JP7071433B2 - エジェクタ装置 - Google Patents
エジェクタ装置 Download PDFInfo
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- JP7071433B2 JP7071433B2 JP2020079916A JP2020079916A JP7071433B2 JP 7071433 B2 JP7071433 B2 JP 7071433B2 JP 2020079916 A JP2020079916 A JP 2020079916A JP 2020079916 A JP2020079916 A JP 2020079916A JP 7071433 B2 JP7071433 B2 JP 7071433B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
本出願は、2019年5月8日に提出された台湾特許出願第108115797号の優先権を主張するものであり、その全内容を本出願に参照により含めるものである。
Claims (9)
- 薄膜に配置されたチップを取り出すためのエジェクタ装置であって、前記チップが第1の方向に第1の長さを有し、第2の方向に第1の幅を有し、前記エジェクタ装置が、
接触面を規定するピンカバーを備え、前記接触面に配置されたピンホールが前記第1の方向に第2の長さを有し、前記第2の方向に第2の幅を有し、
前記エジェクタ装置が、前記接触面から前記ピンホールを介して突出可能な少なくとも1つのピンを備え、
前記接触面が前記薄膜に接触するように構成され、前記第1の長さが前記第2の長さよりも長い場合、前記第1の幅が前記第2の幅よりも広くなく、前記第1の幅が前記第2の幅よりも広い場合、前記第1の長さが前記第2の長さよりも長くなく、
前記ピンカバーが前記接触面に配置された複数の抜き取り孔及び第3の窪み領域をさらに備え、前記第3の窪み領域が前記ピンホールを取り囲み、前記複数の抜き取り孔の少なくとも一部が前記第3の窪み領域に配置され、
前記複数の抜き取り孔がポンプシステムに接続され、前記接触面が前記薄膜に接触すると、前記ポンプシステムが前記複数の抜き取り孔および前記ピンホールを介して負圧をかけ前記薄膜を吸引する、エジェクタ装置。 - 前記ピンカバーが前記接触面に配置された第1の窪み領域をさらに備え、前記第1の窪み領域が前記第1の方向に沿って延び、前記複数の抜き取り孔の少なくとも一部が前記第1の窪み領域に配置されている、請求項1に記載のエジェクタ装置。
- 前記ピンカバーが前記接触面に配置された第2の窪み領域をさらに備え、前記第2の窪み領域が前記第2の方向に沿って延び、前記複数の抜き取り孔の少なくとも一部が前記第2の窪み領域に配置されている、請求項1に記載のエジェクタ装置。
- 前記少なくとも1つのピンは第1のピンを含み、前記第1のピンが前記接触面から前記ピンホールを介して選択的に突出し、前記第1のピンの上面が前記第1の方向に第3の長さを有し、前記上面が前記第2の方向に第3の幅を有し、前記第3の長さが前記第3の幅よりも長い、請求項1に記載のエジェクタ装置。
- 前記少なくとも1つのピンは第2のピン及び第3のピンを含み、前記第2のピン及び前記第3のピンが前記接触面から前記ピンホールを介して選択的に突出し、前記第2のピンが前記第3のピンから第1の距離だけ離間し、前記第1の距離の前記第2の長さに対する割合が0.3から0.7までの間である、請求項1に記載のエジェクタ装置。
- 前記ピンホールが長方形であり、前記第2の長さが前記長方形の長辺の長さであり、前記第2の幅が前記長方形の短辺の長さである、請求項1に記載のエジェクタ装置。
- 前記ピンホールが楕円であり、前記第2の長さが前記楕円の長軸の長さであり、前記第2の幅が前記楕円の短軸の長さである、請求項1に記載のエジェクタ装置。
- 前記第2の長さが前記第2の幅よりも長い、請求項1に記載のエジェクタ装置。
- 薄膜に配置されたチップを取り出すためのエジェクタ装置であって、前記チップが第1の方向に第1の長さを有し、第2の方向に第1の幅を有し、前記エジェクタ装置が、
接触面を規定するピンカバーを備え、前記接触面に配置されたピンホールが前記第1の方向に第2の長さを有し、前記第2の方向に第2の幅を有し、
前記エジェクタ装置が、前記接触面から前記ピンホールを介して突出可能な少なくとも1つのピンを備え、
前記接触面が前記薄膜に接触するように構成され、前記第1の長さが前記第2の長さよりも長い場合、前記第1の幅が前記第2の幅よりも広くなく、前記第1の幅が前記第2の幅よりも広い場合、前記第1の長さが前記第2の長さよりも長くなく、
前記ピンカバーが前記接触面に均一に配置された複数の抜き取り孔及び複数の第4の窪み領域をさらに備え、
前記複数の抜き取り孔のそれぞれが前記複数の第4の窪み領域の1つに対応し、前記接触面の前記複数の第4の窪み領域のそれぞれの面積が前記接触面の前記複数の抜き取り孔の1つの面積よりも大きく、
前記複数の抜き取り孔がポンプシステムに接続され、前記接触面が前記薄膜に接触すると、前記ポンプシステムが前記複数の抜き取り孔および前記ピンホールを介して負圧をかけ前記薄膜を吸引する、エジェクタ装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW108115797 | 2019-05-08 | ||
TW108115797A TWI714079B (zh) | 2019-05-08 | 2019-05-08 | 頂針裝置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020184627A JP2020184627A (ja) | 2020-11-12 |
JP7071433B2 true JP7071433B2 (ja) | 2022-05-18 |
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ID=73045284
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020079916A Active JP7071433B2 (ja) | 2019-05-08 | 2020-04-30 | エジェクタ装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20200357678A1 (ja) |
JP (1) | JP7071433B2 (ja) |
TW (1) | TWI714079B (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001118862A (ja) | 1999-11-09 | 2001-04-27 | Nec Machinery Corp | ペレットピックアップ装置 |
JP2010232678A (ja) | 2010-06-21 | 2010-10-14 | Renesas Electronics Corp | 半導体装置の製造方法および半導体製造装置 |
JP2015065367A (ja) | 2013-09-26 | 2015-04-09 | 株式会社テセック | 剥離装置およびピックアップシステム |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW549563U (en) * | 2002-12-24 | 2003-08-21 | Kingpak Tech Inc | Film removing device for chips |
CN202549811U (zh) * | 2011-09-09 | 2012-11-21 | 苏州均华精密机械有限公司 | 顶针盖结构 |
-
2019
- 2019-05-08 TW TW108115797A patent/TWI714079B/zh active
-
2020
- 2020-04-22 US US16/854,900 patent/US20200357678A1/en not_active Abandoned
- 2020-04-30 JP JP2020079916A patent/JP7071433B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001118862A (ja) | 1999-11-09 | 2001-04-27 | Nec Machinery Corp | ペレットピックアップ装置 |
JP2010232678A (ja) | 2010-06-21 | 2010-10-14 | Renesas Electronics Corp | 半導体装置の製造方法および半導体製造装置 |
JP2015065367A (ja) | 2013-09-26 | 2015-04-09 | 株式会社テセック | 剥離装置およびピックアップシステム |
Also Published As
Publication number | Publication date |
---|---|
JP2020184627A (ja) | 2020-11-12 |
US20200357678A1 (en) | 2020-11-12 |
TW202042334A (zh) | 2020-11-16 |
TWI714079B (zh) | 2020-12-21 |
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