JP7042800B2 - 高配向フミン酸フィルムおよびそれから得られる高導電性黒鉛フィルムならびに同フィルムを含有するデバイス - Google Patents
高配向フミン酸フィルムおよびそれから得られる高導電性黒鉛フィルムならびに同フィルムを含有するデバイス Download PDFInfo
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- JP7042800B2 JP7042800B2 JP2019508186A JP2019508186A JP7042800B2 JP 7042800 B2 JP7042800 B2 JP 7042800B2 JP 2019508186 A JP2019508186 A JP 2019508186A JP 2019508186 A JP2019508186 A JP 2019508186A JP 7042800 B2 JP7042800 B2 JP 7042800B2
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 500
- QJZYHAIUNVAGQP-UHFFFAOYSA-N 3-nitrobicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2(C(O)=O)[N+]([O-])=O QJZYHAIUNVAGQP-UHFFFAOYSA-N 0.000 title claims description 375
- 239000004021 humic acid Substances 0.000 title claims description 374
- 229910002804 graphite Inorganic materials 0.000 title claims description 194
- 239000010439 graphite Substances 0.000 title claims description 194
- 229910021389 graphene Inorganic materials 0.000 claims description 262
- 238000000034 method Methods 0.000 claims description 114
- 238000010438 heat treatment Methods 0.000 claims description 79
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 66
- 239000006185 dispersion Substances 0.000 claims description 66
- 229910052760 oxygen Inorganic materials 0.000 claims description 63
- 239000001301 oxygen Substances 0.000 claims description 62
- 239000000463 material Substances 0.000 claims description 46
- 239000013078 crystal Substances 0.000 claims description 45
- 239000004973 liquid crystal related substance Substances 0.000 claims description 45
- 229910052799 carbon Inorganic materials 0.000 claims description 44
- 239000007788 liquid Substances 0.000 claims description 31
- 239000000126 substance Substances 0.000 claims description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- 229920000642 polymer Polymers 0.000 claims description 24
- 125000003118 aryl group Chemical group 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 23
- 239000002253 acid Substances 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 238000004377 microelectronic Methods 0.000 claims description 18
- 125000000524 functional group Chemical group 0.000 claims description 17
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 16
- 238000002441 X-ray diffraction Methods 0.000 claims description 15
- 238000005087 graphitization Methods 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 15
- -1 alkylene carbonate Chemical compound 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 13
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 8
- 229910052727 yttrium Inorganic materials 0.000 claims description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 7
- 150000001412 amines Chemical class 0.000 claims description 7
- 150000007942 carboxylates Chemical class 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 7
- 230000017525 heat dissipation Effects 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 claims description 6
- 150000005215 alkyl ethers Chemical class 0.000 claims description 6
- 150000001408 amides Chemical class 0.000 claims description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 125000004407 fluoroaryl group Chemical group 0.000 claims description 6
- 125000005348 fluorocycloalkyl group Chemical group 0.000 claims description 6
- 150000004820 halides Chemical group 0.000 claims description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 5
- 239000003125 aqueous solvent Substances 0.000 claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 5
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 5
- 239000002202 Polyethylene glycol Substances 0.000 claims description 4
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims description 4
- 150000007524 organic acids Chemical class 0.000 claims description 4
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 229920000223 polyglycerol Polymers 0.000 claims description 4
- 150000005846 sugar alcohols Chemical class 0.000 claims description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 3
- 150000007513 acids Chemical class 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 230000008521 reorganization Effects 0.000 claims description 2
- 238000000638 solvent extraction Methods 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 4
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims 4
- 125000001153 fluoro group Chemical group F* 0.000 claims 2
- 238000005304 joining Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 133
- 239000010410 layer Substances 0.000 description 47
- 239000000725 suspension Substances 0.000 description 29
- 239000011888 foil Substances 0.000 description 28
- 239000000203 mixture Substances 0.000 description 28
- 239000012071 phase Substances 0.000 description 27
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 24
- 239000000123 paper Substances 0.000 description 23
- 239000010409 thin film Substances 0.000 description 23
