JP6858786B2 - 銅−セラミックス複合材料 - Google Patents
銅−セラミックス複合材料 Download PDFInfo
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- JP6858786B2 JP6858786B2 JP2018544121A JP2018544121A JP6858786B2 JP 6858786 B2 JP6858786 B2 JP 6858786B2 JP 2018544121 A JP2018544121 A JP 2018544121A JP 2018544121 A JP2018544121 A JP 2018544121A JP 6858786 B2 JP6858786 B2 JP 6858786B2
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- 239000000919 ceramic Substances 0.000 title claims description 163
- 239000002131 composite material Substances 0.000 title claims description 56
- 239000002245 particle Substances 0.000 claims description 179
- 239000010949 copper Substances 0.000 claims description 127
- 239000000758 substrate Substances 0.000 claims description 114
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 99
- 229910052802 copper Inorganic materials 0.000 claims description 77
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 66
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 45
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 45
- 238000000576 coating method Methods 0.000 claims description 40
- 239000011248 coating agent Substances 0.000 claims description 37
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 9
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 9
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 2
- 239000000292 calcium oxide Substances 0.000 claims description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 2
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 2
- 239000000395 magnesium oxide Substances 0.000 claims description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 2
- 238000009826 distribution Methods 0.000 description 48
- 239000011889 copper foil Substances 0.000 description 23
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 15
- 239000002994 raw material Substances 0.000 description 10
- 230000006872 improvement Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000035939 shock Effects 0.000 description 8
- 238000005452 bending Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 238000001878 scanning electron micrograph Methods 0.000 description 7
- 238000010561 standard procedure Methods 0.000 description 6
- 238000010304 firing Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- 239000005751 Copper oxide Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 229910000431 copper oxide Inorganic materials 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 238000000879 optical micrograph Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000013001 point bending Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052596 spinel Inorganic materials 0.000 description 2
