JP6872385B2 - 露光装置、基板処理装置、基板の露光方法および基板処理方法 - Google Patents
露光装置、基板処理装置、基板の露光方法および基板処理方法 Download PDFInfo
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- JP6872385B2 JP6872385B2 JP2017038237A JP2017038237A JP6872385B2 JP 6872385 B2 JP6872385 B2 JP 6872385B2 JP 2017038237 A JP2017038237 A JP 2017038237A JP 2017038237 A JP2017038237 A JP 2017038237A JP 6872385 B2 JP6872385 B2 JP 6872385B2
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017038237A JP6872385B2 (ja) | 2017-03-01 | 2017-03-01 | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
| PCT/JP2017/036258 WO2018159006A1 (ja) | 2017-03-01 | 2017-10-05 | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
| TW106135709A TWI682433B (zh) | 2017-03-01 | 2017-10-18 | 曝光裝置、基板處理裝置、基板曝光方法以及基板處理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017038237A JP6872385B2 (ja) | 2017-03-01 | 2017-03-01 | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018146617A JP2018146617A (ja) | 2018-09-20 |
| JP2018146617A5 JP2018146617A5 (enExample) | 2020-04-23 |
| JP6872385B2 true JP6872385B2 (ja) | 2021-05-19 |
Family
ID=63369850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017038237A Active JP6872385B2 (ja) | 2017-03-01 | 2017-03-01 | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6872385B2 (enExample) |
| TW (1) | TWI682433B (enExample) |
| WO (1) | WO2018159006A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6985803B2 (ja) * | 2017-03-01 | 2021-12-22 | 株式会社Ｓｃｒｅｅｎホールディングス | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
| CN120469170A (zh) | 2019-09-19 | 2025-08-12 | 株式会社斯库林集团 | 曝光装置 |
| WO2025110042A1 (ja) * | 2023-11-22 | 2025-05-30 | 東京エレクトロン株式会社 | 処理装置及び処理方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000091207A (ja) * | 1998-09-14 | 2000-03-31 | Nikon Corp | 投影露光装置及び投影光学系の洗浄方法 |
| JP2001284224A (ja) * | 2000-03-30 | 2001-10-12 | Nikon Corp | 露光装置及び露光方法 |
| JP2002164267A (ja) * | 2000-11-22 | 2002-06-07 | Nikon Corp | 露光装置及びデバイスの製造方法 |
| JP2003115433A (ja) * | 2001-10-02 | 2003-04-18 | Nikon Corp | 露光方法及び露光装置 |
| JP4677833B2 (ja) * | 2004-06-21 | 2011-04-27 | 株式会社ニコン | 露光装置、及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法 |
| JP6197641B2 (ja) * | 2013-12-26 | 2017-09-20 | ウシオ電機株式会社 | 真空紫外光照射処理装置 |
| JP6543064B2 (ja) * | 2015-03-25 | 2019-07-10 | 株式会社Ｓｃｒｅｅｎホールディングス | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
-
2017
- 2017-03-01 JP JP2017038237A patent/JP6872385B2/ja active Active
- 2017-10-05 WO PCT/JP2017/036258 patent/WO2018159006A1/ja not_active Ceased
- 2017-10-18 TW TW106135709A patent/TWI682433B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI682433B (zh) | 2020-01-11 |
| TW201842543A (zh) | 2018-12-01 |
| JP2018146617A (ja) | 2018-09-20 |
| WO2018159006A1 (ja) | 2018-09-07 |
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