JP7193478B2 - 高成長速度ケイ素含有膜の前駆体としての官能化シクロシラザン - Google Patents
高成長速度ケイ素含有膜の前駆体としての官能化シクロシラザン Download PDFInfo
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- JP7193478B2 JP7193478B2 JP2019564996A JP2019564996A JP7193478B2 JP 7193478 B2 JP7193478 B2 JP 7193478B2 JP 2019564996 A JP2019564996 A JP 2019564996A JP 2019564996 A JP2019564996 A JP 2019564996A JP 7193478 B2 JP7193478 B2 JP 7193478B2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 50
- 229910052710 silicon Inorganic materials 0.000 title claims description 47
- 239000010703 silicon Substances 0.000 title claims description 46
- 239000002243 precursor Substances 0.000 title description 46
- 238000000034 method Methods 0.000 claims description 126
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 89
- 239000012686 silicon precursor Substances 0.000 claims description 71
- 229910052760 oxygen Inorganic materials 0.000 claims description 68
- 239000001301 oxygen Substances 0.000 claims description 66
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 65
- 229910052739 hydrogen Inorganic materials 0.000 claims description 60
- 239000001257 hydrogen Substances 0.000 claims description 60
- 238000000151 deposition Methods 0.000 claims description 52
- 229910052757 nitrogen Inorganic materials 0.000 claims description 47
- 239000000758 substrate Substances 0.000 claims description 47
- 239000007789 gas Substances 0.000 claims description 45
- 238000010926 purge Methods 0.000 claims description 43
- 125000000217 alkyl group Chemical group 0.000 claims description 41
- 150000001875 compounds Chemical class 0.000 claims description 39
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 36
- 239000000203 mixture Substances 0.000 claims description 32
- 150000002431 hydrogen Chemical class 0.000 claims description 30
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 29
- 125000000623 heterocyclic group Chemical group 0.000 claims description 22
- 125000003118 aryl group Chemical group 0.000 claims description 21
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical group N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 20
- 229910052786 argon Inorganic materials 0.000 claims description 18
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- 125000004122 cyclic group Chemical group 0.000 claims description 17
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 claims description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 14
- 229910052734 helium Inorganic materials 0.000 claims description 14
- 239000001307 helium Substances 0.000 claims description 14
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 14
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 14
- 125000003277 amino group Chemical group 0.000 claims description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 12
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 11
- 229910021529 ammonia Inorganic materials 0.000 claims description 10
- 229920006395 saturated elastomer Polymers 0.000 claims description 9
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- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 8
- 150000001412 amines Chemical class 0.000 claims description 8
- 238000011065 in-situ storage Methods 0.000 claims description 7
- QDHPGTZMLYAEQK-UHFFFAOYSA-N CN([Si]1(N([SiH](N([SiH](N1C)C)C)C)C)C)C Chemical compound CN([Si]1(N([SiH](N([SiH](N1C)C)C)C)C)C)C QDHPGTZMLYAEQK-UHFFFAOYSA-N 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 5
- 239000001569 carbon dioxide Substances 0.000 claims description 4
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 71
- 238000000231 atomic layer deposition Methods 0.000 description 67
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- 238000005229 chemical vapour deposition Methods 0.000 description 19
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 17
- -1 Me SiNHBu -iso Chemical class 0.000 description 16
- 239000002904 solvent Substances 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 14
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- 230000015572 biosynthetic process Effects 0.000 description 12
