JP7207918B2 - コバルト用ケミカルメカニカルポリッシング方法 - Google Patents

コバルト用ケミカルメカニカルポリッシング方法 Download PDF

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Publication number
JP7207918B2
JP7207918B2 JP2018175755A JP2018175755A JP7207918B2 JP 7207918 B2 JP7207918 B2 JP 7207918B2 JP 2018175755 A JP2018175755 A JP 2018175755A JP 2018175755 A JP2018175755 A JP 2018175755A JP 7207918 B2 JP7207918 B2 JP 7207918B2
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Japan
Prior art keywords
chemical mechanical
mechanical polishing
polishing composition
cobalt
substrate
Prior art date
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Active
Application number
JP2018175755A
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English (en)
Japanese (ja)
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JP2019110286A (ja
JP2019110286A5 (enExample
Inventor
ムラリ・ジー・ティヴァナヤガム
ホンユー・ワン
マシュー・ヴァン・ハネヘム
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials Holding Inc
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
DuPont Electronic Materials Holding Inc
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Publication of JP2019110286A publication Critical patent/JP2019110286A/ja
Publication of JP2019110286A5 publication Critical patent/JP2019110286A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • H10P95/04—
    • H10W20/062—
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • H10P50/00—
    • H10P52/00—
    • H10P52/402—
    • H10P52/403—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
JP2018175755A 2017-09-21 2018-09-20 コバルト用ケミカルメカニカルポリッシング方法 Active JP7207918B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/710,898 2017-09-21
US15/710,898 US10377921B2 (en) 2017-09-21 2017-09-21 Chemical mechanical polishing method for cobalt

Publications (3)

Publication Number Publication Date
JP2019110286A JP2019110286A (ja) 2019-07-04
JP2019110286A5 JP2019110286A5 (enExample) 2022-12-06
JP7207918B2 true JP7207918B2 (ja) 2023-01-18

Family

ID=65719934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018175755A Active JP7207918B2 (ja) 2017-09-21 2018-09-20 コバルト用ケミカルメカニカルポリッシング方法

Country Status (5)

Country Link
US (1) US10377921B2 (enExample)
JP (1) JP7207918B2 (enExample)
KR (1) KR102459546B1 (enExample)
CN (1) CN109545736B (enExample)
TW (1) TWI838343B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3714012B1 (en) * 2017-11-22 2023-01-11 Basf Se Chemical mechanical polishing composition
US10947413B2 (en) * 2019-03-29 2021-03-16 Rohm And Haas Electronic Materials Cmp Holdings Chemical mechanical polishing method for cobalt with high cobalt removal rates and reduced cobalt corrosion
US10787592B1 (en) * 2019-05-16 2020-09-29 Rohm And Haas Electronic Materials Cmp Holdings, I Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment
CN113004801B (zh) * 2019-12-20 2024-03-12 安集微电子（上海）有限公司 一种化学机械抛光液
CN115160933B (zh) * 2022-07-27 2023-11-28 河北工业大学 一种用于钴互连集成电路钴cmp的碱性抛光液及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016030831A (ja) 2014-07-25 2016-03-07 エア プロダクツ アンド ケミカルズ インコーポレイテッドＡｉｒ Ｐｒｏｄｕｃｔｓ Ａｎｄ Ｃｈｅｍｉｃａｌｓ Ｉｎｃｏｒｐｏｒａｔｅｄ コバルト含有基板の化学的機械的研磨（ｃｍｐ）
WO2016102531A1 (en) 2014-12-22 2016-06-30 Basf Se Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt and/or cobalt alloy comprising substrates

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4078787B2 (ja) * 2000-03-31 2008-04-23 Ｊｓｒ株式会社 化学機械研磨用水系分散体
JP2011003665A (ja) 2009-06-17 2011-01-06 Jsr Corp 化学機械研磨用水系分散体およびそれを用いた化学機械研磨方法
JP5141792B2 (ja) * 2010-06-29 2013-02-13 日立化成工業株式会社 Ｃｍｐ研磨液及び研磨方法
CN102304327A (zh) 2011-07-05 2012-01-04 复旦大学 一种基于金属Co的抛光工艺的抛光液
US20130045599A1 (en) * 2011-08-15 2013-02-21 Rohm and Electronic Materials CMP Holdings, Inc. Method for chemical mechanical polishing copper
US20130186850A1 (en) 2012-01-24 2013-07-25 Applied Materials, Inc. Slurry for cobalt applications
US20140011362A1 (en) 2012-07-06 2014-01-09 Basf Se Chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and an aromatic compound comprising at least one acid group
WO2014132641A1 (ja) 2013-02-28 2014-09-04 株式会社フジミインコーポレーテッド コバルト除去のための研磨スラリー
JP6156630B2 (ja) 2013-05-24 2017-07-05 Jsr株式会社 化学機械研磨用水系分散体および化学機械研磨方法
JPWO2015129342A1 (ja) * 2014-02-26 2017-03-30 株式会社フジミインコーポレーテッド 研磨用組成物
US9583359B2 (en) * 2014-04-04 2017-02-28 Fujifilm Planar Solutions, LLC Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films
WO2016008896A1 (en) 2014-07-15 2016-01-21 Basf Se A chemical mechanical polishing (cmp) composition
US9735030B2 (en) 2014-09-05 2017-08-15 Fujifilm Planar Solutions, LLC Polishing compositions and methods for polishing cobalt films
JP6646051B2 (ja) 2014-10-21 2020-02-14 キャボット マイクロエレクトロニクス コーポレイション コバルト研磨促進剤
US9944828B2 (en) 2014-10-21 2018-04-17 Cabot Microelectronics Corporation Slurry for chemical mechanical polishing of cobalt
CN104830235B (zh) 2015-04-29 2017-06-23 清华大学 用于钴阻挡层结构化学机械抛光的抛光液及其应用
EP3334794B1 (en) 2015-08-12 2020-02-19 Basf Se Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substrates
US9528030B1 (en) 2015-10-21 2016-12-27 Cabot Microelectronics Corporation Cobalt inhibitor combination for improved dishing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016030831A (ja) 2014-07-25 2016-03-07 エア プロダクツ アンド ケミカルズ インコーポレイテッドＡｉｒ Ｐｒｏｄｕｃｔｓ Ａｎｄ Ｃｈｅｍｉｃａｌｓ Ｉｎｃｏｒｐｏｒａｔｅｄ コバルト含有基板の化学的機械的研磨（ｃｍｐ）
WO2016102531A1 (en) 2014-12-22 2016-06-30 Basf Se Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt and/or cobalt alloy comprising substrates

Also Published As

Publication number Publication date
US20190085206A1 (en) 2019-03-21
KR102459546B1 (ko) 2022-10-26
JP2019110286A (ja) 2019-07-04
US10377921B2 (en) 2019-08-13
CN109545736A (zh) 2019-03-29
TW201915133A (zh) 2019-04-16
KR20190033432A (ko) 2019-03-29
TWI838343B (zh) 2024-04-11
CN109545736B (zh) 2023-09-29

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