JP7221348B1 - 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ - Google Patents

感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ Download PDF

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JP7221348B1
JP7221348B1 JP2021148439A JP2021148439A JP7221348B1 JP 7221348 B1 JP7221348 B1 JP 7221348B1 JP 2021148439 A JP2021148439 A JP 2021148439A JP 2021148439 A JP2021148439 A JP 2021148439A JP 7221348 B1 JP7221348 B1 JP 7221348B1
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meth
parts
acrylate
chemical formula
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JP2023041208A (ja
Inventor
慶一 近藤
慎太郎 櫻井
駿平 鈴木
秀平 河岡
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Toyo Ink SC Holdings Co Ltd
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Toyo Ink SC Holdings Co Ltd
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Priority to JP2021148439A priority Critical patent/JP7221348B1/ja
Priority to PCT/JP2022/033780 priority patent/WO2023038092A1/ja
Priority to CN202280040746.8A priority patent/CN117425857A/zh
Priority to KR1020237041811A priority patent/KR20240054920A/ko
Priority to TW111134372A priority patent/TW202319406A/zh
Priority to JP2022165483A priority patent/JP2023041665A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2021148439A 2021-09-13 2021-09-13 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ Active JP7221348B1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2021148439A JP7221348B1 (ja) 2021-09-13 2021-09-13 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ
PCT/JP2022/033780 WO2023038092A1 (ja) 2021-09-13 2022-09-08 感光性組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ
CN202280040746.8A CN117425857A (zh) 2021-09-13 2022-09-08 感光性组合物、使用其的硬化膜、彩色滤光片、光学滤波器、图像显示装置、固体摄像元件、及红外线传感器
KR1020237041811A KR20240054920A (ko) 2021-09-13 2022-09-08 감광성 조성물, 그것을 이용한 경화막, 컬러 필터, 광학 필터, 화상 표시 장치, 고체 촬상 소자, 및 적외선 센서
TW111134372A TW202319406A (zh) 2021-09-13 2022-09-12 感光性組成物、使用其的硬化膜、彩色濾光片、光學濾波器、圖像顯示裝置、固體攝像元件、及紅外線感測器
JP2022165483A JP2023041665A (ja) 2021-09-13 2022-10-14 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021148439A JP7221348B1 (ja) 2021-09-13 2021-09-13 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ

Related Child Applications (1)

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JP2022165483A Division JP2023041665A (ja) 2021-09-13 2022-10-14 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ

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JP7221348B1 true JP7221348B1 (ja) 2023-02-13
JP2023041208A JP2023041208A (ja) 2023-03-24

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JP2021148439A Active JP7221348B1 (ja) 2021-09-13 2021-09-13 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ
JP2022165483A Pending JP2023041665A (ja) 2021-09-13 2022-10-14 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ

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JP2022165483A Pending JP2023041665A (ja) 2021-09-13 2022-10-14 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ

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JP (2) JP7221348B1 (zh)
KR (1) KR20240054920A (zh)
CN (1) CN117425857A (zh)
TW (1) TW202319406A (zh)
WO (1) WO2023038092A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7401016B1 (ja) 2023-05-15 2023-12-19 東洋インキＳｃホールディングス株式会社 封止シート及び、樹脂組成物層を有するディスプレイ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012118279A (ja) 2010-11-30 2012-06-21 Jsr Corp 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、及び表示素子
WO2019026547A1 (ja) 2017-08-03 2019-02-07 昭和電工株式会社 感光性樹脂組成物及びその製造方法
JP2020052071A (ja) 2018-09-21 2020-04-02 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物及びカラーフィルタ

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101687849B1 (ko) 2012-05-31 2016-12-19 주식회사 엘지화학 잉크 조성물, 이를 이용한 컬러필터 및 이를 포함하는 디스플레이 소자
JP2016084464A (ja) 2014-10-24 2016-05-19 昭和電工株式会社 硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
KR20210080243A (ko) 2019-12-20 2021-06-30 제이에스알 가부시끼가이샤 착색 조성물, 착색 경화막 및 그의 제조 방법, 컬러 필터, 표시 소자, 수광 소자, 그리고 경화성 조성물

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012118279A (ja) 2010-11-30 2012-06-21 Jsr Corp 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、及び表示素子
WO2019026547A1 (ja) 2017-08-03 2019-02-07 昭和電工株式会社 感光性樹脂組成物及びその製造方法
JP2020052071A (ja) 2018-09-21 2020-04-02 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物及びカラーフィルタ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7401016B1 (ja) 2023-05-15 2023-12-19 東洋インキＳｃホールディングス株式会社 封止シート及び、樹脂組成物層を有するディスプレイ

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CN117425857A (zh) 2024-01-19
JP2023041208A (ja) 2023-03-24
WO2023038092A1 (ja) 2023-03-16
JP2023041665A (ja) 2023-03-24
TW202319406A (zh) 2023-05-16
KR20240054920A (ko) 2024-04-26

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