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 12
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 235000012239 silicon dioxide Nutrition 0.000 description 11
- GIRKRMUMWJFNRI-UHFFFAOYSA-N tris(dimethylamino)silicon Chemical compound CN(C)[Si](N(C)C)N(C)C GIRKRMUMWJFNRI-UHFFFAOYSA-N 0.000 description 11
- 238000005137 deposition process Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
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- 125000004432 carbon atom Chemical group C* 0.000 description 8
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- 239000000376 reactant Substances 0.000 description 8
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- 229910052682 stishovite Inorganic materials 0.000 description 8
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- 238000000137 annealing Methods 0.000 description 7
- 238000009835 boiling Methods 0.000 description 7
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- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 6
- WGGNJZRNHUJNEM-UHFFFAOYSA-N 2,2,4,4,6,6-hexamethyl-1,3,5,2,4,6-triazatrisilinane Chemical class C[Si]1(C)N[Si](C)(C)N[Si](C)(C)N1 WGGNJZRNHUJNEM-UHFFFAOYSA-N 0.000 description 6
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 6
- 238000005292 vacuum distillation Methods 0.000 description 6
- GROANKXMOZJKJE-UHFFFAOYSA-N CN(C)C[SiH2]N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C Chemical compound CN(C)C[SiH2]N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C GROANKXMOZJKJE-UHFFFAOYSA-N 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 5
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- 238000012545 processing Methods 0.000 description 5
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 4
- NMPXXBPOGNNTOE-UHFFFAOYSA-N 2,2,4,4,5,6,6-heptamethyl-1,3,5,2,4,6-dioxazatrisilinane Chemical compound CN1[Si](C)(C)O[Si](C)(C)O[Si]1(C)C NMPXXBPOGNNTOE-UHFFFAOYSA-N 0.000 description 4
- FEPZDAAIFYPBKO-UHFFFAOYSA-N C(C)(C)N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C Chemical compound C(C)(C)N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C FEPZDAAIFYPBKO-UHFFFAOYSA-N 0.000 description 4
- WEYVHQGAZVAAAE-UHFFFAOYSA-N C(C)(C)N[SiH2]N1[Si](N[Si](N[Si]1(C)C)(C)C)(C)C Chemical group C(C)(C)N[SiH2]N1[Si](N[Si](N[Si]1(C)C)(C)C)(C)C WEYVHQGAZVAAAE-UHFFFAOYSA-N 0.000 description 4
- 125000000041 C6-C10 aryl group Chemical group 0.000 description 4
- FQPGSQHEOFSTSA-UHFFFAOYSA-N CN(C)C[SiH2]N1[Si](N[Si](N[Si]1(C)C)(C)C)(C)C Chemical compound CN(C)C[SiH2]N1[Si](N[Si](N[Si]1(C)C)(C)C)(C)C FQPGSQHEOFSTSA-UHFFFAOYSA-N 0.000 description 4
- YTABYZBIAHPQFL-UHFFFAOYSA-N CN(C)[SiH2]N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C Chemical compound CN(C)[SiH2]N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C YTABYZBIAHPQFL-UHFFFAOYSA-N 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
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- FIRQYUPQXNPTKO-UHFFFAOYSA-N ctk0i2755 Chemical class N[SiH2]N FIRQYUPQXNPTKO-UHFFFAOYSA-N 0.000 description 4
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- 125000000524 functional group Chemical group 0.000 description 4
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
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- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 125000006413 ring segment Chemical group 0.000 description 4
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 3
- RMFRFTSSEHRKKW-UHFFFAOYSA-N 1,2-bis(diisopropylphosphino)ethane Chemical compound CC(C)P(C(C)C)CCP(C(C)C)C(C)C RMFRFTSSEHRKKW-UHFFFAOYSA-N 0.000 description 3
- LISDBLOKKWTHNH-UHFFFAOYSA-N 1,3,5-trisilinane Chemical compound C1[SiH2]C[SiH2]C[SiH2]1 LISDBLOKKWTHNH-UHFFFAOYSA-N 0.000 description 3
- QXSLCFLPDKRHCE-UHFFFAOYSA-N C(CC)N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C Chemical compound C(CC)N1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C QXSLCFLPDKRHCE-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
