JP7156641B2 - 半導体装置用のパッケージおよび半導体装置 - Google Patents
半導体装置用のパッケージおよび半導体装置 Download PDFInfo
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Description
図9は、上記実施形態の第1変形例に係るパッケージ1Bを示す平面図である。図10は、図9のX-X線に沿った断面を模式的に示す図である。図11は、図9のXI-XI線に沿った断面を模式的に示す図である。図9~図11に示すように、本変形例のパッケージ1Bは、ベース3、側壁4B、2つの入力リード5、2つの出力リード6、接合材7~10、導電層11及び12、複数のビア13、並びに複数のビア14を備える。これらのうち、側壁4B、導電層11及び12を除く他の構成の詳細は、上記実施形態と同様である。
図13は、上記実施形態の第2変形例に係るパッケージ1Cの入力リード5を含む断面を模式的に示す図である。図14は、パッケージ1Cの出力リード6を含む断面を模式的に示す図である。図15は、本変形例における導電層11,12及びビア13,14の配置を示す図であって、導電層11,12及びビア13,14を主面3aの法線方向から見た様子を模式的に示している。理解の容易の為、導電層11,12の存在範囲をハッチングにより示している。
図16は、上記実施形態の第3変形例に係るパッケージ1Dの入力リード5を含む断面を模式的に示す図である。図17は、パッケージ1Dの出力リード6を含む断面を模式的に示す図である。図18の(a)及び(b)は、本変形例における導電層11,12及びビア13,14の配置を示す図であって、導電層11,12及びビア13,14を主面3aの法線方向から見た様子を模式的に示している。理解の容易の為、導電層11,12の存在範囲をハッチングにより示している。
図19は、上記実施形態の第4変形例に係るパッケージ1Eの入力リード5を含む断面を模式的に示す図である。図20は、パッケージ1Eの出力リード6を含む断面を模式的に示す図である。図19及び図20に示すように、本変形例では、ベース3の主面3a上から側壁4Bの内側面4c上にわたって樹脂膜71が設けられている。この樹脂膜71は、半導体ダイ107(図5参照)のマウントに使用される導電性銀ペーストに起因するAgのデンドライトを防止するために、パッケージ1E内部において露出する導電性銀ペーストの全体を覆う膜である。または、この樹脂膜71は、内側面4cの耐湿性向上のために設けられる膜であってもよい。
図21は、上記実施形態の第5変形例に係るパッケージ1Fの入力リード5を含む断面を模式的に示す図である。本変形例では、入力リード5の端縁5aが、主面3aの法線方向から見て、内側面4cよりも外側に位置する。そして、入力リード5と側壁4Bとを接合する接合材8及びプリント配線パターン45の端縁もまた、入力リード5の端縁5aと揃って内側面4cよりも外側に位置する。従って、本変形例では、側壁4Bの上面4bのうち内側面4c側の部分が露出している。
Claims (12)
- 金属製の主面を有するベースと、
前記主面と対向する底面を有する誘電体の側壁と、
銀(Ag)を含み、前記ベースの前記主面と前記側壁の前記底面とを互いに接合する接合材と、
前記側壁の前記底面とは反対側の上面に接合された金属製のリードと、
前記側壁の前記底面と前記上面との間において、前記主面の法線方向から見て前記リードと重なる位置に設けられ、前記接合材と電気的に接続され、前記底面に沿って延在するとともに前記側壁の側面から露出する、銀(Ag)を含まない導電層と、
を備え、
前記導電層と前記接合材との電気的な接続を、前記導電層と前記接合材との間の前記側壁を貫通する導電性のビアが行う、半導体装置用のパッケージ。 - 金属製の主面を有するベースと、
前記主面に接合された底面を有する誘電体の側壁と、
前記側壁の前記底面とは反対側の上面と対向する金属製のリードと、
銀(Ag)を含み、前記リードと前記側壁の前記上面とを互いに接合する接合材と、
前記側壁の前記底面と前記上面との間において、前記主面の法線方向から見て前記リードと重なる位置に設けられ、前記接合材と電気的に接続され、前記上面に沿って延在するとともに前記側壁の側面から露出する、銀(Ag)を含まない導電層と、
を備える、半導体装置用のパッケージ。 - 前記導電層と前記接合材との電気的な接続を、前記導電層と前記接合材との間の前記側壁を貫通する導電性のビアが行う、請求項2に記載の半導体装置用のパッケージ。
- 前記側壁の前記接合材に接合される面と前記導電層との距離は、前記側壁の前記接合材に接合される面とは反対側の面と前記導電層との距離よりも短い、請求項1から請求項3のいずれか1項に記載の半導体装置用のパッケージ。
- 前記誘電体はセラミックであり、
前記導電層はタングステン(W)層及びニッケル(Ni)層を含む積層構造を有する、請求項1から請求項4のいずれか1項に記載の半導体装置用のパッケージ。 - 前記誘電体は樹脂であり、
前記導電層は銅(Cu)層と金(Au)層またはニッケル(Ni)層とを含む積層構造を有する、請求項1から請求項4のいずれか1項に記載の半導体装置用のパッケージ。 - 前記導電層は、前記側壁の内側面寄りに偏って設けられ前記内側面から露出する第1部分と、前記側壁の外側面寄りに偏って設けられ前記外側面から露出する第2部分とのうち少なくとも一方を含む、請求項1から請求項6のいずれか1項に記載の半導体装置用のパッケージ。
- 前記導電層は前記第2部分のみを含む、請求項7に記載の半導体装置用のパッケージ。
- パッケージと、
前記パッケージ内に搭載された半導体素子と、
を備え、
前記パッケージは、
金属製の主面を有するベースと、
前記主面と対向する底面を有する誘電体の側壁と、
銀(Ag)を含み、前記ベースの前記主面と前記側壁の前記底面とを互いに接合する接合材と、
前記側壁の前記底面とは反対側の上面に接合された金属製のリードと、
前記側壁の前記底面と前記上面との間において、前記主面の法線方向から見て前記リードと重なる位置に設けられ、前記接合材と電気的に接続され、前記底面に沿って延在するとともに前記側壁の側面から露出する、銀(Ag)を含まない導電層と、
を有し、
前記リードは、前記パッケージ内の配線を介して前記半導体素子と電気的に接続されており、
前記リードの電位は前記ベースの前記主面の電位よりも低い、半導体装置。 - 請求項2に記載のパッケージと、
前記パッケージ内に搭載された半導体素子と、
を備え、
前記リードは、前記パッケージ内の配線を介して前記半導体素子と電気的に接続されており、
前記リードの電位は前記ベースの前記主面の電位よりも高い、半導体装置。 - 金属製の主面を有するベースと、
前記主面と対向する底面を有する誘電体の側壁と、
銀(Ag)を含み、前記ベースの前記主面と前記側壁の前記底面とを互いに接合する接合材と、
前記側壁の前記底面とは反対側の上面に接合された金属製のリードと、
前記側壁の前記底面と前記上面との間において、前記主面の法線方向から見て前記リードと重なる位置に設けられ、前記接合材と電気的に接続され、前記底面に沿って延在するとともに前記側壁の側面から露出する、銀(Ag)を含まない導電層と、
を備え、
前記誘電体は樹脂であり、
前記導電層は銅(Cu)層と金(Au)層またはニッケル(Ni)層とを含む積層構造を有する、半導体装置用のパッケージ。 - 金属製の主面を有するベースと、
前記主面と対向する底面を有する誘電体の側壁と、
銀(Ag)を含み、前記ベースの前記主面と前記側壁の前記底面とを互いに接合する接合材と、
前記側壁の前記底面とは反対側の上面に接合された金属製のリードと、
前記側壁の前記底面と前記上面との間において、前記主面の法線方向から見て前記リードと重なる位置に設けられ、前記接合材と電気的に接続され、前記底面に沿って延在するとともに前記側壁の側面から露出する、銀(Ag)を含まない導電層と、
を備え、
前記導電層は、前記側壁の内側面寄りに偏って設けられ前記内側面から露出する第1部分と、前記側壁の外側面寄りに偏って設けられ前記外側面から露出する第2部分とのうち少なくとも一方を含み、
前記導電層は前記第2部分のみを含む、半導体装置用のパッケージ。
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