JP7262453B2 - 液体案内部品及びその使用方法、応用 - Google Patents
液体案内部品及びその使用方法、応用 Download PDFInfo
- Publication number
- JP7262453B2 JP7262453B2 JP2020520817A JP2020520817A JP7262453B2 JP 7262453 B2 JP7262453 B2 JP 7262453B2 JP 2020520817 A JP2020520817 A JP 2020520817A JP 2020520817 A JP2020520817 A JP 2020520817A JP 7262453 B2 JP7262453 B2 JP 7262453B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- pixel
- liquid guiding
- inlet end
- liquid guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
- B41J2/17503—Ink cartridges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
- B41J2/17503—Ink cartridges
- B41J2/17553—Outer structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14467—Multiple feed channels per ink chamber
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/034—Manufacture or treatment of coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Ink Jet (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Nozzles (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710953212.5 | 2017-10-13 | ||
| CN201710953212.5A CN107745581B (zh) | 2017-10-13 | 2017-10-13 | 导液组件及其使用方法、和应用 |
| PCT/CN2018/108305 WO2019072102A1 (zh) | 2017-10-13 | 2018-09-28 | 导液组件及其使用方法、应用 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020536729A JP2020536729A (ja) | 2020-12-17 |
| JP2020536729A5 JP2020536729A5 (https=) | 2021-02-04 |
| JP7262453B2 true JP7262453B2 (ja) | 2023-04-21 |
Family
ID=61253853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020520817A Active JP7262453B2 (ja) | 2017-10-13 | 2018-09-28 | 液体案内部品及びその使用方法、応用 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11839886B2 (https=) |
| JP (1) | JP7262453B2 (https=) |
| KR (1) | KR20200066642A (https=) |
| CN (1) | CN107745581B (https=) |
| WO (1) | WO2019072102A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20230276685A9 (en) * | 2016-08-26 | 2023-08-31 | Najing Technology Corporation Limited | Manufacturing method for light emitting device, light emitting device, and hybrid light emitting device |
| CN107745581B (zh) * | 2017-10-13 | 2019-08-23 | 纳晶科技股份有限公司 | 导液组件及其使用方法、和应用 |
| CN110416411B (zh) * | 2019-08-30 | 2022-11-01 | 昆山国显光电有限公司 | 一种喷墨打印对位基板和喷墨打印装置 |
| CN111845076B (zh) * | 2020-09-18 | 2020-12-29 | 季华实验室 | 一种用于判断像素打印缺陷的基板和方法 |
| CN112974040A (zh) * | 2021-02-04 | 2021-06-18 | 山东华冠智能卡有限公司 | 一种石墨烯rfid天线制作设备 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016513003A (ja) | 2013-02-11 | 2016-05-12 | デュール システムズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 塗布装置用有孔板、対応する塗布方法及び製造方法 |
| CN106696501A (zh) | 2016-08-26 | 2017-05-24 | 纳晶科技股份有限公司 | 表面改性掩模板、其制作方法、电致发光器件的制作方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4139186B2 (ja) * | 2002-10-21 | 2008-08-27 | 東北パイオニア株式会社 | 真空蒸着装置 |
| JP2007276443A (ja) | 2006-03-14 | 2007-10-25 | Seiko Epson Corp | 液滴吐出ヘッドの製造方法、液滴吐出ヘッド、および液滴吐出装置の製造方法、液滴吐出装置 |
| JP2008246829A (ja) * | 2007-03-30 | 2008-10-16 | Nec Lcd Technologies Ltd | 凸版反転オフセット印刷用印刷版及びその製造方法、並びに表示装置及び表示装置用基板の製造方法 |
| GB2483635A (en) * | 2010-09-08 | 2012-03-21 | Cambridge Display Tech Ltd | Printing Apparatus involving beat patterns |
| TW201226061A (en) * | 2010-12-16 | 2012-07-01 | Metal Ind Res & Dev Ct | Nozzle device and flow divider used for the same |
| JP5291839B2 (ja) * | 2010-12-21 | 2013-09-18 | シャープ株式会社 | 蒸着装置及び蒸着方法 |
| JP2013154531A (ja) * | 2012-01-30 | 2013-08-15 | Toshiba Tec Corp | 画像形成装置及び画像形成方法 |
| KR20140019579A (ko) * | 2012-08-06 | 2014-02-17 | 삼성디스플레이 주식회사 | 증착 장치 |
| CN103208508A (zh) * | 2013-04-27 | 2013-07-17 | 上海大学 | 有机电致发光显示屏、其专用涂布装置及其制备方法 |
| CN104369541B (zh) * | 2014-12-01 | 2017-01-25 | 京东方科技集团股份有限公司 | 一种喷墨打印设备 |
| CN104985933B (zh) * | 2015-07-28 | 2016-08-24 | 京东方科技集团股份有限公司 | 一种喷墨打印喷头及其喷墨打印方法和喷墨打印设备 |
| CN105789484B (zh) * | 2016-03-09 | 2018-05-15 | 纳晶科技股份有限公司 | 发光器件及其制作方法 |
| CN205705757U (zh) * | 2016-06-24 | 2016-11-23 | 纳晶科技股份有限公司 | 一种用于制备发光器件的打印设备、打印基板及打印系统 |
| CN106158916B (zh) * | 2016-08-26 | 2019-03-12 | 纳晶科技股份有限公司 | 量子点膜、其制作方法及显示器件 |
| CN106252528B (zh) * | 2016-08-26 | 2018-10-12 | 纳晶科技股份有限公司 | 发光器件的制作方法、发光器件及混合发光器件 |
| CN107230697B (zh) * | 2017-05-16 | 2020-09-08 | 纳晶科技股份有限公司 | 具有像素结构的基板、含其的光电器件和打印方法 |
| CN107745581B (zh) | 2017-10-13 | 2019-08-23 | 纳晶科技股份有限公司 | 导液组件及其使用方法、和应用 |
-
2017
- 2017-10-13 CN CN201710953212.5A patent/CN107745581B/zh active Active
-
2018
- 2018-09-28 JP JP2020520817A patent/JP7262453B2/ja active Active
- 2018-09-28 WO PCT/CN2018/108305 patent/WO2019072102A1/zh not_active Ceased
- 2018-09-28 KR KR1020207011702A patent/KR20200066642A/ko not_active Ceased
- 2018-09-28 US US16/652,066 patent/US11839886B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016513003A (ja) | 2013-02-11 | 2016-05-12 | デュール システムズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 塗布装置用有孔板、対応する塗布方法及び製造方法 |
| CN106696501A (zh) | 2016-08-26 | 2017-05-24 | 纳晶科技股份有限公司 | 表面改性掩模板、其制作方法、电致发光器件的制作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2020536729A (ja) | 2020-12-17 |
| US11839886B2 (en) | 2023-12-12 |
| WO2019072102A1 (zh) | 2019-04-18 |
| US20200246810A1 (en) | 2020-08-06 |
| CN107745581A (zh) | 2018-03-02 |
| CN107745581B (zh) | 2019-08-23 |
| KR20200066642A (ko) | 2020-06-10 |
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