JP6858634B2 - 保持テーブル - Google Patents
保持テーブル Download PDFInfo
- Publication number
- JP6858634B2 JP6858634B2 JP2017093493A JP2017093493A JP6858634B2 JP 6858634 B2 JP6858634 B2 JP 6858634B2 JP 2017093493 A JP2017093493 A JP 2017093493A JP 2017093493 A JP2017093493 A JP 2017093493A JP 6858634 B2 JP6858634 B2 JP 6858634B2
- Authority
- JP
- Japan
- Prior art keywords
- holding
- annular
- work
- grinding
- dressing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000014759 maintenance of location Effects 0.000 title claims 2
- 230000003028 elevating effect Effects 0.000 claims description 25
- 238000004891 communication Methods 0.000 claims description 10
- 238000005498 polishing Methods 0.000 description 30
- 238000005520 cutting process Methods 0.000 description 13
- 238000003825 pressing Methods 0.000 description 12
- 235000012431 wafers Nutrition 0.000 description 10
- 238000012545 processing Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 5
- 239000006061 abrasive grain Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Images
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
11 基台テーブル
12 保持面
13 ワーク保持テーブル
15 環状テーブル
19 環状上面
21 ガイド
22 シリンダ(昇降手段)
33 ピストン
34 ケーシング
34a 昇降室
37 連通路
37a 供給排気口
41 エア供給源
42 吸引源
W 板状ワーク
Claims (1)
- 円板ワークを保持する保持テーブルであって、
円板状の基台テーブルと、該基台テーブルの中心軸に中心を一致させ該基台テーブルの上に該基台テーブルより小径で上面に円板ワークを保持する保持面を有するワーク保持テーブルと、該ワーク保持テーブルの外側で該基台テーブルの環状上面に配設される環状テーブルと、該環状テーブルを昇降させる昇降手段と、該環状テーブルを昇降方向に案内し、該保持面の中心を中心に等角度で配設される複数のガイドと、を備え、
該昇降手段は、
該保持面の中心を中心に所定角度で配設される複数のピストンと、
該ピストンを昇降可能に収容する昇降室を有するケーシングと、を備え、
該基台テーブルは、
該環状上面に形成し該昇降室にエアの供給または該昇降室からエアを排出させる供給排気口と、該供給排気口とエア供給源または該供給排気口と吸引源とを連通する連通路とを備える保持テーブル。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017093493A JP6858634B2 (ja) | 2017-05-10 | 2017-05-10 | 保持テーブル |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017093493A JP6858634B2 (ja) | 2017-05-10 | 2017-05-10 | 保持テーブル |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018187730A JP2018187730A (ja) | 2018-11-29 |
JP6858634B2 true JP6858634B2 (ja) | 2021-04-14 |
Family
ID=64477667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017093493A Active JP6858634B2 (ja) | 2017-05-10 | 2017-05-10 | 保持テーブル |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6858634B2 (ja) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001341061A (ja) * | 2000-06-02 | 2001-12-11 | Toshiba Mach Co Ltd | ドレッシング装置 |
JP2002075935A (ja) * | 2000-08-30 | 2002-03-15 | Nikon Corp | 研磨装置 |
JP2008294093A (ja) * | 2007-05-22 | 2008-12-04 | Nikon Corp | 研磨装置、半導体デバイス及び半導体デバイス製造方法 |
JP5115839B2 (ja) * | 2007-07-20 | 2013-01-09 | 株式会社ニコン | 研磨装置 |
JP5221092B2 (ja) * | 2007-09-28 | 2013-06-26 | 株式会社岡本工作機械製作所 | 半導体基板ホルダー機構およびそれを用いて基板を研削する方法 |
JP2009095952A (ja) * | 2007-10-18 | 2009-05-07 | Denso Corp | ウェハの製造方法 |
-
2017
- 2017-05-10 JP JP2017093493A patent/JP6858634B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2018187730A (ja) | 2018-11-29 |
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