JP7076423B2 - バリオエネルギー電子加速器 - Google Patents

バリオエネルギー電子加速器 Download PDF

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Publication number
JP7076423B2
JP7076423B2 JP2019212384A JP2019212384A JP7076423B2 JP 7076423 B2 JP7076423 B2 JP 7076423B2 JP 2019212384 A JP2019212384 A JP 2019212384A JP 2019212384 A JP2019212384 A JP 2019212384A JP 7076423 B2 JP7076423 B2 JP 7076423B2
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Prior art keywords
electron beam
cavity
locus
deflection
radial
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Japanese (ja)
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JP2020087932A5 (enExample
JP2020087932A (ja
Inventor
ミシェル アブス
ジェレミー ブライソン
ウィレム クレーヴェン
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Ion Beam Applications SA
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Ion Beam Applications SA
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H13/00—Magnetic resonance accelerators; Cyclotrons
    • H05H13/10—Accelerators comprising one or more linear accelerating sections and bending magnets or the like to return the charged particles in a trajectory parallel to the first accelerating section, e.g. microtrons or rhodotrons
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/02—Circuits or systems for supplying or feeding radio-frequency energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/001—Arrangements for beam delivery or irradiation
    • H05H2007/004—Arrangements for beam delivery or irradiation for modifying beam energy, e.g. spread out Bragg peak devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/02—Circuits or systems for supplying or feeding radio-frequency energy
    • H05H2007/025—Radiofrequency systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H05H2007/045—Magnet systems, e.g. undulators, wigglers; Energisation thereof for beam bending
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H05H2007/046—Magnet systems, e.g. undulators, wigglers; Energisation thereof for beam deflection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H05H2007/081—Sources
    • H05H2007/084—Electron sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/14—Vacuum chambers
    • H05H7/18—Cavities; Resonators

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optics & Photonics (AREA)
  • Particle Accelerators (AREA)
JP2019212384A 2018-11-28 2019-11-25 バリオエネルギー電子加速器 Active JP7076423B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP18208924.3A EP3661335B1 (en) 2018-11-28 2018-11-28 Vario-energy electron accelerator
EP18208924.3 2018-11-28

Publications (3)

Publication Number Publication Date
JP2020087932A JP2020087932A (ja) 2020-06-04
JP2020087932A5 JP2020087932A5 (enExample) 2021-08-26
JP7076423B2 true JP7076423B2 (ja) 2022-05-27

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JP2019212384A Active JP7076423B2 (ja) 2018-11-28 2019-11-25 バリオエネルギー電子加速器

Country Status (4)

Country Link
US (1) US10743401B2 (enExample)
EP (1) EP3661335B1 (enExample)
JP (1) JP7076423B2 (enExample)
CN (1) CN111246654B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3661335B1 (en) * 2018-11-28 2021-06-30 Ion Beam Applications Vario-energy electron accelerator
CN114375540B (zh) * 2019-07-09 2025-03-11 万睿视影像有限公司 电子枪驱动器
EP3876679B1 (en) * 2020-03-06 2022-07-20 Ion Beam Applications Synchrocyclotron for extracting beams of various energies and related method
CN112888139A (zh) * 2020-12-29 2021-06-01 中国科学院近代物理研究所 一种同轴腔加速器出口电子束能量调节系统及方法
CN112888138B (zh) * 2020-12-30 2024-02-06 中国科学院近代物理研究所 一种产生高品质电子束的往返式同轴腔电子加速器
CN113933761B (zh) * 2021-09-09 2022-09-27 中国地质大学（武汉） 基于电容加载同轴谐振腔的ovh磁传感器腔体
CN118510141B (zh) * 2024-07-22 2024-11-19 苏州益腾电子科技有限公司 一种微焦点x射线的产生装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002141200A (ja) 2000-10-31 2002-05-17 Toshiba Corp 電子線装置
CN105578703A (zh) 2016-03-03 2016-05-11 北京鑫智能技术股份有限公司 一口出多档能量电子束的花瓣型加速器
JP2016521904A (ja) 2013-05-17 2016-07-25 イオンビーム アプリケーションズ， エス．エー． 同軸キャビティを有する電子加速器
WO2016193294A1 (en) 2015-06-04 2016-12-08 Ion Beam Applications Multiple energy electron accelerator
JP2018078101A (ja) 2016-11-07 2018-05-17 イオン ビーム アプリケーションズ ソシエテ アノニム （アイビーエイ）Ｉｏｎ Ｂｅａｍ Ａｐｐｌｉｃａｔｉｏｎｓ Ｓ．Ａ 第１及び第２半体シェルを含むコンパクトな電子加速器

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2616032B1 (fr) 1987-05-26 1989-08-04 Commissariat Energie Atomique Accelerateur d'electrons a cavite coaxiale
JP6277135B2 (ja) * 2012-02-03 2018-02-07 イオン・ビーム・アプリケーションズ・エス・アー 等時性超伝導小型サイクロトロン用磁性構造体
CA2832816C (en) * 2013-11-12 2020-06-02 Mikhail V. Gavich Accelerator - generator
EP3178522B1 (en) * 2015-12-11 2018-02-14 Ion Beam Applications S.A. Particle therapy system with parallel control of energy variation and beam position variation
EP3319402B1 (en) 2016-11-07 2021-03-03 Ion Beam Applications S.A. Compact electron accelerator comprising permanent magnets
CN207638964U (zh) * 2017-12-13 2018-07-20 北京鑫智能技术股份有限公司 利用永久磁铁引导电子多次加速的花瓣型加速器
CN207802493U (zh) * 2018-02-11 2018-08-31 北京鑫智能技术股份有限公司 花瓣型加速器及其c型回转电磁铁
CN108770181A (zh) * 2018-05-24 2018-11-06 新瑞阳光粒子医疗装备(无锡)有限公司 同步加速器、粒子束加速方法、装置、设备及存储介质
EP3661335B1 (en) * 2018-11-28 2021-06-30 Ion Beam Applications Vario-energy electron accelerator

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002141200A (ja) 2000-10-31 2002-05-17 Toshiba Corp 電子線装置
JP2016521904A (ja) 2013-05-17 2016-07-25 イオンビーム アプリケーションズ， エス．エー． 同軸キャビティを有する電子加速器
WO2016193294A1 (en) 2015-06-04 2016-12-08 Ion Beam Applications Multiple energy electron accelerator
CN105578703A (zh) 2016-03-03 2016-05-11 北京鑫智能技术股份有限公司 一口出多档能量电子束的花瓣型加速器
JP2018078101A (ja) 2016-11-07 2018-05-17 イオン ビーム アプリケーションズ ソシエテ アノニム （アイビーエイ）Ｉｏｎ Ｂｅａｍ Ａｐｐｌｉｃａｔｉｏｎｓ Ｓ．Ａ 第１及び第２半体シェルを含むコンパクトな電子加速器

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Publication number Publication date
CN111246654B (zh) 2022-04-08
US10743401B2 (en) 2020-08-11
EP3661335A1 (en) 2020-06-03
CN111246654A (zh) 2020-06-05
US20200170099A1 (en) 2020-05-28
JP2020087932A (ja) 2020-06-04
EP3661335B1 (en) 2021-06-30

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