2011-03-18 | 2012-09-27 | Ecole Polytechnique Federale De Lausanne (Epfl) | Electron beam apparatus |
| US9287057B2 (en) | 2013-06-05 | 2016-03-15 | City University Of Hong Kong | Plasmonic enhanced tandem dye-sensitized solar cell with metallic nanostructures |
| KR102320646B1 (ko) | 2014-07-24 | 2021-11-04 | 유니버셜 디스플레이 코포레이션 | 향상층(들)을 갖는 oled 디바이스 |
| US9418814B2 (en) | 2015-01-12 | 2016-08-16 | Uchicago Argonne, Llc | Planar field emitters and high efficiency photocathodes based on ultrananocrystalline diamond |
| US10748730B2 (en) * | 2015-05-21 | 2020-08-18 | Kla-Tencor Corporation | Photocathode including field emitter array on a silicon substrate with boron layer |
| US10074509B2 (en) | 2015-06-07 | 2018-09-11 | Purdue Research Foundation | Plasmon-excited electron beam array for complementary patterning |
| US9984846B2 (en) | 2016-06-30 | 2018-05-29 | Kla-Tencor Corporation | High brightness boron-containing electron beam emitters for use in a vacuum environment |
| JP6867568B2 (ja) | 2016-11-07 | 2021-04-28 | 国立大学法人東京工業大学 | ナノスケール光陰極電子源 |
| US10141155B2 (en) * | 2016-12-20 | 2018-11-27 | Kla-Tencor Corporation | Electron beam emitters with ruthenium coating |
| JP6501285B2 (ja) * | 2017-04-05 | 2019-04-17 | 株式会社Photo electron Soul | 電子線発生装置、および、電子線適用装置 |
| CN107275168B (zh) | 2017-06-06 | 2019-03-29 | 东南大学 | 一种基于氮化钛的新型纳米结构光阴极 |
| US10395884B2 (en) | 2017-10-10 | 2019-08-27 | Kla-Tencor Corporation | Ruthenium encapsulated photocathode electron emitter |
| US10535493B2 (en) | 2017-10-10 | 2020-01-14 | Kla-Tencor Corporation | Photocathode designs and methods of generating an electron beam using a photocathode |
| CN108231507B (zh) | 2017-12-12 | 2020-06-23 | 东南大学 | 一种基于新型纳米结构的光阴极及其制备方法 |
| CN108630510A (zh) | 2018-05-21 | 2018-10-09 | 南京理工大学 | 变掺杂GaN纳米线阵列光电阴极及其制备方法 |
| US11217416B2 (en) * | 2019-09-27 | 2022-01-04 | Kla Corporation | Plasmonic photocathode emitters |
-
2020
- 2020-02-13 US US16/789,650 patent/US11495428B2/en active Active
- 2020-02-14 EP EP20754952.8A patent/EP3912182A4/en active Pending
- 2020-02-14 KR KR1020217029634A patent/KR102615663B1/ko active Active
- 2020-02-14 JP JP2021547727A patent/JP7329609B2/ja active Active
- 2020-02-14 WO PCT/US2020/018199 patent/WO2020168139A1/en not_active Ceased
- 2020-02-17 TW TW109104970A patent/TWI829864B/zh active
-
2023
- 2023-07-05 JP JP2023110436A patent/JP7599526B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050264148A1 (en) | 2004-05-28 | 2005-12-01 | Applied Materials, Inc. | Multiple electron beam systems |
| JP2012069459A (ja) | 2010-09-27 | 2012-04-05 | Hamamatsu Photonics Kk | 撮像装置 |
| JP2017053823A (ja) | 2015-09-11 | 2017-03-16 | 株式会社東芝 | 電子線照射装置 |
| JP2022501772A (ja) | 2018-09-18 | 2022-01-06 | ケーエルエー コーポレイション | 金属封入光電陰極電子エミッタ |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2022521190A (ja) | 2022-04-06 |
| US11495428B2 (en) | 2022-11-08 |
| WO2020168139A9 (en) | 2020-09-24 |
| TW202101505A (zh) | 2021-01-01 |
| EP3912182A1 (en) | 2021-11-24 |
| KR102615663B1 (ko) | 2023-12-19 |
| WO2020168139A1 (en) | 2020-08-20 |
| US20200266019A1 (en) | 2020-08-20 |
| JP2023118869A (ja) | 2023-08-25 |
| TWI829864B (zh) | 2024-01-21 |
| EP3912182A4 (en) | 2022-12-28 |
| KR20210118223A (ko) | 2021-09-29 |
| JP7599526B2 (ja) | 2024-12-13 |
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