JP7059384B2 - ジブチルフルオレニル誘導体及びその光開始剤としての使用 - Google Patents

ジブチルフルオレニル誘導体及びその光開始剤としての使用 Download PDF

Info

Publication number
JP7059384B2
JP7059384B2 JP2020545844A JP2020545844A JP7059384B2 JP 7059384 B2 JP7059384 B2 JP 7059384B2 JP 2020545844 A JP2020545844 A JP 2020545844A JP 2020545844 A JP2020545844 A JP 2020545844A JP 7059384 B2 JP7059384 B2 JP 7059384B2
Authority
JP
Japan
Prior art keywords
photocurable composition
manufacture
photoinitiator
resists
dibutylfluorenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020545844A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021504555A (ja
Inventor
剣雄 林
傳文 陳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HUIZHOU HUAHONG NEW MATERIAL CO Ltd
Original Assignee
HUIZHOU HUAHONG NEW MATERIAL CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=62227901&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP7059384(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by HUIZHOU HUAHONG NEW MATERIAL CO Ltd filed Critical HUIZHOU HUAHONG NEW MATERIAL CO Ltd
Publication of JP2021504555A publication Critical patent/JP2021504555A/ja
Application granted granted Critical
Publication of JP7059384B2 publication Critical patent/JP7059384B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2/00Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms
    • C07C2/86Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms by condensation between a hydrocarbon and a non-hydrocarbon
    • C07C2/861Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms by condensation between a hydrocarbon and a non-hydrocarbon the non-hydrocarbon contains only halogen as hetero-atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/27Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation
    • C07C45/30Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with halogen containing compounds, e.g. hypohalogenation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2020545844A 2017-11-22 2018-11-22 ジブチルフルオレニル誘導体及びその光開始剤としての使用 Active JP7059384B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201711175135.1 2017-11-22
CN201711175135.1A CN108117616B (zh) 2017-11-22 2017-11-22 二丁基芴基衍生物与其作为光引发剂的应用
PCT/CN2018/116999 WO2019101142A1 (fr) 2017-11-22 2018-11-22 Dérivés dibutylfluorène et application de ceux-ci en tant que photo-initiateur

Publications (2)

Publication Number Publication Date
JP2021504555A JP2021504555A (ja) 2021-02-15
JP7059384B2 true JP7059384B2 (ja) 2022-04-25

Family

ID=62227901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020545844A Active JP7059384B2 (ja) 2017-11-22 2018-11-22 ジブチルフルオレニル誘導体及びその光開始剤としての使用

Country Status (5)

Country Link
US (1) US11560362B2 (fr)
EP (1) EP3715381B1 (fr)
JP (1) JP7059384B2 (fr)
CN (1) CN108117616B (fr)
WO (1) WO2019101142A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108117616B (zh) * 2017-11-22 2019-08-09 惠州市华泓新材料股份有限公司 二丁基芴基衍生物与其作为光引发剂的应用
JP6817503B1 (ja) * 2019-05-29 2021-01-20 株式会社Dnpファインケミカル カラーフィルタ用感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置
WO2021125132A1 (fr) * 2019-12-20 2021-06-24 株式会社Adeka Composé de carbamoyl-oxime, initiateur de polymérisation et composition polymérisable contenant ledit composé
WO2022091711A1 (fr) * 2020-10-27 2022-05-05 株式会社Dnpファインケミカル Composition de résine colorée photosensible, produit durci, filtre coloré et dispositif d'affichage

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050049425A1 (en) 2003-08-25 2005-03-03 Pearson Jason Clay Ethylenically-unsaturated red anthraquinone dyes
JP2006512458A (ja) 2002-12-27 2006-04-13 サン・ケミカル・コーポレーション 放射線硬化可能な水性組成物
US20150329662A1 (en) 2012-12-23 2015-11-19 Huizhou Huahong New Material Co., Ltd. Alkylphenyl derivatives and application thereof as photoinitiator
US20160332960A1 (en) 2014-01-17 2016-11-17 Samyang Corporation Novel fluorenyl b-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
JP2017149914A (ja) 2016-02-26 2017-08-31 東京応化工業株式会社 硬化性樹脂組成物物
WO2018149370A1 (fr) 2017-02-17 2018-08-23 常州强力先端电子材料有限公司 Photoinitiateur de fluorenylaminocétone, son procédé de préparation et composition photodurcissable aux uv le contenant
JP2018532851A (ja) 2015-10-08 2018-11-08 常州強力電子新材料股▲ふん▼有限公司Cahngzhou Tronly New Electronic Materials Co.,Ltd. フルオレン含有オキシムエステル類光開始剤、その合成、それを含有する感光性樹脂組成物及びその使用
JP2019507108A (ja) 2015-12-15 2019-03-14 常州強力先端電子材料有限公司Changzhou Tronly Advanced Electronic Materials Co.,Ltd. フルオレン類多官能光開始剤およびその製造ならびに使用、フルオレン類光開始剤含有感光性樹脂組成物およびその使用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6127130B2 (ja) 2012-05-03 2017-05-10 コリア リサーチ インスティテュート オブ ケミカル テクノロジー 新規のオキシムエステルフルオレン化合物、およびこれを含む光重合開始剤、並びにフォトレジスト組成物
CN102766045B (zh) 2012-07-31 2014-03-05 惠州市华泓新材料有限公司 二苯甲酮衍生物与其作为光引发剂的应用
CN104004395B (zh) 2014-06-17 2016-08-17 广东美涂士建材股份有限公司 一种木皮用uv辊涂弹性底涂涂料及其制备方法与实施工艺
KR101907544B1 (ko) * 2014-07-15 2018-10-15 도쿄 오카 고교 가부시키가이샤 감광성 조성물 및 화합물
CN107272336A (zh) 2016-04-06 2017-10-20 常州强力先端电子材料有限公司 一种含芴类光引发剂的感光性树脂组合物及其应用
CN106883114B (zh) 2015-12-15 2019-11-19 常州强力先端电子材料有限公司 一种芴类多官能度光引发剂及其制备和应用
KR102347918B1 (ko) 2016-03-28 2022-01-05 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
CN106010144B (zh) 2016-06-20 2019-04-23 上海飞凯光电材料股份有限公司 一种uv-led固化用光纤涂覆树脂及其制备方法和应用
CN107793503A (zh) * 2017-09-28 2018-03-13 大连天源基化学有限公司 一种紫外光引发剂及其合成方法
CN108117616B (zh) 2017-11-22 2019-08-09 惠州市华泓新材料股份有限公司 二丁基芴基衍生物与其作为光引发剂的应用

