JPWO2021130837A1 - - Google Patents

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Publication number
JPWO2021130837A1
JPWO2021130837A1 JP2021566413A JP2021566413A JPWO2021130837A1 JP WO2021130837 A1 JPWO2021130837 A1 JP WO2021130837A1 JP 2021566413 A JP2021566413 A JP 2021566413A JP 2021566413 A JP2021566413 A JP 2021566413A JP WO2021130837 A1 JPWO2021130837 A1 JP WO2021130837A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021566413A
Other versions
JPWO2021130837A5 (ja
JP7295974B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021130837A1 publication Critical patent/JPWO2021130837A1/ja
Publication of JPWO2021130837A5 publication Critical patent/JPWO2021130837A5/ja
Application granted granted Critical
Publication of JP7295974B2 publication Critical patent/JP7295974B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/18—Assembling together the component parts of electrode systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/20—Sources of radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission

Landscapes

  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2021566413A 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法 Active JP7295974B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/050481 WO2021130837A1 (ja) 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法

Publications (3)

Publication Number Publication Date
JPWO2021130837A1 true JPWO2021130837A1 (ja) 2021-07-01
JPWO2021130837A5 JPWO2021130837A5 (ja) 2022-08-25
JP7295974B2 JP7295974B2 (ja) 2023-06-21

Family

ID=76575750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021566413A Active JP7295974B2 (ja) 2019-12-24 2019-12-24 電子源、電子線装置および電子源の製造方法

Country Status (3)

Country Link
US (1) US20220415603A1 (ja)
JP (1) JP7295974B2 (ja)
WO (1) WO2021130837A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11651924B1 (en) 2022-06-22 2023-05-16 Fei Company Method of producing microrods for electron emitters, and associated microrods and electron emitters

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6147038A (ja) * 1984-07-02 1986-03-07 ジエイソン　ジヨン　キム 熱電子陰極とその製造方法
WO2008120412A1 (ja) * 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
JP2009152645A (ja) * 2009-04-06 2009-07-09 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2011146250A (ja) * 2010-01-14 2011-07-28 Nuflare Technology Inc 電子銃用のエミッタ使用方法
JP2012069364A (ja) * 2010-09-23 2012-04-05 Nuflare Technology Inc 電子銃および電子銃を用いた電子ビーム描画装置
JP2018142453A (ja) * 2017-02-28 2018-09-13 株式会社日立ハイテクノロジーズ 電子源およびそれを用いた電子線装置
JP2019525401A (ja) * 2016-06-30 2019-09-05 ケーエルエー コーポレイション 高輝度でホウ素を含有する真空環境用電子ビームエミッタ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000173900A (ja) * 1998-12-08 2000-06-23 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6147038A (ja) * 1984-07-02 1986-03-07 ジエイソン　ジヨン　キム 熱電子陰極とその製造方法
WO2008120412A1 (ja) * 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
JP2009152645A (ja) * 2009-04-06 2009-07-09 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2011146250A (ja) * 2010-01-14 2011-07-28 Nuflare Technology Inc 電子銃用のエミッタ使用方法
JP2012069364A (ja) * 2010-09-23 2012-04-05 Nuflare Technology Inc 電子銃および電子銃を用いた電子ビーム描画装置
JP2019525401A (ja) * 2016-06-30 2019-09-05 ケーエルエー コーポレイション 高輝度でホウ素を含有する真空環境用電子ビームエミッタ
JP2018142453A (ja) * 2017-02-28 2018-09-13 株式会社日立ハイテクノロジーズ 電子源およびそれを用いた電子線装置

Also Published As

Publication number Publication date
WO2021130837A1 (ja) 2021-07-01
JP7295974B2 (ja) 2023-06-21
US20220415603A1 (en) 2022-12-29

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