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- 241000894007 species Species 0.000 description 3
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- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
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- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- VUBLMKVEIPBYME-UHFFFAOYSA-N carbon monoxide;osmium Chemical group [Os].[Os].[Os].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] VUBLMKVEIPBYME-UHFFFAOYSA-N 0.000 description 1
- SZQABOJVTZVBHE-UHFFFAOYSA-N carbon monoxide;rhodium Chemical group [Rh].[Rh].[Rh].[Rh].[Rh].[Rh].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] SZQABOJVTZVBHE-UHFFFAOYSA-N 0.000 description 1
- IETKMTGYQIVLRF-UHFFFAOYSA-N carbon monoxide;rhodium;triphenylphosphane Chemical compound [Rh].[O+]#[C-].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 IETKMTGYQIVLRF-UHFFFAOYSA-N 0.000 description 1
- NQZFAUXPNWSLBI-UHFFFAOYSA-N carbon monoxide;ruthenium Chemical group [Ru].[Ru].[Ru].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] NQZFAUXPNWSLBI-UHFFFAOYSA-N 0.000 description 1
- FQNHWXHRAUXLFU-UHFFFAOYSA-N carbon monoxide;tungsten Chemical group [W].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] FQNHWXHRAUXLFU-UHFFFAOYSA-N 0.000 description 1
- FERQZYSWBVOPNX-UHFFFAOYSA-N carbonyl dichloride;rhodium;triphenylphosphane Chemical compound [Rh].ClC(Cl)=O.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 FERQZYSWBVOPNX-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 125000004803 chlorobenzyl group Chemical group 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 238000004939 coking Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- GWFAVIIMQDUCRA-UHFFFAOYSA-L copper(ii) fluoride Chemical compound [F-].[F-].[Cu+2] GWFAVIIMQDUCRA-UHFFFAOYSA-L 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- JAGHDVYKBYUAFD-UHFFFAOYSA-L cyclopenta-1,3-diene;titanium(4+);dichloride Chemical compound [Cl-].[Cl-].[Ti+4].C1C=CC=[C-]1.C1C=CC=[C-]1 JAGHDVYKBYUAFD-UHFFFAOYSA-L 0.000 description 1
- UVMKWDWODUTHAV-UHFFFAOYSA-N cyclopentane;titanium(2+) Chemical compound [Ti+2].[CH]1[CH][CH][CH][CH]1.[CH]1[CH][CH][CH][CH]1 UVMKWDWODUTHAV-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- MQIKJSYMMJWAMP-UHFFFAOYSA-N dicobalt octacarbonyl Chemical group [Co+2].[Co+2].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] MQIKJSYMMJWAMP-UHFFFAOYSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- QFEOTYVTTQCYAZ-UHFFFAOYSA-N dimanganese decacarbonyl Chemical group [Mn].[Mn].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] QFEOTYVTTQCYAZ-UHFFFAOYSA-N 0.000 description 1
- ZIZHEHXAMPQGEK-UHFFFAOYSA-N dirhenium decacarbonyl Chemical group [Re].[Re].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] ZIZHEHXAMPQGEK-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000013628 high molecular weight specie Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- JCYWCSGERIELPG-UHFFFAOYSA-N imes Chemical group CC1=CC(C)=CC(C)=C1N1C=CN(C=2C(=CC(C)=CC=2C)C)[C]1 JCYWCSGERIELPG-UHFFFAOYSA-N 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- OWKFQWAGPHVFRF-UHFFFAOYSA-N n-(diethylaminosilyl)-n-ethylethanamine Chemical compound CCN(CC)[SiH2]N(CC)CC OWKFQWAGPHVFRF-UHFFFAOYSA-N 0.000 description 1
- VYIRVGYSUZPNLF-UHFFFAOYSA-N n-(tert-butylamino)silyl-2-methylpropan-2-amine Chemical compound CC(C)(C)N[SiH2]NC(C)(C)C VYIRVGYSUZPNLF-UHFFFAOYSA-N 0.000 description 1
- SSCVMVQLICADPI-UHFFFAOYSA-N n-methyl-n-[tris(dimethylamino)silyl]methanamine Chemical compound CN(C)[Si](N(C)C)(N(C)C)N(C)C SSCVMVQLICADPI-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000005244 neohexyl group Chemical group [H]C([H])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- BMGNSKKZFQMGDH-FDGPNNRMSA-L nickel(2+);(z)-4-oxopent-2-en-2-olate Chemical compound [Ni+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O BMGNSKKZFQMGDH-FDGPNNRMSA-L 0.000 description 1