- 230000007547 defect Effects 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 16
- 239000002245 particle Substances 0.000 description 15
- 229920001721 polyimide Polymers 0.000 description 14
- 239000004642 Polyimide Substances 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 229910021382 natural graphite Inorganic materials 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000005266 casting Methods 0.000 description 10
- 238000006722 reduction reaction Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000007770 graphite material Substances 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 239000002356 single layer Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000005229 chemical vapour deposition Methods 0.000 description 8
- 239000003245 coal Substances 0.000 description 8
- 230000006835 compression Effects 0.000 description 8
- 238000007906 compression Methods 0.000 description 8
- 229920002239 polyacrylonitrile Polymers 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 230000009467 reduction Effects 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 238000005411 Van der Waals force Methods 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000002041 carbon nanotube Substances 0.000 description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 6
- 229910021393 carbon nanotube Inorganic materials 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 230000003993 interaction Effects 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000002134 carbon nanofiber Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000002086 nanomaterial Substances 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 238000001878 scanning electron micrograph Methods 0.000 description 5
- 238000001338 self-assembly Methods 0.000 description 5
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 150000001923 cyclic compounds Chemical class 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 239000013081 microcrystal Substances 0.000 description 4
- 229910021392 nanocarbon Inorganic materials 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 230000037361 pathway Effects 0.000 description 4
- 238000010008 shearing Methods 0.000 description 4
- 238000000527 sonication Methods 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 3
- 102000004190 Enzymes Human genes 0.000 description 3
- 108090000790 Enzymes Proteins 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000003763 carbonization Methods 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004050 hot filament vapor deposition Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- 239000002689 soil Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical class NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 239000004988 Nematic liquid crystal Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 206010040844 Skin exfoliation Diseases 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000000502 dialysis Methods 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910003472 fullerene Inorganic materials 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000003077 lignite Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000001706 oxygenating effect Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 2
- 238000002411 thermogravimetry Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000004483 ATR-FTIR spectroscopy Methods 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004976 Lyotropic liquid crystal Substances 0.000 description 1
- 108091034117 Oligonucleotide Proteins 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000000427 antigen Substances 0.000 description 1
- 102000036639 antigens Human genes 0.000 description 1
- 108091007433 antigens Proteins 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 229910021383 artificial graphite Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000005102 attenuated total reflection Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000002051 biphasic effect Effects 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000005539 carbonized material Substances 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000005388 cross polarization Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000035618 desquamation Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007337 electrophilic addition reaction Methods 0.000 description 1
- 230000009881 electrostatic interaction Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000002532 enzyme inhibitor Substances 0.000 description 1
- 229940125532 enzyme inhibitor Drugs 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000003864 humus Substances 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000008863 intramolecular interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 150000004658 ketimines Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 231100000897 loss of orientation Toxicity 0.000 description 1
