JP7130530B2 - 可変データ平版印刷システムのインク分離マルチロール清掃機 - Google Patents

可変データ平版印刷システムのインク分離マルチロール清掃機 Download PDF

Info

Publication number
JP7130530B2
JP7130530B2 JP2018218952A JP2018218952A JP7130530B2 JP 7130530 B2 JP7130530 B2 JP 7130530B2 JP 2018218952 A JP2018218952 A JP 2018218952A JP 2018218952 A JP2018218952 A JP 2018218952A JP 7130530 B2 JP7130530 B2 JP 7130530B2
Authority
JP
Japan
Prior art keywords
cleaning
ink
imaging
subsystem
residual ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018218952A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019107886A5 (enExample
JP2019107886A (ja
Inventor
チュ－ヘン・リウ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Publication of JP2019107886A publication Critical patent/JP2019107886A/ja
Publication of JP2019107886A5 publication Critical patent/JP2019107886A5/ja
Application granted granted Critical
Publication of JP7130530B2 publication Critical patent/JP7130530B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F35/00—Cleaning arrangements or devices
    • B41F35/002—Cleaning arrangements or devices for dampening rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F35/00—Cleaning arrangements or devices
    • B41F35/02—Cleaning arrangements or devices for forme cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F7/00—Rotary lithographic machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F7/00—Rotary lithographic machines
    • B41F7/20—Details
    • B41F7/24—Damping devices
    • B41F7/26—Damping devices using transfer rollers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02288—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2235/00—Cleaning
    • B41P2235/10—Cleaning characterised by the methods or devices
    • B41P2235/20—Wiping devices
    • B41P2235/22—Rollers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Printing Methods (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)
  • Rotary Presses (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
JP2018218952A 2017-12-19 2018-11-22 可変データ平版印刷システムのインク分離マルチロール清掃機 Active JP7130530B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/847,010 2017-12-19
US15/847,010 US10603897B2 (en) 2017-12-19 2017-12-19 Ink splitting multi-roll cleaner for a variable data lithography system

Publications (3)

Publication Number Publication Date
JP2019107886A JP2019107886A (ja) 2019-07-04
JP2019107886A5 JP2019107886A5 (enExample) 2022-01-04
JP7130530B2 true JP7130530B2 (ja) 2022-09-05

Family

ID=66674979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018218952A Active JP7130530B2 (ja) 2017-12-19 2018-11-22 可変データ平版印刷システムのインク分離マルチロール清掃機

Country Status (5)

Country Link
US (1) US10603897B2 (enExample)
JP (1) JP7130530B2 (enExample)
KR (1) KR102455375B1 (enExample)
CN (1) CN109927411B (enExample)
DE (1) DE102018132531A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018211601A1 (de) * 2018-07-12 2020-01-16 Heidelberger Druckmaschinen Ag Verfahren zum Reinigen der Oberfläche wenigstens einer rotierbaren Komponente einer Druckmaschine von einem Druckfluid
CN111185414A (zh) * 2019-12-30 2020-05-22 重庆市和鑫达电子有限公司 集成电路铜板除尘装置
CN115431651B (zh) * 2022-09-21 2023-11-28 卡游(上海)文化创意有限公司 一种可回收的绿色节约型印刷工艺

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012096533A (ja) 2010-10-29 2012-05-24 Palo Alto Research Center Inc 可変データ平版印刷システム用の被加熱インク塗布ローラ
JP2015208995A (ja) 2014-04-28 2015-11-24 ゼロックス コーポレイションＸｅｒｏｘ Ｃｏｒｐｏｒａｔｉｏｎ 可変データデジタル平版印刷工程を使用する画像形成装置において、湿し水の均一な層を供給する蒸気凝縮技術を実施するためのシステムおよび方法
JP2017081157A (ja) 2015-10-24 2017-05-18 ゼロックス コーポレイションＸｅｒｏｘ Ｃｏｒｐｏｒａｔｉｏｎ カーボンブラックポリマー性フィラーを組み込むデジタル平版画像形成表面