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006512458A (ja) 2002-12-27 2006-04-13 サン・ケミカル・コーポレーション 放射線硬化可能な水性組成物
US20050049425A1 (en) 2003-08-25 2005-03-03 Pearson Jason Clay Ethylenically-unsaturated red anthraquinone dyes
US20150329662A1 (en) 2012-12-23 2015-11-19 Huizhou Huahong New Material Co., Ltd. Alkylphenyl derivatives and application thereof as photoinitiator
US20160332960A1 (en) 2014-01-17 2016-11-17 Samyang Corporation Novel fluorenyl b-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
JP2018532851A (ja) 2015-10-08 2018-11-08 常州強力電子新材料股▲ふん▼有限公司Cahngzhou Tronly New Electronic Materials Co.,Ltd. フルオレン含有オキシムエステル類光開始剤、その合成、それを含有する感光性樹脂組成物及びその使用
JP2019507108A (ja) 2015-12-15 2019-03-14 常州強力先端電子材料有限公司Changzhou Tronly Advanced Electronic Materials Co.,Ltd. フルオレン類多官能光開始剤およびその製造ならびに使用、フルオレン類光開始剤含有感光性樹脂組成物およびその使用
JP2017149914A (ja) 2016-02-26 2017-08-31 東京応化工業株式会社 硬化性樹脂組成物物
WO2018149370A1 (fr) 2017-02-17 2018-08-23 常州强力先端电子材料有限公司 Photoinitiateur de fluorenylaminocétone, son procédé de préparation et composition photodurcissable aux uv le contenant

Also Published As

Publication number Publication date
WO2019101142A1 (fr) 2019-05-31
CN108117616B (zh) 2019-08-09
EP3715381B1 (fr) 2024-06-12
EP3715381A4 (fr) 2020-09-30
EP3715381A1 (fr) 2020-09-30
CN108117616A (zh) 2018-06-05
US20200385359A1 (en) 2020-12-10
JP2021504555A (ja) 2021-02-15
US11560362B2 (en) 2023-01-24

Similar Documents

Publication Publication Date Title
JP7059384B2 (ja) ジブチルフルオレニル誘導体及びその光開始剤としての使用
TWI406847B (zh) 肟酯化合物及使用其之感光性樹脂組成物
KR101700476B1 (ko) 고감광도 카르바졸 옥심 에스테르계 광개시제, 그 제조방법 및 용도
JP2514804B2 (ja) 共重合性光開始剤
KR101860511B1 (ko) 비스옥심 에스테르 광개시제, 및 그의 제조방법과 용도
KR102362859B1 (ko) 중합성 기를 함유하는 플루오렌 옥심 에스테르 광 개시제, 및 이의 제조방법 및 용도
US9353207B2 (en) Alkylphenyl derivatives and application thereof as photoinitiator
KR101742473B1 (ko) 카바졸 케톡심 에스테르 고-감광도 광개시제
KR20190029707A (ko) 플루오렌 광개시제, 그 제조 방법, 이를 갖는 광경화성 조성물, 및 광경화 분야에서 그 용도
KR20160108532A (ko) 니트로 함유 비스옥심 에스테르 광개시제, 및 그의 제조방법과 용도
KR101883164B1 (ko) 비대칭 디옥심에테르 화합물 및 그 제조 방법과 응용
JP2012051927A (ja) 粉末の形態での白色固体光開始剤およびその製造
Chen et al. Synthesis and preliminary photopolymerization envaluation of photopolymerizalbe type II photoinitiators BRA and TXRA
WO2016192610A1 (fr) Composé d'ester acyloxime pour matériau durcissant aux uv, procédé de synthèse associé, et application associée
US4251341A (en) Photoinitiators for UV-curable systems
CN102766045B (zh) 二苯甲酮衍生物与其作为光引发剂的应用
WO2016192611A1 (fr) Composé ester d'oxime, son procédé de synthèse, et son application
Chen et al. Synthesis and preliminary photopolymerization evaluation of novel photoinitiators containing phototrigger to overcome oxygen inhibition in the UV-curing system
CN112939779B (zh) 适用于uv-led深层光聚合的对苯二甲酰甲酸酯型光引发剂及其制备方法
JP7300108B2 (ja) 硬化物の製造方法
JPS5921638A (ja) 不飽和化合物の光重合法
JP5299838B2 (ja) 10−ヒドロキシ−10−ナフチルメチルアントラセン−9(10h)−オン化合物及びその光ラジカル重合開始剤としての用途。
CN116903580A (zh) 适用于uv-led固化体系的单组份硫杂蒽酮类光引发剂及其制备与应用
CN116947699A (zh) 具有联苯结构的碘鎓盐化合物及其制备方法和应用
JPS629110B2 (fr)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200621

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210617

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210629

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210929

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220201

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220228

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220405

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220413

R150 Certificate of patent or registration of utility model

Ref document number: 7059384

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150