- AIYYMMQIMJOTBM-UHFFFAOYSA-L nickel(ii) acetate Chemical compound [Ni+2].CC([O-])=O.CC([O-])=O AIYYMMQIMJOTBM-UHFFFAOYSA-L 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- ZCYXXKJEDCHMGH-UHFFFAOYSA-N nonane Chemical compound CCCC[CH]CCCC ZCYXXKJEDCHMGH-UHFFFAOYSA-N 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N normal nonane Natural products CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- LXNAVEXFUKBNMK-UHFFFAOYSA-N palladium(II) acetate Substances [Pd].CC(O)=O.CC(O)=O LXNAVEXFUKBNMK-UHFFFAOYSA-N 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- HNNUTDROYPGBMR-UHFFFAOYSA-L palladium(ii) iodide Chemical compound [Pd+2].[I-].[I-] HNNUTDROYPGBMR-UHFFFAOYSA-L 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- RJQWVEJVXWLMRE-UHFFFAOYSA-N platinum;tritert-butylphosphane Chemical compound [Pt].CC(C)(C)P(C(C)(C)C)C(C)(C)C.CC(C)(C)P(C(C)(C)C)C(C)(C)C RJQWVEJVXWLMRE-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- SNOOUWRIMMFWNE-UHFFFAOYSA-M sodium;6-[(3,4,5-trimethoxybenzoyl)amino]hexanoate Chemical compound [Na+].COC1=CC(C(=O)NCCCCCC([O-])=O)=CC(OC)=C1OC SNOOUWRIMMFWNE-UHFFFAOYSA-M 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003510 tertiary aliphatic amines Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 1
- JYTZMGROHNUACI-UHFFFAOYSA-N tris(ethenyl)-methoxysilane Chemical compound CO[Si](C=C)(C=C)C=C JYTZMGROHNUACI-UHFFFAOYSA-N 0.000 description 1
- OBAJXDYVZBHCGT-UHFFFAOYSA-N tris(pentafluorophenyl)borane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1B(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F OBAJXDYVZBHCGT-UHFFFAOYSA-N 0.000 description 1
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 239000011995 wilkinson's catalyst Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- QMBQEXOLIRBNPN-UHFFFAOYSA-L zirconocene dichloride Chemical compound [Cl-].[Cl-].[Zr+4].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 QMBQEXOLIRBNPN-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02219—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and nitrogen
- H01L21/02222—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and nitrogen the compound being a silazane
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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Description
本出願は、合衆国法典第119条(e)に基づいて、2017年5月24日に出願された米国仮特許出願第62/510,506号への優先権を主張し、その全体は参照することにより本明細書に組み込まれる。
I. R1R2 mSi(NR3R4)nXp
式中、R1、R2、及びR3は、それぞれ独立して、水素、直鎖又は分岐鎖C1~C10アルキル基、及びC6~C10アリール基から選択され;R4は、直鎖又は分岐鎖C1~C10アルキル基、C6~C10アリール基、C3~C10アルキルシリル基から選択され;
式中、R3とR4は連結して環構造を形成するか、またはR3とR4は連結して環構造を形成することはなく;Xは、Cl、Br、及びIからなる群から選択されるハロゲン化物であり;mは0~3であり;nは0~2であり;pは0から2であり、そしてm+n+p=3である、ならびに、
II. R1R2 mSi(OR3)n(OR4)qXp
式中、R1及びR2は、それぞれ独立して、水素、直鎖又は分岐鎖C1~C10アルキル基、及びC6~C10アリール基から選択され;R3及びR4は、それぞれ独立して、直鎖又は分岐鎖C1~C10アルキル基、及びC6~C10アリール基から選択され;
式中、R3とR4は連結して環構造を形成するか、またはR3とR4は連結して環構造を形成することはなく;Xは、Cl、Br、及びIからなる群から選択されるハロゲン原子であり;mは0~3であり;nは0~2であり;qは0~2あり;pは0~2あり、そしてm+n+q+p=3である。
R1-3は、それぞれ独立して、水素、メチル、及び有機アミノ基(NR’R’’)からなる群から選択され、ここで、R’とR’’は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ない;R4とR5は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択される;R6-8は、それぞれ独立して、水素、メチル、上記で定義した有機アミノ基(NR’R’’)、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ず、ここで、置換基R1-8、R’、及びR’’の2つ以上は結合して、置換もしくは非置換、飽和又は不飽和の環状基を形成してもよい;そして、ここで、R6-8の少なくとも1つは水素でなければならず、及びR6-8の少なくとも2つはメチルであってはならない。
基板を反応器内に提供する工程;
式A、B、C、D、又はEの1つの少なくとも1種のケイ素前駆体化合物を含む少なくとも1種のケイ素前駆体化合物を、反応器内に導入する工程:
R1-3は、それぞれ独立して、水素、メチル、及び有機アミノ基(NR’R’’)からなる群から選択され、ここで、R’とR’’は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ない;R4とR5は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択される;R6-8は、それぞれ独立して、水素、メチル、上記で定義した有機アミノ基(NR’R’’)、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ず、ここで、置換基R1-8、R’、及びR’’の2つ以上は結合して、置換もしくは非置換、飽和又は不飽和の環状基を形成してもよい;そして、ここで、R6-8の少なくとも1つは水素でなければならず、及びR6-8の少なくとも2つはメチルであってはならない;
反応器をパージガスでパージする工程;
酸素含有供給源又は窒素含有供給源(又はこれらの組み合わせ)を反応器内に導入する工程;ならびに、
反応器を前記パージガスでパージする工程;
上記の工程は、所望の厚さの膜が堆積されるまでが繰り返される、そして、
本方法は、約25℃~600℃の範囲の1つ以上の温度で実施される。
R1-3は、それぞれ独立して、水素、メチル、及び有機アミノ基(NR’R’’)からなる群から選択され、ここで、R’とR’’は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ない;R4とR5は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択される;R6-8は、それぞれ独立して、水素、メチル、上記で定義した有機アミノ基(NR’R’’)、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ず、置換基R1-8、R’、及びR’’の2つ以上は結合して、置換もしくは非置換、飽和又は不飽和の環状基を形成してもよく、R6-8の少なくとも1つは水素でなければならず、R6-8の少なくとも2つはメチルであってはならない。
