JP6874930B2 - ドープされた炭素層を製造するためのコーティング源 - Google Patents
ドープされた炭素層を製造するためのコーティング源 Download PDFInfo
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- JP6874930B2 JP6874930B2 JP2017548472A JP2017548472A JP6874930B2 JP 6874930 B2 JP6874930 B2 JP 6874930B2 JP 2017548472 A JP2017548472 A JP 2017548472A JP 2017548472 A JP2017548472 A JP 2017548472A JP 6874930 B2 JP6874930 B2 JP 6874930B2
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- dopant
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 97
- 238000000576 coating method Methods 0.000 title claims description 89
- 239000011248 coating agent Substances 0.000 title claims description 81
- 229910052799 carbon Inorganic materials 0.000 title claims description 71
- 239000002019 doping agent Substances 0.000 claims description 84
- 239000000843 powder Substances 0.000 claims description 51
- 239000002245 particle Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 238000005245 sintering Methods 0.000 claims description 22
- 229910052752 metalloid Inorganic materials 0.000 claims description 21
- 238000005240 physical vapour deposition Methods 0.000 claims description 18
- 150000002738 metalloids Chemical class 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 14
- 229910052719 titanium Inorganic materials 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 14
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 13
- 239000011159 matrix material Substances 0.000 claims description 13
- 229910052721 tungsten Inorganic materials 0.000 claims description 11
- 239000010937 tungsten Substances 0.000 claims description 11
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 10
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- 239000011651 chromium Substances 0.000 claims description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims description 10
- 239000011733 molybdenum Substances 0.000 claims description 10
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 10
- 229910052735 hafnium Inorganic materials 0.000 claims description 9
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 9
- 150000004767 nitrides Chemical class 0.000 claims description 9
- 229910052720 vanadium Inorganic materials 0.000 claims description 9
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 8
- -1 metalloid nitrides Chemical class 0.000 claims description 8
- 229910052758 niobium Inorganic materials 0.000 claims description 8
- 239000010955 niobium Substances 0.000 claims description 8
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 8
- 229910052715 tantalum Inorganic materials 0.000 claims description 8
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- 230000006835 compression Effects 0.000 claims description 7
- 238000007906 compression Methods 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 238000005087 graphitization Methods 0.000 claims description 2
- 238000003754 machining Methods 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 6
- 150000004706 metal oxides Chemical class 0.000 claims 2
- 229910052914 metal silicate Inorganic materials 0.000 claims 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 52
