JP6880019B2 - Cmpモニタリングのための色画像化 - Google Patents
Cmpモニタリングのための色画像化 Download PDFInfo
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- JP6880019B2 JP6880019B2 JP2018524807A JP2018524807A JP6880019B2 JP 6880019 B2 JP6880019 B2 JP 6880019B2 JP 2018524807 A JP2018524807 A JP 2018524807A JP 2018524807 A JP2018524807 A JP 2018524807A JP 6880019 B2 JP6880019 B2 JP 6880019B2
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Description
LHL≦H(x、y)≦UHL且つLSL≦S(x、y)≦USLならば、T(x、y)=1であり、それ以外は、T(x、y)=0である。
・ライン走査カメラよりもむしろ、全体の基板を撮像するカメラが使用され得る。この場合に、基板に対するカメラの動きは必要ではない。
・カメラは、基板の全体の幅未満をカバーすることができる。この場合に、カメラは、2つの垂直な方向において動きを経験することが必要であり、例えば、全体の基板を走査するためにXYステージ上で支持され得る。
・光源は、全体の基板を照らすことができる。この場合に、光源は、基板に対して動く必要がない。
・光検出器は、カラーカメラであるよりもむしろ分光光度計であってよく、その後、スペクトルデータは、HSL色空間に単純化され得る。
・センサアセンブリは、研磨ステーションと研磨ステーションとの間又は研磨ステーションと移送ステーションとの間に配置されるインラインシステムを必要としない。例えば、センサアセンブリは、移送ステーションの範囲内に配置されてもよく、カセットインターフェースユニット内に配置されてもよく、又はスタンドアローンシステムであってもよい。
・均一性解析ステップは、任意選択的である。例えば、閾値変換を適用することによって生成された画像は、フィードフォーワードプロセスの中へ供給されて基板のための後処理ステップを調整するか、又はフィードバックプロセスの中へ供給されて後続基板のための処理ステップを調整することができる。
Claims (10)
- 基板を、該基板の被研磨表面が下向きに露出された状態で保持するための支持体、
前記基板の下方に研磨パッドを支持するためのプラテンを含む研磨ステーション、
前記研磨ステーション内において前記基板の前記被研磨表面を研磨する前又は研磨した後で前記基板を測定するインライン計測ステーションであって、
前記基板の下方に配されたカラーライン走査カメラであって、前記基板の走査中に前記基板の前記被研磨表面に平行な第1の軸に沿って配置され、且つ前記カラーライン走査カメラの視野が射影歪みなく前記基板の幅に及ぶように前記基板の幅にわたる検出器要素を有する、カラーライン走査カメラと、
前記基板の下方に配された細長い白色光源であって、前記第1の軸に平行な長手方向軸を有し、前記基板の走査中にゼロではない入射角において前記基板の前記被研磨表面に光を向けるように且つ前記基板の幅にわたる直線的な細長い領域を照らすように構成された、細長い白色光源と、
前記細長い白色光源と前記カラーライン走査カメラを前記基板の下方において支持するフレームと、
前記細長い白色光源と前記カラーライン走査カメラに前記基板全体を走査させるために前記第1の軸と垂直な第2の軸に沿って前記フレームと前記支持体との間の相対的な動きをもたらすモータと、を含むインライン計測ステーション、及び
前記カラーライン走査カメラから色データを受信し、前記色データから二次元色画像を生成し、前記二次元色画像に基づいて前記研磨ステーションにおける研磨を制御するように構成されたコントローラを備える、研磨システム。 - 前記細長い白色光源と前記基板との間の光の経路内にディフューザーを備える、請求項1に記載の研磨システム。
- 前記基板と前記カラーライン走査カメラとの間の光経路内に円偏光子を備える、請求項1または2に記載の研磨システム。
- 前記フレームが固定されており、前記モータが、前記支持体を動かして前記基板を走査させるように構成されている、請求項1から3のいずれか一項に記載の研磨システム。
- 前記モータが前記フレームに連結されており、前記基板が静止した状態で前記支持体に保持されている間に、前記モータが、前記フレームを動かして前記基板を走査させるように構成されている、請求項1から3のいずれか一項に記載の研磨システム。
- 別の1つの研磨ステーション又は移送ステーションをさらに備え、
前記支持体が、前記研磨パッドに接触するように前記基板を保持し、かつ前記別の1つの研磨ステーション又は移送ステーションと前記研磨ステーションとの間で前記基板を移動させるためのキャリアヘッドを備え、
前記カラーライン走査カメラ、前記細長い白色光源および前記フレームが、前記基板の下方において、前記研磨ステーションと前記別の1つの研磨ステーション又は移送ステーションとの間に配置されている、請求項1から5のいずれか一項に記載の研磨システム。 - 前記別の1つの研磨ステーション又は移送ステーションと前記研磨ステーションとの間の、前記基板の移動経路が、前記第2の軸に沿った経路である、請求項6に記載の研磨システム。
