JP6828217B2 - Ｘ線位相コントラスト及び／又は暗視野イメージングのための回折格子およびその製造方法 - Google Patents

Ｘ線位相コントラスト及び／又は暗視野イメージングのための回折格子およびその製造方法 Download PDF

Info

Publication number
JP6828217B2
JP6828217B2 JP2020512884A JP2020512884A JP6828217B2 JP 6828217 B2 JP6828217 B2 JP 6828217B2 JP 2020512884 A JP2020512884 A JP 2020512884A JP 2020512884 A JP2020512884 A JP 2020512884A JP 6828217 B2 JP6828217 B2 JP 6828217B2
Authority
JP
Japan
Prior art keywords
gold
diffraction grating
absorption energy
edge absorption
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2020512884A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020534514A5 (https=
JP2020534514A (ja
Inventor
トーマス ケーラー
トーマス ケーラー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips NV filed Critical Koninklijke Philips NV
Publication of JP2020534514A publication Critical patent/JP2020534514A/ja
Publication of JP2020534514A5 publication Critical patent/JP2020534514A5/ja
Application granted granted Critical
Publication of JP6828217B2 publication Critical patent/JP6828217B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/40—Arrangements for generating radiation specially adapted for radiation diagnosis
    • A61B6/4035—Arrangements for generating radiation specially adapted for radiation diagnosis the source being combined with a filter or grating
    • A61B6/4042—K-edge filters
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/42—Arrangements for detecting radiation specially adapted for radiation diagnosis
    • A61B6/4291—Arrangements for detecting radiation specially adapted for radiation diagnosis the detector being combined with a grid or grating
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/48—Diagnostic techniques
    • A61B6/484—Diagnostic techniques involving phase contrast X-ray imaging
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/041—Phase-contrast imaging, e.g. using grating interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
    • G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Medical Informatics (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • Animal Behavior & Ethology (AREA)
  • Surgery (AREA)
  • Molecular Biology (AREA)
  • Biomedical Technology (AREA)
  • Biophysics (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
JP2020512884A 2017-09-06 2018-08-24 Ｘ線位相コントラスト及び／又は暗視野イメージングのための回折格子およびその製造方法 Expired - Fee Related JP6828217B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP17189540.2 2017-09-06
EP17189540.2A EP3454051A1 (en) 2017-09-06 2017-09-06 Diffraction grating for x-ray phase contrast and/or dark-field imaging
PCT/EP2018/072833 WO2019048252A1 (en) 2017-09-06 2018-08-24 DIFFRACTION NETWORK FOR X-RAY IMAGING IN PHASE CONTRAST AND / OR ON BLACK BACKGROUND

Publications (3)

Publication Number Publication Date
JP2020534514A JP2020534514A (ja) 2020-11-26
JP2020534514A5 JP2020534514A5 (https=) 2021-01-14
JP6828217B2 true JP6828217B2 (ja) 2021-02-10

Family

ID=59811101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020512884A Expired - Fee Related JP6828217B2 (ja) 2017-09-06 2018-08-24 Ｘ線位相コントラスト及び／又は暗視野イメージングのための回折格子およびその製造方法

Country Status (5)

