JP7190880B2 - 半導体膜の形成方法及び成膜装置 - Google Patents
半導体膜の形成方法及び成膜装置 Download PDFInfo
- Publication number
- JP7190880B2 JP7190880B2 JP2018220608A JP2018220608A JP7190880B2 JP 7190880 B2 JP7190880 B2 JP 7190880B2 JP 2018220608 A JP2018220608 A JP 2018220608A JP 2018220608 A JP2018220608 A JP 2018220608A JP 7190880 B2 JP7190880 B2 JP 7190880B2
- Authority
- JP
- Japan
- Prior art keywords
- forming
- seed layer
- substrate
- semiconductor film
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 84
- 239000004065 semiconductor Substances 0.000 title claims description 36
- 239000007789 gas Substances 0.000 claims description 115
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 54
- 229910052710 silicon Inorganic materials 0.000 claims description 54
- 239000010703 silicon Substances 0.000 claims description 54
- 239000000758 substrate Substances 0.000 claims description 47
- 238000012545 processing Methods 0.000 claims description 39
- 238000010438 heat treatment Methods 0.000 claims description 35
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 7
- 229910000077 silane Inorganic materials 0.000 claims description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- -1 silane hydride Chemical class 0.000 claims description 2
- 230000000087 stabilizing effect Effects 0.000 claims 2
- 239000010408 film Substances 0.000 description 118
- 239000010410 layer Substances 0.000 description 72
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 45
- 229920005591 polysilicon Polymers 0.000 description 45
- 235000012431 wafers Nutrition 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000013078 crystal Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 12
- 230000006641 stabilisation Effects 0.000 description 11
- 238000011105 stabilization Methods 0.000 description 11
- 229910052732 germanium Inorganic materials 0.000 description 10
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 10
- 230000001276 controlling effect Effects 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 238000002425 crystallisation Methods 0.000 description 7
- 230000008025 crystallization Effects 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 3
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000001887 electron backscatter diffraction Methods 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- BIVNKSDKIFWKFA-UHFFFAOYSA-N N-propan-2-yl-N-silylpropan-2-amine Chemical compound CC(C)N([SiH3])C(C)C BIVNKSDKIFWKFA-UHFFFAOYSA-N 0.000 description 2
- 229910003691 SiBr Inorganic materials 0.000 description 2
- GMEFXBFKMIZRMO-UHFFFAOYSA-N aminogermanium Chemical compound [Ge]N GMEFXBFKMIZRMO-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KVEARUYYTYRPGK-UHFFFAOYSA-N N-ethyl-N-germylethanamine Chemical compound CCN([GeH3])CC KVEARUYYTYRPGK-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 1