a.反応器内に基板を提供する工程と、
b.上記で規定された式A~Eを有する少なくとも1種のケイ素前駆体を反応器内に導入する工程と、
c.反応器をパージガスでパージする工程と、
d.プラズマを含む酸素含有供給源を反応器内に導入する工程と、そして
e.反応器をパージガスでパージする工程。
a.反応器内に基板を提供する工程と、
b.上記の式A~Eを有する少なくとも1種のケイ素前駆体を反応器内に導入する工程と、
c.反応器をパージガスでパージして、吸収されていない前駆体の少なくとも一部を除去する工程と、
d.酸素含有プラズマ供給源を反応器内に導入する工程と、
e.反応器をパージガスでパージして、未反応の酸素供給源の少なくとも一部を除去する工程と、を含み、
ここで、所望の厚さのケイ素含有膜が堆積されるまで工程b~eが繰り返される。
a.反応器内に基板を提供する工程と、
b.上記で規定された式A~Eで表される構造を有する少なくとも1種のケイ素前駆体化合物から生成された蒸気を、酸素供給源の共流有り又はなしで、加熱された基板上に前駆体を化学的に吸収させるように接触させる工程と、
c.吸収されなかった前駆体を全てパージ除去する工程と、
d.加熱された基板に酸素供給源を導入して、吸収された前駆体と反応させる工程と、
e.未反応の酸素供給源をパージ除去する工程、であり、
ここで、所望の厚さが達成されるまで工程b~eが繰り返される。
a.反応器内に基板を提供する工程と、
b.上記の式A~Eを有する少なくとも1種のケイ素前駆体を反応器内に導入する工程と、
c.反応器をパージガスでパージして、吸収されていない前駆体の少なくとも一部を除去する工程と、
d.窒素含有プラズマ供給源を反応器内に導入する工程と、
e.反応器をパージガスでパージして、未反応の窒素供給源の少なくとも一部を除去する工程と、を含み、
ここで、所望の厚さのケイ素含有膜が堆積されるまで工程b~eが繰り返される。
a.反応器内に基板を提供する工程と、
b.上記で規定された式A~Eで示される構造を有する少なくとも1種のケイ素前駆体化合物から生成される蒸気を、窒素供給源の共流有り又はなしで、加熱された基板に前駆体を化学的に吸収させるように接触させる工程と、
c.吸収されていない前駆体をパージして除去する工程と、
d.加熱した基板に窒素含有プラズマ供給源を導入して、吸収された前駆体と反応させる工程と、
e.未反応の窒素供給源をパージ除去する工程と、であり
ここで、所望の厚さが堆積されるまで工程b~eが繰り返される。
表面フィーチャを備えた基板を反応器内に配置する工程であって、この基板は約-20℃~約400℃の範囲の1つ以上の温度に維持され、反応器の圧力は100トール以下に維持される工程と、
式A~Eからなる群から選択される少なくとも1種の化合物を導入する工程と、
酸素供給源を反応器に供給して、少なくとも1種の化合物と反応させて膜を形成し、表面フィーチャの少なくとも一部を被覆させる工程と、
約100℃~1000℃の範囲の1つ以上の温度でこの膜をアニールして、表面フィーチャの少なくとも一部をコーティングする工程と、
酸素供給源を用いて基板を約20℃~約1000℃の範囲の1つ以上の温度で処理して、表面フィーチャの少なくとも一部の上にケイ素含有膜を形成させる工程と、を含む。
表面フィーチャを備えた基板を反応器内に配置する工程であって、基板は約-20℃~約400℃の範囲の1つ以上の温度に維持され、反応器の圧力は100トール以下に維持される工程と、
式A~Eからなる群から選択される少なくとも1種の化合物を導入する工程と、
窒素供給源を反応器に供給して、少なくとも1種の化合物と反応させて膜を形成し、表面フィーチャの少なくとも一部を被覆させる工程と、
約100℃~1000℃の範囲の1つ以上の温度でこの膜をアニールして、表面フィーチャの少なくとも一部をコーティングする工程と、
酸素供給源を用いて基板を約20℃~約1000℃の範囲の1つ以上の温度で処理して、表面フィーチャの少なくとも一部の上にケイ素含有膜を形成する工程と、を含む。
丸底フラスコ中で、1-メチルシリル-2,2,4,4,6,6-ヘキサメチルシクロトリシラザンをTHF溶媒中のジメチルアミンと混合する。攪拌しながら、1モル%のRu3(CO)12触媒を加える。反応混合物を室温で1日間撹拌し、その間、H2ガス副産物を排出させる。反応混合物を真空蒸留により精製して、1-(ジメチルアミノメチルシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザンを得る。
1リットルの丸底フラスコ中で攪拌中の1,2,3,4,5,6-ヘキサメチルシクロトリシラザン(200g、0.91mmol)とRu3(CO)12触媒(1.45g、0.00227mol)の混合物に、ジメチルアミン(THF中の2.0M溶液230mL、0.46mol)を3回に分けて6時間かけて添加した。反応混合物を室温で1日間撹拌し、その間H2ガス副産物を排出させた。揮発性物質を、-78℃に冷却した受け器フラスコを備えたフラスコ-ツー-フラスコ装置で真空移送した。凝縮した揮発物を真空蒸留により精製して、2-ジメチルアミノ-1,2,3,4,5,6-ヘキサメチルシクロトリシラザンを得た。GC-MSは次のピークを示した:262(M+)、247(M-15)、231、218、202、189、175、159、145、131、118、102、88、72。
2,2,4,4,6,6-ヘキサメチルシクロトリシラザンを、ヘキサン溶媒中の3当量のトリエチルアミンと混合し、-50℃に冷却する。次に3等量のモノクロロシランを、-50℃で攪拌しながら反応容器中でゆっくり凝縮させる。得られるスラリーを、撹拌しながら室温までゆっくり温める。固形物をろ過によって除去し、溶媒及び他の低沸点物を減圧下で除去する。粗生成物を真空蒸留により精製して、1,2,3-トリシリル-2,2,4,4,6,6-ヘキサメチルシクロトリシラザンを得る。
1,1,1,2,3,3,3-ヘプタメチルジシラザンを、触媒量のピリジンの存在下で、1当量の1,5-ジクロロ-1,1,3,3,5,5-ヘキサメチルトリシロキサンと混合する。GC分析により反応が完了したと判断した後、粗反応混合物を真空蒸留により精製して、2,2,4,4,5,6,6-ヘプタメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサンを得る。
ジメチルアミンを、THF中の2.0M溶液として、5-シリル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン及び0.1mol%のRu3(CO)12触媒の攪拌された混合物に加える。混合物を室温で1日間攪拌し、H2ガス副産物を排出させる。反応混合物を真空蒸留により精製して、5-(ジメチルアミノシリル)-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサンを得る。
ペンタン(5mL)中の1,5-ジクロロ-1,1,3,3,5,5-ヘキサメチルトリシロキサン(0.5g、0.0018mol)の溶液を、ペンタン(4mL)中のイソプロピルアミン(0.40g、0.0068mol)の攪拌された溶液に滴下した。得られた白色スラリーを一晩攪拌した。固形物を濾過により除去し、得られた濾液はGC-MS分析により、5-イソプロピル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサンを生成物の1つとして含むと決定された。GC-MSは次のピークを示した:262(M+)、248、234、218、207、193、177、160、147、133、119、110、96、88、73。
ヘキサン(4mL)中のn-プロピルアミン(0.30g、0.0051mol)の溶液を、ヘキサン(4mL)中の5-ジクロロ-1,1,3,3,5,5-ヘキサメチルトリシロキサン(0.5g、0.0018mol)及びトリエチルアミン(0.40g、0.0020mol)の攪拌された混合物に滴下した。得られたスラリーを一晩攪拌した。固形物を濾過により除去し、得られた濾液はGC-MSにより、5-n-プロピル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサンを生成物の1つとして含むと決定した。GC-MSは次のピークを示した:262(M+)、248、234、218、207、193、177、160、147、133、119、110、96、88、73。
窒素雰囲気の保護下で、116mLのブチルリチウム溶液(ヘキサン中2.5M、0.29mol)を、ヘキサン(140mL)中の2,2,4,4,6,6-ヘキサメチルシクロトリシラザン(66g、0.30mol)の撹拌された溶液に-30℃で滴下した。添加が完了した後に、反応物を室温まで温め、2時間撹拌した。次に、得られた反応混合物を-30℃に冷却した。この混合物に、(ジイソプロピルアミノ)クロロシラン(48g、0.29mol)を、滴下漏斗を介して-30℃で滴下した。反応混合物を撹拌しながら室温まで温めた。濾過により白色固体を除去し、溶媒を減圧下で除去した。粗生成物を真空蒸留により精製して、所望の生成物、1-(ジイソプロピルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザンを得た。GC-MSは次のピークを示した:349(M+)、334(M-15)、318、306、292、276、248、234、218、203、188、175、159、142、130、116、100、86、73。
