JP7245059B2 - 基板処理装置及び基板処理方法 - Google Patents
基板処理装置及び基板処理方法 Download PDFInfo
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Description
基板11の回転により周方向に広がりながら、基板11の外周に向って流れる。これにより、処理面S1の全面がノズル43から噴出されたオゾンガスに曝される。処理面S1のレジスト膜は、このようにしてオゾンガスに曝されると、その部分がオゾンで酸化分解されて徐々に分解されて除去される。また、ハロゲンランプヒータ18により基板11が加熱されているため、オゾンによるレジスト膜の酸化分解が促進される。気体であるオゾンガスは、オゾン水等の液体と比べて熱伝導率が小さいため、基板11の温度が低下しづらく、レジスト膜の酸化分解の促進が効果的になされる。
11 基板
12 ハウジング
12a 上部開口
14 回転テーブル
16 噴出部
17 供給部
19 排出部
32 基板保持部
43 ノズル
Claims (9)
- 鉛直軸まわりに回動自在に配され、基板の処理面に対する処理の際に回転される回転テーブルと、
前記回転テーブルに設けられ、前記処理面を下向きにして前記回転テーブルの上面と離した状態で前記基板を水平に保持し、前記回転テーブルと一体に回転する基板保持部と、
前記回転テーブルに保持された前記基板の前記処理面よりも下側に固定されており、前記回転テーブルの中央部に配され、供給される流体を噴出して前記処理面に供給する1または複数のノズルを有する噴出部と、
前記回転テーブルの回転中に、前記噴出部に対して前記流体としてオゾンガスを供給するオゾンガス供給部と
を備え、
前記オゾンガス供給部から前記噴出部にオゾンガスの供給を行い、オゾンガスで前記処理面を処理するドライモードと、前記ドライモード後に移行し、前記回転テーブルと一体に回転している前記基板の前記処理面を処理液で処理するウエットモードとを有し、
前記ウエットモード下で前記噴出部に前記流体として前記処理液を供給する処理液供給部と、
前記ウエットモードに移行する前に、オゾンガスに代えて前記噴出部に冷却用ガスを供給し、前記回転テーブルと一体に回転する前記基板を冷却する冷却用ガス供給部とを備える
ことを特徴とする基板処理装置。 - 前記オゾンガス供給部から前記噴出部にオゾンガスを供給しているときに、前記基板保持部に保持された前記基板を上方から加熱するヒータを備えることを特徴とする請求項1に記載の基板処理装置。
- 前記処理液供給部は、前記噴出部に対して、前記処理液としてパーティクルを除去する薬液を供給してから純水を供給することを特徴とする請求項1または2に記載の基板処理装置。
- 前記噴出部は、噴出する前記流体の広がりまたは噴出量の異なる複数のノズルを有することを特徴とする請求項1ないし3のいずれか1項に記載の基板処理装置。
- 前記回転テーブルとともに前記基板を収容するハウジングと、
前記回転テーブルの上面よりも低い位置に設けられた排出口を有し、前記噴出部にオゾンガスを供給しているときに、前記回転テーブルに保持された前記基板と前記回転テーブルとの間よりも前記排出口の圧力を小さくする圧力差を生じさせる排出部と
を備えることを特徴とする請求項1ないし4のいずれか1項に記載の基板処理装置。 - 基板の処理面を下向きにするとともに水平にし、鉛直軸まわりに回動自在な回転テーブルの上面から離した状態で前記基板を前記回転テーブルに設けた基板保持部で保持する基板保持工程と、
前記基板と一体に前記回転テーブルを回転させる回転工程と、
前記回転テーブルの中央部から回転中の前記回転テーブルと前記基板との間にオゾンガスを噴出して前記処理面に供給するオゾンガス供給工程と、
前記オゾンガス供給工程の後に移行し、前記回転テーブルの中央部から回転中の前記回転テーブルと前記基板との間に処理液を噴出して前記処理面に供給する処理液供給工程と、
前記オゾンガス供給工程の後で前記処理液供給工程に移行する前に、前記回転テーブルと前記基板との回転を継続するとともに、前記回転テーブルと前記基板との間に冷却用ガスを供給し、前記基板を冷却する冷却工程と
を有することを特徴とする基板処理方法。 - 前記オゾンガス供給工程の間に、前記基板を上方から加熱する加熱工程を有することを特徴とする請求項6に記載の基板処理方法。
- 前記処理液供給工程は、前記処理液としてパーティクルを除去する薬液を供給してから純水を供給することを特徴とする請求項6または7に記載の基板処理方法。
- 前記処理液供給工程の後に、前記回転テーブルの回転速度を増大して前記回転テーブル及び前記基板を乾燥させる乾燥工程を有することを特徴とする請求項6ないし8のいずれか1項に記載の基板処理方法。
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