JP7295974B2 - 電子源、電子線装置および電子源の製造方法 - Google Patents

電子源、電子線装置および電子源の製造方法 Download PDF

Info

Publication number
JP7295974B2
JP7295974B2 JP2021566413A JP2021566413A JP7295974B2 JP 7295974 B2 JP7295974 B2 JP 7295974B2 JP 2021566413 A JP2021566413 A JP 2021566413A JP 2021566413 A JP2021566413 A JP 2021566413A JP 7295974 B2 JP7295974 B2 JP 7295974B2
Authority
JP
Japan
Prior art keywords
electron source
tip
electron
protrusion
emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021566413A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2021130837A1 (https=
JPWO2021130837A5 (https=
Inventor
敏明 楠
富博 橋詰
紀明 荒井
圭吾 糟谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of JPWO2021130837A1 publication Critical patent/JPWO2021130837A1/ja
Publication of JPWO2021130837A5 publication Critical patent/JPWO2021130837A5/ja
Application granted granted Critical
Publication of JP7295974B2 publication Critical patent/JP7295974B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/18—Assembling together the component parts of electrode systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/20—Sources of radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
JP2021566413A 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法 Active JP7295974B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/050481 WO2021130837A1 (ja) 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法

Publications (3)

Publication Number Publication Date
JPWO2021130837A1 JPWO2021130837A1 (https=) 2021-07-01
JPWO2021130837A5 JPWO2021130837A5 (https=) 2022-08-25
JP7295974B2 true JP7295974B2 (ja) 2023-06-21

Family

ID=76575750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021566413A Active JP7295974B2 (ja) 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法

Country Status (3)

Country Link
US (1) US12494338B2 (https=)
JP (1) JP7295974B2 (https=)
WO (1) WO2021130837A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11651924B1 (en) * 2022-06-22 2023-05-16 Fei Company Method of producing microrods for electron emitters, and associated microrods and electron emitters

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008120412A1 (ja) 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
JP2009152645A (ja) 2009-04-06 2009-07-09 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2011146250A (ja) 2010-01-14 2011-07-28 Nuflare Technology Inc 電子銃用のエミッタ使用方法
JP2012069364A (ja) 2010-09-23 2012-04-05 Nuflare Technology Inc 電子銃および電子銃を用いた電子ビーム描画装置
JP2018142453A (ja) 2017-02-28 2018-09-13 株式会社日立ハイテクノロジーズ 電子源およびそれを用いた電子線装置
JP2019525401A (ja) 2016-06-30 2019-09-05 ケーエルエー コーポレイション 高輝度でホウ素を含有する真空環境用電子ビームエミッタ

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6147038A (ja) * 1984-07-02 1986-03-07 ジエイソン　ジヨン　キム 熱電子陰極とその製造方法
JP2000173900A (ja) 1998-12-08 2000-06-23 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
US8952605B2 (en) 2012-07-03 2015-02-10 National Institute For Materials Science Metal hexaboride cold field emitter, method of fabricating same, and electron gun
US9165737B2 (en) * 2012-10-04 2015-10-20 Nuflare Technology, Inc. High-brightness, long life thermionic cathode and methods of its fabrication
WO2018016286A1 (ja) * 2016-07-19 2018-01-25 デンカ株式会社 電子源およびその製造方法
CN109804450B (zh) 2016-10-13 2020-12-01 株式会社日立高新技术 电子束装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008120412A1 (ja) 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
JP2009152645A (ja) 2009-04-06 2009-07-09 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2011146250A (ja) 2010-01-14 2011-07-28 Nuflare Technology Inc 電子銃用のエミッタ使用方法
JP2012069364A (ja) 2010-09-23 2012-04-05 Nuflare Technology Inc 電子銃および電子銃を用いた電子ビーム描画装置
JP2019525401A (ja) 2016-06-30 2019-09-05 ケーエルエー コーポレイション 高輝度でホウ素を含有する真空環境用電子ビームエミッタ
JP2018142453A (ja) 2017-02-28 2018-09-13 株式会社日立ハイテクノロジーズ 電子源およびそれを用いた電子線装置

Also Published As

Publication number Publication date
JPWO2021130837A1 (https=) 2021-07-01
US12494338B2 (en) 2025-12-09
WO2021130837A1 (ja) 2021-07-01
US20220415603A1 (en) 2022-12-29

Similar Documents

Publication Publication Date Title
CN104347335B (zh) 铱针尖、及使用铱针尖的离子源、电子源、显微镜和装置
JP6001292B2 (ja) エミッタの作製方法
CN109804450B (zh) 电子束装置
JP6999277B2 (ja) 熱電界エミッタチップ、熱電界エミッタチップを含む電子ビーム装置、および電子ビーム装置を動作させる方法
JP7403678B2 (ja) 電子源とその製造方法およびそれを用いた電子線装置
JP2009301920A (ja) ナノチップエミッタ作製方法
EP2242084B1 (en) Method of manufacturing an electron source
JP7295974B2 (ja) 電子源、電子線装置および電子源の製造方法
JP5564689B2 (ja) 電界電離型ガスイオン源のエミッタおよびこれを備えた集束イオンビーム装置ならびに電界電離型ガスイオン源のエミッタの製造方法
US10658143B2 (en) Method of manufacturing emitter
KR100264365B1 (ko) 니들 전극 및 전자 에미터용 니들 전극의 제조방법
US6531811B1 (en) Liquid metal ion source and method for producing the same
JP4792404B2 (ja) 電子源の製造方法
JP7022837B2 (ja) 電子源とその製造方法およびそれを用いた電子線装置
US11081312B2 (en) Method of manufacturing emitter, emitter, and focused ion beam apparatus
US20250316438A1 (en) Field emission electron source, method of producing same, and electron beam device using same
JP3250724B2 (ja) 針状電極の製造方法
JP6236480B2 (ja) エミッタの作製方法
TW202548811A (zh) 肖特基電子源，肖特基電子源的製造方法及電子線裝置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220616

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220616

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230411

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230531

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230606

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230609

R150 Certificate of patent or registration of utility model

Ref document number: 7295974

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150