更なる官能化シクロシラザン前駆体化合物を実施例8と同様の方法で調製し、GC-MSにより特性解析した。各化合物の分子量(MW)、構造、及び対応する主要なMS断片化ピークを表3に示して、その同定を裏付ける。
ケイ素前駆体としてHMDSZを使用して、酸化ケイ素膜の原子層堆積を行った。堆積は、実験室規模のALD処理装置で実施した。ケイ素前駆体は、蒸気を引くことによりチャンバに送った。堆積プロセスとパラメータを表2に示す。工程1~6は、所望の厚さに達するまでサイクルを何度も繰り返した。堆積のプロセスパラメータと結果を表4に示す。
表5に示す条件下で、ケイ素前駆体としてのHMDSZ及びO2プラズマを用いて堆積を実施した。HMDSZは、100sccmのArキャリアガスによってチャンバに送られた。工程b~eを何度も繰り返して、計測用の望ましい厚さの酸化ケイ素を得た。膜の堆積のパラメータと堆積のGPC及びウエハの均一性を表6に示す。堆積ウエハは、均一性が悪く、GPCが非常に低いことを示している。
ケイ素前駆体として2,2,4,4,6,6-ヘキサメチルシコトリシラザンを使用して、酸化ケイ素膜の原子層堆積を実施した。堆積は、実験室規模のALD処理装置で実施した。ケイ素前駆体は、蒸気を引くことによりチャンバに送った。堆積プロセスとパラメータを表2に示す。工程1~6は、所望の厚さに達するまでサイクルを何度も繰り返した。堆積のプロセスパラメータと結果を表7に示す。
表8に示した条件下で、ケイ素前駆体としての2,2,4,4,6,6-ヘキサメチルシコトリシラザン及びO2プラズマを用いて堆積を実施した。前駆体は、200sccmのキャリアガスAr流でチャンバに送られた。工程b~eを何度も繰り返して、計測用の望ましい厚さの酸化ケイ素を得た。膜の堆積のパラメータと堆積のGPCを表9に示す。GPCは、8秒以上の前駆体パルスで飽和を示していることがわかる。
表8に示した条件下で、ケイ素前駆体としての1,2,3,4,5,6-ヘキサメチルシコトリシラザン及びO2プラズマを用いて堆積を実施した。前駆体は、200sccmのキャリアガスAr流でチャンバに送られた。工程b~eを何度も繰り返して、計測用の望ましい厚さの酸化ケイ素を得た。膜の堆積のパラメータと堆積のGPCを表10に示す。
表8に示した条件下で、ケイ素前駆体としての1-ジメチルアミノ-1,2,3,4,5,6-ヘキサメチルシコトリシラザン及びO2プラズマを用いて堆積を実施した。前駆体は、200sccmのキャリアガスAr流でチャンバに送られた。工程b~eを何度も繰り返して、計測用の望ましい厚さの酸化ケイ素を得た。膜の堆積のパラメータと堆積のGPCを表11に示す。
ケイ素前駆体としての1-ジメチルアミノ-1,2,3,4,5,6-ヘキサメチルシクロトリシラザン及びAr/N2プラズマを用いて、ケイ素含有膜を堆積した。ケイ素前駆体は、100sccmのArキャリアガスを使用して55℃に保持された容器から送られた。サセプタの温度を300℃に設定し、反応器には平行板のインサイチュ電極が装備された。プラズマ周波数と出力は、それぞれ13.56MHzと200Wであった。堆積プロセス工程を表12に記載されているように実施し、工程b~eを何度も繰り返して、計測用の所望の厚さの酸化ケイ素を得た。
結果として得られた堆積された膜は、GPCが0.24A/サイクルで屈折率が1.97であった。
本発明は、以下の態様を含んでいる。
(1)以下の式A、B、C、D、又はEの1種のケイ素前駆体化合物であって、
R 1-3 は、それぞれ独立して、水素、メチル、及び有機アミノ基(NR’R’’)からなる群から選択され、ここで、R’とR’’は、それぞれ独立して、水素、C 1-10 直鎖アルキル基、C 3-10 分岐アルキル基、C 3-10 環状アルキル基、C 2-10 アルケニル基、C 4-10 アリール基、及びC 4-10 複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ない;
R 4 とR 5 は、それぞれ独立して、水素、C 1-10 直鎖アルキル基、C 3-10 分岐アルキル基、C 3-10 環状アルキル基、C 2-10 アルケニル基、C 4-10 アリール基、及びC 4-10 複素環基からなる群から選択される;
R 6-8 は、それぞれ独立して、水素、メチル、上記で規定した有機アミノ基(NR’R’’)、C 3-10 分岐アルキル基、C 3-10 環状アルキル基、C 2-10 アルケニル基、C 4-10 アリール基、及びC 4-10 複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ず、
ここで、置換基R 1-8 、R’、及びR’’の2つ以上は結合して、置換もしくは非置換の飽和又は不飽和の環状基を形成してもよい;そして、
ここで、R 6-8 の少なくとも1つは水素でなければならず、及びR 6-8 の少なくとも2つはメチルであってはならない、
ケイ素前駆体化合物。
(2)少なくとも1種のパージガスを更に含む、(1)に記載の組成物。
(3)式A~Eの1つから選択される前記少なくとも1種のケイ素前駆体化合物が、1-シリル-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(イソプロピルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(ジメチルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(イソプロピルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(メチルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(ジメチルアミノメチルシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、2-ジメチルアミノ-1,2,3,4,5,6-ヘキサメチルシクロトリシラザン、1-(ジメチルアミノ-メチルシリル)-2,4,6-トリメチルシクロトリシラザン、1,2,3-トリシリル-2、2,4,4,6,6-ヘキサメチルシクロトリシラザン、1,2,3-トリシリル-2,4,6-トリメチルシクロトリシラザン、2,2,4,4,5,6,6-ヘプタメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-エチル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-n-プロピル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-イソプロピル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-シリル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-メチルシリル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2、4,6-トリシラシクロヘキサン、5-(ジメチルアミノシリル)-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-(ジメチルアミノメチルシリル)-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサンからなる群から選択される少なくとも1つを含む、(1)に記載の組成物。
(4)以下の式B、C、又はEの1つから選択される少なくとも1種のケイ素前駆体化合物を含む組成物であって、
R 1-3 は、それぞれ独立して、水素、メチル、及び有機アミノ基(NR’R’’)からなる群から選択され、ここで、R’とR’’は、それぞれ独立して、水素、C 1-10 直鎖アルキル基、C 3-10 分岐アルキル基、C 3-10 環状アルキル基、C 2-10 アルケニル基、C 4-10 アリール基、及びC 4-10 複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ない;
R 4 とR 5 は、それぞれ独立して、水素、C 1-10 直鎖アルキル基、C 3-10 分岐アルキル基、C 3-10 環状アルキル基、C 2-10 アルケニル基、C 4-10 アリール基、及びC 4-10 複素環基からなる群から選択される;
R 6-8 は、それぞれ独立して、水素、メチル、上記で規定した有機アミノ基(NR’R’’)、C 3-10 分岐アルキル基、C 3-10 環状アルキル基、C 2-10 アルケニル基、C 4-10 アリール基、及びC 4-10 複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ない;
