JP6931084B2 - 光学検査結果に発する計量案内型検査サンプルシェイピング - Google Patents

光学検査結果に発する計量案内型検査サンプルシェイピング Download PDF

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JP6931084B2
JP6931084B2 JP2019559038A JP2019559038A JP6931084B2 JP 6931084 B2 JP6931084 B2 JP 6931084B2 JP 2019559038 A JP2019559038 A JP 2019559038A JP 2019559038 A JP2019559038 A JP 2019559038A JP 6931084 B2 JP6931084 B2 JP 6931084B2
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wafer
interpolation
inspection
controller
data
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JP2020519017A (ja
JP2020519017A5 (enExample
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カウシク サー
カウシク サー
アンドリュー ジェイムズ クロス
アンドリュー ジェイムズ クロス
アントニオ マーニ
アントニオ マーニ
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KLA Corp
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KLA Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q90/00—Scanning-probe techniques or apparatus not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8867—Grading and classifying of flaws using sequentially two or more inspection runs, e.g. coarse and fine, or detecting then analysing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2019559038A 2017-05-05 2018-05-04 光学検査結果に発する計量案内型検査サンプルシェイピング Active JP6931084B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762502459P 2017-05-05 2017-05-05
US62/502,459 2017-05-05
US15/671,230 US10598617B2 (en) 2017-05-05 2017-08-08 Metrology guided inspection sample shaping of optical inspection results
US15/671,230 2017-08-08
PCT/US2018/031002 WO2018204731A1 (en) 2017-05-05 2018-05-04 Metrology guided inspection sample shaping from optical inspection results

Publications (3)

Publication Number Publication Date
JP2020519017A JP2020519017A (ja) 2020-06-25
JP2020519017A5 JP2020519017A5 (enExample) 2021-06-10
JP6931084B2 true JP6931084B2 (ja) 2021-09-01

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JP2019559038A Active JP6931084B2 (ja) 2017-05-05 2018-05-04 光学検査結果に発する計量案内型検査サンプルシェイピング

Country Status (6)

Country Link
US (1) US10598617B2 (enExample)
JP (1) JP6931084B2 (enExample)
KR (1) KR102324687B1 (enExample)
CN (1) CN110582842B (enExample)
TW (1) TWI750368B (enExample)
WO (1) WO2018204731A1 (enExample)

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US10679333B2 (en) * 2018-03-14 2020-06-09 Kla-Tencor Corporation Defect detection, classification, and process window control using scanning electron microscope metrology
WO2021140515A1 (en) * 2020-01-07 2021-07-15 Nova Measuring Instruments Ltd. Detecting outliers and anomalies for ocd metrology machine learning
US11967060B2 (en) * 2020-08-25 2024-04-23 Kla Corporation Wafer level spatial signature grouping using transfer learning
US12443840B2 (en) 2020-10-09 2025-10-14 Kla Corporation Dynamic control of machine learning based measurement recipe optimization
WO2023285138A1 (en) * 2021-07-13 2023-01-19 Asml Holding N.V. Metrology systems with phased arrays for contaminant detection and microscopy
US20230317528A1 (en) * 2022-03-31 2023-10-05 Mellanox Technologies, Ltd. Efficient Semiconductor Metrology Using Machine Learning
WO2025021438A1 (en) * 2023-07-24 2025-01-30 Asml Netherlands B.V. A multiple-device training flow to reduce the time-to-recipe for computational guided inspection

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US6171737B1 (en) 1998-02-03 2001-01-09 Advanced Micro Devices, Inc. Low cost application of oxide test wafer for defect monitor in photolithography process
US6121156A (en) 1998-04-28 2000-09-19 Cypress Semiconductor Corporation Contact monitor, method of forming same and method of analyzing contact-, via-and/or trench-forming processes in an integrated circuit
US6408219B2 (en) 1998-05-11 2002-06-18 Applied Materials, Inc. FAB yield enhancement system
US6701259B2 (en) 2000-10-02 2004-03-02 Applied Materials, Inc. Defect source identifier
US6744266B2 (en) 2000-10-02 2004-06-01 Applied Materials, Inc. Defect knowledge library
US7804994B2 (en) * 2002-02-15 2010-09-28 Kla-Tencor Technologies Corporation Overlay metrology and control method
US6828542B2 (en) 2002-06-07 2004-12-07 Brion Technologies, Inc. System and method for lithography process monitoring and control
US7207017B1 (en) 2004-06-10 2007-04-17 Advanced Micro Devices, Inc. Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results
US7853920B2 (en) 2005-06-03 2010-12-14 Asml Netherlands B.V. Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing
EP1955225A4 (en) * 2005-11-18 2009-11-04 Kla Tencor Tech Corp METHOD AND SYSTEMS FOR USE OF DESIGN DATA IN COMBINATION WITH TEST DATA
US7962866B2 (en) * 2006-12-29 2011-06-14 Cadence Design Systems, Inc. Method, system, and computer program product for determining three-dimensional feature characteristics in electronic designs
WO2008086282A2 (en) 2007-01-05 2008-07-17 Kla-Tencor Corporation Methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions
US8559001B2 (en) * 2010-01-11 2013-10-15 Kla-Tencor Corporation Inspection guided overlay metrology
US9620426B2 (en) * 2010-02-18 2017-04-11 Kla-Tencor Corporation Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation
JP5672941B2 (ja) * 2010-10-21 2015-02-18 ソニー株式会社 画像処理装置、および画像処理方法、並びにプログラム
US8429570B2 (en) * 2010-10-28 2013-04-23 International Business Machines Corporation Pattern recognition with edge correction for design based metrology
US8495527B2 (en) * 2010-10-28 2013-07-23 International Business Machines Corporation Pattern recognition with edge correction for design based metrology
KR101943593B1 (ko) * 2011-04-06 2019-01-30 케이엘에이-텐코 코포레이션 공정 제어를 개선하기 위한 품질 메트릭 제공 방법 및 시스템
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US9110039B2 (en) * 2013-07-25 2015-08-18 Kla-Tencor Corporation Auto-focus system and methods for die-to-die inspection
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KR102548650B1 (ko) * 2014-10-03 2023-06-27 케이엘에이 코포레이션 검증 계측 타겟 및 그 설계
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Also Published As

Publication number Publication date
TW201907156A (zh) 2019-02-16
WO2018204731A1 (en) 2018-11-08
CN110582842B (zh) 2021-02-23
US20180321168A1 (en) 2018-11-08
JP2020519017A (ja) 2020-06-25
CN110582842A (zh) 2019-12-17
TWI750368B (zh) 2021-12-21
KR102324687B1 (ko) 2021-11-10
KR20190138891A (ko) 2019-12-16
US10598617B2 (en) 2020-03-24

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