- 229910000078 germane Inorganic materials 0.000 description 1
- 229910052986 germanium hydride Inorganic materials 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011553 magnetic fluid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- FCNQZDQTHQTUMZ-UHFFFAOYSA-N n-germyl-n-methylmethanamine Chemical compound CN(C)[GeH3] FCNQZDQTHQTUMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02441—Group 14 semiconducting materials
- H01L21/0245—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02592—Microstructure amorphous
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02595—Microstructure polycrystalline
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/32055—Deposition of semiconductive layers, e.g. poly - or amorphous silicon layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Recrystallisation Techniques (AREA)
- Chemical Vapour Deposition (AREA)
Description
(第1の実施形態)
第1の実施形態の半導体膜の形成方法について、ポリシリコン膜を形成する場合を例に挙げて説明する。図1は、第1の実施形態のポリシリコン膜の形成方法の一例を示すフローチャートである。図2は、図1の各工程における温度とガス供給状態の一例を示す図である。
次に、第2の実施形態の半導体膜の形成方法について、ポリシリコン膜を形成する場合を例に挙げて説明する。図4は、第2の実施形態のポリシリコン膜の形成方法の一例を示すフローチャートである。図5は、図4の各工程における温度とガス供給状態の一例を示す図である。
上記の半導体膜の形成方法を実施できる成膜装置について、多数枚の基板に対して一括で熱処理を行うバッチ式の縦型熱処理装置を例に挙げて説明する。但し、成膜装置は、バッチ式の装置に限定されるものではなく、例えば基板を1枚ずつ処理する枚葉式の装置であってもよい。
実施例1では、真空引き工程の時間を制御することでポリシリコン膜のグレインサイズを制御できることを確認するために行った実験結果について説明する。実施例1では、上記の縦型熱処理装置1を用いて、前述のポリシリコン膜の形成方法におけるステップS11~S16を行った。シード層形成工程では、処理温度を380℃、圧力を1Torr(133Pa)、シード層用のシリコン原料ガスをSi2H6とするプロセス条件で、厚さが2nmのシード層を形成した。また、シリコン膜形成工程では、処理温度を470℃、圧力を0.4Torr(53Pa)、シリコン原料ガスをSiH4とするプロセス条件で、厚さが28nmのアモルファスシリコン膜を形成した。また、真空引き工程の時間を0分、5分、60分と変化させた。さらに、EBSD(Electron Back Scatter Diffraction Patterns)法により、形成したポリシリコン膜のグレインサイズを評価した。
実施例2では、シード層形成工程の時間を制御することでポリシリコン膜のグレインサイズを制御できることを確認するために行った実験結果について説明する。実施例2では、上記の縦型熱処理装置1を用いて、前述のポリシリコン膜の形成方法におけるステップS21,S22,S23,S25,S26を行った。シード層形成工程では、処理温度を350℃、圧力を1Torr(133Pa)、シード層用のシリコン原料ガスをアミノシラン系ガスとするプロセス条件で、第1のシード層を形成した。また、処理温度を350℃、圧力を4Torr(533Pa)、シード層用のシリコン原料ガスをSi2H6とするプロセス条件で、第1のシード層の上に第2のシード層を形成した。このとき、第2のシード層を形成する際の時間を0分、50分、150分と変化させた。また、シリコン膜形成工程では、処理温度を520℃、圧力を0.3Torr(40Pa)、シリコン原料ガスをSiH4、不純物含有ガスをPH3とするプロセス条件で、リンがドープされたアモルファスシリコン膜を28nmの厚さで形成した。さらに、EBSD法により、形成したポリシリコン膜のグレインサイズを評価した。
34 反応管
40 ガス供給手段
41 排気手段
42 加熱手段
95 制御手段
Claims (6)
- 基板の上に所望のグレインサイズを有する結晶化された半導体膜を形成する方法であって、
処理容器内に収容された前記基板の上にシード層を形成する工程と、
前記シード層が形成された前記基板を収容した状態で前記処理容器内の圧力を中真空以下に真空引きする工程と、
前記処理容器内を真空引きした後、前記シード層の上にアモルファス半導体膜を形成する工程と、
前記アモルファス半導体膜を熱処理により結晶化させる工程と、
を有し、
前記真空引きする工程は、前記所望のグレインサイズに応じた時間、前記処理容器内を排気する、
半導体膜の形成方法。 - 前記シード層を形成する工程の後に行われ、水素雰囲気で前記基板を第1の温度から前記第1の温度よりも高い第2の温度に昇温する工程と、
前記基板が前記第2の温度に昇温した後、水素雰囲気で温度を安定化させる工程と、
を有し、
前記真空引きする工程は、前記温度を安定化させる工程の後に行われる、
請求項1に記載の半導体膜の形成方法。 - 前記真空引きする工程は、前記処理容器内にガスを供給することなく行われる、
請求項1又は2に記載の半導体膜の形成方法。 - 前記シード層を形成する工程は、前記基板に一分子中に2つ以上のSiを含む高次シラン系ガス、アミノシラン系ガス、水素化シランガスとハロゲン含有シリコンガスの混合ガスの少なくともいずれかを含むガスを供給する工程を含み、