置換基R 1-8 、R’、及びR’’の2つ以上は結合して、置換もしくは非置換の飽和又は不飽和の環状基を形成してもよい;そして
R 6-8 の少なくとも1つは水素でなければならず、R 6-8 の少なくとも2つはメチルであってはならない、
組成物。
(5)ケイ素含有膜を基板上に堆積させる方法であって、
a)反応器内に基板を提供する工程と、
b)(1)に記載の少なくとも1種のケイ素前駆体化合物を反応器内に導入する工程と、
c)反応器をパージガスでパージする工程と、
d)酸素含有又は窒素含有供給源(又はこれらの組合せ)を反応器内に導入する工程と、
e)反応器をパージガスでパージする工程と、を含み、
ここで、工程b~eは、所望の厚さの膜が堆積されるまで繰り返され、そして
前記方法は、約25℃~600℃の範囲の1つ以上の温度で実施される、
方法。
(6)前記少なくとも1種のケイ素前駆体化合物が、2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-シリル-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(イソプロピルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(ジメチルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(イソプロピルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(メチルアミノシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1-(ジメチルアミノメチルシリル)-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1,2,3,4,5,6-ヘキサメチルシクロトリシラザン、2-ジメチルアミノ-1,2,3,4,5,6-ヘキサメチルシクロトリシラザン、1-(ジメチルアミノ-メチルシリル)-2,4,6-トリメチルシクロトリシラザン、1,2,3-トリシリル-2,2,4,4,6,6-ヘキサメチルシクロトリシラザン、1,2,3-トリシリル-2,4,6-トリメチルシクロトリシラザン、2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、2,2,4,4,5,6,6-ヘプタメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-エチル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-n-プロピル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-イソプロピル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-シリル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-メチルシリル-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-(ジメチルアミノシリル)-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサン、5-(ジメチルアミノメチルシリル)-2,2,4,4,6,6-ヘキサメチル-1,3-ジオキサ-5-アザ-2,4,6-トリシラシクロヘキサンからなる群から選択される、(5)に記載の方法。
(7)前記酸素含有供給源が、オゾン、酸素プラズマ、酸素とアルゴンを含むプラズマ、酸素とヘリウムを含むプラズマ、オゾンプラズマ、水プラズマ、亜酸化窒素プラズマ、二酸化炭素プラズマ、及びこれらの組み合わせからなる群から選択される、(5)に記載の方法。
(8)前記窒素含有供給源が、アンモニア、ヒドラジン、モノアルキルヒドラジン、ジアルキルヒドラジン、窒素、窒素/水素、窒素/アルゴンプラズマ、窒素/ヘリウムプラズマ、アンモニアプラズマ、窒素プラズマ、窒素/水素プラズマ、有機アミン、例えばtert-ブチルアミン、ジメチルアミン、ジエチルアミン、イソプロピルアミン、ジエチルアミンプラズマ、ジメチルアミンプラズマ、トリメチルプラズマ、トリメチルアミンプラズマ、エチレンジアミンプラズマ、及びアルコキシアミン、例えばエタノールアミンプラズマ、及びこれらの混合物からなる群から選択される、(5)に記載の方法。
(9)前記酸素含有供給源及び/又は前記窒素含有供給源がプラズマを含む、(5)に記載の方法。
(10)前記プラズマがインサイチュで発生される、(9)に記載の方法。
(11)前記プラズマが遠隔的に発生される、(9)に記載の方法。
(12)前記膜の密度が約2.1g/cc以上である、(5)に記載の方法。
(13)前記膜が更に炭素を含む、(5)に記載の方法。
(14)前記膜の密度が約1.8g/cc以上である、(5)に記載の方法。
(15)前記膜の炭素含有量が、X線光分光法により測定すると0.5原子重量%(at.%)以上である、(5)に記載の方法。
(16)(5)に記載の方法により形成された膜。
(17)(9)に記載の方法により形成された膜。
Claims (10)
- 以下の式Aのケイ素前駆体化合物であって、
R1-3は、それぞれ独立して、水素、メチル、及び有機アミノ基(NR’R’’)からなる群から選択され、ここで、R’とR’’は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択されるが、但し、R’とR’’の両方が水素ではあり得ず、式A中のR1-3の少なくとも1つは上記の有機アミノ基である;
R4とR5は、それぞれ独立して、水素、C1-10直鎖アルキル基、C3-10分岐アルキル基、C3-10環状アルキル基、C2-10アルケニル基、C4-10アリール基、及びC4-10複素環基からなる群から選択される;
ここで、置換基R1-5、R’、及びR’’の2つ以上は結合して、置換もしくは非置換の飽和又は不飽和の環状基を形成してもよい;
ケイ素前駆体化合物。 - 式Aの少なくとも1種のケイ素前駆体化合物が、2-ジメチルアミノ-1,2,3,4,5,6-ヘキサメチルシクロトリシラザンを含む、請求項1に記載のケイ素前駆体化合物。
- ケイ素含有膜を基板上に堆積させる方法であって、
a)反応器内に基板を提供する工程と、
b)請求項1に記載の少なくとも1種のケイ素前駆体化合物を反応器内に導入する工程と、
c)反応器をパージガスでパージする工程と、
d)酸素含有又は窒素含有供給源(又はこれらの組合せ)を反応器内に導入する工程と、
e)反応器をパージガスでパージする工程と、を含み、
ここで、工程b~eは、所望の厚さの膜が堆積されるまで繰り返され、そして
前記方法は、25℃~600℃の範囲の1つ以上の温度で実施される、
方法。 - 前記少なくとも1種のケイ素前駆体化合物が、2-ジメチルアミノ-1,2,3,4,5,6-ヘキサメチルシクロトリシラザンである、請求項3に記載の方法。
- 前記酸素含有供給源が、オゾン、酸素プラズマ、酸素とアルゴンを含むプラズマ、酸素とヘリウムを含むプラズマ、オゾンプラズマ、水プラズマ、亜酸化窒素プラズマ、二酸化炭素プラズマ、及びこれらの組み合わせからなる群から選択される、請求項3に記載の方法。
- 前記窒素含有供給源が、アンモニア、ヒドラジン、モノアルキルヒドラジン、ジアルキルヒドラジン、窒素、窒素/水素、窒素/アルゴンプラズマ、窒素/ヘリウムプラズマ、アンモニアプラズマ、窒素プラズマ、窒素/水素プラズマ、有機アミン、及びこれらの混合物からなる群から選択される、請求項3に記載の方法。
- 前記酸素含有供給源及び/又は前記窒素含有供給源がプラズマを含む、請求項3に記載の方法。
- 前記プラズマがインサイチュで発生される、請求項7に記載の方法。
- 前記プラズマが遠隔的に発生される、請求項7に記載の方法。
- 前記膜が更に炭素を含む、請求項3に記載の方法。
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013236073A (ja) | 2012-04-12 | 2013-11-21 | Air Products & Chemicals Inc | 酸化ケイ素薄膜の高温原子層堆積 |
US20160032452A1 (en) | 2014-08-04 | 2016-02-04 | Veeco Ald Inc. | Atomic Layer Deposition Method Using Source Precursor Transformed by Hydrogen Radical Exposure |
WO2016065219A1 (en) | 2014-10-24 | 2016-04-28 | Air Products And Chemicals, Inc. | Compositions and methods using same for deposition of silicon-containing film |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3444127A (en) | 1967-09-15 | 1969-05-13 | Webb James E | Preparation of ordered poly(arylenesiloxane)polymers |
US4103045A (en) | 1972-07-31 | 1978-07-25 | Rhone-Poulenc, S.A. | Process for improving the adhesion of coatings made of photoresistant polymers to surfaces of inorganic oxides |
US4788309A (en) * | 1985-04-26 | 1988-11-29 | Sri International | Method of forming compounds having Si-N groups and resulting products |
US4719125A (en) * | 1985-10-11 | 1988-01-12 | Allied Corporation | Cyclosilazane polymers as dielectric films in integrated circuit fabrication technology |
US5413813A (en) | 1993-11-23 | 1995-05-09 | Enichem S.P.A. | CVD of silicon-based ceramic materials on internal surface of a reactor |
US5424095A (en) | 1994-03-07 | 1995-06-13 | Eniricerche S.P.A. | Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors |
JPH0827162A (ja) * | 1994-07-12 | 1996-01-30 | Shin Etsu Chem Co Ltd | 環状有機ケイ素化合物の製造方法 |
KR100505668B1 (ko) | 2002-07-08 | 2005-08-03 | 삼성전자주식회사 | 원자층 증착 방법에 의한 실리콘 산화막 형성 방법 |
US7084076B2 (en) | 2003-02-27 | 2006-08-01 | Samsung Electronics, Co., Ltd. | Method for forming silicon dioxide film using siloxane |
US7470450B2 (en) * | 2004-01-23 | 2008-12-30 | Intel Corporation | Forming a silicon nitride film |
US9337054B2 (en) * | 2007-06-28 | 2016-05-10 | Entegris, Inc. | Precursors for silicon dioxide gap fill |
JP5547418B2 (ja) | 2009-03-19 | 2014-07-16 | 株式会社Adeka | 化学気相成長用原料及びこれを用いたシリコン含有薄膜形成方法 |
JP2010275602A (ja) | 2009-05-29 | 2010-12-09 | Adeka Corp | 化学気相成長用原料とこれを用いたシリコン含有薄膜形成方法 |
EP2363512A1 (en) | 2010-02-04 | 2011-09-07 | Air Products And Chemicals, Inc. | Methods to prepare silicon-containing films |
US8460753B2 (en) | 2010-12-09 | 2013-06-11 | Air Products And Chemicals, Inc. | Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes |
US8474164B2 (en) | 2011-03-23 | 2013-07-02 | Tracer Imaging Llc | Checkout divider with optical effect |
US8871656B2 (en) | 2012-03-05 | 2014-10-28 | Applied Materials, Inc. | Flowable films using alternative silicon precursors |
TWI449802B (zh) | 2012-06-06 | 2014-08-21 | Univ Nat Chiao Tung | 掺碳氮化矽薄膜及其製造方法與裝置 |
US10325773B2 (en) | 2012-06-12 | 2019-06-18 | Novellus Systems, Inc. | Conformal deposition of silicon carbide films |
US9245740B2 (en) | 2013-06-07 | 2016-01-26 | Dnf Co., Ltd. | Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same |
TW201522696A (zh) | 2013-11-01 | 2015-06-16 | Applied Materials Inc | 使用遠端電漿cvd技術的低溫氮化矽膜 |
WO2015105337A1 (en) | 2014-01-08 | 2015-07-16 | Dnf Co.,Ltd. | Novel trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same |
WO2015190749A1 (en) | 2014-06-11 | 2015-12-17 | Dnf Co., Ltd. | Novel amino-silyl amine compound and the manufacturing method of dielectric film containing si-n bond by using atomic layer deposition |
SG10201600832VA (en) * | 2015-02-06 | 2016-09-29 | Novellus Systems Inc | Conformal deposition of silicon carbide films |
US9777025B2 (en) | 2015-03-30 | 2017-10-03 | L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
US9793108B2 (en) | 2015-06-25 | 2017-10-17 | Applied Material, Inc. | Interconnect integration for sidewall pore seal and via cleanliness |
-
2018
- 2018-05-22 US US15/986,030 patent/US11177127B2/en active Active
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-
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- 2021-12-14 JP JP2021202314A patent/JP2022033162A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013236073A (ja) | 2012-04-12 | 2013-11-21 | Air Products & Chemicals Inc | 酸化ケイ素薄膜の高温原子層堆積 |
US20160032452A1 (en) | 2014-08-04 | 2016-02-04 | Veeco Ald Inc. | Atomic Layer Deposition Method Using Source Precursor Transformed by Hydrogen Radical Exposure |
WO2016065219A1 (en) | 2014-10-24 | 2016-04-28 | Air Products And Chemicals, Inc. | Compositions and methods using same for deposition of silicon-containing film |
Non-Patent Citations (4)
Title |
---|
Bulletin of the Academy of Science, USSR,1963年,12,1694-1697 |
Macromolecules ,2007年,40,3547-3553 |
Phosphorus, Sulfur, and Silicon,1993年,83,9-20 |
Zhurnal Structurnoj Khimii ,1986年,27,53-60 |
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