JPWO2021130837A1 - - Google Patents

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Publication number
JPWO2021130837A1
JPWO2021130837A1 JP2021566413A JP2021566413A JPWO2021130837A1 JP WO2021130837 A1 JPWO2021130837 A1 JP WO2021130837A1 JP 2021566413 A JP2021566413 A JP 2021566413A JP 2021566413 A JP2021566413 A JP 2021566413A JP WO2021130837 A1 JPWO2021130837 A1 JP WO2021130837A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021566413A
Other languages
Japanese (ja)
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JP7295974B2 (ja
JPWO2021130837A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Publication of JPWO2021130837A1 publication Critical patent/JPWO2021130837A1/ja
Publication of JPWO2021130837A5 publication Critical patent/JPWO2021130837A5/ja
Application granted granted Critical
Publication of JP7295974B2 publication Critical patent/JP7295974B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/022Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/075Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/18Assembling together the component parts of electrode systems
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/20Sources of radiation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/40Imaging
    • G01N2223/418Imaging electron microscope
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/061Construction
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/063Electron sources
    • H01J2237/06308Thermionic sources
    • H01J2237/06316Schottky emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
JP2021566413A 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法 Active JP7295974B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/050481 WO2021130837A1 (ja) 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法

Publications (3)

Publication Number Publication Date
JPWO2021130837A1 true JPWO2021130837A1 (https=) 2021-07-01
JPWO2021130837A5 JPWO2021130837A5 (https=) 2022-08-25
JP7295974B2 JP7295974B2 (ja) 2023-06-21

Family

ID=76575750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021566413A Active JP7295974B2 (ja) 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法

Country Status (3)

Country Link
US (1) US12494338B2 (https=)
JP (1) JP7295974B2 (https=)
WO (1) WO2021130837A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11651924B1 (en) * 2022-06-22 2023-05-16 Fei Company Method of producing microrods for electron emitters, and associated microrods and electron emitters

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6147038A (ja) * 1984-07-02 1986-03-07 ジエイソン ジヨン キム 熱電子陰極とその製造方法
WO2008120412A1 (ja) * 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
JP2009152645A (ja) * 2009-04-06 2009-07-09 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2011146250A (ja) * 2010-01-14 2011-07-28 Nuflare Technology Inc 電子銃用のエミッタ使用方法
JP2012069364A (ja) * 2010-09-23 2012-04-05 Nuflare Technology Inc 電子銃および電子銃を用いた電子ビーム描画装置
JP2018142453A (ja) * 2017-02-28 2018-09-13 株式会社日立ハイテクノロジーズ 電子源およびそれを用いた電子線装置
JP2019525401A (ja) * 2016-06-30 2019-09-05 ケーエルエー コーポレイション 高輝度でホウ素を含有する真空環境用電子ビームエミッタ

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000173900A (ja) 1998-12-08 2000-06-23 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
US8952605B2 (en) 2012-07-03 2015-02-10 National Institute For Materials Science Metal hexaboride cold field emitter, method of fabricating same, and electron gun
US9165737B2 (en) * 2012-10-04 2015-10-20 Nuflare Technology, Inc. High-brightness, long life thermionic cathode and methods of its fabrication
WO2018016286A1 (ja) * 2016-07-19 2018-01-25 デンカ株式会社 電子源およびその製造方法
CN109804450B (zh) 2016-10-13 2020-12-01 株式会社日立高新技术 电子束装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6147038A (ja) * 1984-07-02 1986-03-07 ジエイソン ジヨン キム 熱電子陰極とその製造方法
WO2008120412A1 (ja) * 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
JP2009152645A (ja) * 2009-04-06 2009-07-09 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2011146250A (ja) * 2010-01-14 2011-07-28 Nuflare Technology Inc 電子銃用のエミッタ使用方法
JP2012069364A (ja) * 2010-09-23 2012-04-05 Nuflare Technology Inc 電子銃および電子銃を用いた電子ビーム描画装置
JP2019525401A (ja) * 2016-06-30 2019-09-05 ケーエルエー コーポレイション 高輝度でホウ素を含有する真空環境用電子ビームエミッタ
JP2018142453A (ja) * 2017-02-28 2018-09-13 株式会社日立ハイテクノロジーズ 電子源およびそれを用いた電子線装置

Also Published As

Publication number Publication date
JP7295974B2 (ja) 2023-06-21
US12494338B2 (en) 2025-12-09
WO2021130837A1 (ja) 2021-07-01
US20220415603A1 (en) 2022-12-29

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