Country Link
US (1) US11107599B2 (https=)
EP (2) EP3454051A1 (https=)
JP (1) JP6828217B2 (https=)
CN (1) CN111051863A (https=)
WO (1) WO2019048252A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3454051A1 (en) * 2017-09-06 2019-03-13 Koninklijke Philips N.V. Diffraction grating for x-ray phase contrast and/or dark-field imaging
EP3834731A1 (en) 2019-12-12 2021-06-16 Koninklijke Philips N.V. Combined k-edge filters for dose reduction in x-ray imaging
EP4407635A1 (en) * 2023-01-30 2024-07-31 Koninklijke Philips N.V. Microstructure for selective transmission of electromagnetic radiation
CN116577357B (zh) * 2023-05-15 2025-09-26 中国科学技术大学 基于x射线阵列靶光源的光栅相衬成像系统的调试方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5200327B2 (ja) * 2006-03-31 2013-06-05 凸版印刷株式会社 反射型フォトマスクブランク及びその製造方法、反射型フォトマスク及びその製造方法、並びに、極端紫外光の露光方法
DE102008049200B4 (de) 2008-09-26 2010-11-11 Paul Scherrer Institut Verfahren zur Herstellung von röntgenoptischen Gittern, röntgenoptisches Gitter und Röntgen-System
US9315663B2 (en) * 2008-09-26 2016-04-19 Mikro Systems, Inc. Systems, devices, and/or methods for manufacturing castings
EP2168488B1 (de) 2008-09-30 2013-02-13 Siemens Aktiengesellschaft Röntgen-CT-System zur Röntgen-Phasenkontrast-und/oder Röntgen-Dunkelfeld-Bildgebung
CN101413905B (zh) * 2008-10-10 2011-03-16 深圳大学 X射线微分干涉相衬成像系统
US8855265B2 (en) * 2009-06-16 2014-10-07 Koninklijke Philips N.V. Correction method for differential phase contrast imaging
US8999435B2 (en) * 2009-08-31 2015-04-07 Canon Kabushiki Kaisha Process of producing grating for X-ray image pickup apparatus
JP5627247B2 (ja) 2010-02-10 2014-11-19 キヤノン株式会社 マイクロ構造体の製造方法および放射線吸収格子
JP5660910B2 (ja) * 2010-03-30 2015-01-28 富士フイルム株式会社 放射線画像撮影用グリッドの製造方法
DE102010017426A1 (de) * 2010-06-17 2011-12-22 Karlsruher Institut für Technologie Gitter aus mindestens zwei Materialien für die Röntgenbildgebung
JP2012047688A (ja) * 2010-08-30 2012-03-08 Fujifilm Corp 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
JP2012047687A (ja) * 2010-08-30 2012-03-08 Fujifilm Corp 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
JP2012093163A (ja) * 2010-10-26 2012-05-17 Canon Inc Ｘ線分光システム
JP2012132793A (ja) * 2010-12-22 2012-07-12 Fujifilm Corp 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
JP5714968B2 (ja) * 2011-04-15 2015-05-07 株式会社日立ハイテクサイエンス Ｘ線タルボ干渉計用回折格子及びその製造方法、並びにｘ線タルボ干渉計
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
JP2013116270A (ja) * 2011-12-05 2013-06-13 Canon Inc Ｘ線撮像装置
JP2014006194A (ja) * 2012-06-26 2014-01-16 Canon Inc 構造体の製造方法
CN104622492A (zh) * 2013-11-11 2015-05-20 中国科学技术大学 一种x射线光栅相位衬度成像装置和方法
JP2015221192A (ja) * 2014-04-30 2015-12-10 キヤノン株式会社 Ｘ線遮蔽格子および該ｘ線遮蔽格子を備えたｘ線トールボット干渉計
CN106535769B (zh) * 2014-05-01 2020-03-13 斯格瑞公司 X射线干涉成像系统
AT14686U1 (de) * 2015-01-27 2016-04-15 Plansee Se Streustrahlenraster
WO2017036729A1 (en) * 2015-09-01 2017-03-09 Paul Scherrer Institut Method for fabricating high aspect ratio gratings for phase contrast imaging
CN106290414B (zh) * 2016-07-29 2019-10-22 中国科学技术大学 一种x射线光栅相衬成像装置和成像方法
JPWO2018066198A1 (ja) * 2016-10-06 2019-06-24 株式会社島津製作所 回折格子ユニット、格子ユニットの製造方法およびｘ線位相イメージ撮影装置
EP3454051A1 (en) * 2017-09-06 2019-03-13 Koninklijke Philips N.V. Diffraction grating for x-ray phase contrast and/or dark-field imaging

Also Published As

Publication number Publication date
JP2020534514A (ja) 2020-11-26
WO2019048252A1 (en) 2019-03-14
CN111051863A (zh) 2020-04-21
EP3679359A1 (en) 2020-07-15
US11107599B2 (en) 2021-08-31
US20210065923A1 (en) 2021-03-04
EP3454051A1 (en) 2019-03-13
EP3679359B1 (en) 2021-01-13

Similar Documents

Publication Publication Date Title
CN101013613B (zh) X射线设备的焦点-检测器装置的x射线光学透射光栅
US7564941B2 (en) Focus-detector arrangement for generating projective or tomographic phase contrast recordings with X-ray optical gratings
CN102047344B (zh) 用于x射线的源光栅、用于x射线相衬图像的成像装置和x射线计算层析成像系统
RU2545319C2 (ru) Формирование фазово-контрастных изображений
JP5777360B2 (ja) Ｘ線撮像装置
JP5127249B2 (ja) Ｘ線装置の焦点‐検出器装置のｘ線光学透過格子
JP6828217B2 (ja) Ｘ線位相コントラスト及び／又は暗視野イメージングのための回折格子およびその製造方法
CN102187207B (zh) X射线成像装置和x射线成像方法
US9907524B2 (en) Material decomposition technique using x-ray phase contrast imaging system
US20120250823A1 (en) Calibration of differential phase-contrast imaging systems
EP2442722A1 (en) Correction method for differential phase contrast imaging
CN102656644A (zh) 具有即时相位步进的非平行光栅装置、x射线系统及使用
JP2012090945A (ja) 放射線検出装置、放射線撮影装置、放射線撮影システム
JP2013536403A (ja) 少なくとも二つの材料から成るｘ線撮像用の格子
JP2013541699A (ja) サンプリングを改善した微分位相差イメージング
JP6106809B2 (ja) 可動式格子を含む微分位相コントラスト撮像装置
JP2010253157A (ja) Ｘ線干渉計撮影装置及びｘ線干渉計撮影方法
JP6688795B2 (ja) Ｘ線位相コントラストトモシンセシス撮像に対する検出器及び撮像システム
US11000249B2 (en) X-ray detector for grating-based phase-contrast imaging
WO2019171920A1 (ja) 放射線位相撮像装置
JP5733908B2 (ja) Ｘ線撮像装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20201118

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20201118

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20201118

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20201125

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20201222

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210120

R150 Certificate of patent or registration of utility model

Ref document number: 6828217

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees