JP6836959B2 - プラズマ処理装置、処理システム、及び、多孔質膜をエッチングする方法 - Google Patents
プラズマ処理装置、処理システム、及び、多孔質膜をエッチングする方法 Download PDFInfo
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- JP6836959B2 JP6836959B2 JP2017097557A JP2017097557A JP6836959B2 JP 6836959 B2 JP6836959 B2 JP 6836959B2 JP 2017097557 A JP2017097557 A JP 2017097557A JP 2017097557 A JP2017097557 A JP 2017097557A JP 6836959 B2 JP6836959 B2 JP 6836959B2
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Description
Claims (18)
- 多孔質膜をエッチングするためのプラズマ処理装置であって、
チャンバを提供するチャンバ本体と、
前記チャンバ内に設けられたステージであり、冷媒用の流路が形成された、該ステージと、
前記多孔質膜内においてその毛管凝縮が生じる第1のガス、及び、前記多孔質膜のエッチング用の第2のガスを前記チャンバに供給するためのガス供給系と、
前記チャンバに供給されるガスのプラズマを生成するためのプラズマ生成部と、
を備え、
前記ガス供給系は、前記第2のガスのソースを前記チャンバに接続する第1の流路、前記第1のガスのソースを前記第1の流路に接続する第2の流路、及び、排気装置を前記第2の流路に接続する第3の流路を提供する、
プラズマ処理装置。 - 前記ガス供給系は、
前記第2の流路上に設けられたコントロールバルブと、
前記コントロールバルブの下流において前記第2の流路の終端を画成する第1のオリフィス部材と、
前記第2の流路の前記終端を前記第1の流路に対して開閉する第1の開閉バルブであり、前記第1の流路と前記第2の流路の接続箇所に設けられた、該1の開閉バルブと、
を有する、請求項1に記載のプラズマ処理装置。 - 前記ガス供給系は、
前記第3の流路を部分的に画成する第2のオリフィス部材と、
前記第2のオリフィス部材と前記排気装置との間において前記第3の流路上に設けられた第2の開閉バルブと、
を更に有する、請求項2に記載のプラズマ処理装置。 - 前記ガス供給系は、
前記第2の流路上に設けられた第1の開閉バルブと、
前記第3の流路上に設けられた第2の開閉バルブと、
を有する、請求項1に記載のプラズマ処理装置。 - 前記第1の流路、前記第2の流路、及び、前記第3の流路を提供する配管を加熱するためのヒータを更に備える、請求項1〜4の何れか一項に記載のプラズマ処理装置。
- 前記チャンバ本体を加熱するヒータを更に備える、請求項1〜5の何れか一項に記載のプラズマ処理装置。
- 請求項1〜6の何れか一項に記載のプラズマ処理装置と、
前記プラズマ処理装置の前記チャンバに接続可能であり、且つ、減圧可能な搬送チャンバを提供し、該搬送チャンバ内に設けられた、被加工物を搬送するための搬送装置を有する搬送モジュールと、
前記搬送チャンバに接続可能な別のチャンバを提供し、該別のチャンバ内において被加工物を加熱するよう構成された加熱処理装置と、
を備える、処理システム。 - 請求項1〜6の何れか一項に記載のプラズマ処理装置又は請求項7に記載の処理システムを用いて、多孔質膜をエッチングする方法であって、該方法は、前記多孔質膜、及び、該多孔質膜上に設けられ該多孔質膜を部分的に露出させる開口を提供するマスクを有する被加工物が、前記プラズマ処理装置の前記チャンバ内に設けられたステージ上に載置された状態で実行され、
前記多孔質膜内において前記第1のガスの毛管凝縮が生じるよう、前記チャンバに前記第1のガスを供給する工程であり、前記チャンバ内における前記第1のガスの分圧、又は、前記第1のガスのみが前記チャンバに供給されるときの前記チャンバ内における該第1のガスの圧力は、前記多孔質膜内で該第1のガスの毛管凝縮が生じる臨界圧力よりも高く、該第1のガスの飽和蒸気圧よりも低い、該工程と、
前記多孔質膜をエッチングするために、前記プラズマ処理装置の前記チャンバ内において前記第2のガスのプラズマを生成する工程と、
を含む、方法。 - 前記第1のガスを供給する前記工程の実行前に、前記排気装置によって前記第2の流路内のガスを排気する工程を更に含む、請求項8に記載の方法。
- 前記プラズマ処理装置は請求項2〜4の何れか一項に記載のプラズマ処理装置であり、
前記第2の流路内のガスを排気する前記工程の実行時に、前記第1の開閉バルブが閉じられる、請求項9に記載の方法。 - 前記第2のガスのプラズマを生成する前記工程の実行後に、前記排気装置によって前記第2の流路内のガスを排気する工程を更に含む、請求項8に記載の方法。
- 前記プラズマ処理装置は請求項2〜4の何れか一項に記載のプラズマ処理装置であり、
前記第2の流路内のガスを排気する前記工程の実行時に、前記第1の開閉バルブが閉じられる、請求項11に記載の方法。 - 前記第1のガスを供給する前記工程及び前記第2のガスのプラズマを生成する前記工程が、交互に繰り返される、請求項8〜12の何れか一項に記載の方法。
- 前記第2のガスのプラズマを生成する前記工程において、前記チャンバに対する前記第1のガスの供給が停止される、請求項13に記載の方法。
- 前記第1のガスを供給する前記工程及び前記第2のガスのプラズマを生成する前記工程の交互の繰り返し中に、前記第1のガスの流量が段階的に減少される、請求項14に記載の方法。
- 前記第1のガスを供給する前記工程及び前記第2のガスのプラズマを生成する前記工程にわたって、前記第1のガス及び前記第2のガスが前記チャンバに供給される、請求項13に記載の方法。
- 前記第2のガスのプラズマを生成する前記工程において、前記チャンバに供給される前記第2のガスの流量が、段階的に増加される、請求項16に記載の方法。
- 前記第1のガスを供給する前記工程及び前記第2のガスのプラズマを生成する前記工程にわたって、前記第1のガス及び前記第2のガスが前記チャンバに供給される、請求項8〜12の何れか一項に記載の方法。
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