- 239000000463 material Substances 0.000 description 29
- 229910002804 graphite Inorganic materials 0.000 description 26
- 239000010439 graphite Substances 0.000 description 26
- 229910003481 amorphous carbon Inorganic materials 0.000 description 18
- 238000001704 evaporation Methods 0.000 description 12
- 239000012071 phase Substances 0.000 description 10
- 238000005229 chemical vapour deposition Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 238000009826 distribution Methods 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000010298 pulverizing process Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- 238000002490 spark plasma sintering Methods 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- UHPOHYZTPBGPKO-UHFFFAOYSA-N bis(boranylidyne)chromium Chemical compound B#[Cr]#B UHPOHYZTPBGPKO-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000000571 coke Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000011863 silicon-based powder Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910021383 artificial graphite Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910021382 natural graphite Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
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- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/52—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite
- C04B35/528—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite obtained from carbonaceous particles with or without other non-organic components
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
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- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/008—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression characterised by the composition
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
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- C01B32/921—Titanium carbide
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- C01B32/00—Carbon; Compounds thereof
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- C01B32/963—Preparation from compounds containing silicon
- C01B32/984—Preparation from elemental silicon
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Description
実施例1として、75mmの直径と5mmの厚さを有する円形プレス粗材の形状をしたターゲットを、グラファイト(C)とケイ素(Si)とからなる粉末混合物から製造した。出発原料としては、混合比が10/90モル%であるSi粉末及びC粉末(約10μmの平均粒子径d50)からなる混合物約1.5kgを使用し、この混合物を、5Lのイソプロパノール及び5kgの窒化ケイ素からなる粉砕媒体を加えて4時間、ポットローラー内で湿式粉砕した。粉砕媒体の分離後に、粉末バッチを約100℃でアルコール蒸発によって乾燥させ、続いて1mmの網目サイズを有するふるい装置において分別した。それによって生じたSi/C粉末バッチの化学分析によって、10モル%のSi比率と90モル%の炭素含有量が示された。続いて、その粉末混合物を、スパークプラズマ焼結装置(SPS装置)において、グラファイトのプレス工具を用いて30MPaの圧縮圧で圧縮し、直接通電により、2,100℃の温度で焼結することにより、85mmの直径と8mmの厚さを有する円形プレス粗材を得た。2,100℃の焼結温度において、材料の理論密度の88%に相当する1.90g/cm3の密度が得られた。焼結された円形プレス粗材は、切削加工によって、75mmの直径と5mmの厚さを有するターゲットに最終加工された。
実施例2においては、チタンでドープされた炭素層を蒸着するための、チタンでドープされたコーティング源を製造した。75mmの直径と5mmの厚さを有する円形プレス粗材の形をしたターゲットのための出発材料として、Ti粉末とC粉末からなり混合比が10/90モル%である約1.5kgの混合物(約10μmの平均粒子径d50)を使用し、その混合物を、5Lのイソプロピル及び5kgのケイ素窒化物からなる粉砕媒体を加えて4時間ポットローラー内で湿式粉砕した。個々の製造工程は実施例1における製造工程と同様であり、乾燥させた粉末混合物を30MPaのプレス圧と2,100℃の温度において直接通電法で焼結し、続いて機械加工した。焼結された試料の検鏡用薄切片について実施したXRD検査により、チタンが、炭素との反応の結果、組織内において炭化チタンの形でのみ存在することが示された。