前記アモルファス半導体膜を形成する工程は、前記基板にシリコン原料ガスを供給する工程を含む、
請求項1乃至3のいずれか一項に記載の半導体膜の形成方法。 - 前記アモルファス半導体膜は、アモルファスシリコン膜である、
請求項1乃至4のいずれか一項に記載の半導体膜の形成方法。 - 基板の上に所望のグレインサイズを有する結晶化された半導体膜を形成する成膜装置であって、
前記基板を収容する処理容器と、
前記処理容器内にガスを供給する供給部と、
前記処理容器内を排気する排気部と、
前記基板を加熱する加熱部と、
制御部と、
を有し、
前記制御部は、
前記処理容器内に収容された前記基板の上にシード層を形成する工程と、
前記シード層が形成された前記基板を収容した状態で前記処理容器内の圧力を中真空以下に真空引きする工程と、
前記処理容器内を真空引きした後、前記シード層の上にアモルファス半導体膜を形成する工程と、
前記アモルファス半導体膜を熱処理により結晶化させる工程と、
を実行するように前記供給部、前記排気部及び前記加熱部を制御するよう構成され、
前記制御部は、前記真空引きする工程において、前記所望のグレインサイズに応じた時間、前記処理容器内を排気するように前記排気部を制御するよう構成される、
成膜装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018220608A JP7190880B2 (ja) | 2018-11-26 | 2018-11-26 | 半導体膜の形成方法及び成膜装置 |
KR1020190150886A KR20200062050A (ko) | 2018-11-26 | 2019-11-22 | 반도체막의 형성 방법 및 성막 장치 |
US16/693,748 US11114297B2 (en) | 2018-11-26 | 2019-11-25 | Method for forming semiconductor film and film forming device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018220608A JP7190880B2 (ja) | 2018-11-26 | 2018-11-26 | 半導体膜の形成方法及び成膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020088175A JP2020088175A (ja) | 2020-06-04 |
JP7190880B2 true JP7190880B2 (ja) | 2022-12-16 |
Family
ID=70771728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018220608A Active JP7190880B2 (ja) | 2018-11-26 | 2018-11-26 | 半導体膜の形成方法及び成膜装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US11114297B2 (ja) |
JP (1) | JP7190880B2 (ja) |
KR (1) | KR20200062050A (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110089429A1 (en) | 2009-07-23 | 2011-04-21 | Venkatraman Prabhakar | Systems, methods and materials involving crystallization of substrates using a seed layer, as well as products produced by such processes |
JP2011171424A (ja) | 2010-02-17 | 2011-09-01 | Toshiba Corp | 成膜方法、半導体装置の製造方法及び半導体装置 |
JP2012004542A (ja) | 2010-05-20 | 2012-01-05 | Tokyo Electron Ltd | シリコン膜の形成方法およびその形成装置 |
JP2013082986A (ja) | 2011-09-30 | 2013-05-09 | Tokyo Electron Ltd | 薄膜の形成方法及び成膜装置 |
JP2014127524A (ja) | 2012-12-25 | 2014-07-07 | Hitachi Kokusai Electric Inc | 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3965215B2 (ja) * | 1995-03-25 | 2007-08-29 | 純一 半那 | 半導体基材の製造方法 |
TWI313059B (ja) * | 2000-12-08 | 2009-08-01 | Sony Corporatio | |
TWI282126B (en) * | 2001-08-30 | 2007-06-01 | Semiconductor Energy Lab | Method for manufacturing semiconductor device |
US7050878B2 (en) * | 2001-11-22 | 2006-05-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductror fabricating apparatus |
AU2002951838A0 (en) * | 2002-10-08 | 2002-10-24 | Unisearch Limited | Method of preparation for polycrystalline semiconductor films |
JP5311791B2 (ja) | 2007-10-12 | 2013-10-09 | 東京エレクトロン株式会社 | ポリシリコン膜の形成方法 |
EP2474023A1 (en) * | 2009-09-02 | 2012-07-11 | Imec | Process for manufacturing a crystalline silicon layer |