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4718340A (en) * 1982-08-09 1988-01-12 Milliken Research Corporation Printing method
US4729310A (en) * 1982-08-09 1988-03-08 Milliken Research Corporation Printing method
US6318259B1 (en) 1997-09-03 2001-11-20 Graphic Systems, Inc. Apparatus and method for lithographic printing utilizing a precision emulsion ink feeding mechanism
US6024017A (en) * 1997-09-26 2000-02-15 Dainippon Screen Mfg. Co., Ltd. Printing apparatus
US6336404B1 (en) * 1999-02-01 2002-01-08 Dainippon Screen Mfg. Co., Ltd. Printing apparatus, and a processing device in the printing apparatus
US6895861B2 (en) * 2003-07-11 2005-05-24 James F. Price Keyless inking systems and methods using subtractive and clean-up rollers
US6553205B1 (en) * 2001-12-14 2003-04-22 Xerox Corporation System for toner cleaning
JP2006047793A (ja) * 2004-08-06 2006-02-16 Toshiba Corp 湿式画像形成装置及び液体現像剤クリーナ
US8967044B2 (en) 2006-02-21 2015-03-03 R.R. Donnelley & Sons, Inc. Apparatus for applying gating agents to a substrate and image generation kit
CN101835614B (zh) * 2007-03-13 2013-03-20 东洋制罐株式会社 油墨捕集装置
US8942615B2 (en) * 2010-08-31 2015-01-27 Hewlett-Packard Development Company, L.P. Vortex flow resisters
US20120103212A1 (en) 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Variable Data Lithography System
US20120103221A1 (en) * 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Cleaning Method for a Variable Data Lithography System
US20120103217A1 (en) 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Cleaning Subsystem for a Variable Data Lithography System
JP5752318B2 (ja) * 2011-04-29 2015-07-22 ヒューレット−パッカード デベロップメント カンパニー エル．ピー．Ｈｅｗｌｅｔｔ‐Ｐａｃｋａｒｄ Ｄｅｖｅｌｏｐｍｅｎｔ Ｃｏｍｐａｎｙ， Ｌ．Ｐ． プリンター表面から材料を除去するための装置、プリンター、及び方法
US8573121B2 (en) * 2011-06-09 2013-11-05 Xerox Corporation Methods, apparatus, and systems for erasing ink history from ink transfer roll in digital offset systems
JP6091106B2 (ja) * 2011-08-05 2017-03-08 パロ・アルト・リサーチ・センター・インコーポレーテッドＰａｌｏ Ａｌｔｏ Ｒｅｓｅａｒｃｈ Ｃｅｎｔｅｒ Ｉｎｃｏｒｐｏｒａｔｅｄ マーキング材料サブシステム
US8347787B1 (en) 2011-08-05 2013-01-08 Palo Alto Research Center Incorporated Variable data lithography apparatus employing a thermal printhead subsystem
US8950322B2 (en) * 2012-03-21 2015-02-10 Xerox Corporation Evaporative systems and methods for dampening fluid control in a digital lithographic system
US20130327237A1 (en) 2012-06-12 2013-12-12 Xerox Corportation Systems and methods for implementing digital offset lithographic printing techniques
US9316994B2 (en) * 2012-07-12 2016-04-19 Xerox Corporation Imaging system with electrophotographic patterning of an image definition material and methods therefor
US9529307B2 (en) * 2012-07-12 2016-12-27 Palo Alto Research Center Incorporated Imaging system for patterning of an image definition material by electro-wetting and methods therefor
US20140060360A1 (en) * 2012-08-31 2014-03-06 Palo Alto Research Center Inc. Textured imaging member
US9724733B2 (en) * 2012-12-21 2017-08-08 Floral Packaging Ip Holdings, Llc Method and system for removing ink from films
US9507266B2 (en) * 2014-06-29 2016-11-29 Xerox Corporation Systems and methods for implementing advanced single pass cleaning of a reimageable surface in a variable data digital lithographic printing device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012096533A (ja) 2010-10-29 2012-05-24 Palo Alto Research Center Inc 可変データ平版印刷システム用の被加熱インク塗布ローラ
JP2016193615A (ja) 2010-10-29 2016-11-17 パロ・アルト・リサーチ・センター・インコーポレーテッドＰａｌｏ Ａｌｔｏ Ｒｅｓｅａｒｃｈ Ｃｅｎｔｅｒ Ｉｎｃｏｒｐｏｒａｔｅｄ 可変データ平版印刷システム用の被加熱インク塗布ローラ
JP2015208995A (ja) 2014-04-28 2015-11-24 ゼロックス コーポレイションＸｅｒｏｘ Ｃｏｒｐｏｒａｔｉｏｎ 可変データデジタル平版印刷工程を使用する画像形成装置において、湿し水の均一な層を供給する蒸気凝縮技術を実施するためのシステムおよび方法
JP2017081157A (ja) 2015-10-24 2017-05-18 ゼロックス コーポレイションＸｅｒｏｘ Ｃｏｒｐｏｒａｔｉｏｎ カーボンブラックポリマー性フィラーを組み込むデジタル平版画像形成表面

