JP7125515B2 - 組成物、及びケイ素含有膜の堆積のための組成物を使用する方法 - Google Patents
組成物、及びケイ素含有膜の堆積のための組成物を使用する方法 Download PDFInfo
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Description
表面特徴を備える基材を、-20℃~約100℃の範囲の1つ又は複数の温度の反応器中に配置する工程;
式RnSiR1 4-nを有し、式中、Rが直鎖又は分岐鎖のC2~C6アルケニル基、直鎖又は分岐鎖のC2~C6アルキニル基から選択され、R1が水素及び分岐鎖のC1~C10アルキル基から選択され、nが1、2、3及び4から選択される数である少なくとも1つの化合物を含む組成物を反応器中に導入する工程;並びに
プラズマ源を反応器中に提供し、少なくとも1つの化合物を少なくとも部分的に反応させて流動性液体オリゴマーを形成する工程であって、流動性液体オリゴマーが表面特徴の少なくとも一部を少なくとも部分的に充填し、プラズマ源が、組み合わされて働くリモートプラズマ源及びインサイチュプラズマ源の両方を含む工程
を含む。
Claims (11)
- 流動性化学気相堆積プロセスにおいてケイ素含有膜を堆積するための方法であって、
表面特徴を備える基材を、-20℃~約100℃の範囲の1つ又は複数の温度の反応器中に配置する工程;
式RnSiR1 4-nを有し、式中、Rが直鎖又は分岐鎖のC2~C6アルケニル基、直鎖又は分岐鎖のC2~C6アルキニル基から選択され、R1が水素、メタン及び直鎖又は分岐鎖のC2~C10アルキル基から選択され、nが1、2、3及び4から選択される数である少なくとも1つの化合物を含む組成物を反応器中に導入する工程;
プラズマ源を反応器中に提供し、少なくとも1つの化合物を少なくとも部分的に反応させて流動性液体オリゴマーを形成する工程であって、流動性液体オリゴマーが表面特徴の少なくとも一部を少なくとも部分的に充填し、プラズマ源が、組み合わされて働くリモートプラズマ源及びインサイチュプラズマ源の両方を含む工程
を含む、方法。 - リモートプラズマ源及びインサイチュプラズマ源のうち少なくとも1つが、窒素プラズマ、窒素及び水素を含むプラズマ、窒素及びヘリウムを含むプラズマ、窒素及びアルゴンを含むプラズマ、アンモニアプラズマ、アンモニア及びヘリウムを含むプラズマ、アンモニア及びアルゴンを含むプラズマ、アンモニア及び窒素を含むプラズマ、NF3プラズマ、有機アミンプラズマ並びにそれらの組み合わせからなる群から選択されるプラズマ源を含む、請求項1に記載の方法。
- リモートプラズマ源及びインサイチュプラズマ源のうち少なくとも1つが、炭化水素プラズマ、炭化水素及びヘリウムを含むプラズマ、炭化水素及びアルゴンを含むプラズマ、二酸化炭素プラズマ、一酸化炭素プラズマ、炭化水素及び水素を含むプラズマ、炭化水素及び窒素源を含むプラズマ、炭化水素及び酸素源を含むプラズマ並びにそれらの組み合わせからなる群から選択される炭素源プラズマを含む、請求項1に記載の方法。
- リモートプラズマ源及びインサイチュプラズマ源のうち少なくとも1つが、水素プラズマ、ヘリウムプラズマ、アルゴンプラズマ、キセノンプラズマ及びそれらの組み合わせからなる群から選択される、請求項1に記載の方法。
- リモートプラズマ源及びインサイチュプラズマ源のうち少なくとも1つが、水(H2O)プラズマ、酸素プラズマ、オゾン(O3)プラズマ、NOプラズマ、N2Oプラズマ、一酸化炭素(CO)プラズマ、二酸化炭素(CO2)プラズマ及びそれらの組み合わせからなる群から選択される酸素を含むプラズマ源を含む、請求項1に記載の方法。
- 約100℃~約1000℃の範囲の1つ又は複数の温度で流動性液体オリゴマーを処理して、流動性液体オリゴマーを硬化させて硬化膜を形成する工程をさらに含む、請求項1に記載の方法。
- 反応器の圧力が100torr以下に保持される、請求項1に記載の方法。
- ケイ素含有膜が、炭化ケイ素、窒化ケイ素、酸化ケイ素、炭素ドープ窒化ケイ素、炭素ドープ酸化ケイ素、酸窒化ケイ素及び炭素ドープ酸窒化ケイ素の膜からなる群から選択される、請求項1に記載の方法。
- 少なくとも1つの化合物がテトラビニルシランを含む、請求項9に記載の方法。
- ケイ素含有膜が、以下の特徴、i)紫外線硬化後における約150~約190MPaの範囲の膜引張応力と、ii)約1.35~約2.10g/cm3の範囲の密度とのうち少なくとも1つを有する、請求項1~10のいずれか1項に記載の方法。
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