JP7143974B2 - 高さ調整された光回折格子を製造する方法 - Google Patents

高さ調整された光回折格子を製造する方法 Download PDF

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JP7143974B2
JP7143974B2 JP2019566802A JP2019566802A JP7143974B2 JP 7143974 B2 JP7143974 B2 JP 7143974B2 JP 2019566802 A JP2019566802 A JP 2019566802A JP 2019566802 A JP2019566802 A JP 2019566802A JP 7143974 B2 JP7143974 B2 JP 7143974B2
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JP2020522023A (ja
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バルティアイネン、イスモ
ラホマキ、ユッシ
エルトマニス、ミハイル
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ディスペリックス オーイー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
    • G02B2027/0125—Field-of-view increase by wavefront division
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2019566802A 2017-06-02 2018-05-22 高さ調整された光回折格子を製造する方法 Active JP7143974B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20175504 2017-06-02
FI20175504A FI128410B (en) 2017-06-02 2017-06-02 A method of fabricating a height modulated optical diffractive grating
PCT/FI2018/050383 WO2018220271A1 (en) 2017-06-02 2018-05-22 Method of manufacturing a height-modulated optical diffractive grating

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JP2020522023A JP2020522023A (ja) 2020-07-27
JP2020522023A5 JP2020522023A5 (enExample) 2021-05-27
JP7143974B2 true JP7143974B2 (ja) 2022-09-29

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US (1) US11448876B2 (enExample)
EP (1) EP3631535B1 (enExample)
JP (1) JP7143974B2 (enExample)
CN (1) CN111033324B (enExample)
ES (1) ES2938663T3 (enExample)
FI (1) FI128410B (enExample)
WO (1) WO2018220271A1 (enExample)

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CN114051650A (zh) * 2019-05-14 2022-02-15 尼尔技术有限公司 用于光学装置和其他装置的结构化涂层的基种结构
JP7467619B2 (ja) * 2019-11-08 2024-04-15 マジック リープ， インコーポレイテッド 複数の材料を含む光再指向構造を伴うメタ表面およびその加工方法
CN113448014A (zh) * 2020-03-25 2021-09-28 苏州苏大维格科技集团股份有限公司 一种浮雕型波导结构及其制作方法
WO2022234782A1 (ja) * 2021-05-07 2022-11-10 Ａｇｃ株式会社 導光素子、及びこれを用いた表示装置
CN116609871B (zh) * 2023-07-19 2023-10-03 上海鲲游科技有限公司 一种不等高直齿光栅的制作方法
CN118655722B (zh) * 2023-08-01 2025-04-29 华为技术有限公司 光学模组、显示装置、显示设备及电子设备

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JP2005202104A (ja) 2004-01-15 2005-07-28 Nikon Corp 偏光化素子の製造方法、偏光化素子、および画像投影装置の製造方法、並びに画像投影装置
JP2007328096A (ja) 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
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US20090231702A1 (en) 2008-03-17 2009-09-17 Qihong Wu Optical films and methods of making the same
JP2011215267A (ja) 2010-03-31 2011-10-27 Nagoya Univ 色消しレンズとその製造方法、および色消しレンズを備えた光学装置
JP2015064426A (ja) 2013-09-24 2015-04-09 ウシオ電機株式会社 グリッド偏光素子及びグリッド偏光素子製造方法
US20160047961A1 (en) 2014-08-13 2016-02-18 Samsung Display Co., Ltd. Polarizer and method of fabricating the same
US20170123208A1 (en) 2015-10-29 2017-05-04 Tuomas Vallius Diffractive optical element with uncoupled grating structures
WO2017091738A1 (en) 2015-11-24 2017-06-01 President And Fellows Of Harvard College Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum

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Publication number Priority date Publication date Assignee Title
JP2000258608A (ja) 1999-03-11 2000-09-22 Canon Inc 光学素子への成膜方法
JP2005202104A (ja) 2004-01-15 2005-07-28 Nikon Corp 偏光化素子の製造方法、偏光化素子、および画像投影装置の製造方法、並びに画像投影装置
JP2009524229A (ja) 2006-01-21 2009-06-25 セーエスエーエム サントル スイス ドュレクトロニック エ ドゥ ミクロテクニック エスアー ルシェルシュ エ デヴロプマン 波長可変レーザ
JP2007328096A (ja) 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
US20090231702A1 (en) 2008-03-17 2009-09-17 Qihong Wu Optical films and methods of making the same
JP2011215267A (ja) 2010-03-31 2011-10-27 Nagoya Univ 色消しレンズとその製造方法、および色消しレンズを備えた光学装置
JP2015064426A (ja) 2013-09-24 2015-04-09 ウシオ電機株式会社 グリッド偏光素子及びグリッド偏光素子製造方法
US20160047961A1 (en) 2014-08-13 2016-02-18 Samsung Display Co., Ltd. Polarizer and method of fabricating the same
US20170123208A1 (en) 2015-10-29 2017-05-04 Tuomas Vallius Diffractive optical element with uncoupled grating structures
WO2017091738A1 (en) 2015-11-24 2017-06-01 President And Fellows Of Harvard College Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum

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Publication number Publication date
EP3631535A1 (en) 2020-04-08
EP3631535A4 (en) 2021-03-03
US20210157134A1 (en) 2021-05-27
WO2018220271A1 (en) 2018-12-06
CN111033324B (zh) 2022-08-02
JP2020522023A (ja) 2020-07-27
FI20175504A1 (en) 2018-12-03
EP3631535B1 (en) 2023-01-11
FI128410B (en) 2020-04-30
US11448876B2 (en) 2022-09-20
ES2938663T3 (es) 2023-04-13
CN111033324A (zh) 2020-04-17

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