WO2012119084A1 (en) * | 2011-03-03 | 2012-09-07 | Board Of Trustees Of The University Of Arkansas | Top down aluminum induced crystallization for high efficiency photovoltaics |
US20140295579A1 (en) * | 2013-03-29 | 2014-10-02 | T3Memory, Inc. | Method of patterning mtj stack |
WO2017180892A1 (en) * | 2016-04-13 | 2017-10-19 | Massachusetts Institute Of Technology | Germanium devices on amorphous substrates |
WO2018209088A1 (en) * | 2017-05-10 | 2018-11-15 | Mcmahon Shane Thomas | Thin film crystallization process |
-
2018
- 2018-11-26 JP JP2018220608A patent/JP7190880B2/ja active Active
-
2019
- 2019-11-22 KR KR1020190150886A patent/KR20200062050A/ko active IP Right Grant
- 2019-11-25 US US16/693,748 patent/US11114297B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110089429A1 (en) | 2009-07-23 | 2011-04-21 | Venkatraman Prabhakar | Systems, methods and materials involving crystallization of substrates using a seed layer, as well as products produced by such processes |
JP2011171424A (ja) | 2010-02-17 | 2011-09-01 | Toshiba Corp | 成膜方法、半導体装置の製造方法及び半導体装置 |
JP2012004542A (ja) | 2010-05-20 | 2012-01-05 | Tokyo Electron Ltd | シリコン膜の形成方法およびその形成装置 |
JP2013082986A (ja) | 2011-09-30 | 2013-05-09 | Tokyo Electron Ltd | 薄膜の形成方法及び成膜装置 |
JP2014127524A (ja) | 2012-12-25 | 2014-07-07 | Hitachi Kokusai Electric Inc | 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム |
Also Published As
Publication number | Publication date |
---|---|
US20200168455A1 (en) | 2020-05-28 |
JP2020088175A (ja) | 2020-06-04 |
US11114297B2 (en) | 2021-09-07 |
KR20200062050A (ko) | 2020-06-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7190875B2 (ja) | ポリシリコン膜の形成方法及び成膜装置 | |
TWI686505B (zh) | 矽膜之形成方法與形成裝置及記錄媒體 | |
JP5393895B2 (ja) | 半導体装置の製造方法及び基板処理装置 | |
KR102072270B1 (ko) | 오목부 내의 결정 성장 방법 및 처리 장치 | |
KR100996689B1 (ko) | 반도체장치의 제조방법, 막생성방법 및 기판처리장치 | |
JP2007035740A (ja) | 成膜方法、成膜装置及び記憶媒体 | |
JP7190880B2 (ja) | 半導体膜の形成方法及び成膜装置 | |
JP7018849B2 (ja) | 成膜方法及び成膜装置 | |
US20200308696A1 (en) | Film Forming Method and Film Forming Apparatus | |
JP7004608B2 (ja) | 半導体膜の形成方法及び成膜装置 | |
JP7213726B2 (ja) | 成膜方法及び熱処理装置 | |
JP7149890B2 (ja) | 成膜方法及び成膜装置 | |
JP7341052B2 (ja) | 膜形成方法及び膜形成装置 | |
US20230141501A1 (en) | Method for forming polycrystalline silicon film | |
JP5051180B2 (ja) | 成膜方法 | |
JP4892579B2 (ja) | 半導体装置の製造方法 | |
KR20180108455A (ko) | 가열 방법, 성막 방법, 반도체 장치의 제조 방법, 및 성막 장치 | |
JP2006120734A (ja) | 成膜方法及び成膜装置並びに記憶媒体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20211013 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220714 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220719 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220915 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20221108 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221206 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7190880 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |