JP6981811B2 - パターン検査装置及びパターン検査方法 - Google Patents

パターン検査装置及びパターン検査方法 Download PDF

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Publication number
JP6981811B2
JP6981811B2 JP2017162076A JP2017162076A JP6981811B2 JP 6981811 B2 JP6981811 B2 JP 6981811B2 JP 2017162076 A JP2017162076 A JP 2017162076A JP 2017162076 A JP2017162076 A JP 2017162076A JP 6981811 B2 JP6981811 B2 JP 6981811B2
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image
inspected
reference image
pixel
shift amount
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JP2019039808A5 (cg-RX-API-DMAC7.html
JP2019039808A (ja
Inventor
昌孝 白土
力 小川
英昭 橋本
和弘 中島
亮一 平野
英雄 土屋
長作 能弾
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Nuflare Technology Inc
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Nuflare Technology Inc
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Priority to US16/104,191 priority patent/US10846846B2/en
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Publication of JP2019039808A5 publication Critical patent/JP2019039808A5/ja
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T3/00—Geometric image transformations in the plane of the image
    • G06T3/40—Scaling of whole images or parts thereof, e.g. expanding or contracting
    • G06T3/4053—Scaling of whole images or parts thereof, e.g. expanding or contracting based on super-resolution, i.e. the output image resolution being higher than the sensor resolution
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G06T5/70—Denoising; Smoothing
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/30—Determination of transform parameters for the alignment of images, i.e. image registration
    • G06T7/32—Determination of transform parameters for the alignment of images, i.e. image registration using correlation-based methods
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G06T2207/10061—Microscopic image from scanning electron microscope
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20016—Hierarchical, coarse-to-fine, multiscale or multiresolution image processing; Pyramid transform
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20021—Dividing image into blocks, subimages or windows
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20024—Filtering details
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Quality & Reliability (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
JP2017162076A 2017-08-25 2017-08-25 パターン検査装置及びパターン検査方法 Active JP6981811B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2017162076A JP6981811B2 (ja) 2017-08-25 2017-08-25 パターン検査装置及びパターン検査方法
US16/104,191 US10846846B2 (en) 2017-08-25 2018-08-17 Pattern inspection apparatus and pattern inspection method

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JP2017162076A JP6981811B2 (ja) 2017-08-25 2017-08-25 パターン検査装置及びパターン検査方法

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JP2019039808A JP2019039808A (ja) 2019-03-14
JP2019039808A5 JP2019039808A5 (cg-RX-API-DMAC7.html) 2020-08-20
JP6981811B2 true JP6981811B2 (ja) 2021-12-17

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10997712B2 (en) * 2018-01-18 2021-05-04 Canon Virginia, Inc. Devices, systems, and methods for anchor-point-enabled multi-scale subfield alignment
JP7215882B2 (ja) * 2018-11-15 2023-01-31 株式会社ニューフレアテクノロジー パターン検査装置及びパターン検査方法
US10762618B1 (en) * 2019-02-14 2020-09-01 United Microelectronics Corp. Mask weak pattern recognition apparatus and mask weak pattern recognition method
JP7264751B2 (ja) * 2019-07-08 2023-04-25 株式会社ニューフレアテクノロジー 検査装置及び検査方法
JP7409988B2 (ja) * 2020-07-29 2024-01-09 株式会社ニューフレアテクノロジー パターン検査装置及び輪郭線同士のアライメント量取得方法
JP2022077420A (ja) * 2020-11-11 2022-05-23 株式会社ニューフレアテクノロジー 画像補正装置、パターン検査装置、及び画像補正方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5654685Y2 (cg-RX-API-DMAC7.html) 1975-12-13 1981-12-19
JP3161849B2 (ja) 1991-12-25 2001-04-25 松下電器産業株式会社 画像データ補間方法および画像データ補間装置
US5430811A (en) 1991-12-25 1995-07-04 Matsushita Electric Industrial Co., Ltd. Method for interpolating missing pixels and an apparatus employing the method
JPH10340347A (ja) * 1997-06-09 1998-12-22 Hitachi Ltd パターン検査方法及びその装置並びに半導体ウエハの製造方法
JP3397101B2 (ja) * 1997-10-29 2003-04-14 株式会社日立製作所 欠陥検査方法および装置
US6947587B1 (en) * 1998-04-21 2005-09-20 Hitachi, Ltd. Defect inspection method and apparatus
JP3524819B2 (ja) * 1999-07-07 2004-05-10 株式会社日立製作所 画像比較によるパターン検査方法およびその装置
JP3993483B2 (ja) * 2002-07-11 2007-10-17 東芝Ｉｔコントロールシステム株式会社 コンピュータ断層撮影装置
JP4402004B2 (ja) * 2005-04-15 2010-01-20 株式会社日立ハイテクノロジーズ 検査装置
JP4203498B2 (ja) * 2005-09-22 2009-01-07 アドバンスド・マスク・インスペクション・テクノロジー株式会社 画像補正装置、パターン検査装置、画像補正方法、及び、パターン欠陥検査方法
JP3161849U (ja) 2010-05-31 2010-08-12 みどり 宮▲崎▼ 医療機器用可撓管保持具
JP4970570B2 (ja) 2010-06-17 2012-07-11 株式会社東芝 パターン検査装置、画像位置合わせ方法及びプログラム
RS56176B1 (sr) 2010-09-30 2017-11-30 Samsung Electronics Co Ltd Postupak za interpolaciju slika pomoću filtera za interpolaciju i uglačavanje
JP6293023B2 (ja) * 2014-09-04 2018-03-14 株式会社ニューフレアテクノロジー 検査方法
US9875536B2 (en) * 2015-03-31 2018-01-23 Kla-Tencor Corp. Sub-pixel and sub-resolution localization of defects on patterned wafers
JP6546509B2 (ja) * 2015-10-28 2019-07-17 株式会社ニューフレアテクノロジー パターン検査方法及びパターン検査装置

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US10846846B2 (en) 2020-11-24
US20190066286A1 (en) 2019-02-28
JP2019039808A (ja) 2019-03-14

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