- 239000011029 spinel Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- JRBRVDCKNXZZGH-UHFFFAOYSA-N alumane;copper Chemical compound [AlH3].[Cu] JRBRVDCKNXZZGH-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
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Description
− 酸化アルミニウムを含むセラミック基板と、
− 前記セラミック基板上に存在する、銅又は銅合金からなる被膜と、を有し、
前記酸化アルミニウムの各粒子が、最大粒子径dK,max、dK,maxの長さを半分にする箇所においてdK,maxに直交する粒子径dK,ortho及び形状係数RK=dK,ortho/dK,maxを有し、前記酸化アルミニウムは、前記各粒子の形状係数RKの算術平均として求められる平均粒子形状係数Ra(Al2O3)が少なくとも0.4である、
上記銅−セラミックス複合材料により達成される。
9.5≧(d95−d5)/d50≧0.7
4.0≧(d95−d5)/d50≧0.5
− 銅箔を酸化して、表面に酸化銅層を形成する;
− 酸化銅層を形成した銅箔をセラミック基板に載せる;
− 複合材料を<1083℃の温度(例えば1065℃から1080℃の温度範囲内)で加熱する;
− 室温まで冷却する。
0.7≦S(Al2O3)/S(Cu)≦1.4。
0.74≦S(Al2O3)/S(Cu)≦1.35;
さらに好ましくは以下の条件を満たす:
0.80≦S(Al2O3)/S(Cu)≦1.25。
0.5≦Ra(Al2O3)/Ra(Cu)≦2.0。
0.75≦Ra(Al2O3)/Ra(Cu)≦1.5であり、
なおより好ましくは、
0.80≦Ra(Al2O3)/Ra(Cu)≦1.20
である。
(i) dmin(Al2O3)/dmax(Cu)≧1x10−5;
(ii) 2.5≧dmax(Al2O3)/dmin(Cu)。
(i) dmin(Al2O3)/dmax(Cu)≧0.001;
(ii) 1.5≧dmax(Al2O3)/dmin(Cu);
最も好ましくは以下の条件(i)及び(ii)を満たす:
(i) dmin(Al2O3)/dmax(Cu)≧0.002;
(ii) 1.0≧dmax(Al2O3)/dmin(Cu)。
(i) 0.005≧dmin(Al2O3)/dmax(Cu)≧0.002;かつ
(ii) 1.0≧dmax(Al2O3)/dmin(Cu)≧0.05である。
セラミック基板の表面の走査顕微鏡写真(SEM像)を撮影する。研磨切片の形態の特別な試料調製は不要である。SEM像は、セラミック基板の銅で覆われていた箇所をエッチングにより露出させて撮影する。
銅又は銅合金からなる被膜の表面の光学顕微鏡写真を撮る(被覆された基板表面と平行)。研磨切片の形態の特別な試料調製は不要である。
(酸化アルミニウム)
粒子サイズ分布の測定に用いたSEM像を用いる。
最も長い寸法dK,maxを求める。続いて、dK,maxの長さを半分にする箇所においてdK,maxに直交する粒子径dK,orthoを求める。個々の粒子RKの形状係数は、dK,maxに対するdK,orthoの比、すなわちRK=dK,ortho/dK,maxとして得られる。
粒子サイズ分布の測定に用いた光学顕微鏡写真を用いる。
本発明において、銅被膜をセラミック基板に貼り付けるために好ましく用いられる典型的な方法は、例えば文書US3744120、US3994430、EP0085914A又はDE2319854Aにより公知であり、これらの対応する開示は、本発明に参照により援用される。
銅−セラミックス複合材料1、以下「K−K−V1」と称する(本発明)
銅−セラミックス複合材料2、以下「K−K−V2」と称する(本発明)
銅−セラミックス複合材料3、以下「K−K−V3」と称する(比較試料)
セラミック基板の厚さ:0.38mm;
セラミック基板の長さx幅:190x140mm2であった。
Claims (7)
- 銅−セラミックス複合材料であって、
− セラミック基板であって、酸化ジルコニウムを有さない酸化アルミニウムを少なくとも95重量%、又は、ZrO2強化酸化アルミニウムを少なくとも96重量%含む、セラミック基板と、
− 前記セラミック基板上に直接存在する銅又は銅合金からなる被膜と、を有し、
前記ZrO2強化酸化アルミニウムは全質量に対して酸化ジルコニウムを0.5重量%から30重量%の割合で含み、
前記酸化アルミニウムの各粒子が、最大粒子径dK,max、dK,maxの長さを半分にする箇所においてdK,maxに直交する粒子径dK,ortho及び形状係数RK=dK,ortho/dK,maxを有し、前記酸化アルミニウムは、前記各粒子の形状係数RKの算術平均として求められる平均粒子形状係数Ra(Al2O3)が少なくとも0.8である、
上記銅−セラミックス複合材料。 - 前記酸化ジルコニウムが、酸化イットリウム、酸化カルシウム、酸化セリウム又は酸化マグネシウムにより、酸化ジルコニウム及び酸化アルミニウムの全質量に対して最大5重量%の割合でドープされている、請求項1に記載の銅−セラミックス複合材料。
- 前記酸化アルミニウムは、粒子サイズが0.01μmから25μmの範囲内、より好ましくは0.3μmから23μmの範囲内、さらに好ましくは0.5μmから20μmである、請求項1又は請求項2に記載の銅−セラミックス複合材料。
- 銅又は銅合金からなる前記被膜が、DCB法によって前記セラミック基板に貼り付けられる、請求項1から請求項3のいずれか1項に記載の銅−セラミックス複合材料。
- 銅又は銅合金からなる前記被膜が、少なくとも部分的に電気接触部を形成する構造化部を有する、請求項1から請求項4のいずれか1項に記載の銅−セラミックス複合材料。
- 銅又は銅合金からなる前記被膜は、その面積の少なくとも70%に渡って、厚さが0.2mmから1.2mmの範囲内であり;及び/又は、前記セラミック基板は、その面積の少なくとも70%に渡って、厚さが0.2mmから1.2mmの範囲内である、請求項1から請求項5のいずれか1項に記載の銅−セラミックス複合材料。
- 請求項1から請求項6のいずれか1項に記載の銅−セラミックス複合材料を少なくとも1種と、1又は2以上のボンドワイヤーとを含むモジュール。
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