- 前記支持体が、移送ロボットを備え、前記インライン計測ステーションが、カセットインターフェースユニット内に配置されている、請求項1から3のいずれか一項に記載の研磨システム。
- 前記コントローラが、前記二次元色画像を色相・彩度・輝度色空間に変換し、前記色相・彩度・輝度色空間内の前記二次元色画像からの色相値及び彩度値をそれぞれの色相閾値及び彩度閾値と比較して閾値処理された画像を生成し、前記閾値処理された画像に基づいて前記研磨ステーションにおける研磨を制御するように構成されている、請求項1から8のいずれか一項に記載の研磨システム。
- 前記コントローラが、前記閾値処理された画像内の画素がオンかオフかを判定することにおいて、前記色相・彩度・輝度色空間内の前記二次元色画像からの輝度値を閾値と比較しないように構成されている、請求項9に記載の研磨システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/942,777 | 2015-11-16 | ||
US14/942,777 US10565701B2 (en) | 2015-11-16 | 2015-11-16 | Color imaging for CMP monitoring |
PCT/US2016/059501 WO2017087140A1 (en) | 2015-11-16 | 2016-10-28 | Color imaging for cmp monitoring |
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Publication Number | Publication Date |
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JP2019502256A JP2019502256A (ja) | 2019-01-24 |
JP2019502256A5 JP2019502256A5 (ja) | 2020-05-14 |
JP6880019B2 true JP6880019B2 (ja) | 2021-06-02 |
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JP2018524807A Active JP6880019B2 (ja) | 2015-11-16 | 2016-10-28 | Cmpモニタリングのための色画像化 |
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US (2) | US10565701B2 (ja) |
JP (1) | JP6880019B2 (ja) |
KR (1) | KR102668141B1 (ja) |
CN (2) | CN115555982A (ja) |
SG (1) | SG11201803216WA (ja) |
TW (2) | TWI757154B (ja) |
WO (1) | WO2017087140A1 (ja) |
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Publication number | Priority date | Publication date | Assignee | Title |
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US10565701B2 (en) * | 2015-11-16 | 2020-02-18 | Applied Materials, Inc. | Color imaging for CMP monitoring |
US11557048B2 (en) | 2015-11-16 | 2023-01-17 | Applied Materials, Inc. | Thickness measurement of substrate using color metrology |
TWI784719B (zh) | 2016-08-26 | 2022-11-21 | 美商應用材料股份有限公司 | 獲得代表在基板上的層的厚度的測量的方法,及量測系統和電腦程式產品 |
WO2019177841A1 (en) | 2018-03-13 | 2019-09-19 | Applied Materials, Inc. | Consumable part monitoring in chemical mechanical polisher |
JP7197999B2 (ja) * | 2018-05-11 | 2022-12-28 | キオクシア株式会社 | 研磨装置および研磨パッド |
WO2020068345A1 (en) * | 2018-09-24 | 2020-04-02 | Applied Materials, Inc. | Machine vision as input to a cmp process control algorithm |
US11315232B2 (en) | 2018-10-22 | 2022-04-26 | Applied Materials, Inc. | Residue detection using a luminance histogram |
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