- 230000002535 lyotropic effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000006263 metalation reaction Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000002114 nanocomposite Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 239000002773 nucleotide Substances 0.000 description 1
- 125000003729 nucleotide group Chemical group 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002296 pyrolytic carbon Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- JVBXVOWTABLYPX-UHFFFAOYSA-L sodium dithionite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])=O JVBXVOWTABLYPX-UHFFFAOYSA-L 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002889 sympathetic effect Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- JOHWNGGYGAVMGU-UHFFFAOYSA-N trifluorochlorine Chemical compound FCl(F)F JOHWNGGYGAVMGU-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62218—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic films, e.g. by using temporary supports
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- C08K13/00—Use of mixtures of ingredients not covered by one single of the preceding main groups, each of these compounds being essential
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- C08L99/00—Compositions of natural macromolecular compounds or of derivatives thereof not provided for in groups C08L89/00 - C08L97/00
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US15/240,543 US9988273B2 (en) | 2016-08-18 | 2016-08-18 | Process for producing highly oriented humic acid films and highly conducting graphitic films derived therefrom |
US15/240,537 | 2016-08-18 | ||
US15/240,537 US10731931B2 (en) | 2016-08-18 | 2016-08-18 | Highly oriented humic acid films and highly conducting graphitic films derived therefrom and devices containing same |
US15/240,543 | 2016-08-18 | ||
PCT/US2017/043485 WO2018034798A1 (en) | 2016-08-18 | 2017-07-24 | Highly oriented humic acid films and highly conducting graphitic films derived therefrom and devices containing same |
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JP2023022851A (ja) * | 2021-08-04 | 2023-02-16 | 国立研究開発法人物質・材料研究機構 | グラフェン材料、その製造方法およびその用途 |
CN113480863A (zh) * | 2021-08-24 | 2021-10-08 | 生态环境部华南环境科学研究所 | 一种氧化石墨烯和腐殖酸二元组装物及其制备方法与应用 |
KR102681354B1 (ko) * | 2021-09-07 | 2024-07-03 | 포항공과대학교 산학협력단 | 층상 구조가 분리된 2차원 물질을 포함하는 나노시트 분산액의 제조 방법 |
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US20070125493A1 (en) | 2005-12-05 | 2007-06-07 | Jang Bor Z | Method for producing highly conductive sheet molding compound, fuel cell flow field plate, and bipolar plate |
WO2011030720A1 (ja) | 2009-09-10 | 2011-03-17 | 日産自動車株式会社 | 燃料電池用ガス拡散層の製造方法、燃料電池用ガス拡散層、および燃料電池 |
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US20150086881A1 (en) | 2013-09-23 | 2015-03-26 | Aruna Zhamu | Large-grain graphene thin film current collector and secondary batteries containing same |
JP2015536900A (ja) | 2012-11-26 | 2015-12-24 | ナノテク インスツルメンツ インク | 単一グラファイト層又はグラフェン単結晶 |
US20160079001A1 (en) | 2014-09-12 | 2016-03-17 | Yi-Jun Lin | Graphene Electrode Based Ceramic Capacitor |
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US8361430B2 (en) * | 2010-01-12 | 2013-01-29 | National Nanomaterials, Inc. | Method and system for producing graphene and graphenol |
WO2013123308A1 (en) * | 2012-02-15 | 2013-08-22 | Arizona Board Of Regents, A Body Corporate Of The State Of Arizona Acting For And On Behalf Of Arizona State University | Multifunctional materials and composites |
CN102760867B (zh) * | 2012-07-25 | 2014-09-10 | 哈尔滨工业大学 | 包含石墨烯基水凝胶的超级电池极板、其制备方法以及由其组装的铅酸超级电池 |
KR101520541B1 (ko) * | 2013-07-02 | 2015-05-14 | 주식회사 두산 | 그래핀투명 폴리아믹산 복합 조성물 및 이를 이용한 배리어 필름 |
KR101535002B1 (ko) * | 2014-01-10 | 2015-07-08 | 인천대학교 산학협력단 | 공액 고분자 및 환원된 산화 그래핀을 포함하는 다층 필름 및 이의 제조 방법 |
US9382117B2 (en) * | 2014-04-03 | 2016-07-05 | Nanotek Instruments, Inc. | Process for producing highly conducting graphitic films from graphene liquid crystals |
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Patent Citations (6)
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US20070125493A1 (en) | 2005-12-05 | 2007-06-07 | Jang Bor Z | Method for producing highly conductive sheet molding compound, fuel cell flow field plate, and bipolar plate |
WO2011030720A1 (ja) | 2009-09-10 | 2011-03-17 | 日産自動車株式会社 | 燃料電池用ガス拡散層の製造方法、燃料電池用ガス拡散層、および燃料電池 |
US20130140495A1 (en) | 2010-01-12 | 2013-06-06 | National Nanomaterials, Inc. | Method and system for producing graphene and functionalized graphene |
JP2015536900A (ja) | 2012-11-26 | 2015-12-24 | ナノテク インスツルメンツ インク | 単一グラファイト層又はグラフェン単結晶 |
US20150086881A1 (en) | 2013-09-23 | 2015-03-26 | Aruna Zhamu | Large-grain graphene thin film current collector and secondary batteries containing same |
US20160079001A1 (en) | 2014-09-12 | 2016-03-17 | Yi-Jun Lin | Graphene Electrode Based Ceramic Capacitor |
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JP2019531999A (ja) | 2019-11-07 |
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