Also Published As

Publication number Publication date
DE102018132531A1 (de) 2019-06-19
US20190184698A1 (en) 2019-06-20
KR20190074216A (ko) 2019-06-27
CN109927411A (zh) 2019-06-25
KR102455375B1 (ko) 2022-10-14
JP2019107886A (ja) 2019-07-04
CN109927411B (zh) 2021-09-07
US10603897B2 (en) 2020-03-31

Similar Documents

Publication Publication Date Title
JP7130530B2 (ja) 可変データ平版印刷システムのインク分離マルチロール清掃機
US9156248B1 (en) Systems and methods for implementing a release film for a cleaning unit in an image forming device using digital offset lithographic printing techniques
JP6132720B2 (ja) 液浸現像を用いてインクベースのデジタル印刷を行うシステムおよび方法
CN103660656A (zh) 使用润湿液成像部件和图像转印部件进行墨基数字印刷的系统和方法
JP2013256113A (ja) デジタルオフセット石版印刷技術を実施するためのシステムおよび方法
JP7252812B2 (ja) デジタル印刷デバイスのための湿し水蒸着装置および方法
US8840238B2 (en) Systems and methods for ink-based digital printing using imaging member and image transfer member
US9507266B2 (en) Systems and methods for implementing advanced single pass cleaning of a reimageable surface in a variable data digital lithographic printing device
JP2019142217A (ja) パターンフリーアニロックスインク付けシステムおよび方法
JP6095910B2 (ja) インキング方法およびインキング装置
US11801674B2 (en) Fountain solution thickness identification via gloss measurement system and method
US20180250929A1 (en) Cleaning system and method for digital offset printer
JP6259373B2 (ja) 画像オフセット構成を用いるインクベースのデジタル印刷に関するシステムおよび方法
US9019329B2 (en) Systems for dampening fluid removal, vapor control and recovery for ink-based digital printing
US10124576B2 (en) Contamination-proof imaging member cleaning device and method
US20140261030A1 (en) Systems for applying dampening fluid to an imaging member for ink-based digital printing
US9056452B2 (en) Systems and methods for ink-based digital printing using variable data lithography inkjet imaging system
US11577503B2 (en) Fountain solution thickness control system in a digital printing device using a drag force sensor
CN109891331B (zh) 转印打印剂到可清洁介质
US8503912B2 (en) Device for preparing a recording medium for transfer printing toner images in an electro-phoretic printing system
US20150174888A1 (en) Methods for ink-based digital printing using imaging member surface conditioning fluid
JP2014140965A (ja) 印刷装置、印刷方法及び印刷版

Legal Events

Date Code Title Description
RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20181204

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20190227

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20210311

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20210415

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20211119

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20211119

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20211119

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20211213

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220314

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220404

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220701

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220725

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220824

R150 Certificate of patent or registration of utility model

Ref document number: 7130530

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250