実施例3においては、二ホウ化クロムでドープされた炭素層の物理蒸着用のターゲットを製造した。その製造工程は、前の実施例における製造工程と同様である。75mmの直径と5mmの厚さを有する円形プレス粗材の形をしたターゲットのための出発材料として、二ホウ化クロム粉末及びC粉末からなり混合比が10/90モル%である1.5kgの混合物(10μmの平均粒子径d50)を使用し、その混合物を5Lのイソプロピル及び5kgのケイ素窒化物からなる粉砕媒体とを加えて4時間ポットローラー内で湿式粉砕した。乾燥した粉末混合物を、30MPaのプレス圧と2,100℃の温度で焼結して85mmの直径と8mmの厚さを有する円形プレス粗材を得、続いて機械的に後処理した。焼結された試料の検鏡用薄切片について実施されたXRD検査により、ドーパントが炭素と反応していない形で存在することが示された。
Claims (8)
- ドープされた炭素層の物理蒸着用のコーティング源の製造方法であって、
前記コーティング源は、75モル%以上の割合を有するマトリックス材料としての炭素と、1モル%と25モル%との間の割合を有する少なくとも1つのドーパントとを含有し、前記ドーパントが、チタン、バナジウム、クロム、ジルコニウム、ニオブ、モリブデン、ハフニウム、タンタル、タングステン及びケイ素からなる群から選択された元素、半金属、金属酸化物、半金属酸化物、金属窒化物、半金属窒化物、金属ホウ化物、半金属ホウ化物、金属ケイ化物又は半金属ケイ化物、のいずれかであり、前記ドーパントが炭素マトリックス中に粒子の形で細かく分散されて包埋され、前記コーティング源の組織が少なくとも2つの異なる結晶相を有し、その内の少なくとも1つの相がドーパントを含有し、前記コーティング源の密度が理論密度の80%よりも大きく、前記炭素マトリックスとして使われる炭素含有粉末の粒子及び前記ドーパントを含有するドーパント含有粉末の粒子の平均粒子径が50μmよりも小さいものであり、
・前記炭素含有粉末と前記ドーパント含有粉末とからなる粉末混合物を製造する工程と、
・前記粉末混合物を、5〜50MPaの圧力下において、1,300℃〜3,000℃までの温度で、直接通電での焼結により又は熱間圧縮により焼結して賦形体を得る工程と、
・前記焼結された賦形体を機械加工してコーティング源を得る工程と、
を少なくとも含むことを特徴とする、製造方法。 - 前記ドーパントが、チタン、バナジウム、クロム、ジルコニウム、ニオブ、モリブデン、ハフニウム、タンタル、タングステン及びケイ素からなる群から選択された元素、チタン、バナジウム、クロム、ジルコニウム、ニオブ、モリブデン、ハフニウム、タンタル及びタングステンからなる群から選択された元素の酸化物、窒化物、ホウ化物若しくはケイ化物、又はケイ素の酸化物、窒化物若しくはホウ化物、のいずれかであることを特徴とする請求項1に記載の製造方法。
- 前記焼結された賦形体が、焼結プロセス後に、グラファイト化のために外部圧力を追加的に印加することなしに、2,000℃から3,000℃までの範囲の温度で、熱処理されることを特徴とする請求項1又は2に記載の製造方法。
- ドープされた炭素層を製造するための物理蒸着用のコーティング源であって、
請求項1〜3項のいずれか1項に記載の前記粉末混合物から焼結により製造さ
れており、前記コーティング源が少なくとも75モル%の割合を有するマトリックス材料としての炭素と、1モル%と25モル%との間の割合を有する少なくとも1つのドーパントを含有し、前記ドーパントが、チタン、バナジウム、クロム、ジルコニウム、ニオブ、モリブデン、ハフニウム、タンタル、タングステン及びケイ素からなる群から選択された元素、半金属、金属酸化物、半金属酸化物、金属窒化物、半金属窒化物、金属ホウ化物、半金属ホウ化物、金属ケイ化物又は半金属ケイ化物、のいずれかであり、前記ドーパントが炭素マトリックス中に粒子の形で細かく分散されて包埋され、前記コーティング源の組織が少なくとも2つの異なる結晶相を有し、その内の少なくとも1つの相が前記ドーパントを含有し、前記コーティング源の密度が理論密度の80%よりも大きいコーティング源。 - 前記ドーパントが、チタン、バナジウム、クロム、ジルコニウム、ニオブ、モリブデン、ハフニウム、タンタル、タングステン及びケイ素からなる群から選択された元素、又はチタン、バナジウム、クロム、ジルコニウム、ニオブ、モリブデン、ハフニウム、タンタル及びタングステンからなる群から選択された元素の酸化物、窒化物、ホウ化物若しくはケイ化物、又はケイ素の酸化物、窒化物若しくはホウ化物、のいずれかであることを特徴とする請求項4に記載のコーティング源。
- 前記ドーパント含有粉末の粒子の平均間隔が50μmよりも小さいことを特徴とする請求項4又は5に記載のコーティング源。
- 前記組織が配向性構造を有することを特徴とする請求項4〜6のいずれか1項に記載のコーティング源。
- ドープされた炭素層を蒸着するための請求項4〜6のいずれか1項に記載のコーティング源の使用。
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CN113913735B (zh) * | 2021-09-07 | 2022-06-24 | 广州今泰科技股份有限公司 | 一种钒/钇共掺杂dlc涂层及其制备方法 |
AT18142U1 (de) * | 2023-02-08 | 2024-03-15 | Plansee Composite Mat Gmbh | Siliziumhaltige übergangsmetallboridverdampfungsquelle |
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GB9910842D0 (en) * | 1999-05-10 | 1999-07-07 | Univ Nanyang | Composite coatings |
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CN102363215A (zh) * | 2011-11-04 | 2012-02-29 | 中南大学 | 铬铝合金靶材的粉末真空热压烧结制备方法 |
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KR102622490B1 (ko) | 2024-01-08 |
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EP3271497A1 (de) | 2018-01-24 |
WO2016146256A1 (de) | 2016-09-22 |
US10781102B2 (en) | 2020-09-22 |
CN107406971B (zh) | 2020-07-24 |
AT14701U1 (de) | 2016-04-15 |
KR20170129749A (ko) | 2017-11-27 |
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US20180105421A1 (en) | 2018-04-19 |
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